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公开(公告)号:US11177268B2
公开(公告)日:2021-11-16
申请号:US16584710
申请日:2019-09-26
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Wei-Cheng Wu , Chien-Hung Chang
IPC: H01L27/11524 , H01L29/66 , H01L29/788
Abstract: A memory device includes a substrate, a transistor, and a memory cell. The substrate includes a cell region and a logic region. The transistor is over the logic region and includes a first metal gate stack. The memory cell is over the cell region and includes an erase gate. The erase gate is a metal gate stack.
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公开(公告)号:US11169207B2
公开(公告)日:2021-11-09
申请号:US16869775
申请日:2020-05-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wei-Cheng Wu , Hsien-Pin Hu , Shang-Yun Hou , Shin-Puu Jeng , Chen-Hua Yu , Chao-Hsiang Yang
Abstract: A device includes a test pad on a chip. A first microbump has a first surface area that is less than a surface area of the test pad. A first conductive path couples the test pad to the first microbump. A second microbump has a second surface area that is less than the surface area of the test pad. A second conductive path couples the test pad to the second microbump.
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公开(公告)号:US20210193618A1
公开(公告)日:2021-06-24
申请号:US17195903
申请日:2021-03-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Cheng-Hsien Hsieh , Li-Han Hsu , Wei-Cheng Wu , Hsien-Wei Chen , Der-Chyang Yeh , Chi-Hsi Wu , Chen-Hua Yu
IPC: H01L25/065 , H01L21/56 , H01L23/31 , H01L23/538 , H01L23/00 , H01L25/10 , H01L25/00
Abstract: An embodiment package includes a first integrated circuit die, an encapsulant around the first integrated circuit die, and a conductive line electrically connecting a first conductive via to a second conductive via. The conductive line includes a first segment over the first integrated circuit die and having a first lengthwise dimension extending in a first direction and a second segment having a second lengthwise dimension extending in a second direction different than the first direction. The second segment extends over a boundary between the first integrated circuit die and the encapsulant.
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公开(公告)号:US20210082845A1
公开(公告)日:2021-03-18
申请号:US17093190
申请日:2020-11-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Cheng-Hsien Hsieh , Hsien-Wei Chen , Chen-Hua Yu , Tsung-Shu Lin , Wei-Cheng Wu
Abstract: A redistribution layer with a landing pad is formed over a substrate with one or more mesh holes extending through the landing pad. The mesh holes may be arranged in a circular shape, and a passivation layer may be formed over the landing pad and the mesh holes. An opening is formed through the passivation layer and an underbump metallization is formed in contact with an exposed portion of the landing pad and extends over the mesh holes. By utilizing the mesh holes, sidewall delamination and peeling that might otherwise occur may be reduced or eliminated.
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公开(公告)号:US20200043939A1
公开(公告)日:2020-02-06
申请号:US16527044
申请日:2019-07-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wei-Cheng Wu , Hung-Pin Ko
IPC: H01L27/11526 , G11C16/04 , G11C16/08
Abstract: Provided are a semiconductor device and a method of manufacturing the same. The semiconductor device includes a substrate, a first FET, and a second FET formed over the substrate. The substrate has a first surface and a second surface, and the first surface and the second surface form a step. The first FET comprises a first gate dielectric layer over the first surface of the substrate. The second FET comprises a second gate dielectric layer thinner than the first gate dielectric layer over the second surface of the substrate.
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公开(公告)号:US20190057912A1
公开(公告)日:2019-02-21
申请号:US16148169
申请日:2018-10-01
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Tzuan-Horng Liu , Chen-Hua Yu , Hsien-Pin Hu , Tzu-Yu Wang , Wei-Cheng Wu , Shang-Yun Hou , Shin-Puu Jeng
IPC: H01L21/66 , H01L21/48 , H01L23/58 , G01R1/073 , H01L23/522 , H01L23/498 , H01L21/683 , H01L21/56
Abstract: An embodiment of the disclosure is a structure comprising an interposer. The interposer has a test structure extending along a periphery of the interposer, and at least a portion of the test structure is in a first redistribution element. The first redistribution element is on a first surface of a substrate of the interposer. The test structure is intermediate and electrically coupled to at least two probe pads.
