公开(公告)号：US20110319756A1

公开(公告)日：2011-12-29

申请号：US13254227

申请日：2010-03-09

申请人： Yi Zheng ,  Aiping Yao ,  James F. Greenleaf ,  Shigao Chen ,  Matthew W. Urban

发明人： Yi Zheng ,  Aiping Yao ,  James F. Greenleaf ,  Shigao Chen ,  Matthew W. Urban

IPC分类号： A61B8/00

CPC分类号： G01S7/52036 ,  A61B8/485 ,  G01S7/52022 ,  G01S15/8952

摘要： A method for measuring a mechanical property of a subject includes using an ultrasound transducer to apply ultrasonic vibration pulses to a location in a subject in order to induce shear waves at multiple prescribed orthogonal frequencies in the subject. The ultrasound transducer is directed by an excitation signal that is composed of multiple orthogonal basis functions, each having a given frequency component corresponding to the prescribed orthogonal frequencies. The power level of each orthogonal basis function is independently adjustable. The excitation signal can be sparsely sampled, or portions of the excitation signal can be removed in order to improve tissue vibration and to provide for the interleaving ultrasonic vibration and detection pulses. Ultrasonic detection pulses are applied to at least one motion detection point, from which echo signals are received. From the received echo signals, a motion signal is determined, from which mechanical properties of the subject are calculated.

摘要翻译： 用于测量受试者的机械性质的方法包括使用超声波换能器将超声波振动脉冲施加到受试者中的位置，以便在受试者中以多个规定的正交频率诱发剪切波。 超声换能器由多个正交基函数组成的激励信号引导，每个正交基函数具有对应于规定正交频率的给定频率分量。 每个正交基函数的功率电平是独立可调的。 励磁信号可以被稀疏地采样，或者可以去除激励信号的部分，以便改善组织振动并提供交织超声波振动和检测脉冲。 超声波检测脉冲被施加到至少一个运动检测点，从该运动检测点接收回波信号。 从所接收的回波信号中，确定运动信号，从而计算被摄体的机械性质。

公开(公告)号：US20110212898A1

公开(公告)日：2011-09-01

申请号：US13036964

申请日：2011-02-28

申请人： Yi Zheng ,  David A. Williams

发明人： Yi Zheng ,  David A. Williams

IPC分类号： A61K38/02 ,  C12N9/00 ,  C12N9/14 ,  C07K19/00 ,  A61P35/00

CPC分类号： C07K14/4706 ,  C07K2319/01 ,  C07K2319/02 ,  C07K2319/03 ,  C12N9/14 ,  C12Y306/05002

摘要： Chimeric peptides or fusion proteins are disclosed that include a RhoGAP activity domain and at least one specificity domain that targets a specific Rho protein. The fusion proteins can be used to inhibit any GTPase activity within a cell. The fusion proteins are particularly advantageous for the treatment of cancer. The present invention generally relates to chimeric peptides capable of regulating GTPases, and more particularly, to methods of targeting individual GTPases by using GTPase-activating proteins. Such proteins may be used for the treatment of cancers and other GTPase-related diseases. This invention relates to nucleic acid molecules and the encoded GTPase activating proteins, and variants thereof, and to the use of these molecules in the characterization, diagnosis, prevention, and treatment of cell signaling, immune, and cell proliferative disorders, particularly cancer. Disclosed herein are compounds and methods for regulating transcription of a selected gene.

摘要翻译： 公开了嵌合肽或融合蛋白，其包括RhoGAP活性结构域和至少一个靶向特异性Rho蛋白的特异性结构域。 融合蛋白可用于抑制细胞内的任何GTP酶活性。 融合蛋白对癌症的治疗特别有利。 本发明一般涉及能够调节GTP酶的嵌合肽，更具体地，涉及通过使用GTP酶活化蛋白靶向各种GTP酶的方法。 这些蛋白质可用于治疗癌症和其它与GTP酶有关的疾病。 本发明涉及核酸分子和编码的GTP酶活化蛋白及其变体，以及这些分子在表征，诊断，预防和治疗细胞信号传导，免疫和细胞增殖性疾病，特别是癌症中的用途。 本文公开了用于调节所选基因转录的化合物和方法。

