公开(公告)号：US07027155B2

公开(公告)日：2006-04-11

申请号：US10107702

申请日：2002-03-27

申请人： James J. Cordingley ,  Joseph J. Griffiths ,  Donald V. Smart

发明人： James J. Cordingley ,  Joseph J. Griffiths ,  Donald V. Smart

IPC分类号： G01B11/26

CPC分类号： B23K26/0736 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/082 ,  B23K26/10 ,  B23K26/16 ,  B23K26/361 ,  B23K26/389 ,  B23K26/40 ,  B23K2101/38 ,  B23K2101/40 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/485 ,  H01L21/76888 ,  H01L21/76894 ,  H01L22/12 ,  H01L23/5258 ,  H01L2924/0002 ,  H05K3/0026 ,  H01L2924/00

摘要： A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

公开(公告)号：US07192846B2

公开(公告)日：2007-03-20

申请号：US11125367

申请日：2005-05-09

申请人： James J. Cordingley ,  Roger D. Dowd ,  Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

发明人： James J. Cordingley ,  Roger D. Dowd ,  Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

IPC分类号： H01L21/00 ,  H01L21/46

CPC分类号： B23K26/0736 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/082 ,  B23K26/10 ,  B23K26/16 ,  B23K26/361 ,  B23K26/389 ,  B23K26/40 ,  B23K2101/38 ,  B23K2101/40 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/485 ,  H01L21/76888 ,  H01L21/76894 ,  H01L22/12 ,  H01L23/5258 ,  H01L2924/0002 ,  H05K3/0026 ,  H01L2924/00

摘要： A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

摘要翻译： 提供一种用于局部处理形成在基板上的预定微结构而不引起基板或其上形成在基板上的其它结构的电学或物理特性的不希望的变化的方法和系统。 该方法包括基于与预定微结构，衬底和其它结构的激光脉冲相互作用的模型来提供信息。 基于该信息确定至少一个脉冲的至少一个特性。 生成包括至少一个脉冲的脉冲激光束。 该方法还包括将具有至少一个确定特性的至少一个脉冲照射到预定微结构上的点中。 所述至少一个脉冲的至少一个确定的特征和其它特征足以在不引起不期望的变化的情况下局部地处理预定的微结构。

公开(公告)号：US08193468B2

公开(公告)日：2012-06-05

申请号：US11247541

申请日：2005-10-11

申请人： James J. Cordingley ,  Joseph J. Griffiths ,  Donald V. Smart

发明人： James J. Cordingley ,  Joseph J. Griffiths ,  Donald V. Smart

IPC分类号： B23K26/00

CPC分类号： B23K26/0736 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/082 ,  B23K26/10 ,  B23K26/16 ,  B23K26/361 ,  B23K26/389 ,  B23K26/40 ,  B23K2101/38 ,  B23K2101/40 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/485 ,  H01L21/76888 ,  H01L21/76894 ,  H01L22/12 ,  H01L23/5258 ,  H01L2924/0002 ,  H05K3/0026 ,  H01L2924/00

摘要： A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

摘要翻译： 提供一种用于局部处理形成在基板上的预定微结构而不引起基板或其上形成在基板上的其它结构的电学或物理特性的不期望的变化的方法和系统。 该方法包括基于与预定微结构，衬底和其它结构的激光脉冲相互作用的模型来提供信息。 基于该信息确定至少一个脉冲的至少一个特性。 生成包括至少一个脉冲的脉冲激光束。 该方法还包括将具有至少一个确定特性的至少一个脉冲照射到预定微结构上的点中。 所述至少一个脉冲的至少一个确定的特征和其它特征足以在不引起不期望的变化的情况下局部地处理预定的微结构。

公开(公告)号：US07394476B2

公开(公告)日：2008-07-01

申请号：US11415547

申请日：2006-05-02

申请人： James J. Cordingley ,  Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  Shepard D. Johnson ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

发明人： James J. Cordingley ,  Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  Shepard D. Johnson ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

IPC分类号： B41J2/435 ,  B23K26/00

CPC分类号： B23K26/0736 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/082 ,  B23K26/10 ,  B23K26/16 ,  B23K26/361 ,  B23K26/389 ,  B23K26/40 ,  B23K2101/38 ,  B23K2101/40 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/485 ,  H01L21/76888 ,  H01L21/76894 ,  H01L22/12 ,  H01L23/5258 ,  H01L2924/0002 ,  H05K3/0026 ,  H01L2924/00

摘要： A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

摘要翻译： 提供一种用于局部处理形成在基板上的预定微结构而不引起基板或其上形成在基板上的其它结构的电学或物理特性的不期望的变化的方法和系统。 该方法包括基于与预定微结构，衬底和其它结构的激光脉冲相互作用的模型来提供信息。 基于该信息确定至少一个脉冲的至少一个特性。 生成包括至少一个脉冲的脉冲激光束。 该方法还包括将具有至少一个确定特性的至少一个脉冲照射到预定微结构上的点中。 所述至少一个脉冲的至少一个确定的特征和其它特征足以在不引起不期望的变化的情况下局部地处理预定的微结构。

