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    Dose-based end-pointing for low-kV FIB milling TEM sample preparation
    3.
    发明授权
    Dose-based end-pointing for low-kV FIB milling TEM sample preparation 有权

    公开(公告)号：US10465293B2

    公开(公告)日：2019-11-05

    申请号：US13600843

    申请日：2012-08-31

    申请人： Thomas G. Miller ,  Jason Arjavac ,  Michael Moriarty

    发明人： Thomas G. Miller ,  Jason Arjavac ,  Michael Moriarty

    IPC分类号： C23F1/04 ,  G01N1/32 ,  H01J37/302 ,  H01J37/305

    摘要： A method, system, and computer-readable medium for forming transmission electron microscopy sample lamellae using a focused ion beam including directing a high energy focused ion beam toward a bulk volume of material; milling away the unwanted volume of material to produce an unfinished sample lamella with one or more exposed faces having a damage layer; characterizing the removal rate of the focused ion beam; subsequent to characterizing the removal rate, directing a low energy focused ion beam toward the unfinished sample lamella for a predetermined milling time to deliver a specified dose of ions per area from the low energy focused ion beam; and milling the unfinished sample lamella with the low energy focused ion beam to remove at least a portion of the damage layer to produce the finished sample lamella including at least a portion of the feature of interest.

    Method and apparatus for controlling topological variation on a milled cross-section of a structure
    4.
    发明申请
    Method and apparatus for controlling topological variation on a milled cross-section of a structure 有权
    用于控制结构的铣削横截面上的拓扑变化的方法和装置

    公开(公告)号：US20050103746A1

    公开(公告)日：2005-05-19

    申请号：US10716181

    申请日：2003-11-18

    申请人： James Nadeau ,  Pei Zou ,  Jason Arjavac

    发明人： James Nadeau ,  Pei Zou ,  Jason Arjavac

    IPC分类号： G11B5/31 ,  C23F1/00 ,  B44C1/22 ,  C03C15/00 ,  C03C25/68

    CPC分类号： G11B5/3163 ,  H01J2237/3114

    摘要： An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles.

    摘要翻译： 一种改进的铣削结构截面时控制形貌变化的方法，可用于减少写头的横截面上的形貌变化，以提高计量应用的准确性。 通过使用保护层来减小地形变化，所述保护层包括具有较高入射角的磨机速率的材料，其紧密接近在那些较高入射角下的结构的轧机速度。 可以通过使用保护层来有意地引入地形变化，所述保护层包括在较高入射角下具有较高入射角的磨机速率的材料，该材料在这些较高入射角下不接近于结构的磨机速度。

    Dose-Based End-Pointing for Low-KV FIB Milling TEM Sample Preparation
    6.
    发明申请
    Dose-Based End-Pointing for Low-KV FIB Milling TEM Sample Preparation 审中-公开
    用于低KV FIB铣削TEM样品制备的基于剂量的终点

    公开(公告)号：US20140061032A1

    公开(公告)日：2014-03-06

    申请号：US13600843

    申请日：2012-08-31

    申请人： Thomas G. Miller ,  Jason Arjavac ,  Michael Moriarty

    发明人： Thomas G. Miller ,  Jason Arjavac ,  Michael Moriarty

    IPC分类号： C23F1/04

    CPC分类号： C23F1/04 ,  G01N1/32 ,  H01J37/3023 ,  H01J37/3056 ,  H01J2237/30466 ,  H01J2237/31745

    摘要： A method, system, and computer-readable medium for forming transmission electron microscopy sample lamellae using a focused ion beam including directing a high energy focused ion beam toward a bulk volume of material; milling away the unwanted volume of material to produce an unfinished sample lamella with one or more exposed faces having a damage layer; characterizing the removal rate of the focused ion beam; subsequent to characterizing the removal rate, directing a low energy focused ion beam toward the unfinished sample lamella for a predetermined milling time to deliver a specified dose of ions per area from the low energy focused ion beam; and milling the unfinished sample lamella with the low energy focused ion beam to remove at least a portion of the damage layer to produce the finished sample lamella including at least a portion of the feature of interest.

    摘要翻译： 一种用于使用聚焦离子束形成透射电子显微镜样品薄片的方法，系统和计算机可读介质，包括将高能量聚焦离子束引向体积体积的材料; 铣削不需要的体积的材料以产生具有一个或多个具有损伤层的暴露面的未完成的样品薄片; 表征聚焦离子束的去除速率; 在表征去除速率之后，将低能量聚焦离子束引向未完成的样品薄片达预定的研磨时间，以从低能量聚焦离子束输送每个面积的特定剂量的离子; 并用低能量聚焦离子束研磨未完成的样品薄片以去除损伤层的至少一部分，以产生包括感兴趣特征的至少一部分的成品样品薄片。