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公开(公告)号:US06174854B1
公开(公告)日:2001-01-16
申请号:US08361257
申请日:1994-12-21
Applicant: Urs Hofer , Werner Kaufmann , Manfred Rembold
Inventor: Urs Hofer , Werner Kaufmann , Manfred Rembold
IPC: C11D328
CPC classification number: D06M13/352 , C11D1/62 , C11D3/0015 , C11D3/42 , D06M13/358
Abstract: There is provided a stable, concentrated fabric rinse composition comprising 0.1 to 20, preferably 1 to 10% by weight of a UV absorber selected from a hydroxyaryl-1,3,5-triazine, a sulphonated-1,3,5-triazine, an o-hydroxyphenylbenzotriazole or a 2-aryl-2H-benzotriazole, based on the total weight of the composition, and a fabric care ingredient, preferably a fabric softener, a stain release or stain repellant ingredient or a water-proofing agent, the remainder being substantially water. The fabric rinse composition is preferably a fabric softener composition comprising 5 to 25, preferably 10 to 20% by weight of a cationic fabric softening agent and 0.1 to 20, preferably 1 to 10% by weight of a UV absorber selected from a hydroxyaryl-1,3,5-triazine, a sulphonated-1,3,5-triazine, an o-hydroxyphenylbenzotriazole or a 2-aryl-2H-benzotriazole, each based on the total weight of the composition, the remainder being substantially water. The present invention also provides method for the treatment of a textile article, comprising applying, to the previously washed article, the said fabric rinse composition, preferably the rinse cycle fabric softener composition, whereby the SPF value of articles so treated can be significantly increased.
Abstract translation: 提供了稳定的浓缩织物漂洗组合物,其包含0.1至20重量%,优选1至10重量%的选自羟基芳基-1,3,5-三嗪,磺化1,3,5-三嗪, 基于组合物的总重量的邻羟基苯基苯并三唑或2-芳基-2H-苯并三唑,以及织物护理成分,优选织物柔软剂,防污剂或防污剂成分或防水剂,其余 基本上是水。 织物漂洗组合物优选是织物柔软剂组合物,其包含5至25重量%,优选10至20重量%的阳离子织物软化剂和0.1至20重量%,优选1至10重量%的选自羟基芳基-1 ,3,5-三嗪,磺化-1,3,5-三嗪,邻羟基苯基苯并三唑或2-芳基-2H-苯并三唑,各自基于组合物的总重量,其余基本上为水。 本发明还提供了一种用于处理纺织品的方法,其包括向先前洗涤的制品施加所述织物漂洗组合物,优选漂洗循环织物柔软剂组合物,由此可以显着提高如此处理的制品的SPF值。
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公开(公告)号:US5942564A
公开(公告)日:1999-08-24
申请号:US783184
申请日:1997-01-15
Applicant: Jurgen Kaschig , Dieter Reinehr , Manfred Rembold
Inventor: Jurgen Kaschig , Dieter Reinehr , Manfred Rembold
IPC: C07D251/24 , C08K5/3477 , C08K5/3492 , C08L101/00 , C09D7/12 , D06M13/02 , D06M13/152 , D06M13/224 , D06M13/236 , D06M13/244 , D06M13/248 , D06M13/252 , D06M13/282 , D06M13/288 , D06M13/322 , D06M13/325 , D06M13/35 , D06M13/352 , D06M13/355 , D06M13/358 , D06M13/402 , D06M13/415 , D06M101/00 , D06M101/16 , D06M101/30 , D06M101/32 , C08K5/34
CPC classification number: C09D7/1241 , C07D251/24 , C08K5/3492 , C08K5/34926
Abstract: The invention relates to o-hydroxyphenyl-s-triazines of formula ##STR1## wherein at least one of Y and Z are C.sub.1 -C.sub.18 alkoxyThe compounds are suitable for use as UV stabilisers for the photochemical and thermal stabilisation of polyester fibre materials and as stabilisers for organic ploymers.
