公开(公告)号：US11878388B2

公开(公告)日：2024-01-23

申请号：US16009226

申请日：2018-06-15

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Kuan-Cheng Wang ,  Ching-Hua Hsieh ,  Yi-Yang Lei

IPC分类号： B24B37/26 ,  B24B37/16 ,  B24D11/04 ,  B24B37/22 ,  B24B37/24 ,  B24B7/22 ,  H01L21/321 ,  H01L23/00 ,  H01L21/48 ,  H01L21/687 ,  B24D13/14

CPC分类号： B24B37/22 ,  B24B7/228 ,  B24B37/245 ,  B24B37/26 ,  B24D11/04 ,  B24D13/142 ,  H01L21/3212 ,  H01L21/486 ,  H01L21/68764 ,  H01L24/08 ,  H01L2224/02372

摘要： A polishing pad, a polishing apparatus and a method of manufacturing a semiconductor package using the same are provided. In some embodiments, a polishing pad includes a sub-pad portion and a top pad portion over the sub-pad portion. The top pad portion includes a plurality of grooves having a first width and a plurality of openings having a second width different from the first width, and the openings are located in a center zone of the polishing pad.

公开(公告)号：US11471999B2

公开(公告)日：2022-10-18

申请号：US16042016

申请日：2018-07-23

申请人： Applied Materials, Inc.

发明人： Ashavani Kumar ,  Ashwin Chockalingam ,  Sivapackia Ganapathiappan ,  Rajeev Bajaj ,  Boyi Fu ,  Daniel Redfield ,  Nag B. Patibandla ,  Mario Dagio Cornejo ,  Amritanshu Sinha ,  Yan Zhao ,  Ranga Rao Arnepalli ,  Fred C. Redeker

IPC分类号： B24B37/24 ,  B24D11/04 ,  B24B37/26 ,  B24D18/00 ,  B24B37/16 ,  B24B37/20 ,  B33Y80/00 ,  B33Y10/00 ,  B29C64/112 ,  B33Y30/00 ,  H01L21/306

摘要： Embodiments described herein relate to integrated abrasive (IA) polishing pads, and methods of manufacturing IA polishing pads using, at least in part, surface functionalized abrasive particles in an additive manufacturing process, such as a 3D inkjet printing process. In one embodiment, a method of forming a polishing article includes dispensing a first plurality of droplets of a first precursor, curing the first plurality of droplets to form a first layer comprising a portion of a sub-polishing element, dispensing a second plurality of droplets of the first precursor and a second precursor onto the first layer, and curing the second plurality of droplets to form a second layer comprising portions of the sub-polishing element and portions of a plurality of polishing elements. Here, the second precursor includes functionalized abrasive particles having a polymerizable group chemically bonded to surfaces thereof.

公开(公告)号：US11040430B2

公开(公告)日：2021-06-22

申请号：US15443716

申请日：2017-02-27

申请人： Charles Neff

发明人： Charles Neff

IPC分类号： B24D5/14 ,  B24D11/04 ,  B24D18/00 ,  B24B5/04 ,  B41N3/04

摘要： The present disclosure relates to abrasives surfaces located on an outer diameter of a grinding wheel to provide grinding characteristics of both coarse and fine abrasive textures. The grinding wheel has a coarse abrasive portion located at one disclosure uses a transition band formed at an interface between the abrasive surfaces, that has an abrasive coating with a gradual change in texture from a coarse surface to a fine surface.

公开(公告)号：US11040429B2

公开(公告)日：2021-06-22

申请号：US15758371

申请日：2016-09-06

申请人： 3M INNOVATIVE PROPERTIES COMPANY

发明人： Bruce A. Sventek ,  David G. Baird ,  Adam J. Painter ,  Tammy J. Engfer ,  Dennis J. Stapleton ,  John J. Gagliardi

IPC分类号： B24D3/10 ,  B24D3/18 ,  B24D11/02 ,  B24D3/28 ,  B24D11/04 ,  B24D13/12 ,  B24D13/14 ,  B24B5/313 ,  B24B5/48 ,  B24B9/06 ,  B24B9/10

摘要： An abrasive rotary tool includes a tool shank defining an axis of rotation for the rotary tool, and an abrasive external working surface. The abrasive external working surface includes a resin, and a plurality of porous ceramic abrasive composites dispersed in the resin, the porous ceramic abrasive composites including individual abrasive particles dispersed in a porous ceramic matrix. At least a portion of the porous ceramic matrix comprises glassy ceramic material. A ratio of the average porous ceramic abrasive composite size to the average individual abrasive particle size is no greater than 15 to 1.

公开(公告)号：US20210107116A1

公开(公告)日：2021-04-15

申请号：US17114633

申请日：2020-12-08

申请人： Applied Materials, Inc.

