利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

15 条记录 (耗时 0.013 秒)

    Sputtering coating of protective layer for charged particle beam processing
    3.
    发明申请
    Sputtering coating of protective layer for charged particle beam processing 有权
    用于带电粒子束加工的保护层溅射涂层

    公开(公告)号：US20080073587A1

    公开(公告)日：2008-03-27

    申请号：US11706053

    申请日：2007-02-14

    申请人： Michael Schmidt ,  Jeff Blackwood

    发明人： Michael Schmidt ,  Jeff Blackwood

    IPC分类号： H01J37/08

    CPC分类号： B23K15/06 ,  B23K15/0086 ,  B23K2101/40 ,  C23C14/30 ,  H01J37/302 ,  H01J37/3056

    摘要： A coating is applied to a work piece in a charged particle beam system without directing the beam to work piece. The coating is applied by sputtering, either within the charged particle beam vacuum chamber or outside the charged particle beam vacuum chamber. In one embodiment, the sputtering is performed by directing the charged particle beam to a sputter material source, such as a needle from a gas injection system. Material is sputtered from the sputter material source onto the work piece to form, for example, a protective or conductive coating, without requiring the beam to be directed to the work piece, thereby reducing or eliminating damage to the work piece.

    摘要翻译： 将涂层施加到带电粒子束系统中的工件上，而不将梁束导向工件。 涂层通过溅射施加，或者在带电粒子束真空室内或者带电粒子束真空室外。 在一个实施例中，通过将带电粒子束引导到溅射材料源（例如来自气体注入系统的针）来进行溅射。 材料从溅射材料源溅射到工件上以形成例如保护性或导电性涂层，而不需要将光束引导到工件，从而减少或消除对工件的损坏。

    Protective layer for charged particle beam processing
    4.
    发明授权
    Protective layer for charged particle beam processing 有权
    带电粒子束加工保护层

    公开(公告)号：US09263306B2

    公开(公告)日：2016-02-16

    申请号：US13345375

    申请日：2012-01-06

    申请人： Jeff Blackwood ,  Stacey Stone

    发明人： Jeff Blackwood ,  Stacey Stone

    IPC分类号： B05C5/02 ,  H01L21/67

    CPC分类号： H01L21/6715 ,  H01J2237/26 ,  H01J2237/31745

    摘要： A protective layer is applied to a work piece to protect the surface during charged particle beam processing by directing a fluid toward the surface. The surface is preferably not touched by the applicator. Ink jet print-type print heads are suitable applicators. Ink jet-type print heads allow a wide variety of fluids to be used to form the protective layer. Useful fluids that form protective layers include colloidal silica having small silver particles and hydrocarbon-based inks.

    摘要翻译： 将保护层施加到工件上，以通过将流体引向表面来在带电粒子束加工期间保护表面。 该表面优选地不被施加器接触。 喷墨打印型打印头是合适的涂布器。 喷墨式打印头允许使用各种各样的流体来形成保护层。 形成保护层的有用流体包括具有小银颗粒和烃类油墨的胶体二氧化硅。

    Methods for preparing thin samples for TEM imaging
    5.
    发明授权
    Methods for preparing thin samples for TEM imaging 有权
    TEM成像薄样品的制备方法

    公开(公告)号：US08859963B2

    公开(公告)日：2014-10-14

    申请号：US13481351

    申请日：2012-05-25

    申请人： Michael Moriarty ,  Stacey Stone ,  Jeff Blackwood

    发明人： Michael Moriarty ,  Stacey Stone ,  Jeff Blackwood

    IPC分类号： G01N23/00 ,  H01L21/02 ,  G01N1/28 ,  H01J37/305

    CPC分类号： G01N1/32 ,  G01N1/286 ,  G01N2001/2886 ,  H01J37/02 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01L21/02318

    摘要： A method and apparatus for preparing thin TEM samples in a manner that reduces or prevents bending and curtaining is realized. Embodiments of the present invention deposit material onto the face of a TEM sample during the process of preparing the sample. In some embodiments, the material can be deposited on a sample face that has already been thinned before the opposite face is thinned, which can serve to reinforce the structural integrity of the sample and refill areas that have been over-thinned due to a curtaining phenomena. In other embodiments, material can also be deposited onto the face being milled, which can serve to reduce or eliminate curtaining on the sample face.