公开(公告)号：US20110151676A1

公开(公告)日：2011-06-23

申请号：US13039724

申请日：2011-03-03

申请人： Nitin K. Ingle ,  Jing Tang ,  Yi Zheng ,  Zheng Yuan ,  Zhenbin Ge ,  Xinliang Lu ,  Chien-Teh Kao ,  Vikash Banthia ,  William H. McClintock ,  Mei Chang

发明人： Nitin K. Ingle ,  Jing Tang ,  Yi Zheng ,  Zheng Yuan ,  Zhenbin Ge ,  Xinliang Lu ,  Chien-Teh Kao ,  Vikash Banthia ,  William H. McClintock ,  Mei Chang

IPC分类号： H01L21/31

CPC分类号： H01L21/67253 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/3105 ,  H01L21/31116 ,  H01L21/76232

摘要： A method for forming a semiconductor structure includes forming a plurality of features across a surface of a substrate, with at least one space being between two adjacent features. A first dielectric layer is formed on the features and within the at least one space. A portion of the first dielectric layer interacts with a reactant derived from a first precursor and a second precursor to form a first solid product. The first solid product is decomposed to substantially remove the portion of the first dielectric layer. A second dielectric layer is formed to substantially fill the at least one space.

摘要翻译： 一种用于形成半导体结构的方法包括跨越衬底的表面形成多个特征，其中至少一个空间位于两个相邻特征之间。 第一电介质层形成在特征上并且在至少一个空间内。 第一介电层的一部分与衍生自第一前体和第二前体的反应物相互作用以形成第一固体产物。 第一固体产物被分解以基本上除去第一介电层的部分。 形成第二电介质层以基本上填充至少一个空间。

公开(公告)号：US20110063950A1

公开(公告)日：2011-03-17

申请号：US12992228

申请日：2009-05-15

申请人： James F. Greenleaf ,  Shigao Chen ,  Yi Zheng ,  Aiping Yao

发明人： James F. Greenleaf ,  Shigao Chen ,  Yi Zheng ,  Aiping Yao

IPC分类号： G01S15/88

CPC分类号： A61B8/485 ,  G01S7/52038

摘要： A method for measuring a mechanical property of a subject includes using an ultrasonic transducer to apply ultrasonic vibration pulses to a vibration origin in the subject in an on-off time sequence in order to impart a harmonic motion at a prescribed frequency to the subject, and when the vibration pulses are off, preferably using the same transducer to apply ultrasonic detection pulses to a motion detection point and to receive echo signals therefrom in order to sense the harmonic motion on the subject at the motion detection point The ultrasonic detection pulses are interspersed with the vibration pulses and can be applied in a non-uniform manner From the received ultrasonic echo signals, a harmonic signal is detected and a characteristic such as amplitude or phase of the detected harmonic signal is calculated using a Kalman filter or interpolation.

摘要翻译： 用于测量受试者的机械性质的方法包括使用超声波换能器以开关时间顺序将超声波振动脉冲施加到被检体中的振动起点，以向受检者施加规定频率的谐波运动，以及 当振动脉冲关闭时，优选地使用相同的换能器将超声波检测脉冲施加到运动检测点并从其接收回波信号，以便感测在运动检测点处的对象上的谐波运动。超声波检测脉冲分布在 可以以不均匀的方式施加振动脉冲从接收到的超声波回波信号中，检测出谐波信号，并且使用卡尔曼滤波器或内插来计算检测到的谐波信号的振幅或相位的特性。

公开(公告)号：US07826982B2

公开(公告)日：2010-11-02

申请号：US11496959

申请日：2006-07-31

申请人： Yi Zheng ,  Nicolas Nassar ,  Karlheinz R. Skowronek

发明人： Yi Zheng ,  Nicolas Nassar ,  Karlheinz R. Skowronek

IPC分类号： G01N31/00 ,  G06G7/58

CPC分类号： C12N9/16 ,  A61K31/506 ,  C07K2299/00 ,  Y02A90/26

摘要： The preferred embodiments generally relate to methods and compositions that affect the GTP-binding activity of members of the Rho family GTPases, preferably Rac (Rac1, Rac2 and/or Rac3), such compositions include compounds that modulate the GTP/GDP exchange activity, along with uses for the compounds including screening for compounds which recognize Rac GTPase, and methods of treating pathological conditions associated or related to a Rho family GTPase, including Rac. The preferred embodiments also relate to methods of using such compounds, or derivatives thereof, e.g., in therapeutics, diagnostics, and as research tools.

