公开(公告)号：US20100040533A1

公开(公告)日：2010-02-18

申请号：US12443091

申请日：2006-09-26

Applicant: Alexander Simpson ,  Philip Carter

Inventor： Alexander Simpson ,  Philip Carter

IPC: C01G23/04 ,  B01J19/00

CPC classification number: B01J6/00 ,  B01J2219/00135 ,  B01J2219/00155 ,  C01G23/043 ,  C01P2004/60 ,  C04B35/46 ,  C04B2235/652 ,  C04B2235/656 ,  C04B2235/6562 ,  C04B2235/6567 ,  C04B2235/6582 ,  C04B2235/6586 ,  C04B2235/79 ,  C04B2235/9661 ,  F27B5/04 ,  F27D5/00

Abstract: A method and apparatus are described for manufacturing Ebonex® articles such as rods and tiles from titanium oxide precursors. The precursors are held within the interior space of a kiln and heated in a reducing gas. The precursors are held so that the reducing gas is able to fully envelop them. In a preferred embodiment, the precursors are hung from a support within the kiln. The temperature of the kiln is also controlled to limit the initial heating of the kiln and to maintain the kiln within a predetermined range of operating temperatures.

Abstract translation: 描述了用于从氧化钛前体制造诸如棒和瓦的Ebonex®制品的方法和装置。 前体保持在窑的内部空间内并在还原气体中加热。 保持前体使得还原气体能够完全包封它们。 在优选的实施方案中，前体悬浮在窑内的载体上。 还控制窑的温度以限制窑的初始加热并将窑保持在预定的操作温度范围内。

公开(公告)号：US20090311096A1

公开(公告)日：2009-12-17

申请号：US12138776

申请日：2008-06-13

Applicant: Stefan Herr ,  Ryan Michael Leclair ,  Christopher Winslow ,  Alexander Simpson ,  Carlos Haertel ,  Thierry Maeder

Inventor： Stefan Herr ,  Ryan Michael Leclair ,  Christopher Winslow ,  Alexander Simpson ,  Carlos Haertel ,  Thierry Maeder

IPC: F03D7/00

CPC classification number: F03D7/0224 ,  F03D17/00 ,  F05B2270/321 ,  F05B2270/324 ,  F05B2270/328 ,  Y02E10/723

Abstract: A method and an apparatus for measuring an air flow at an airfoil surface are provided, wherein at least one pressure sensor adapted to detect an air flow associated with a rotor blade surface and a pressure transducer which converts the detected air flow into an electrical signal indicating the air flow are provided. The pressure sensor is arranged within the boundary layer of the air flow at the airfoil surface such that the boundary layer profile may be determined from the electrical signal. The air flow sensor is adapted for rotor blades of a wind turbine to assist in adjusting a pitch angle of the rotor blades.

Abstract translation: 提供了一种用于测量翼型表面上的空气流量的方法和装置，其中至少一个适于检测与转子叶片表面相关联的气流的压力传感器和压力传感器，该压力传感器将检测到的空气流转换成指示 提供气流。 压力传感器被布置在翼型表面处的空气流的边界层内，使得边界层轮廓可以根据电信号确定。 空气流量传感器适用于风力涡轮机的转子叶片，以帮助调节转子叶片的桨距角。

公开(公告)号：US07247567B2

公开(公告)日：2007-07-24

申请号：US10869397

申请日：2004-06-16

Applicant: Robert Vacassy ,  Dinesh N. Khanna ,  Alexander Simpson

Inventor： Robert Vacassy ,  Dinesh N. Khanna ,  Alexander Simpson

IPC: H01L21/302 ,  H01L21/461

CPC classification number: C09G1/02 ,  C09K3/1463 ,  C23F3/06 ,  H01L21/3212

Abstract: The invention provides a method of chemically-mechanically polishing a substrate comprising tungsten through use of a composition comprising a tungsten etchant, an inhibitor of tungsten etching, and water, wherein the inhibitor of tungsten polishing is a polymer, copolymer, or polymer blend comprising at least one repeating group comprising at least one nitrogen-containing heterocyclic ring or a tertiary or quaternary nitrogen atom. The invention further provides a chemical-mechanical polishing composition particularly useful in polishing tungsten-containing substrates.

Abstract translation: 本发明提供了通过使用包含钨蚀刻剂，钨蚀刻抑制剂和水的组合物对包含钨的基材进行化学机械抛光的方法，其中所述钨抛光抑制剂是聚合物，共聚物或聚合物共混物，其包含在 至少一个包含至少一个含氮杂环或叔或季氮原子的重复基团。 本发明还提供了一种特别适用于抛光含钨衬底的化学机械抛光组合物。

公开(公告)号：US06932674B2

公开(公告)日：2005-08-23

申请号：US10248950

申请日：2003-03-05

Applicant: Peter Lahnor ,  Olaf Kuehn ,  Andreas Roemer ,  Alexander Simpson

Inventor： Peter Lahnor ,  Olaf Kuehn ,  Andreas Roemer ,  Alexander Simpson

IPC: B24B49/00

CPC classification number: B24B37/013 ,  B24B49/00

Abstract: A method of determining the endpoint of a planarizing process is disclosed. An endpoint detection signal is selectively sampled from at least one predetermined location within a planarizing region defined on a planarizing web. Planarization is stopped when the endpoint criterion based on the endpoint detection signal is detected.