Abstract translation: 本发明涉及下式的邻羟基苯基-s-三嗪,其中Y和Z中的至少一个是C 1 -C 18烷氧基该化合物适合用作UV稳定剂,用于聚酯纤维材料的光化学和热稳定化以及作为有机物的稳定剂 工匠
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公开(公告)号:US5856380A
公开(公告)日:1999-01-05
申请号:US656268
申请日:1996-06-14
Applicant: Michael Bauer , Manfred Rembold
Inventor: Michael Bauer , Manfred Rembold
IPC: C08J7/18 , B05D7/24 , C08F30/02 , C08G79/02 , C08L101/00 , D06M10/00 , D06M10/02 , D06M10/08 , D06M13/02 , D06M13/244 , D06M13/282 , D06M14/20 , D06M14/26 , C08J3/28 , B32B9/04
Abstract: A process is described for flame-proofing organic polymeric materials by means of a low temperature plasma treatment in the presence of at least one volatile, low-molecular compound. The process comprises subjecting a volatile compound, selected from a halogen-free phosphorus compound, to the low temperature plasma, such that a homogeneous polymeric structure forms on the organic material. A very wide range of organic materials can be effectively flame-proofed with the process of this invention without adversely affecting their other properties such as mechanical properties or photochemical stability.
Abstract translation: PCT No.PCT / EP94 / 04029 Sec。 371日期1996年6月14日第 102(e)1996年6月14日PCT 1994年12月3日PCT PCT。 公开号WO95 / 16715 日期1995年6月22日描述了在至少一种挥发性低分子化合物的存在下,通过低温等离子体处理来阻止有机聚合物材料的方法。 该方法包括使选自无卤素磷化合物的挥发性化合物经受低温等离子体,从而在有机材料上形成均匀的聚合物结构。 通过本发明的方法可以有效地阻燃非常宽范围的有机材料,而不会不利地影响其它性能如机械性能或光化学稳定性。
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公开(公告)号:US5591850A
公开(公告)日:1997-01-07
申请号:US340952
申请日:1994-11-17
Applicant: Jean-Luc Birbaum , J urgen Kaschig , Dieter Reinehr , Manfred Rembold , Andr e Schmitter , Helmut Luther , Bernd Herzog , Dietmar H uglin
Inventor: Jean-Luc Birbaum , J urgen Kaschig , Dieter Reinehr , Manfred Rembold , Andr e Schmitter , Helmut Luther , Bernd Herzog , Dietmar H uglin
IPC: C07D251/02 , A61K8/00 , A61K8/42 , A61K8/49 , A61K8/85 , A61Q17/04 , C07D251/12 , C07D251/24 , C08K5/3492 , C08L67/00 , C09K3/00 , D06P1/642 , D06P3/52 , C07D251/00
CPC classification number: C08K5/3492 , A61K8/4966 , A61Q17/04 , C07D251/24 , D06P1/6426
Abstract: o-Hydroxyphenyl-s-triazines are described which contain at least two alkoxyphenyl substituents. They have the formula (1).The compounds according to the invention are suitable as stabilizers for textile fiber materials, in particular polyester fiber materials, and for organic polymers. Furthermore, they are suitable for use as sunscreens in cosmetic preparations.