摘要翻译： 优选的实施方案通常涉及影响Rho家族GTP酶，优选Rac（Rac1，Rac2和/或Rac3）成员的GTP-结合活性的方法和组合物，所述组合物包括调节GTP / GDP交换活性的化合物 用于化合物的用途，包括筛选识别Rac GTP酶的化合物，以及治疗与Rho家族GTP酶（包括Rac）相关或相关的病理状况的方法。 优选实施方案还涉及使用这些化合物或其衍生物的方法，例如在治疗学，诊断学和研究工具中。

公开(公告)号：US07749563B2

公开(公告)日：2010-07-06

申请号：US10266551

申请日：2002-10-07

申请人： Yi Zheng ,  Srinivas D. Nemani ,  Li-Qun Xia

发明人： Yi Zheng ,  Srinivas D. Nemani ,  Li-Qun Xia

IPC分类号： C23C16/00

CPC分类号： H01L21/02167 ,  C23C16/0272 ,  C23C16/325 ,  H01L21/022 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/314 ,  H01L21/7681 ,  H01L21/76826 ,  H01L21/76832

摘要： A method is provided for processing a substrate including providing a processing gas comprising an organosilicon compound comprising a phenyl group to the processing chamber, and reacting the processing gas to deposit a low k silicon carbide barrier layer useful as a barrier layer in damascene or dual damascene applications with low k dielectric materials. A method is provided for depositing a silicon carbide cap layer that has substantially no phenyl groups attached to silicon atoms from a processing gas comprising an oxygen-free organosilicon compound on a low k silicon carbide barrier layer.

摘要翻译： 提供了一种处理基材的方法，包括提供包含含有苯基的有机硅化合物的处理气体至处理室，并使处理气体反应沉积在大马士革或双镶嵌中可用作阻挡层的低k碳化硅阻挡层 低k电介质材料的应用。 提供了一种用于沉积在低k碳化硅阻挡层上基本上没有从包含无氧有机硅化合物的处理气体连接到硅原子上的苯基沉积碳化硅盖层的方法。

公开(公告)号：US07659220B1

公开(公告)日：2010-02-09

申请号：US12327207

申请日：2008-12-03

申请人： Yi Zheng ,  Richard C. Marlor ,  George C. Wei

发明人： Yi Zheng ,  Richard C. Marlor ,  George C. Wei

IPC分类号： C03C8/14 ,  C03C8/18

CPC分类号： C03C8/24 ,  C04B37/005 ,  C04B41/009 ,  C04B41/5022 ,  C04B41/86 ,  C04B2237/062 ,  C04B2237/066 ,  C04B2237/095 ,  C04B2237/10 ,  C04B2237/366 ,  H01J9/266 ,  C04B35/581 ,  C04B41/5096 ,  C04B41/5071

摘要： There is described a sealing composition for sealing aluminum nitride and aluminum oxynitride ceramics comprising: a mixture of SiO2, at least one other metal oxide, and a silicon additive comprising at least one of silicon metal or a silicide. The silicon additive acts to suppress the formation of nitrogen bubbles during the sealing of articles comprised of aluminum nitride or aluminum oxynitride ceramics, e.g., as in the case of a ceramic discharge vessel for a high intensity discharge lamp.

摘要翻译： 描述了用于密封氮化铝和氮氧化铝陶瓷的密封组合物，其包括：SiO 2，至少一种其它金属氧化物和包含硅金属或硅化物中的至少一种的硅添加剂的混合物。 在氮化铝或氮氧化铝陶瓷的制品的密封过程中，例如与用于高强度放电灯的陶瓷放电容器的情况相同，硅添加剂起到抑制氮气泡形成的作用。

公开(公告)号：US07612080B2

公开(公告)日：2009-11-03

申请号：US11283556

申请日：2005-11-18

申请人： Yi Zheng ,  Huzoor Akbar ,  David A. Williams ,  Wieslaw Adam Mazur

发明人： Yi Zheng ,  Huzoor Akbar ,  David A. Williams ,  Wieslaw Adam Mazur

IPC分类号： A61K31/506

CPC分类号： A61K31/506

摘要： The preferred embodiments generally relate to methods and compositions that affect the GTP-binding activity of members of the Rho family GTPases, preferably Rac (Rac1, Rac2 and/or Rac3), such compositions include compounds that modulate the GTP/GDP exchange activity, along with uses for the compounds including screening for compounds which recognize Rac GTPase, and methods of treating pathological conditions associated or related to a Rho family GTPase, including Rac. The preferred embodiments also relate to methods of using such compounds, or derivatives thereof, e.g., in therapeutics, diagnostics, and as research tools.

