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公开(公告)号：US07411203B2
公开(公告)日：2008-08-12
申请号：US11647016
申请日：2006-12-27
IPC分类号： H01J49/00
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a ibeus defining a desired plasma initiation site, comprising; a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis genemily perpendicular to the target stream track from a desired stream truck intersecting the desired plasma initiation site.
摘要翻译： 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集 光学元件具有限定期望的等离子体起始位置的ibeus，包括： 目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中所述目标流轨迹由所述摄像机的成像速度导致太慢以不能成像形成所述目标的各个等离子体形成目标 流成像为目标流轨道; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流动车辆，在垂直于目标流轨迹的至少一个轴中至少一个轴上检测目标流轨迹的位置的误差。
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公开(公告)号：US06556612B2
公开(公告)日：2003-04-29
申请号：US09309478
申请日：1999-05-10
IPC分类号： H01S308
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70575 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： A line narrowed laser system having a spatial filter to filter light at wavelengths greater and/or smaller than a desired range of wavelengths. The laser system is line narrowed with a line narrowing mechanism having a dispersive element which disperses laser light into wavelength dependent directions. By spatially filtering the resulting beam the bandwidth of the beam can be reduced substantially. There is also a reduction of beam energy as a result of the spatial filtering but this reduction is substantially less than some other known techniques for reducing bandwidths. A preferred spatial filter, for reducing the bandwidth of a line narrowed gas discharge laser, includes two cylindrical mirrors separated by a distance equal to their focal lengths with a slit aperture positioned at the common focal line.
摘要翻译： 一种具有空间滤波器的线窄化激光系统，用于对波长较大和/或小于期望波长范围的波长进行滤光。 激光系统线条变窄，线条变窄机构具有将激光分散成波长相关方向的色散元件。 通过对所得到的光束进行空间滤波，可以显着地减小光束的带宽。 作为空间滤波的结果，还有光束能量的减少，但是这种减少远远小于用于减小带宽的一些其它已知的技术。 用于减小气体放电激光器线窄带宽的优选空间滤波器包括两个圆柱形反射镜，其间隔开等于其焦距的距离，并且狭缝孔位于公共焦线处。
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公开(公告)号：US20110192995A1
公开(公告)日：2011-08-11
申请号：US13087207
申请日：2011-04-14
IPC分类号： H05G2/00
摘要： An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.
摘要翻译： 公开了一种装置和方法，其包括或使用包括输出激光束的激光装置的EUV光源，将激光束引导到照射部位的光束传递系统，以及用于在照射部位与激光束相互作用的材料 创建用于处理衬底的EUV发光等离子体。
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公开(公告)号：US07928417B2
公开(公告)日：2011-04-19
申请号：US12288970
申请日：2008-10-24
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，使得在有效的等离子体产生能量下聚焦在小于约100μm的EUV目标液滴在所涉及的几何形状的约束条件下是不实际的 聚焦镜头。 驱动激光器可以包括CO2激光器。 驱动激光重定向机构可以包括镜子。
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公开(公告)号：US07655925B2
公开(公告)日：2010-02-02
申请号：US11897644
申请日：2007-08-31
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
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公开(公告)号：US07449704B2
公开(公告)日：2008-11-11
申请号：US11647024
申请日：2006-12-27
IPC分类号： H01J35/20
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having reflective portion comprised of the same materials as the EUV light collector reflective portion; a first EUV detector for detecting EUV light produced in the EUV plasma; and a second EUV detector for detecting EUV light reflected from the target sample.
摘要翻译： EUV光源装置及其制造方法，其包括：产生EUV等离子体的等离子体产生室; 具有在EUV等离子体中产生的EUV光照射的反射部的EUV集光体; 具有由与EUV集光反射部相同的材料构成的反射部的目标样品; 用于检测在EUV等离子体中产生的EUV光的第一EUV检测器; 以及用于检测从目标样品反射的EUV光的第二EUV检测器。
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公开(公告)号：US07439530B2
公开(公告)日：2008-10-21
申请号：US11174299
申请日：2005-06-29
IPC分类号： G01J1/00
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100mum的EUV目标液滴上，如果在所涉及的几何形状的约束条件下 聚焦镜头。 驱动激光器可以包括CO 2激光器。 驱动激光重定向机构可以包括镜子。
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公开(公告)号：US07388220B2
公开(公告)日：2008-06-17
申请号：US11646938
申请日：2006-12-27
IPC分类号： H01J35/20
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site.
摘要翻译： 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源，其包括适于递送移动等离子体引发靶的目标传送系统和具有EUV光收集光学器件的EUV光收集光学器件， 定义所需等离子体起始位点的焦点。
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公开(公告)号：US20080087847A1
公开(公告)日：2008-04-17
申请号：US11580414
申请日：2006-10-13
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
摘要翻译： 公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。 对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。 在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。
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公开(公告)号：US07288778B2
公开(公告)日：2007-10-30
申请号：US11603670
申请日：2006-11-21
IPC分类号： H01J35/20
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： It will be understood that an apparatus and method is disclosed, which may comprise a multi-layer reflecting coating forming an EUV reflective surface which may comprise a spectral filter tuned to selectively highly reflect light in a band centered about at a first preferred wavelength and to significantly reduce the reflection of light at a band centered about a second wavelength, e.g., it may be tuned to reflect maximally or almost maximally, near the top of the reflectivity curve, e.g., at around 13.5 nm and at a significantly lower reflectivity at, e.g., around 11 nm, to discriminate against light near 11 nm and favor light at around 13.5 nm. The spectral filter may comprise a plurality of nested grazing angle of incidence shells comprising reflective surfaces comprising the multi-layer reflective coating. e.g. multilayer mirrors, e.g., with one or more reflecting surfaces per shell.
摘要翻译： 应当理解，公开了一种装置和方法，其可以包括形成EUV反射表面的多层反射涂层，其可以包括调谐为选择性地高度反射在以第一优选波长为中心的带的光的光谱滤光器，并且 显着地减少了在以第二波长为中心的频带处的光的反射，例如，它可以被调谐以在反射率曲线的顶部附近最大或几乎最大程度地反射，例如在大约13.5nm处和在显着较低的反射率处， 例如约11nm，以区分11nm附近的光并有利于约13.5nm的光。 频谱滤波器可以包括多个嵌套的入射角入射壳，包括多层反射涂层的反射表面。 例如 多层反射镜，例如每个壳体具有一个或多个反射表面。
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