Semiconductor wafer, semiconductor wafer manufacturing method, and electronic device
    1.
    发明授权
    Semiconductor wafer, semiconductor wafer manufacturing method, and electronic device 失效
    半导体晶片,半导体晶片制造方法和电子器件

    公开(公告)号:US08716836B2

    公开(公告)日:2014-05-06

    申请号:US12811011

    申请日:2008-12-26

    IPC分类号: H01L21/331 H01L29/737

    摘要: A high-quality GaAs-type crystal thin film using an inexpensive Si wafer with good thermal release characteristics is achieved. Provided is a semiconductor wafer comprising an Si wafer; an inhibiting layer that is formed on the wafer and that inhibits crystal growth, the inhibiting layer including a covering region that covers a portion of the wafer and an open region that does not cover a portion of the wafer within the covering region; a Ge layer that is crystal-grown in the open region; and a functional layer that is crystal-grown on the Ge layer. The Ge layer may be formed by annealing with a temperature and duration that enables movement of crystal defects, and the annealing is repeated a plurality of times.

    摘要翻译: 实现了具有良好热释放特性的廉价Si晶片的高质量GaAs型晶体薄膜。 提供了包括Si晶片的半导体晶片; 所述抑制层形成在所述晶片上并且抑制晶体生长,所述抑制层包括覆盖所述晶片的一部分的覆盖区域和不覆盖所述覆盖区域内的所述晶片的一部分的开放区域; 在开放区域晶体生长的Ge层; 以及在Ge层上晶体生长的功能层。 Ge层可以通过使得能够移动晶体缺陷的温度和持续时间退火而形成,并且退火重复多次。

    Ge photodetectors
    2.
    发明授权
    Ge photodetectors 有权
    Ge光电探测器

    公开(公告)号:US07723754B2

    公开(公告)日:2010-05-25

    申请号:US11191769

    申请日:2005-07-28

    IPC分类号: H01L29/737

    摘要: A phototransistor includes an emitter and a base that comprises Ge. A collector comprises Si. The base, emitter, and collector form at least one Si/Ge heterojunction allowing the unpinning of Fermi energy level (EF) of the phototransistor.

    摘要翻译: 光电晶体管包括发射极和包含Ge的基极。 收集器包括Si。 基极,发射极和集电极形成至少一个Si / Ge异质结,允许去除光电晶体管的费米能级(EF)。

    Multiple oxidation smoothing method for reducing silicon waveguide roughness
    5.
    发明授权
    Multiple oxidation smoothing method for reducing silicon waveguide roughness 有权
    减少硅波导粗糙度的多重氧化平滑法

    公开(公告)号:US07123805B2

    公开(公告)日:2006-10-17

    申请号:US10869636

    申请日:2004-06-16

    IPC分类号: G02B6/10 H01L21/00

    摘要: The light-guiding structure includes a waveguide structure that comprises a substrate and a low refractive index underclad material. The waveguide structure is oxidized to form an oxidized layer on a surface of the waveguide structure. The oxidized layer is isotropically etched after the reaction-limited oxidation regime is approaching the diffusion-limited regime and repeatedly oxidized and etched so that the waveguide structure is continuously oxidized in the reaction-limited regime, reducing the overall time of oxidation and volume of oxidized material so that the waveguide structure has its sidewall roughness reduced efficiently enabling high transmission rates of guided light.

    摘要翻译: 导光结构包括波导结构,其包括基底和低折射率底层材料。 波导结构被氧化以在波导结构的表面上形成氧化层。 在反应限制氧化态接近扩散限制状态后,氧化层进行各向同性蚀刻,并被反复氧化和蚀刻,使得波导结构在反应限制状态下连续氧化,减少氧化的总时间和氧化的体积 材料,使得波导结构的侧壁粗糙度有效地降低,导致导光的高透射率。

    Ge photodetectors
    6.
    发明申请
    Ge photodetectors 有权
    Ge光电探测器

    公开(公告)号:US20060022226A1

    公开(公告)日:2006-02-02

    申请号:US11191769

    申请日:2005-07-28

    IPC分类号: H01L27/148

    摘要: A phototransistor includes an emitter and a base that comprises Ge. A collector comprises Si. The base, emitter, and collector form at least one Si/Ge heterojunction allowing the unpinning of Fermi energy level (EF) of the phototransistor.

    摘要翻译: 光电晶体管包括发射极和包含Ge的基极。 收集器包括Si。 基极,发射极和集电极形成至少一个Si / Ge异质结,允许去除光电晶体管的费米能级(E> F)。

    Process for fabrication of high reflectors by reversal of layer sequence and application thereof
    8.
    发明申请
    Process for fabrication of high reflectors by reversal of layer sequence and application thereof 失效
    通过反转层序列制造高反射体的方法及其应用

    公开(公告)号:US20050063061A1

    公开(公告)日:2005-03-24

    申请号:US10917209

    申请日:2004-08-12

    CPC分类号: G02B5/0833

    摘要: An optical reflector includes an optical reflective element that comprises alternating layers of high and low index layers. A new substrate is bonded on the optical reflective element. The sequence of layers in the reflective element is reversed in order such that the layers grown first with lowest surface roughness are exposed to the highest electric field strength, and the layer grown last, of highest roughness, are buried deep in the multilayer stack.

    摘要翻译: 光学反射器包括光反射元件,其包括高折射率层和低折射率层的交替层。 新的衬底粘结在光学反射元件上。 反射元件中的层序顺序颠倒,使得首先以最低表面粗糙度生长的层暴露于最高的电场强度,并且最后粗糙度最高的层被深埋在多层叠层中。

    Multiple oxidation smoothing method for reducing silicon waveguide roughness
    9.
    发明申请
    Multiple oxidation smoothing method for reducing silicon waveguide roughness 有权
    减少硅波导粗糙度的多重氧化平滑法

    公开(公告)号:US20050013575A1

    公开(公告)日:2005-01-20

    申请号:US10869636

    申请日:2004-06-16

    摘要: The light-guiding structure includes a waveguide structure that comprises a substrate and a low refractive index underclad material. The waveguide structure is oxidized to form an oxidized layer on a surface of the waveguide structure. The oxidized layer is isotropically etched after the reaction-limited oxidation regime is approaching the diffusion-limited regime and repeatedly oxidized and etched so that the waveguide structure is continuously oxidized in the reaction-limited regime, reducing the overall time of oxidation and volume of oxidized material so that the waveguide structure has its sidewall roughness reduced efficiently enabling high transmission rates of guided light.

    摘要翻译: 导光结构包括波导结构,其包括基底和低折射率底层材料。 波导结构被氧化以在波导结构的表面上形成氧化层。 在反应限制氧化态接近扩散限制状态后,氧化层进行各向同性蚀刻,并被反复氧化和蚀刻,使得波导结构在反应限制状态下连续氧化,减少氧化的总时间和氧化的体积 材料,使得波导结构的侧壁粗糙度有效降低,导致导光的高透射率。