Electron Beam Apparatus and Method for Production of Its Specimen Chamber
    62.
    发明申请
    Electron Beam Apparatus and Method for Production of Its Specimen Chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号:US20080048118A1

    公开(公告)日:2008-02-28

    申请号:US11907375

    申请日:2007-10-11

    IPC分类号: G01N23/00

    摘要: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    摘要翻译: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室,其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金,镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Ribbon beam ion implanter cluster tool
    63.
    发明申请
    Ribbon beam ion implanter cluster tool 有权
    丝带束离子注入机群集工具

    公开(公告)号:US20070262271A1

    公开(公告)日:2007-11-15

    申请号:US11432977

    申请日:2006-05-12

    IPC分类号: H01J37/317

    摘要: An ion implantation cluster tool for implanting ions into a workpiece is provided, wherein a plurality of beamline assemblies having a respective plurality of ion beamlines associated therewith are positioned about a common process chamber. Each of the plurality of ion beamline assemblies are selectively isolated from the common process chamber, and the plurality of beamline intersect at a processing region of the process chamber. A scanning apparatus positioned within the common process chamber is operable to selectively translate a workpiece holder in one or more directions through each of the plurality of ion beamlines within the processing region, and a common dosimetry apparatus within the common process chamber is operable to measure one or more properties of each of the plurality of ion beamlines. A load lock chamber is operably coupled to the common process chamber for exchange of workpieces between the common process chamber and an external environment.

    摘要翻译: 提供了用于将离子注入到工件中的离子注入簇工具,其中具有与其相关联的多个离子束线的多个束线组件围绕公共处理室定位。 多个离子束线组件中的每一个与公共处理室选择性地隔离,并且多个束线在处理室的处理区域相交。 定位在公共处理室内的扫描设备可操作以选择性地将工件保持器在一个或多个方向上通过处理区域内的多个离子束线中的每一个,并且公共处理室内的常见剂量测量装置可操作以测量一个 或更多的多个离子束线中的每一个的性质。 负载锁定室可操作地联接到公共处理室,用于在公共处理室和外部环境之间交换工件。

    Simplified reticle stage removal system for an electron beam system
    64.
    发明授权
    Simplified reticle stage removal system for an electron beam system 失效
    用于电子束系统的简化标线片去除系统

    公开(公告)号:US06815695B2

    公开(公告)日:2004-11-09

    申请号:US10056017

    申请日:2002-01-28

    IPC分类号: H01L2100

    摘要: A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or pivotably attached thereto. The angled opening provides access to a reticle stage housed within the reticle chamber. The angled opening further permits removal of the reticle stage from the reticle chamber without having to disassemble and remove the optics system of the electron beam system. This reduces maintenance and repair costs, as well as reduces down time of the electron beam system.

    摘要翻译: 与电子束系统一起使用的简化掩模版去除系统。 简化的掩模版去除系统包括具有成角度的开口的标线室和可拆卸地或可枢转地附接到其上的维护面板。 倾斜的开口提供了进入分隔板室内的掩模版阶段。 成角度的开口还允许从标线室移除光罩台,而不必拆卸和移除电子束系统的光学系统。 这样可以减少维护和修理成本,同时减少电子束系统的停机时间。

    Apparatus for tilting a beam system
    65.
    发明授权
    Apparatus for tilting a beam system 有权
    用于倾斜梁系统的装置

    公开(公告)号:US06661009B1

    公开(公告)日:2003-12-09

    申请号:US10159790

    申请日:2002-05-31

    IPC分类号: H01J3700

    摘要: The present invention provides a column tilt apparatus and method for providing an off-normal angle of incidence of a beam in a scanned beam system onto a substrate passing through the eucentric point that is electro-mechanically adjustable during operation while maintaining vacuum integrity of the column and work chamber, and without introducing significant vibrations.

    摘要翻译: 本发明提供了一种列倾斜装置和方法,用于将扫描光束系统中的光束的偏离正常入射角提供给通过在操作期间电机械可调节的偏心点的基板,同时保持色谱柱的真空完整性 和工作室,没有引起显着的振动。

    Simplified reticle stage removal system for an electron beam system
    66.
    发明申请
    Simplified reticle stage removal system for an electron beam system 失效
    用于电子束系统的简化标线片去除系统

    公开(公告)号:US20030141461A1

    公开(公告)日:2003-07-31

    申请号:US10056017

    申请日:2002-01-28

    摘要: A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or pivotably attached thereto. The angled opening provides access to a reticle stage housed within the reticle chamber. The angled opening further permits removal of the reticle stage from the reticle chamber without having to disassemble and remove the optics system of the electron beam system. This reduces maintenance and repair costs, as well as reduces down time of the electron beam system.