公开(公告)号：US20130200050A1

公开(公告)日：2013-08-08

申请号：US13608454

申请日：2012-09-10

申请人： Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  James J. Cordingley ,  Donald J. Svetkoff ,  Shepard D. Johnson ,  Michael Plotkin

发明人： Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  James J. Cordingley ,  Donald J. Svetkoff ,  Shepard D. Johnson ,  Michael Plotkin

IPC分类号： B23K26/08 ,  B23K26/36

CPC分类号： B23K26/0869 ,  B23K26/0344 ,  B23K26/06 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/082 ,  B23K26/0853 ,  B23K26/361 ,  B23K26/40 ,  B23K2101/40 ,  B23K2103/16 ,  B23K2103/50 ,  H01L21/76894 ,  H01L23/5258 ,  H01L27/10844 ,  H01L2924/0002 ,  Y10T29/49156 ,  H01L2924/00

摘要： The present invention relates to the field of laser processing methods and systems, and specifically, to laser processing methods and systems for laser processing multi-material devices. Systems and methods may utilize high speed deflectors to improve processing energy window and/or improve processing speed. In some embodiments, a deflector is used for non-orthogonal scanning of beam spots. In some embodiment, a deflector is used to implement non-synchronous processing of target structures.

公开(公告)号：US08269137B2

公开(公告)日：2012-09-18

申请号：US12233476

申请日：2008-09-18

申请人： Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  James J. Cordingley ,  Donald J. Svetkoff ,  Shepard D. Johnson ,  Michael Plotkin

发明人： Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  James J. Cordingley ,  Donald J. Svetkoff ,  Shepard D. Johnson ,  Michael Plotkin

IPC分类号： B23K26/36

CPC分类号： B23K26/0869 ,  B23K26/0344 ,  B23K26/06 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/082 ,  B23K26/0853 ,  B23K26/361 ,  B23K26/40 ,  B23K2101/40 ,  B23K2103/16 ,  B23K2103/50 ,  H01L21/76894 ,  H01L23/5258 ,  H01L27/10844 ,  H01L2924/0002 ,  Y10T29/49156 ,  H01L2924/00

摘要： The present invention relates to the field of laser processing methods and systems, and specifically, to laser processing methods and systems for laser processing multi-material devices. Systems and methods may utilize high speed deflectors to improve processing energy window and/or improve processing speed. In some embodiments, a deflector is used for non-orthogonal scanning of beam spots. In some embodiment, a deflector is used to implement non-synchronous processing of target structures.

摘要翻译： 本发明涉及激光加工方法和系统的领域，具体涉及用于激光加工多材料装置的激光加工方法和系统。 系统和方法可以利用高速偏转器来改善处理能量窗口和/或提高处理速度。 在一些实施例中，偏转器用于束斑的非正交扫描。 在一些实施例中，偏转器用于实现目标结构的非同步处理。

公开(公告)号：US20090095722A1

公开(公告)日：2009-04-16

申请号：US12233476

申请日：2008-09-18

申请人： Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  James J. Cordingley ,  Donald J. Svetkoff ,  Shepard D. Johnson ,  Michael Plotkin

发明人： Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  James J. Cordingley ,  Donald J. Svetkoff ,  Shepard D. Johnson ,  Michael Plotkin

IPC分类号： B23K26/36

CPC分类号： B23K26/0869 ,  B23K26/0344 ,  B23K26/06 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/082 ,  B23K26/0853 ,  B23K26/361 ,  B23K26/40 ,  B23K2101/40 ,  B23K2103/16 ,  B23K2103/50 ,  H01L21/76894 ,  H01L23/5258 ,  H01L27/10844 ,  H01L2924/0002 ,  Y10T29/49156 ,  H01L2924/00

摘要： The present invention relates to the field of laser processing methods and systems, and specifically, to laser processing methods and systems for laser processing multi-material devices. Systems and methods may utilize high speed deflectors to improve processing energy window and/or improve processing speed. In some embodiments, a deflector is used for non-orthogonal scanning of beam spots. In some embodiment, a deflector is used to implement non-synchronous processing of target structures.

