Li4Sr(BO3)2 Compound, Li4Sr(BO3)2 Nonlinear Optical Crystal, Preparation Method and Use Thereof
    71.
    发明申请
    Li4Sr(BO3)2 Compound, Li4Sr(BO3)2 Nonlinear Optical Crystal, Preparation Method and Use Thereof 有权
    Li4Sr(BO3)2化合物,Li4Sr(BO3)2非线性光学晶体,其制备方法和用途

    公开(公告)号:US20160137515A1

    公开(公告)日:2016-05-19

    申请号:US14900016

    申请日:2013-06-20

    摘要: The present invention relates to the field of nonlinear optical crystal materials and provided herein a Li4Sr(BO3)2 compound, a Li4Sr(BO3)2 nonlinear optical crystal as well as preparation method and use thereof. The Li4Sr(BO3)2 nonlinear optical crystal has a second harmonic conversion efficiency at 1064 nm of about two times that of a KH2PO4 (KDP) crystal, and an UV absorption cut-off edge less than 190 nm. Furthermore, the crystal did not disintegrate. By flux method with Li2O, Li2O-B2O and Li2O-B2O3-LiF used as flux agent, large-size and transparent Li4Sr(BO3)2 nonlinear optical crystal can grow. The Li4Sr(BO3)2 crystal had stable physicochemical properties, moderate hardness, and was easy to cut, processing, preserve and use. Therefore it can be used for preparing nonlinear optical devices and thus for developing nonlinear optical applications in the ultraviolet and deep-ultraviolet band.

    摘要翻译: 本发明涉及非线性光学晶体材料领域,本文提供了Li4Sr(BO3)2化合物,Li4Sr(BO3)2非线性光学晶体及其制备方法和用途。 Li4Sr(BO3)2非线性光学晶体在1064nm具有约为KH2PO4(KDP)晶体的二倍的二次谐波转换效率,以及小于190nm的UV吸收截止边。 此外,晶体没有分解。 通过Li2O,Li2O-B2O和Li2O-B2O3-LiF作为助熔剂的助熔剂,大尺寸和透明的Li4Sr(BO3)2非线性光学晶体可以生长。 Li4Sr(BO3)2晶体具有稳定的物理化学性质,硬度适中,易于切割,加工,保存和使用。 因此,它可以用于制备非线性光学器件,从而用于在紫外线和深紫外波段中开发非线性光学应用。

    METHOD AND DEVICE FOR FABRICATING A LAYER IN SEMICONDUCTOR MATERIAL
    75.
    发明申请
    METHOD AND DEVICE FOR FABRICATING A LAYER IN SEMICONDUCTOR MATERIAL 有权
    用于在半导体材料中制备层的方法和装置

    公开(公告)号:US20140158041A1

    公开(公告)日:2014-06-12

    申请号:US14131295

    申请日:2012-07-25

    申请人: Michel Bruel

    发明人: Michel Bruel

    IPC分类号: C30B19/10 C30B19/06

    摘要: The invention concerns a method for fabricating a substrate in semiconductor material characterized in that it comprises the steps of: starting from a donor substrate in a first semiconductor material at an initial temperature, contacting a surface of the donor substrate with a bath of a second semiconductor material held in the liquid state at a temperature higher than the initial temperature, the second semiconductor material being chosen so that its melting point is equal to or lower than the melting point of the first semiconductor material, solidifying the bath material on the surface to thicken the donor substrate with a solidified layer. The invention also concerns a device for implementing the method.