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公开(公告)号:US10163497B2
公开(公告)日:2018-12-25
申请号:US15905058
申请日:2018-02-26
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wei Min Chan , Wei-Cheng Wu , Yen-Huei Chen
IPC: G11C11/419 , G11C11/412 , H01L27/11 , G11C11/413 , G11C8/16 , H01L27/06 , G11C5/02 , G11C8/08
Abstract: A three dimensional dual-port bit cell generally comprises a first portion disposed on a first tier, wherein the first portion includes a plurality of port elements. The dual-port bit cell also includes a second portion disposed on a second tier that is vertically stacked with respect to the first tier using at least one via, wherein the second portion includes a latch.
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公开(公告)号:US09905292B2
公开(公告)日:2018-02-27
申请号:US15422529
申请日:2017-02-02
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Wei Min Chan , Wei-Cheng Wu , Yen-Huei Chen
IPC: G11C5/06 , G11C11/419 , H01L27/11 , H01L27/06
CPC classification number: G11C11/419 , G11C5/025 , G11C8/08 , G11C8/16 , G11C11/412 , G11C11/413 , H01L27/0688 , H01L27/1104 , H01L2224/48227 , H01L2224/73265
Abstract: A three dimensional dual-port bit cell generally comprises a first portion disposed on a first tier, wherein the first portion includes a plurality of port elements. The dual-port bit cell also includes a second portion disposed on a second tier that is vertically stacked with respect to the first tier using at least one via, wherein the second portion includes a latch.
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公开(公告)号:US20170212167A1
公开(公告)日:2017-07-27
申请号:US15481891
申请日:2017-04-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wei-Cheng Wu , Hsien-Pin Hu , Shang-Yun Hou , Shin-Puu Jeng , Chen-Hua Yu , Chao-Hsiang Yang
CPC classification number: G01R31/2896 , G01R1/0416 , G01R31/2601 , G01R31/2884 , G01R31/2886 , G01R31/2889 , G01R31/2893 , H01L22/32 , H01L24/03 , H01L24/05 , H01L24/06 , H01L24/11 , H01L24/13 , H01L2224/02377 , H01L2224/0392 , H01L2224/0401 , H01L2224/05027 , H01L2224/05147 , H01L2224/05552 , H01L2224/05568 , H01L2224/05655 , H01L2224/0614 , H01L2224/0616 , H01L2224/1146 , H01L2224/1147 , H01L2224/11849 , H01L2224/13005 , H01L2224/13083 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13139 , H01L2224/13147 , H01L2224/13155 , H01L2224/14131 , H01L2224/16238 , H01L2924/20752 , H01L2924/00012 , H01L2924/00014 , H01L2924/01047 , H01L2924/014
Abstract: A device includes a test pad on a chip. A first microbump has a first surface area that is less than a surface area of the test pad. A first conductive path couples the test pad to the first microbump. A second microbump has a second surface area that is less than the surface area of the test pad. A second conductive path couples the test pad to the second microbump.
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公开(公告)号:US09618572B2
公开(公告)日:2017-04-11
申请号:US15170062
申请日:2016-06-01
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wei-Cheng Wu , Hsien-Pin Hu , Shang-Yun Hou , Shin-Puu Jeng , Chen-Hua Yu , Chao-Hsiang Yang
CPC classification number: G01R31/2896 , G01R1/0416 , G01R31/2601 , G01R31/2884 , G01R31/2886 , G01R31/2889 , G01R31/2893 , H01L22/32 , H01L24/03 , H01L24/05 , H01L24/06 , H01L24/11 , H01L24/13 , H01L2224/02377 , H01L2224/0392 , H01L2224/0401 , H01L2224/05027 , H01L2224/05147 , H01L2224/05552 , H01L2224/05568 , H01L2224/05655 , H01L2224/0614 , H01L2224/0616 , H01L2224/1146 , H01L2224/1147 , H01L2224/11849 , H01L2224/13005 , H01L2224/13083 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13139 , H01L2224/13147 , H01L2224/13155 , H01L2224/14131 , H01L2224/16238 , H01L2924/20752 , H01L2924/00012 , H01L2924/00014 , H01L2924/01047 , H01L2924/014
Abstract: A package includes a semiconductor chip. The semiconductor chip includes a test pad, and a plurality of microbump pads, wherein each microbump pad of the plurality of microbump pads is electrically connected to the test pad. The package further includes a substrate; and a plurality of microbumps configured to electrically connect the semiconductor chip to the substrate, wherein each microbump of the plurality of microbumps is electrically connected to a corresponding microbump pad of the plurality of microbump pads. The package further includes a package substrate, wherein the package substrate comprises a bump pad, wherein an area of the bump pad is greater than a combined area of the test pad and the plurality of microbump pads. The package further includes a bump configured to electrically connect the substrate to the package substrate.
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