Abstract translation: 公开了一种确定平坦化工艺终点的方法。 从平坦化网上限定的平坦化区域内的至少一个预定位置选择性地采样端点检测信号。 当检测到基于端点检测信号的端点标准时，停止平面化。

公开(公告)号：US06740539B2

公开(公告)日：2004-05-25

申请号：US10366149

申请日：2003-02-13

Applicant: Richard A. Conti ,  Prakash Chimanlal Dev ,  David M. Dobuzinsky ,  Daniel C. Edelstein ,  Gill Y. Lee ,  Kia-Seng Low ,  Padraic C. Shafer ,  Alexander Simpson ,  Peter Wrschka

Inventor： Richard A. Conti ,  Prakash Chimanlal Dev ,  David M. Dobuzinsky ,  Daniel C. Edelstein ,  Gill Y. Lee ,  Kia-Seng Low ,  Padraic C. Shafer ,  Alexander Simpson ,  Peter Wrschka

IPC: H01L5140

CPC classification number: H01L21/28185 ,  H01L21/02126 ,  H01L21/02274 ,  H01L21/28194 ,  H01L21/31633 ,  H01L23/5329 ,  H01L23/53295 ,  H01L29/513 ,  H01L29/517 ,  H01L29/518 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A structure and method for an insulator layer having carbon-graded layers above a substrate is disclosed, wherein the concentration of carbon increases in each successive carbon-graded layer above the substrate. The insulator comprises a low-k dielectric having a dielectric constant less than 3.3. The carbon-graded layer increases adhesion between the substrate and the insulator and between the insulator and the conductor layer. The structure may also include stabilization interfaces between the carbon-graded layers. More specifically, the carbon-graded layers include a first layer adjacent the substrate having a carbon content between about 5% and 20%, a second layer above the first layer having a carbon content between about 10% and 30%, and a third layer above the second layer having a carbon content between about 20% and 40%.

Abstract translation: 公开了一种在衬底上方具有碳分级层的绝缘体层的结构和方法，其中在衬底上方的每个连续的碳分级层中碳的浓度增加。 绝缘体包括介电常数小于3.3的低k电介质。 碳分级层增加了衬底和绝缘体之间以及绝缘体和导体层之间的粘合性。 该结构还可以包括碳分级层之间的稳定界面。 更具体地，碳分级层包括邻近基底的第一层，其碳含量在约5％至20％之间，第一层上方的碳含量在约10％至30％之间，第三层 在第二层上方具有约20％至40％的碳含量。

公开(公告)号：US06485355B1

公开(公告)日：2002-11-26

申请号：US09887790

申请日：2001-06-22

Applicant: Laertis Economikos ,  Alexander Simpson

Inventor： Laertis Economikos ,  Alexander Simpson

IPC: B24B100

CPC classification number: H01L21/31053 ,  B24B37/042

Abstract: The invention provides fixed-abrasive chemical-mechanical polishing processes which are effective in rapidly reducing thickness of oxide layers, especially siliceous oxides. The processes of the invention are preferably characterized by at least one step involving simultaneous use of a fixed-abrasive polishing element and an aqueous liquid medium containing an abrasive. Where the original oxide layer has topographic variation, the thickness reduction technique of the invention may be preceeded by topography reduction step using a fixed-abrasive and an aqueous medium containing a polyelectrolyte for at least a portion of the polishing process involving reduction in the amount of topographic variation (height differential) across the oxide layer on the substrate.

Abstract translation: 本发明提供固定研磨化学机械抛光方法，其有效地快速减少氧化物层的厚度，特别是二氧化硅。 本发明的方法优选的特征在于包括同时使用固定研磨抛光元件和含有磨料的含水液体介质的至少一个步骤。 在原始氧化物层具有地形变化的情况下，本发明的厚度减小技术可以在使用固定研磨剂和含有聚电解质的含水介质的地面还原步骤之前进行至少一部分抛光过程，所述抛光过程涉及减少 跨衬底上的氧化物层的地形变化（高差）。

公开(公告)号：US20100146967A1

公开(公告)日：2010-06-17

申请号：US12333841

申请日：2008-12-12

Applicant: Alexander Simpson ,  Rodrigo Rodriguez Erdmenger

Inventor： Alexander Simpson ,  Rodrigo Rodriguez Erdmenger

IPC: F02B33/44

CPC classification number: F02B37/00 ,  F02B37/001 ,  F02M26/05 ,  F02M26/23 ,  Y02T10/144