    摘要翻译: 本发明涉及一种用于制造半导体材料中的衬底的方法,其特征在于其包括以下步骤:从初始温度下的第一半导体材料中的施主衬底开始,将供体衬底的表面与第二半导体 在高于初始温度的温度下保持在液态的材料,选择第二半导体材料使其熔点等于或低于第一半导体材料的熔点,使表面上的浴材固化成稠化 施主衬底具有固化层。 本发明还涉及一种用于实现该方法的装置。

    Method of manufacturing Group III nitride crystals, method of manufacturing semiconductor substrate, Group III nitride crystals, semiconductor substrate, and electronic device
    76.
    发明申请
    Method of manufacturing Group III nitride crystals, method of manufacturing semiconductor substrate, Group III nitride crystals, semiconductor substrate, and electronic device 有权
    制造III族氮化物晶体的方法,制造半导体衬底的方法,III族氮化物晶体,半导体衬底和电子器件

    公开(公告)号:US20050011432A1

    公开(公告)日:2005-01-20

    申请号:US10884252

    申请日:2004-07-02

    IPC分类号: C30B19/04 C30B19/06 C30B19/00

    摘要: The present invention provides a method of manufacturing Group III nitride crystals that are of high quality, are manufactured efficiently, and are useful and usable as a substrate for semiconductor manufacturing processes. A semiconductor layer that is made of a semiconductor and includes crystal-nucleus generation regions at its surface is formed. The semiconductor is expressed by a composition formula of AluGavIn1-u-vN (where 0≦u≦1, 0≦v≦1, and u+v≦1). Group III nitride crystals then are grown on the semiconductor layer by bringing the crystal-nucleus generation regions of the semiconductor layer into contact with a melt in an atmosphere including nitrogen. The melt contains nitrogen, at least one Group III element selected from the group consisting of gallium, aluminum, and indium, and at least one of alkali metal and alkaline-earth metal.

    摘要翻译: 本发明提供一种制造高品质的III族氮化物晶体的方法,其有效制造,并且可用作半导体制造工艺的基板。 形成由半导体构成的半导体层,其表面具有晶核生成区域。 半导体由AluGavIn1-u-vN的组成式表示(其中0 <= u <= 1,0 <= v <= 1,u + v <= 1)。 然后通过在包括氮气的气氛中使半导体层的晶核生成区域与熔体接触,在半导体层上生长III族氮化物晶体。 熔体含有氮,至少一种选自镓,铝和铟的III族元素,以及碱金属和碱土金属中的至少一种。

    Method for making semiconductor body and photovoltaic device
    77.
    发明授权
    Method for making semiconductor body and photovoltaic device 失效
    制造半导体器件和光伏器件的方法

    公开(公告)号:US5712199A

    公开(公告)日:1998-01-27

    申请号:US466761

    申请日:1995-06-06

    摘要: A method of making a semiconductor body includes the steps of preparing a sheet-like substrate having an insulating film and holes which pass through the insulating film, the holes being disposed at a uniform density, preparing a solution in which a semiconductor material is dissolved, and conveying the sheet-like substrate along a surface of the solution so as to grow a single crystal nucleus from each of the holes and thereby form a set of single crystal semiconductors on the sheet-like substrate. A solar cell can be manufactured by forming a semiconductor active area on the sheet-like support member made of a conductive material by a process containing the above-described semiconductor body forming method, and then by forming an electrode which makes a pair with the sheet-like support member.

    摘要翻译: 制造半导体本体的方法包括以下步骤:制备具有绝缘膜的片状基材和穿过绝缘膜的孔,孔以均匀的密度设置,制备半导体材料溶解的溶液, 并且沿着溶液的表面输送片状基材,以从每个孔生长单晶核,从而在片状基材上形成一组单晶半导体。 可以通过通过包含上述半导体本体形成方法的工艺在由导电材料制成的片状支撑构件上形成半导体有源区域来制造太阳能电池,然后通过形成与片材成对的电极 类支撑构件。

    Liquid-phase epitaxy growth system and method for growing epitaxial layer
    78.
    发明授权
    Liquid-phase epitaxy growth system and method for growing epitaxial layer 失效
    液相外延生长系统和生长外延层的方法

    公开(公告)号:US5334278A

    公开(公告)日:1994-08-02

    申请号:US752856

    申请日:1991-08-30

    申请人: Song J. Lee

    发明人: Song J. Lee

    CPC分类号: C30B19/063

    摘要: The liquid-phase epitaxy system having the LPE boat consists of of a slider section, a source holder section, and a contacting well section, in which the distance between the first two contacting wells is different from that between the first two source holding wells, so that the concentration of the solutions can be controlled by the proper temperature profile, since the solution for melt-etch and the remaining solution for the epitaxial growth are not filled into the contacting wells at the same time.Thus, the present invention can easily perform the in-situ melt-etch and can improve the quality of the epitaxial layer and the epitaxial yield by minimizing the contamination of the melt-etched surface of the substrate.

