SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20200043939A1

    公开(公告)日:2020-02-06

    申请号:US16527044

    申请日:2019-07-31

    Abstract: Provided are a semiconductor device and a method of manufacturing the same. The semiconductor device includes a substrate, a first FET, and a second FET formed over the substrate. The substrate has a first surface and a second surface, and the first surface and the second surface form a step. The first FET comprises a first gate dielectric layer over the first surface of the substrate. The second FET comprises a second gate dielectric layer thinner than the first gate dielectric layer over the second surface of the substrate.

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