公开(公告)号：US07816022B2

公开(公告)日：2010-10-19

申请号：US12368027

申请日：2009-02-09

申请人： Claudia Ekstein ,  Hubert Holderer

发明人： Claudia Ekstein ,  Hubert Holderer

IPC分类号： B32B9/00 ,  B32B15/00

CPC分类号： H01L21/68757 ,  C04B37/005 ,  C04B37/006 ,  C04B37/008 ,  C04B37/045 ,  C04B2235/77 ,  C04B2235/9607 ,  C04B2237/06 ,  C04B2237/062 ,  C04B2237/083 ,  C04B2237/10 ,  C04B2237/12 ,  C04B2237/121 ,  C04B2237/122 ,  C04B2237/123 ,  C04B2237/125 ,  C04B2237/341 ,  C04B2237/365 ,  C04B2237/52 ,  C04B2237/62 ,  C04B2237/708 ,  C04B2237/72 ,  G03F7/707 ,  G03F7/70858 ,  G03F7/7095 ,  H01L21/67103 ,  Y10T428/12576 ,  Y10T428/24661 ,  Y10T428/249953 ,  Y10T428/31612 ,  Y10T428/31678

摘要： A composite structure for microlithography, in particular a holding device for a wafer, has two or more components, the surfaces of which are bonded together at least at one bond. At least one of the components consists of cordierite (Mg2Al4Si5O18) or of silicon carbide (SiC). Also disclosed is an optical arrangement, in particular a projection illumination apparatus for microlithography, having at least one such composite structure, preferably a wafer stage.

摘要翻译： 用于微光刻的复合结构，特别是用于晶片的保持装置具有两个或更多个部件，其表面至少在一个键处结合在一起。 至少一种组分由堇青石（Mg2Al4Si5O18）或碳化硅（SiC）组成。 还公开了光学装置，特别是用于微光刻的投影照明装置，其具有至少一个这样的复合结构，优选晶片台。

公开(公告)号：US07570343B2

公开(公告)日：2009-08-04

申请号：US11285283

申请日：2005-11-23

申请人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

发明人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

摘要翻译： 微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜 在投影透镜的图像平面中。 投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。 相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。

公开(公告)号：US07486382B2

公开(公告)日：2009-02-03

申请号：US11316160

申请日：2005-12-21

申请人： Stephan Back ,  Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schoengart ,  Markus Neumaier ,  Baerbel Schwaer ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

发明人： Stephan Back ,  Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schoengart ,  Markus Neumaier ,  Baerbel Schwaer ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/52 ,  G02B7/02

CPC分类号： G03F7/70825 ,  G03F7/70258

摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

摘要翻译： 用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。 线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。 剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。 线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。

公开(公告)号：US20090015947A1

公开(公告)日：2009-01-15

申请号：US11722091

申请日：2005-12-22

申请人： Hubert Holderer ,  Thomas Petasch ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan ,  Gary Krebs

发明人： Hubert Holderer ,  Thomas Petasch ,  Chris Reed ,  Dragos Pariza ,  Mike Meehan ,  Gary Krebs

IPC分类号： G02B7/00 ,  G01M11/00

CPC分类号： G03F7/70825 ,  G01M11/005 ,  G01M11/02 ,  Y10T29/49769

摘要： In an apparatus for mounting two or more optical elements that are each held in an individual mount or in a support structure, said optical elements are mounted in a common mount. The relative positioning of the optical elements (10, 11) in the common mount (18) can be set.

摘要翻译： 在用于安装两个或更多个光学元件的装置中，每个光学元件被保持在单独的安装件或支撑结构中，所述光学元件安装在公共安装件中。 可以设置光学元件（10,11）在公共安装件（18）中的相对定位。

公开(公告)号：US07400460B2

公开(公告)日：2008-07-15

申请号：US10599784

申请日：2005-04-16

申请人： Hubert Holderer ,  Bernhard Gellrich ,  Dirk Rexhaeuser

发明人： Hubert Holderer ,  Bernhard Gellrich ,  Dirk Rexhaeuser

IPC分类号： G02B7/02

CPC分类号： G02B7/021 ,  G02B13/143 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70825

摘要： The invention relates to a method for connection of an optical element to a mount structure, whereby in a first step the optical element is connected to the mount structure and in a second step the optical element is welded to the mount structure in the region of the connection.

