Method of estimating chordal holdup values of gas, oil and water for tomographic imaging of a three-phase flow through a volume
    71.
    发明授权
    Method of estimating chordal holdup values of gas, oil and water for tomographic imaging of a three-phase flow through a volume 有权
    估算气体,油和水的弦状滞留值用于通过体积的三相流的断层成像的方法

    公开(公告)号:US09291579B2

    公开(公告)日:2016-03-22

    申请号:US14111772

    申请日:2012-04-16

    Abstract: A method of estimating chordal holdup values of gas, oil, and water (εG, εO, εW) for tomographic imaging of a three-phase flow through a volume, including: providing an X-ray source for irradiating through said volume and X-ray sensors for discriminating between a first and a second radiation bands, conducting first calibration measurements (IGS, IOS, IWS) of said first radiation band, conducting second calibration measurements (IGH, IOH, IWH) of said second radiation band, arranging a mixture of two or more fluids, irradiating said volume and conducting X-ray measurements (IS, IH) in said radiation bands, establishing a relationship between a function of holdup values f(εG, εW) of at least gas and water and said X-ray measurements (IS, IH), searching holdup values (εG, εW) that minimize said function of holdup values f(εG, εW) under the constraints of the sum of said holdup values is more than or equal to zero and less than or equal to one, i.e. that 0≦εG+εW≦1.

    Abstract translation: 一种估计气体,油和水(&Egr; G,&egr; O,&egr; W)的弦状滞留值用于通过体积的三相流的断层成像的方法,包括:提供用于照射的X射线源 通过所述体积和X射线传感器来区分第一和第二辐射带,进行所述第一辐射带的第一校准测量(IGS,IOS,IWS),进行所述第二辐射带的第二校准测量(IGH,IOH,IWH) 辐射带,布置两种或更多种流体的混合物,照射所述体积并在所述辐射带中进行X射线测量(IS,IH),建立保持值f(&egr; G,&egr; W)的函数之间的关系, 至少气体和水以及所述X射线测量(IS,IH),搜索在约束条件下使滞留值f(&egr; G,&egr; W)的所述功能最小化的保持值(&egr; G,&egr; W) 所述保持值的总和大于或等于零且小于或等于1,即tha t 0≦̸&egr; G +&egr; W≦̸ 1。

    Mask layout patterns for closely spaced primitives in phase shift photolithography masks
    72.
    发明授权
    Mask layout patterns for closely spaced primitives in phase shift photolithography masks 有权
    在相移光刻掩模中用于紧密间隔的基元的掩模布局图案

    公开(公告)号:US09122169B2

    公开(公告)日:2015-09-01

    申请号:US13977638

    申请日:2011-12-29

    CPC classification number: G03F1/68 G03F1/26 G03F1/70

    Abstract: Improved mask layout patterns are described for closely spaced primitives in phase shift photolithography masks. In one example, at least a portion of a photolithography mask layout is decomposed into primitives. Jogs are identified from among the primitives, the jogs being characterized by three adjacent corners. E-fields are determined for the identified jogs and are applied to synthesize an electric field at a substrate. The mask layout is corrected using the synthesized electric field and a printed wafer pattern is calculated.

    Abstract translation: 在相移光刻掩模中描述了用于紧密间隔的基元的改进的掩模布局图案。 在一个示例中,光刻掩模布局的至少一部分被分解为基元。 从原始图像中识别出慢跑,其特征在于三个相邻角落。 为识别的点动确定电场,并且被应用于在衬底处合成电场。 使用合成电场校正掩模布局,并计算印刷晶片图案。

    Client assisted multicasting for audio and video streams
    75.
    发明授权
    Client assisted multicasting for audio and video streams 有权
    客户端协助音频和视频流多播

    公开(公告)号:US08868658B2

    公开(公告)日:2014-10-21

    申请号:US13459002

    申请日:2012-04-27

    CPC classification number: H04N21/6405 H04L12/1854

    Abstract: A method, a system and computer readable storage media facilitate receiving a data stream from a host media server that is outside of a network, designating a multicasting source within the network to receive the data stream from the host media server, and multicasting the data stream from the multicasting source to a plurality of client devices within the network.

    Abstract translation: 方法,系统和计算机可读存储介质便于从网络外部的主机媒体服务器接收数据流,指定网络内的多播源以从主机媒体服务器接收数据流,并且多播数据流 从组播源到网络内的多个客户端设备。

    Method and system for determining users that satisfy desired conditions
    76.
    发明授权
    Method and system for determining users that satisfy desired conditions 有权
    用于确定满足所需条件的用户的方法和系统

    公开(公告)号:US08224850B2

    公开(公告)日:2012-07-17

    申请号:US12191055

    申请日:2008-08-13

    Applicant: Sean Kelley Bin Hu

    Inventor: Sean Kelley Bin Hu

    CPC classification number: H04L67/24 H04L67/18 H04L67/306 H04W4/02

    Abstract: A method and system are disclosed allowing for determining those users of multiple users who satisfy desired condition(s), where characteristics of the users in at least some embodiments vary dynamically. In at least one embodiment, the method includes receiving at a server device a request for a determination regarding which of a plurality of users satisfies a plurality of conditions respectively relating to a plurality of user characteristics, and obtaining at the server device a conditions specification. Additionally, the method includes accessing at least one repository in which is stored information regarding the users to obtain at least some of the information, the information concerning the user characteristics. The method also includes making a determination regarding which of the users satisfies the plurality of conditions, obtaining at the first server device updated information from the at least one repository, re-evaluating the determination, and sending output information regarding the re-evaluated determination.

    Abstract translation: 公开了一种方法和系统,其允许确定满足期望条件的多个用户的那些用户,其中至少一些实施例中的用户的特征动态变化。 在至少一个实施例中,该方法包括在服务器设备处接收关于多个用户中的哪一个满足多个用户特征的多个条件的确定请求,以及在服务器设备处获取条件规范。 此外,该方法包括访问至少一个存储库,其中存储关于用户的信息以获得关于用户特征的信息中的至少一些信息。 该方法还包括确定哪个用户满足多个条件,从第一服务器设备获取来自至少一个存储库的更新信息,重新评估该确定,以及发送关于重新评估的确定的输出信息。

    Highly dilutable polishing concentrates and slurries
    78.
    发明授权
    Highly dilutable polishing concentrates and slurries 有权
    高度可稀释的抛光浓缩液和浆液

    公开(公告)号:US08192644B2

    公开(公告)日:2012-06-05

    申请号:US12580868

    申请日:2009-10-16

    CPC classification number: H01L21/30625 C09G1/02 H01L21/3212 H01L21/7684

    Abstract: The present disclosure provides a concentrate for use in chemical mechanical polishing slurries, and a method of diluting that concentrate to a point of use slurry. The concentrate comprises abrasive, complexing agent, and corrosion inhibitor, and the concentrate is diluted with water and oxidizer. These components are present in amounts such that the concentrate can be diluted at very high dilution ratios, without affecting the polishing performance.

    Abstract translation: 本公开提供了用于化学机械抛光浆料的浓缩物,以及将该浓缩物稀释到使用点浆料的方法。 浓缩物包括研磨剂,络合剂和缓蚀剂,浓缩物用水和氧化剂稀释。 这些组分的存在量使得浓缩物可以以非常高的稀释比稀释,而不影响抛光性能。

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