摘要翻译： 优选的实施方案通常涉及影响Rho家族GTP酶，优选Rac（Rac1，Rac2和/或Rac3）成员的GTP结合活性的方法和组合物，所述组合物包括沿着GTP / GDP交换活性调节GTP / GDP交换活性的化合物 用于化合物的用途，包括筛选识别Rac GTP酶的化合物，以及治疗与Rho家族GTP酶（包括Rac）相关或相关的病理状况的方法。 优选实施方案还涉及使用这些化合物或其衍生物的方法，例如在治疗学，诊断学和研究工具中。

公开(公告)号：US07611996B2

公开(公告)日：2009-11-03

申请号：US11085416

申请日：2005-03-21

申请人： Francimar Schmitt ,  Yi Zheng ,  Kang Sub Yim ,  Sang H. Ahn ,  Lester A. D'Cruz ,  Dustin W. Ho ,  Alexandros T. Demos ,  Li-Qun Xia ,  Derek R. Witty ,  Hichem M'Saad

发明人： Francimar Schmitt ,  Yi Zheng ,  Kang Sub Yim ,  Sang H. Ahn ,  Lester A. D'Cruz ,  Dustin W. Ho ,  Alexandros T. Demos ,  Li-Qun Xia ,  Derek R. Witty ,  Hichem M'Saad

IPC分类号： H01L21/469 ,  H01L21/31

CPC分类号： H01L21/76825 ,  C23C16/401 ,  C23C16/56 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02208 ,  H01L21/02274 ,  H01L21/02304 ,  H01L21/02351 ,  H01L21/02362 ,  H01L21/3105 ,  H01L21/3121 ,  H01L21/31695 ,  H01L21/76811 ,  H01L21/76813 ,  H01L21/7682 ,  H01L2221/1047 ,  Y10T428/249978

摘要： Embodiments in accordance with the present invention relate to multi-stage curing processes for chemical vapor deposited low K materials. In certain embodiments, a combination of electron beam irradiation and thermal exposure steps may be employed to control selective outgassing of porogens incorporated into the film, resulting in the formation of nanopores. In accordance with one specific embodiment, a low K layer resulting from reaction between a silicon-containing component and a non-silicon containing component featuring labile groups, may be cured by the initial application of thermal energy, followed by the application of radiation in the form of an electron beam.

摘要翻译： 根据本发明的实施方案涉及用于化学气相沉积的低K材料的多阶段固化方法。 在某些实施方案中，可以采用电子束照射和热暴露步骤的组合来控制掺入薄膜中的孔原子的选择性除气，从而形成纳米孔。 根据一个具体实施方案，由含硅组分和含有不稳定基团的不含硅组分之间的反应产生的低K层可以通过初始施加热能来固化，随后在 形式的电子束。

公开(公告)号：US20090184091A1

公开(公告)日：2009-07-23

申请号：US12018084

申请日：2008-01-22

申请人： Yi Zheng

发明人： Yi Zheng

IPC分类号： B44C1/22

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： A method according to one embodiment comprises forming a thin film layer; forming a hardmask layer above the thin film layer, the hardmask layer comprising laminated layers of diamond-like carbon; removing a portion of the hardmask layer; and removing a portion of the thin film layer that is unprotected by the hardmask layer. A method according to another embodiment comprises forming a thin film layer; forming a patterned hardmask layer above the thin film layer, the hardmask layer comprising laminated layers of diamond-like carbon; and implanting a material into a portion of the thin film layer that is unprotected by the patterned hardmask layer. Additional methods are disclosed.

摘要翻译： 根据一个实施方案的方法包括形成薄膜层; 在所述薄膜层上形成硬掩模层，所述硬掩模层包括类金刚石碳的叠层; 去除硬掩模层的一部分; 以及去除未被硬掩模层保护的薄膜层的一部分。 根据另一实施例的方法包括形成薄膜层; 在薄膜层上形成图案化的硬掩模层，硬掩模层包括类金刚石碳的层压层; 以及将材料注入到未被图案化的硬掩模层保护的薄膜层的一部分中。 公开了另外的方法。