摘要翻译： 本发明涉及一种用于将光学元件连接到安装结构的方法，由此在第一步骤中，光学元件连接到安装结构，并且在第二步骤中，光学元件在该区域中被焊接到安装结构 连接。

公开(公告)号：US07336342B2

公开(公告)日：2008-02-26

申请号：US10975496

申请日：2004-10-29

申请人： Hubert Holderer ,  Christian Hembd-Soellner ,  Rudolf Von Buenau ,  Ulrich Haag

发明人： Hubert Holderer ,  Christian Hembd-Soellner ,  Rudolf Von Buenau ,  Ulrich Haag

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B26/06 ,  G02B27/58 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70825

摘要： A catadioptric lens with optical elements, which are arranged along an optical axis and with at least one concave mirror located in the vicinity of a pupillar surface of the projection lens. The concave mirror is sub-divided into a number of annular or honeycomb mirror segments, which can be displaced independently in relation to one another with the aid of piezoelectric drive elements. The mirror can be used as a phase-shifting pupillar filter, whereby the filtration function can be adjusted by the relative displacement of the mirror elements in relation to one another.

摘要翻译： 一种具有光学元件的反射折射透镜，其沿光轴布置并且具有位于投影透镜的瞳面附近的至少一个凹面镜。 凹面镜被细分成许多环形或蜂窝状镜片段，它们可以通过压电驱动元件相对于彼此独立地移位。 反射镜可以用作相移瞳孔过滤器，由此可以通过镜元件相对于彼此的相对位移来调节过滤功能。

公开(公告)号：US20070285647A1

公开(公告)日：2007-12-13

申请号：US11728799

申请日：2007-03-27

申请人： Yim-Bun Kwan ,  Hubert Holderer ,  Johannes Deyhle ,  Claudia Ekstein

发明人： Yim-Bun Kwan ,  Hubert Holderer ,  Johannes Deyhle ,  Claudia Ekstein

IPC分类号： G03B27/58 ,  G03F1/00

CPC分类号： G03F7/707 ,  H01L21/67103 ,  H01L21/6838 ,  H01L21/6875 ,  H01L21/68757 ,  Y10T29/49826

摘要： There is provided a support structure for temporarily supporting a substrate in a support di-reaction during one of treatment and handling of the substrate comprising a base structure and at least one layer connected to the base structure. The at least one layer defines at least one protrusion of the support structure, the at least one protrusion being adapted to contact the substrate when the substrate is supported by the support structure. The at least one layer comprises a wear resistant material.

摘要翻译： 提供了一种支撑结构，用于在包括基础结构和连接到基部结构的至少一个层的基底的处理和处理之一期间临时支撑载体二反应中的基底。 所述至少一个层限定所述支撑结构的至少一个突出部，所述至少一个突出部适于在所述基板由所述支撑结构支撑时接触所述基板。 至少一层包括耐磨材料。

公开(公告)号：US07277157B2

公开(公告)日：2007-10-02

申请号：US10975496

申请日：2004-10-29

申请人： Hubert Holderer ,  Christian Hembd-Soellner ,  Rudolf Von Buenau ,  Ulrich Haag

发明人： Hubert Holderer ,  Christian Hembd-Soellner ,  Rudolf Von Buenau ,  Ulrich Haag

IPC分类号： G03B27/54 ,  G03B27/42

摘要： A catadioptric lens with optical elements, which are arranged along an optical axis and with at least one concave mirror located in the vicinity of a pupillar surface of the projection lens. The concave mirror is sub-divided into a number of annular or honeycomb mirror segments, which can be displaced independently in relation to one another with the aid of piezoelectric drive elements. The mirror can be used as a phase-shifting pupillar filter, whereby the filtration function can be adjusted by the relative displacement of the mirror elements in relation to one another.

公开(公告)号：US07242537B2

公开(公告)日：2007-07-10

申请号：US10944135

申请日：2004-09-17

申请人： Ulrich Weber ,  Hubert Holderer

发明人： Ulrich Weber ,  Hubert Holderer

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/003 ,  G02B7/1822 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

摘要： In a holding and positioning apparatus for an optical element, the optical element is mounted in a mounting ring and the mounting ring is mounted via at least one manipulator unit. The manipulator unit has a linear actuating element. The manipulator unit has a manipulator head, a movable manipulator part and a manipulator foot, the manipulator head being connected to the movable manipulator part via a solid body joint. The movable manipulator part is connected to the manipulator foot via an actuator and at least one solid body joint, the linear actuating element being coupled to the manipulator foot and the actuator.

摘要翻译： 在用于光学元件的保持和定位装置中，光学元件安装在安装环中，并且安装环经由至少一个操纵器单元安装。 操纵器单元具有线性致动元件。 操纵器单元具有操纵器头，可移动操纵器部分和操纵脚，操纵器头经由固体接头连接到可动操纵器部分。 可移动操纵器部分经由致动器和至少一个实体接头连接到操纵器脚，所述线性致动元件联接到操纵器脚和致动器。

公开(公告)号：US20060187430A1

公开(公告)日：2006-08-24

申请号：US11285283

申请日：2005-11-23

申请人： Aurelian Dodoc ,  Karl Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

发明人： Aurelian Dodoc ,  Karl Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.