摘要翻译： 本发明涉及激光加工方法和系统的领域，具体涉及用于激光加工多材料装置的激光加工方法和系统。 系统和方法可以利用高速偏转器来改善处理能量窗口和/或提高处理速度。 在一些实施例中，偏转器用于束斑的非正交扫描。 在一些实施例中，偏转器用于实现目标结构的非同步处理。

公开(公告)号：US06972268B2

公开(公告)日：2005-12-06

申请号：US10108101

申请日：2002-03-27

申请人： Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  Donald V. Smart ,  Donald J. Svetkoff

发明人： Jonathan S. Ehrmann ,  Joseph J. Griffiths ,  Donald V. Smart ,  Donald J. Svetkoff

IPC分类号： B23K26/00 ,  B23K26/03 ,  B23K26/04 ,  B23K26/06 ,  B23K26/067 ,  B23K26/073 ,  B23K26/36 ,  B23K26/38 ,  B23K26/40 ,  B23K101/40 ,  G11C29/04 ,  H01L21/304 ,  H01L21/48 ,  H01L21/66 ,  H01L21/768 ,  H01L21/82 ,  H01L23/525 ,  H05K3/00 ,  H01L21/26 ,  A61N5/00 ,  G21G5/00

CPC分类号： B23K26/0736 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/082 ,  B23K26/10 ,  B23K26/16 ,  B23K26/361 ,  B23K26/389 ,  B23K26/40 ,  B23K2101/38 ,  B23K2101/40 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/485 ,  H01L21/76888 ,  H01L21/76894 ,  H01L22/12 ,  H01L23/5258 ,  H01L2924/0002 ,  H05K3/0026 ,  H01L2924/00

摘要： A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

摘要翻译： 提供一种用于局部处理形成在基板上的预定微结构而不引起基板或其上形成在基板上的其它结构的电学或物理特性的不期望的变化的方法和系统。 该方法包括基于与预定微结构，衬底和其它结构的激光脉冲相互作用的模型来提供信息。 基于该信息确定至少一个脉冲的至少一个特性。 生成包括至少一个脉冲的脉冲激光束。 该方法还包括将具有至少一个确定特性的至少一个脉冲照射到预定微结构上的点中。 所述至少一个脉冲的至少一个确定的特征和其它特征足以在不引起不期望的变化的情况下局部地处理预定的微结构。

公开(公告)号：US20120195331A1

公开(公告)日：2012-08-02

申请号：US13359879

申请日：2012-01-27

申请人： Bo Gu ,  Joseph J. Griffiths ,  Joohan Lee

发明人： Bo Gu ,  Joseph J. Griffiths ,  Joohan Lee

IPC分类号： H01S3/10

CPC分类号： B23K26/073 ,  B23K26/06 ,  B23K26/0624 ,  B23K26/36 ,  B23K26/40 ,  B23K2101/40 ,  B23K2103/12 ,  B23K2103/50 ,  H01L23/5258 ,  H01L2924/0002 ,  H01L2924/00

摘要： A laser system for processing conductive link structures includes a seed laser generating a seed laser beam. The seed laser is sliced by a modulator into a user configurable series of pulses and the pulses are optically amplified and applied to a conductive link structure. Preferably, the bandwidth of the seed laser is less than 1 nm with an IR center frequency, and the frequency of the laser light of the pulses is doubled or quadrupled prior to application to the conductive structure. Preferably, the pulses are about 1-18 nanosecond pulsewidth and are separated by 100-400 nanoseconds.

摘要翻译： 用于处理导电链路结构的激光系统包括产生种子激光束的种子激光器。 种子激光器由调制器切片成用户可配置的一系列脉冲，并且脉冲被光学放大并应用于导电连接结构。 优选地，种子激光器的带宽具有IR中心频率小于1nm，并且在施加到导电结构之前，脉冲的激光频率加倍或增加了四倍。 优选地，脉冲为约1-18纳秒脉冲宽度，并分隔100-400纳秒。

公开(公告)号：US20110297851A1

公开(公告)日：2011-12-08

申请号：US13153928

申请日：2011-06-06

申请人： William Lauer ,  Jonathan S. Ehrmann ,  Joseph J. Griffiths

发明人： William Lauer ,  Jonathan S. Ehrmann ,  Joseph J. Griffiths

IPC分类号： G21K5/00

CPC分类号： B23K26/0676 ,  B23K26/0006 ,  B23K26/06 ,  B23K26/067 ,  B23K26/36 ,  B23K2103/56 ,  H01L21/02686 ,  H01L21/02691 ,  H01L23/525 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a system for severing conductive links by laser irradiation to repair electronic devices, multiple laser beams are deflected at high-speed to target selected links for processing by positioning laser spots in a two dimensional pattern during relative motion of a substrate and a beam delivery system. As link targeting flexibility is increased, selection may be required from a large number of addressable link pairs. Various embodiments advantageously use beam deflection and beam splitting to improve memory repair processing rates.

摘要翻译： 在用于通过激光照射来切断导电连接以修复电子设备的系统中，多个激光束在基板和光束传送系统的相对运动期间以高速偏转到目标所选择的链接以进行处理，其中定位激光斑点为二维图案 。 随着链路定向灵活性的增加，可能需要从大量可寻址链路对中进行选择。 各种实施例有利地使用光束偏转和光束分割来改善存储器修复处理速率。