发明人： Rajeev BAJAJ ,  Daniel REDFIELD ,  Mahendra C. ORILALL ,  Boyi FU ,  Aniruddh Jagdish KHANNA ,  Jason G. FUNG ,  Ashwin CHOCKALINGAM ,  Mayu YAMAMURA ,  Veera Raghava Reddy KAKIREDDY ,  Gregory E. MENK ,  Nag B. PATIBANDLA

IPC分类号： B24D11/00 ,  B24B37/22 ,  B24B37/24 ,  B24B37/26 ,  B24D11/04 ,  B24D3/28

摘要： Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

公开(公告)号：US20200262031A1

公开(公告)日：2020-08-20

申请号：US16859336

申请日：2020-04-27

申请人： SAINT-GOBAIN ABRASIVES, INC. ,  SAINT-GOBAIN ABRASIFS

发明人： Anuj SETH ,  Darrell K. Everts ,  Vivek Cheruvari Kottieth Raman

IPC分类号： B24D18/00 ,  B24D11/04 ,  B24D3/00

摘要： A coated abrasive article comprising a backing, an adhesive layer disposed in a discontinuous distribution on at least a portion of the backing, wherein the discontinuous distribution comprises a plurality of adhesive contact regions and at least one shaped abrasive particle is disposed on a majority of each of the discrete adhesive contact regions, wherein at least 50% of the shaped abrasive particles comprise a predetermined side orientation and have a tilt angle of at least 45 degrees, wherein the shaped abrasive particles comprise a polycrystalline material and are free of binder, wherein the first plurality of discrete adhesive contact regions comprise a predetermined two-dimensional shape as viewed from above, and wherein each of the discrete contact regions comprises a length, a width, or a combination thereof that substantially corresponds to a dimension of the at least one abrasive particle.

公开(公告)号：US20190217442A1

公开(公告)日：2019-07-18

申请号：US16359370

申请日：2019-03-20

申请人： Saint-Gobain Abrasives, Inc. ,  Saint-Gobain Abrasifs

发明人： Anthony C. GAETA ,  Anuj SETH ,  Christopher ARCONA ,  Doruk O. YENER ,  Jennifer H. CZEREPINSKI ,  Sujatha K. IYENGAR ,  Frank J. CSILLAG ,  William C. RICE ,  Satyalakshmi K. RAMESH ,  Gregory G. LAFOND ,  Sidath S. WIJESOORIYA ,  Adam D. LIOR ,  Alan J. BRANDES ,  Anil PARMAR ,  Paul BRAUN ,  Darrell K. EVERTS

IPC分类号： B24D3/00 ,  B24D11/04 ,  B24D18/00 ,  B24D7/02 ,  C09K3/14

CPC分类号： B24D3/001 ,  B24D7/02 ,  B24D11/04 ,  B24D18/00 ,  B24D18/0072 ,  B24D2203/00 ,  C09K3/1409 ,  Y10T428/24 ,  Y10T428/24372 ,  Y10T428/24893 ,  Y10T428/25

摘要： An abrasive article comprising a first group including a plurality of shaped abrasive particles overlying a backing, wherein the plurality of shaped abrasive particles of the first group define a first non-shadowing distribution relative to each other.

公开(公告)号：US10220487B2

公开(公告)日：2019-03-05

申请号：US15042777

申请日：2016-02-12

申请人： NexPlanar Corporation

发明人： Pradip K. Roy ,  Manish Deopura ,  Sudhanshu Misra

IPC分类号： C09K3/14 ,  B24B37/26 ,  B24D7/14 ,  B24D11/04 ,  B24D3/00 ,  B24D11/00 ,  B24D18/00

摘要： The present application relates to polishing pads for chemical mechanical planarization (CMP) of substrates, and methods of fabrication and use thereof. The pads described in this invention are customized to polishing specifications where specifications include (but not limited to) to the material being polished, chip design and architecture, chip density and pattern density, equipment platform and type of slurry used. These pads can be designed with a specialized polymeric nano-structure with a long or short range order which allows for molecular level tuning achieving superior thermo-mechanical characteristics. More particularly, the pads can be designed and fabricated so that there is both uniform and nonuniform spatial distribution of chemical and physical properties within the pads. In addition, these pads can be designed to tune the coefficient of friction by surface engineering, through the addition of solid lubricants, and creating low shear integral pads having multiple layers of polymeric material which form an interface parallel to the polishing surface. The pads can also have controlled porosity, embedded abrasive, novel grooves on the polishing surface, for slurry transport, which are produced in situ, and a transparent region for endpoint detection.

公开(公告)号：US10195718B2

公开(公告)日：2019-02-05

申请号：US15218381

申请日：2016-07-25

申请人： Paolo Ficai

发明人： Paolo Ficai

IPC分类号： B24D5/14 ,  B24D5/04 ,  B24D7/04 ,  B24D11/04

摘要： An abrasive grinding wheel (20) comprising an annular body (200) defining an abrasive front face (202) at least partly made of a layer of an abrasive mixture (21) and an opposite rear face (203), which grinding wheel (20) comprises an annular damping element (23) made of a resilient yielding material and fixed to the annular body (200), wherein the damping element (23) comprises a first face (231) facing towards the abrasive front face (202) and an opposite free second face (232) which defines at least a portion of the rear face (203) of the annular body (200).

公开(公告)号：US10183379B2

公开(公告)日：2019-01-22

申请号：US15310288

申请日：2015-05-19

申请人： 3M INNOVATIVE PROPERTIES COMPANY

发明人： Christopher J. Carter ,  Michael J. Annen ,  Gordon A. Kuhnley

IPC分类号： B24D11/04 ,  B24D11/00

摘要： Described herein is an improved abrasive material (300) in which the cutting performance is orientation-independent. The abrasive material (300) comprises an abrasive structure (310) including a plurality of elongate abrasive elements (320, 330) aligned to be define a first open square. A plurality of pyramidal abrasive elements (340, 350) arranged in a second open square are located within the first open square defined by the elongate elements (320, 330).