    摘要翻译: 具有LPE舟的液相外延系统由滑块部分,源支架部分和接触井部分组成,其中前两个接触井之间的距离与前两个源保持井之间的距离不同, 因此溶液的浓度可以通过适当的温度分布来控制,因为用于熔融蚀刻的溶液和用于外延生长的剩余溶液不会同时填充到接触孔中。 因此,本发明可以容易地进行原位熔融蚀刻,并且可以通过使衬底的熔融蚀刻表面的污染最小化来提高外延层的质量和外延产率。

    Liquid phase epitaxial film growth apparatus
    79.
    发明授权
    Liquid phase epitaxial film growth apparatus 失效
    液相外延膜生长装置

    公开(公告)号:US5264190A

    公开(公告)日:1993-11-23

    申请号:US866489

    申请日:1992-04-10

    摘要: An apparatus for liquid phase epitaxial film growth includes a mother boat for supporting a substrate, a melt boat slidable on the mother boat for containing a melt and selectively bringing the substrate and the melt into contact, and a lid for opening and closing the melt boat. The mother boat is disposed in a quartz tube and push rods extend into the tube for sliding the lid to open and close the melt boat.

    摘要翻译: 一种用于液相外延膜生长的装置包括用于支撑基底的母船,可在母船上滑动以容纳熔体并且选择性地使基底和熔体接触的熔体舟和用于打开和关闭熔体舟的盖 。 母船设置在石英管中,推杆延伸到管中以滑动盖以打开和关闭熔体船。

    Liquid phase epitaxy apparatus and method
    80.
    发明授权
    Liquid phase epitaxy apparatus and method 失效
    液相外延装置及方法

    公开(公告)号:US4828648A

    公开(公告)日:1989-05-09

    申请号:US157557

    申请日:1988-02-19

    IPC分类号: C30B19/04 C30B19/06

    摘要: An apparatus and method for performing liquid phase epitaxy, mercury containment, substrate leveling, in situ annealing/doping and gas flushing in a liquid phase epitaxy growth of HgCdTe. The apparatus is a self contained unit comprising a transparent cover for providing access to the interior of the apparatus and for forming a gas impermeable seal between the apparatus and the cover. The apparatus also contains a leveling apparatus, a gas flushing apparatus, and an apparatus for the in situ doping/quench annealing of HgCdTe epitaxial films. The leveling apparatus comprising channels and leveling balls that travel therein which align themselves between scribe marks when the apparatus is in a level position. The gas flushing apparatus is comprised of a gaseous purge ball valve that opens and seals a flushing channel that lead from the interior of the invention to the external environment. The in situ doping/quench annealing apparatus is accomplished via a stabilized chamber ball valve which operates independently with respect to the gaseous purge ball valve, thereby allowing in situ doping leveling without effecting the atmospheric integrity of the vessel.

    摘要翻译: 一种用于在HgCdTe的液相外延生长中进行液相外延,汞封存,基板流平,原位退火/掺杂和气体冲洗的装置和方法。 该装置是一种自包含单元,包括透明盖,用于提供对装置内部的通路,并在装置和盖之间形成气体不可渗透的密封。 该装置还包含调平装置,气体冲洗装置和用于HgCdTe外延膜的原位掺杂/淬火退火的装置。 调平装置包括在其中行进的通道和调平球,当装置处于水平位置时,它们在划痕之间对齐。 气体冲洗装置由气体吹扫球阀组成,该气体吹扫球阀将从本发明的内部引导到外部环境的冲洗通道打开并密封。 原位掺杂/淬火退火装置通过稳定的室球阀实现,该稳定室球阀相对于气体吹扫球阀独立地操作,从而允许原位掺杂流平而不影响容器的大气完整性。