    摘要翻译: 与电子束系统一起使用的简化掩模版去除系统。 简化的掩模版去除系统包括具有成角度的开口的标线室和可拆卸地或可枢转地附接到其上的维护面板。 倾斜的开口提供了进入分隔板室内的掩模版阶段。 成角度的开口还允许从标线室移除光罩台,而不必拆卸和移除电子束系统的光学系统。 这样可以减少维护和修理成本,同时减少电子束系统的停机时间。

    Fluid bearing vacuum seal assembly
    67.
    发明授权
    Fluid bearing vacuum seal assembly 有权
    流体轴承真空密封组件

    公开(公告)号:US06274875B1

    公开(公告)日:2001-08-14

    申请号:US09293941

    申请日:1999-04-19

    IPC分类号: H01J3720

    摘要: A fluid bearing vacuum seal assembly comprises an annular stator with first and second opposed surfaces, at least part of the first surface defining a first bearing surface. The stator also defines an aperture having a wall extending between the first and second surfaces. The assembly also comprises a rotor with first and second opposed surfaces, the second surface defining in part a second bearing surface which is supported relative to the first bearing surface in use so that the rotor is rotatable relative to the stator. A cylindrical wall projects axially from the second surface of the rotor through the aperture in the stator. An annular flange projects radially outwardly from the cylindrical wall adjacent to the second surface of the stator. At least one annular differential pumping channel is defined in each of the first and second surfaces of the stator and the wall which connects the first and second surfaces. This configuration allows the differential pumping channels to be spaced apart to a greater extent, improving the performance of the vacuum seal and allowing a better vacuum to be achieved.

    摘要翻译: 流体轴承真空密封组件包括具有第一和第二相对表面的环形定子,所述第一表面的至少一部分限定第一支承表面。 定子还限定了具有在第一和第二表面之间延伸的壁的孔。 组件还包括具有第一和第二相对表面的转子,第二表面部分地限定第二支承表面,该第二支承表面在使用中相对于第一支承表面支撑,使得转子可相对于定子旋转。 圆柱形壁从转子的第二表面通过定子中的孔轴向突出。 环形凸缘从与定子的第二表面相邻的圆柱形壁径向向外突出。 至少一个环形差动泵送通道限定在定子和连接第一和第二表面的壁的第一和第二表面中的每一个中。 这种构造允许差分泵送通道在更大程度上间隔开,从而改善了真空密封件的性能并且实现了更好的真空。

    Domed extension for process chamber electrode
    69.
    发明授权
    Domed extension for process chamber electrode 失效
    处理室电极的圆顶延伸

    公开(公告)号:US5480052A

    公开(公告)日:1996-01-02

    申请号:US141456

    申请日:1993-10-22

    摘要: A domed dielectric extension is set atop a standard electrode in a bell jar shaped process chamber to decrease electrical interaction between the electrode and the process chamber and thereby decrease the stagnant plasma in the region between the electrode and the process chamber lid that promotes polymer deposition upon the inner surface of a process chamber lid. The extension, made of a process inert dielectric material such as polycarbonate, has an upper surface that is curved to conform to the shape of the inner surface of the process chamber lid and that is precisely spaced from the upper portion of the process chamber lid inner surface.

    摘要翻译: 圆顶形电介质延伸器设置在钟罩形状处理室中的标准电极顶部,以减小电极和处理室之间的电相互作用,从而减少电极和处理室盖之间的区域中滞留的等离子体,从而促进聚合物沉积 处理室盖的内表面。 由诸如聚碳酸酯的工艺惰性介电材料制成的延伸部具有弯曲的上表面,以适应处理室盖的内表面的形状并且与处理室盖内部的上部精确地间隔开 表面。

    Integrated electron optical/differential pumping/imaging signal
detection system for an environmental scanning electron microscope
    70.
    发明授权
    Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope 失效
    用于环境扫描电子显微镜的集成电子光学/差分泵浦/成像信号检测系统

    公开(公告)号:US4823006A

    公开(公告)日:1989-04-18

    申请号:US158208

    申请日:1988-02-19

    摘要: This invention provides for an integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope (ESEM). The ESEM includes a substantially cylindrical objective lens magnetic housing containing an axially disposed vacuum liner tube and containing means for magnetically focusing a beam of electrons passing through said liner tube. An annular ring comprised of magnetic materials abuts said magnetic housing at the lower end thereof and contains at least two pumping ports therein located axially with respect to one another. At least two annular nonmagnetic diaphragms and a final magnetic annular diaphragm are attached to the annular ring at different axial locations and extending inwardly therefrom. The diaphragms define at least two interior passages which each communicate with one of the pumping ports formed in the annular ring. A combination aperture holder and electron detector is releasably received and sealed with in the central openings of the annular diaphragms. The aperture holder has apertures therein for the passage of the electron beam and gas into and out of the specimen chamber of the ESEM and the interior passages and has electron detector means associated with the lower portion thereof.

    摘要翻译: 本发明提供了一种用于环境扫描电子显微镜(ESEM)的集成电子光学/差分泵浦/成像信号检测系统。 ESEM包括基本上圆柱形的物镜磁性壳体,其包含轴向设置的真空衬套管和用于磁化聚焦通过所述衬管的电子束的容纳装置。 由磁性材料构成的环形环在其下端邻接所述磁性壳体并且在其中包含至少两个相对于彼此轴向的泵送端口。 至少两个环形非磁性膜片和最终的磁性环形隔膜在不同的轴向位置附接到环形环并从其向内延伸。 隔膜限定至少两个内部通道,每个内部通道与形成在环形环中的一个泵送端口连通。 组合的孔保持器和电子检测器可释放地接收并密封在环形隔膜的中心开口中。 孔保持器具有用于电子束和气体进入和离开ESEM和内部通道的样本室的孔,并具有与其下部相关联的电子检测器装置。