Abstract translation: 描述了含有至少两个烷氧基苯基取代基的邻羟基苯基-s-三嗪。 他们有公式(1)。 根据本发明的化合物适用于纺织纤维材料,特别是聚酯纤维材料和有机聚合物的稳定剂。 此外,它们适合用作化妆品制剂中的防晒剂。
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公开(公告)号:US5629356A
公开(公告)日:1997-05-13
申请号:US614121
申请日:1996-03-12
Applicant: Vincent Desobry , Kurt Dietliker , Rinaldo H usler , Werner Rutsch , Manfred Rembold , Franciszek Sitek
Inventor: Vincent Desobry , Kurt Dietliker , Rinaldo H usler , Werner Rutsch , Manfred Rembold , Franciszek Sitek
IPC: C07D209/12 , C07C67/00 , C07C209/86 , C07C213/00 , C07C219/02 , C07C219/04 , C07C225/16 , C07C225/22 , C07C229/06 , C07C229/14 , C07C229/16 , C07C229/34 , C07C229/52 , C07C233/36 , C07C253/00 , C07C255/56 , C07C313/00 , C07C317/32 , C07C317/36 , C07C323/23 , C07C323/25 , C07C323/31 , C07C323/32 , C07C323/65 , C07D209/86 , C07D219/02 , C07D219/04 , C07D223/22 , C07D263/32 , C07D263/56 , C07D265/30 , C07D265/36 , C07D265/38 , C07D279/18 , C07D283/00 , C07D295/02 , C07D295/10 , C07D295/104 , C07D295/112 , C07D295/12 , C07D307/91 , C07F7/18 , C08F2/46 , C08F2/50 , C09D4/00 , C09D5/32 , C09D7/12 , C09D11/10 , G03F7/031
CPC classification number: C07D295/112 , C07D209/86 , C07D295/104 , C08F2/50 , G03F7/031
Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
Abstract translation: 式I,II,III和IIIa的化合物其中Ar1是未取代或取代的芳族基团,并且基团R 1和R 2中的至少一个是烯基 ,环烯基或芳基甲基是用于光聚合不饱和化合物的有效光引发剂。 它们特别适用于着色系统的光固化。
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公开(公告)号:US5534629A
公开(公告)日:1996-07-09
申请号:US432035
申请日:1995-05-01
Applicant: Vincent Desobry , Kurt Dietliker , Rinaldo Husler , Werner Rutsch , Manfred Rembold , Franciszek Sitek
Inventor: Vincent Desobry , Kurt Dietliker , Rinaldo Husler , Werner Rutsch , Manfred Rembold , Franciszek Sitek
IPC: C07D209/12 , C07C67/00 , C07C209/86 , C07C213/00 , C07C219/02 , C07C219/04 , C07C225/16 , C07C225/22 , C07C229/06 , C07C229/14 , C07C229/16 , C07C229/34 , C07C229/52 , C07C233/36 , C07C253/00 , C07C255/56 , C07C313/00 , C07C317/32 , C07C317/36 , C07C323/23 , C07C323/25 , C07C323/31 , C07C323/32 , C07C323/65 , C07D209/86 , C07D219/02 , C07D219/04 , C07D223/22 , C07D263/32 , C07D263/56 , C07D265/30 , C07D265/36 , C07D265/38 , C07D279/18 , C07D283/00 , C07D295/02 , C07D295/10 , C07D295/104 , C07D295/112 , C07D295/12 , C07D307/91 , C07F7/18 , C08F2/46 , C08F2/50 , C09D4/00 , C09D5/32 , C09D7/12 , C09D11/10 , G03F7/031
CPC classification number: C07D295/112 , C07D209/86 , C07D295/104 , C08F2/50 , G03F7/031
Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
Abstract translation: 式I,II,III和IIIa的化合物其中Ar1是未取代或取代的芳族基团,并且基团R 1和R 2中的至少一个是烯基 ,环烯基或芳基甲基是用于光聚合不饱和化合物的有效光引发剂。 它们特别适用于着色系统的光固化。
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公开(公告)号:US5106722A
公开(公告)日:1992-04-21
申请号:US567048
申请日:1990-08-14
Applicant: Rinaldo Husler , Bernd Klingert , Manfred Rembold , Eginhard Steiner
Inventor: Rinaldo Husler , Bernd Klingert , Manfred Rembold , Eginhard Steiner
IPC: G03F7/028 , C07D207/32 , C07D207/325 , C07D207/333 , C07D207/335 , C07D405/04 , C07F7/08 , C07F7/28 , C07F17/00 , C08F2/50 , C08F4/76 , C09D4/00 , C09D11/10 , G03F7/029
CPC classification number: C07D207/325 , C07D207/333 , C07D207/335 , C07D405/04 , C07F17/00 , C07F7/0814 , C08F2/50 , G03F7/029 , Y10S430/121 , Y10S430/148
Abstract: Titanocenes containing two 5-membered cyclodienyl groups, for example cyclopentadienyl, and one or two 6-membered carbocyclic or 5- or 6-membered heterocyclic aromatic rings which are substituted by a fluorine atom in at least one of the two ortho-positions to the titanium-carbon bond and contain, as a further substituent, unsubstituted or substituted 1-pyrryl, are suitable as photoinitiators for radiation-induced polymerization of ethylenically unsaturated compounds.
