RECONSTITUTED WAFER WARPAGE ADJUSTMENT
    3.
    发明申请
    RECONSTITUTED WAFER WARPAGE ADJUSTMENT 有权
    重新配置的WAVER WARPAGE调整

    公开(公告)号:US20120171875A1

    公开(公告)日:2012-07-05

    申请号:US12982707

    申请日:2010-12-30

    IPC分类号: H01L21/324 F27D3/00

    CPC分类号: H01L21/67288

    摘要: A system and method for reducing warpage of a semiconductor wafer. The system includes a device for securing the semiconductor wafer in a heating area. The device includes a holding mechanism for securing an edge of the semiconductor wafer. The device further includes a pressure reducing device that reduces the pressure underneath the semiconductor device, which further secures the semiconductor device in the heating area. The heating area includes a plurality of heating and cooling zones in which the semiconductor wafer is subjected to various temperatures.

    摘要翻译: 一种减少半导体晶片翘曲的系统和方法。 该系统包括用于将半导体晶片固定在加热区域中的装置。 该装置包括用于固定半导体晶片的边缘的保持机构。 该装置还包括减压装置,其降低半导体器件下方的压力,这进一步将半导体器件固定在加热区域中。 加热区域包括多个加热和冷却区域,其中半导体晶片经受各种温度。

    PLASMA TREATMENT ON SEMICONDUCTOR WAFERS
    4.
    发明申请
    PLASMA TREATMENT ON SEMICONDUCTOR WAFERS 审中-公开
    半导体波长处理等离子体处理

    公开(公告)号:US20120168943A1

    公开(公告)日:2012-07-05

    申请号:US12982719

    申请日:2010-12-30

    IPC分类号: H01L23/485 H01L21/50

    摘要: A semiconductor package and method of forming the same is described. The semiconductor package is formed from a semiconductor die cut from a semiconductor wafer that has a passivation layer. The semiconductor wafer is exposed to ionized gas causing the passivation layer to roughen. The semiconductor wafer is cut to form a plurality of semiconductor dies each with a roughened passivation layer. The plurality of semiconductor dies are placed on an adhesive layer to form a reconstituted wafer, and an encapsulation layer is formed enclosing the adhesive layer and the plurality of semiconductor dies. The passivation layer is removed and the semiconductor package formed includes electrical contacts for establishing electrical connections external to the semiconductor package.

    摘要翻译: 描述了半导体封装及其形成方法。 半导体封装由从具有钝化层的半导体晶片切割的半导体管芯形成。 将半导体晶片暴露于电离气体,导致钝化层变粗糙。 切割半导体晶片以形成多个具有粗糙化钝化层的半导体管芯。 多个半导体管芯被放置在粘合剂层上以形成重构的晶片,并且形成包封粘合剂层和多个半导体管芯的封装层。 去除钝化层,形成的半导体封装包括用于在半导体封装外部建立电连接的电触头。

    Reconstituted wafer warpage adjustment
    7.
    发明授权
    Reconstituted wafer warpage adjustment 有权
    晶圆翘曲调整

    公开(公告)号:US08728831B2

    公开(公告)日:2014-05-20

    申请号:US12982707

    申请日:2010-12-30

    IPC分类号: H01L21/00

    CPC分类号: H01L21/67288

    摘要: A system and method for reducing warpage of a semiconductor wafer. The system includes a device for securing the semiconductor wafer in a heating area. The device includes a holding mechanism for securing an edge of the semiconductor wafer. The device further includes a pressure reducing device that reduces the pressure underneath the semiconductor device, which further secures the semiconductor device in the heating area. The heating area includes a plurality of heating and cooling zones in which the semiconductor wafer is subjected to various temperatures.

    摘要翻译: 一种减少半导体晶片翘曲的系统和方法。 该系统包括用于将半导体晶片固定在加热区域中的装置。 该装置包括用于固定半导体晶片的边缘的保持机构。 该装置还包括减压装置,其降低半导体器件下方的压力,这进一步将半导体器件固定在加热区域中。 加热区域包括多个加热和冷却区域,其中半导体晶片经受各种温度。