Abstract: A system, apparatus, and method for exhaust gas recirculation (EGR) is disclosed. The EGR apparatus includes an EGR circuit having an input configured to receive an exhaust gas from an engine exhaust port, an output configured to return the exhaust gas to an intake port of the engine, and an EGR path configured to circulate the exhaust gas between the input and the output. The EGR apparatus also includes an expansion turbine connected to the EGR circuit in the EGR path downstream of the input to receive the exhaust gas, the expansion turbine configured to expand the exhaust gas and reduce a pressure thereof. The EGR apparatus further includes an EGR compressor connected to the EGR path downstream of the expansion turbine and decoupled from the expansion turbine, the EGR compressor configured to compress the exhaust gas for circulation to the output.

Abstract translation: 公开了一种用于废气再循环（EGR）的系统，装置和方法。 EGR装置包括：EGR回路，其具有被配置为接收来自发动机排气口的废气的输入，被配置为将排气返回到发动机的进气口的输出;以及EGR路径，其被配置为使废气在 输入和输出。 EGR装置还包括在输入端下游的EGR路径中连接到EGR回路以接收废气的膨胀涡轮机，该膨胀涡轮机构造成膨胀排气并降低其压力。 EGR装置还包括连接到膨胀涡轮机下游的EGR路径并与膨胀涡轮分离的EGR压缩机，EGR压缩机构造成压缩排气以循环到输出端。

公开(公告)号：US20070214728A1

公开(公告)日：2007-09-20

申请号：US11670137

申请日：2007-02-01

Applicant: Robert Vacassy ,  Dinesh Khanna ,  Alexander Simpson

Inventor： Robert Vacassy ,  Dinesh Khanna ,  Alexander Simpson

IPC: C09G1/00

CPC classification number: C09G1/02 ,  C09K3/1463 ,  C23F3/06 ,  H01L21/3212

Abstract: The invention provides a method of chemically-mechanically polishing a substrate comprising tungsten through use of a composition comprising a tungsten etchant, an inhibitor of tungsten etching, and water, wherein the inhibitor of tungsten polishing is a polymer, copolymer, or polymer blend comprising at least one repeating group comprising at least one nitrogen-containing heterocyclic ring or a tertiary or quaternary nitrogen atom. The invention further provides a chemical-mechanical polishing composition particularly useful in polishing tungsten-containing substrates.

Abstract translation: 本发明提供了通过使用包含钨蚀刻剂，钨蚀刻抑制剂和水的组合物对包含钨的基材进行化学机械抛光的方法，其中所述钨抛光抑制剂是聚合物，共聚物或聚合物共混物，其包含在 至少一个包含至少一个含氮杂环或叔或季氮原子的重复基团。 本发明还提供了一种特别适用于抛光含钨衬底的化学机械抛光组合物。

公开(公告)号：US06294470B1

公开(公告)日：2001-09-25

申请号：US09469922

申请日：1999-12-22

Applicant: Laertis Economikos ,  Alexander Simpson

Inventor： Laertis Economikos ,  Alexander Simpson

IPC: H01L21302

CPC classification number: H01L21/31053

Abstract: The invention provides slurry-less chemical-mechanical polishing processes which are effective in planarizing oxide materials, especially siliceous oxides, even where the starting oxide layer has significant topographical variation. The processes of the invention are preferably characterized by the use of a fixed abrasive polishing element and by use of an aqueous liquid medium containing a polyelectrolyte for at least a portion of the polishing process involving reduction in the amount of topographic variation (height differential) across the oxide material on the substrate. The method reduces or eliminates the transfer of topographic variations to levels below the desired planarization level. The processes enable elimination of special endpoint detection techniques. The processes are also especially suitable for polishing interlevel dielectrics.

Abstract translation: 本发明提供无浆化学机械抛光方法，其有效平坦化氧化物材料，特别是硅氧化物，即使起始氧化物层具有显着的形貌变化。 本发明的方法优选的特征在于使用固定的研磨抛光元件，并且通过使用含有聚电解质的含水液体介质，用于抛光过程的至少一部分，包括减少跨越的地形变化量（高差） 衬底上的氧化物材料。 该方法减少或消除了地形变化的转移到低于期望的平坦化水平的水平。 这些过程能够消除特殊的端点检测技术。 该工艺也特别适用于抛光层间电介质。

公开(公告)号：US2099238A

公开(公告)日：1937-11-16

申请号：US6867536

申请日：1936-03-13

Applicant: ALEXANDER SIMPSON

Inventor： ALEXANDER SIMPSON

IPC: A41D1/00

CPC classification number: A41D1/00