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8.
公开(公告)号:US5095044A
公开(公告)日:1992-03-10
申请号:US515971
申请日:1990-04-27
Applicant: Rinaldo Husler , Rudolf Kirchmayr , Werner Rutsch , Manfred Rembold
Inventor: Rinaldo Husler , Rudolf Kirchmayr , Werner Rutsch , Manfred Rembold
CPC classification number: C07C45/515 , C07C45/71 , C07C49/84 , C08G4/00 , Y10S522/904
Abstract: Compounds of the formula I ##STR1## in which n is 1-30 and X, Y, R, Ar.sup.1 and Ar.sup.2 are as defined in claim 1 can be prepared by reaction of a benzil dialkyl ketal with a diol. Depending on the molar ratio of the two reaction components, products having a different polycondensation degree n are obtained. the compounds can be used as photoinitiators.
Abstract translation: 式I的化合物(I)其中n为1-30且X,Y,R,Ar1和Ar2如权利要求1所定义,可以通过苯偶酰二烷基缩酮与二醇的反应来制备。 取决于两种反应组分的摩尔比,获得具有不同缩聚度n的产物。 该化合物可用作光引发剂。
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公开(公告)号:US5077402A
公开(公告)日:1991-12-31
申请号:US501409
申请日:1990-03-28
Applicant: Vincent Desobry , Kurt Dietliker , Rinaldo Husler , Werner Rutsch , Manfred Rembold , Franciszek Sitek
Inventor: Vincent Desobry , Kurt Dietliker , Rinaldo Husler , Werner Rutsch , Manfred Rembold , Franciszek Sitek
IPC: C07D209/12 , C07C67/00 , C07C209/86 , C07C213/00 , C07C219/02 , C07C219/04 , C07C225/16 , C07C225/22 , C07C229/06 , C07C229/14 , C07C229/16 , C07C229/34 , C07C229/52 , C07C233/36 , C07C253/00 , C07C255/56 , C07C313/00 , C07C317/32 , C07C317/36 , C07C323/23 , C07C323/25 , C07C323/31 , C07C323/32 , C07C323/65 , C07D209/86 , C07D219/02 , C07D219/04 , C07D223/22 , C07D263/32 , C07D263/56 , C07D265/30 , C07D265/36 , C07D265/38 , C07D279/18 , C07D283/00 , C07D295/02 , C07D295/10 , C07D295/104 , C07D295/112 , C07D295/12 , C07D307/91 , C07F7/18 , C08F2/46 , C08F2/50 , C09D4/00 , C09D5/32 , C09D7/12 , C09D11/10 , G03F7/031
CPC classification number: C07D295/112 , C07D209/86 , C07D295/104 , C08F2/50 , G03F7/031
Abstract: Compounds of the formula I, II, III and IIIa ##STR1## in which Ar.sup.1 is an unsubstituted or substituted aromatic radical and at least one of the radicals R.sup.1 and R.sup.2 is an alkenyl, cycloalkenyl or arylmethyl group, are effective photoinitiators for photopolymerization of unsaturated compounds. They are particularly suitable for photocuring of pigmented systems.
Abstract translation: 式I,II,III和IIIa的化合物其中Ar1是未取代或取代的芳族基团,并且基团R 1和R 2中的至少一个是烯基 ,环烯基或芳基甲基是用于光聚合不饱和化合物的有效光引发剂。 它们特别适用于着色系统的光固化。
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公开(公告)号:US4970136A
公开(公告)日:1990-11-13
申请号:US361194
申请日:1989-06-05
Applicant: Martin Riediker , Eginhard Steiner , Harry Beyeler , Manfred Rembold , Franciszek Sitek
Inventor: Martin Riediker , Eginhard Steiner , Harry Beyeler , Manfred Rembold , Franciszek Sitek
CPC classification number: C07F17/00 , C08F2/50 , G03F7/029 , Y10S430/12 , Y10S430/122 , Y10S430/124 , Y10S430/126 , Y10S430/148
Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the matal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.
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