    摘要翻译： 实现了以减少或防止弯曲和卷曲的方式制备薄TEM样品的方法和装置。 在制备样品的过程中，本发明的实施方案将材料沉积在TEM样品的表面上。 在一些实施例中，材料可以沉积在样品面上，该样品表面在相对面变薄之前已经变薄，这可以用于增强样品的结构完整性并且由于存在现象而已经被过度稀释的区域 。 在其他实施例中，材料也可以沉积到被研磨的面上，这可以用于减少或消除样品面上的绘制。

    Protective Layer For Charged Particle Beam Processing
    7.
    发明申请
    Protective Layer For Charged Particle Beam Processing 审中-公开
    带电粒子束加工保护层

    公开(公告)号：US20120107521A1

    公开(公告)日：2012-05-03

    申请号：US13345375

    申请日：2012-01-06

    申请人： Jeff Blackwood ,  Stacey Stone

    发明人： Jeff Blackwood ,  Stacey Stone

    IPC分类号： B05D3/06 ,  B05C5/02

    CPC分类号： H01L21/6715 ,  H01J2237/26 ,  H01J2237/31745

    摘要： A protective layer is applied to a work piece to protect the surface during charged particle beam processing by directing a fluid toward the surface. The surface is preferably not touched by the applicator. Ink jet print-type print heads are suitable applicators. Ink jet-type print heads allow a wide variety of fluids to be used to form the protective layer. Useful fluids that form protective layers include colloidal silica having small silver particles and hydrocarbon-based inks.

    摘要翻译： 将保护层施加到工件上，以通过将流体引向表面来在带电粒子束加工期间保护表面。 该表面优选地不被施加器接触。 喷墨打印型打印头是合适的涂布器。 喷墨式打印头允许使用各种各样的流体来形成保护层。 形成保护层的有用流体包括具有小银颗粒和烃类油墨的胶体二氧化硅。

    METHODS FOR PREPARING THIN SAMPLES FOR TEM IMAGING
    9.
    发明申请
    METHODS FOR PREPARING THIN SAMPLES FOR TEM IMAGING 有权
    用于制备TEM成像的稀薄样品的方法

    公开(公告)号：US20130143412A1

    公开(公告)日：2013-06-06

    申请号：US13481351

    申请日：2012-05-25

    申请人： Michael Moriarty ,  Stacey Stone ,  Jeff Blackwood

    发明人： Michael Moriarty ,  Stacey Stone ,  Jeff Blackwood

    IPC分类号： H01L21/02

    CPC分类号： G01N1/32 ,  G01N1/286 ,  G01N2001/2886 ,  H01J37/02 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/2802 ,  H01J2237/31745 ,  H01L21/02318

    摘要： A method and apparatus for preparing thin TEM samples in a manner that reduces or prevents bending and curtaining is realized. Embodiments of the present invention deposit material onto the face of a TEM sample during the process of preparing the sample. In some embodiments, the material can be deposited on a sample face that has already been thinned before the opposite face is thinned, which can serve to reinforce the structural integrity of the sample and refill areas that have been over-thinned due to a curtaining phenomena. In other embodiments, material can also be deposited onto the face being milled, which can serve to reduce or eliminate curtaining on the sample face.

    摘要翻译： 实现了以减少或防止弯曲和卷曲的方式制备薄TEM样品的方法和装置。 在制备样品的过程中，本发明的实施方案将材料沉积在TEM样品的表面上。 在一些实施例中，材料可以沉积在样品面上，该样品表面在相对面变薄之前已经变薄，这可以用于增强样品的结构完整性并且由于存在现象而已经被过度稀释的区域 。 在其他实施例中，材料也可以沉积到被研磨的面上，这可以用于减少或消除样品面上的绘制。