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公开(公告)号：US3193722A
公开(公告)日：1965-07-06
申请号：US10252861
申请日：1961-04-12
申请人： UNITED AIRCRAFT CORP
发明人： WOLFGANG OPITZ
IPC分类号： H01J37/24
CPC分类号： H01J37/24
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公开(公告)号：US2301987A
公开(公告)日：1942-11-17
申请号：US30476339
申请日：1939-11-16
申请人： VON BORRIES BODO
发明人： VON BORRIES BODO
IPC分类号： H01J37/147 , H01J37/15 , H01J37/24
CPC分类号： H01J37/1471 , H01J37/15 , H01J37/24
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公开(公告)号：US20240242927A1
公开(公告)日：2024-07-18
申请号：US18562345
申请日：2022-05-24
发明人： Toshihiko OGURA
摘要： A sample holder for an impedance microscope according to an aspect includes: a first insulating film having a front surface and a back surface; a second insulating film having a front surface facing the back surface of the first insulating film and a back surface; a conductive film disposed on the front surface of the first insulating film; an electrode disposed to face the back surface of the second insulating film; and a conductive member fixed at a ground potential or a constant potential, in which the conductive member has an opening located between the first insulating film and the electrode.
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公开(公告)号：US20190088440A1
公开(公告)日：2019-03-21
申请号：US16196081
申请日：2018-11-20
发明人： Dirk Zeidler , Thomas Kemen , Christof Riedesel , Ralf Lenke
CPC分类号： H01J37/10 , H01J37/09 , H01J37/12 , H01J37/24 , H01J37/26 , H01J37/28 , H01J2237/0453 , H01J2237/1202
摘要： Particle beam system comprising a particle source; a first multi-aperture plate with a multiplicity of openings downstream of which particle beams are formed; a second multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams; an aperture plate with an opening which is penetrated by all the particles which also penetrate the openings in the first and the second multi-aperture plate; a third multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams, and with a multiplicity of field generators which respectively provide a dipole field or quadrupole field for a beam; and a controller for feeding electric potentials to the multi-aperture plates and the aperture plate so that the second openings in the second multi-aperture plate respectively act as a lens on the particle beams 3 and feed adjustable excitations to the field generators.
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公开(公告)号：US10074512B2
公开(公告)日：2018-09-11
申请号：US14795795
申请日：2015-07-09
发明人： Chun-Hsiang Yen , Barak Dee-Noor , Yuval Gronau , Ronen Hagai , Efim Vinnitsky , Yohanan Madmon
CPC分类号： H01J37/24 , G03F7/70875 , H01J37/20 , H01J2237/002 , H01J2237/20278 , H01L21/67248 , H01L21/68 , H01L22/12
摘要： A system that may include a chamber, a motorized system, a chuck, a controller, multiple temperature sensors and a cooling module; wherein the chuck is configured to support an object that is positioned within the chamber; wherein the motorized system is configured to move the chuck in relation to the chamber; wherein the multiple temperature sensors are configured to sense multiple temperatures of at least one point within the chamber; wherein the cooling module is configured to cool a unit of the motorized system; and wherein the controller is configured to control the cooling module in response to the multiple temperatures.
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公开(公告)号：US09966225B2
公开(公告)日：2018-05-08
申请号：US15329638
申请日：2014-07-28
申请人： HITACHI, LTD.
发明人： Daisuke Bizen , Makoto Sakakibara , Hiroya Ohta , Junichi Tanaka
IPC分类号： H01J37/24 , H01J37/244 , H01J37/26
CPC分类号： H01J37/244 , H01J37/222 , H01J37/24 , H01J37/261 , H01J37/28 , H01J2237/221 , H01J2237/226
摘要： A simulation device calculates a detection number of electrons generated by charged particles radiated to a sample by a simulation and generates a simulation image of the sample. The simulation device holds penetration length information (272) in which incidence conditions of the charged particles and a penetration length are associated with each other, sample configuration information (271) which shows a configuration of a sample, and emission electron number information in which the incidence conditions of the charged particles and an emission electron number are associated with each other. The simulation device calculates the number of electrons emitted from a predetermined incidence point, on the basis of incidence conditions at the predetermined incidence point, the penetration length information (272), the sample configuration information (271), and the emission electron number information.
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公开(公告)号：US09947504B2
公开(公告)日：2018-04-17
申请号：US15180735
申请日：2016-06-13
发明人： Klaus Hegele , Edgar Fichter , Michel Aliman , Dirk Preikszas , Christian Hendrich , Momme Mommsen , Michael Schnell , Kai Schubert
IPC分类号： H01J37/24 , H01J37/28 , H01J37/147 , H01J37/30 , H01J37/141 , H01J37/21 , H01J37/26
CPC分类号： H01J37/1477 , H01J37/141 , H01J37/147 , H01J37/21 , H01J37/24 , H01J37/265 , H01J37/28 , H01J37/3007 , H01J2237/103 , H01J2237/1504 , H01J2237/151 , H01J2237/152
摘要： The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.
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公开(公告)号：US09875879B2
公开(公告)日：2018-01-23
申请号：US15243753
申请日：2016-08-22
申请人： FEI Company
IPC分类号： H01J37/26 , H01J37/24 , H01J37/20 , H01J37/244 , H01J37/22
CPC分类号： H01J37/24 , H01J37/20 , H01J37/226 , H01J37/244 , H01J37/265 , H01J37/268 , H01J2237/0216
摘要： A method of using a Charged Particle Microscope comprising: A specimen holder, connected to a positioning stage, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; A detector, for detecting a flux of radiation emanating from the specimen in response to said irradiation, comprising the following steps: Providing the microscope with an interferential optical position sensor for determining a position of said specimen holder relative to a reference; Providing an automatic controller with a time-dependent position signal from said optical position sensor; Invoking said controller to use said signal to produce a vibration profile for the microscope.
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公开(公告)号：US09875874B2
公开(公告)日：2018-01-23
申请号：US15341699
申请日：2016-11-02
IPC分类号： H01J29/98
CPC分类号： H01J29/98 , H01J37/24 , H01J2237/0206 , H01J2237/06366 , H01J2237/3132
摘要： An apparatus for suppression of arcs in an electron beam generator including: a first module providing an operating voltage; a second module including a coil suitable for a voltage of at least 10 kV, and at least one free-wheeling diode connected in parallel to the coil; a third module including a first circuit component configured to detect a first actual value for electric voltage, and a first signal is producible when the first actual value falls below a first threshold value, a second circuit component by which a second actual value for electric current is detectable, and a second signal is generated when the second actual value exceeds a second threshold value, a control logic, which optionally links the first and second signals and a resultant output signal is producible; a semiconductor-based switch suitable for the voltage of at least 10 kV, which is opened based on the output signal.
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