Method for producing a high-speed power diode with soft recovery, and a power diode produced using such a method
    1.
    发明授权
    Method for producing a high-speed power diode with soft recovery, and a power diode produced using such a method 失效
    用于生产具有软恢复的高速功率二极管的方法和使用这种方法制造的功率二极管

    公开(公告)号:US06469368B2

    公开(公告)日:2002-10-22

    申请号:US09897027

    申请日:2001-07-03

    申请人: Norbert Galster

    发明人: Norbert Galster

    IPC分类号: H01L29167

    摘要: In a method for producing a high-speed power diode with soft recovery, in which method the carrier life within the associated semiconductor substrate (10) is governed by first, unmasked bombardment (14) with an axial profile and by subsequent, second, masked bombardment (15) with a lateral profile, improved reverse characteristics are achieved in that the first, unmasked bombardment is ion bombardment (14) which governs the switching response of the power diode and in that the second, masked bombardment is electron bombardment (15), which reduces the active area of the power diode. In a power diode equipped with such a semiconductor substrate (10), the thermal resistance Rth is reduced in relation to the active area of the power diode.

    摘要翻译: 在用于制造具有软恢复的高速功率二极管的方法中,在该方法中,相关联的半导体衬底(10)内的载体寿命由具有轴向轮廓的第一未被掩蔽的轰击(14)和随后的第二掩模 实现了具有横向轮廓的轰击(15),改进了反向特性,因为第一次未掩蔽的轰击是控制功率二极管的开关响应的离子轰击(14),并且第二个被掩蔽的轰击是电子轰击(15) ,这降低了功率二极管的有效面积。 在配备有这种半导体基板(10)的功率二极管中,热电阻Rth相对于功率二极管的有效面积减小。

    Process for adjusting the carrier lifetime in a semiconductor component
    4.
    发明授权
    Process for adjusting the carrier lifetime in a semiconductor component 失效
    用于调整半导体部件中的载流子寿命的方法

    公开(公告)号:US6159830A

    公开(公告)日:2000-12-12

    申请号:US363645

    申请日:1999-07-30

    CPC分类号: H01L21/26506 H01L21/266

    摘要: In a process for adjusting the carrier lifetime in a semiconductor component (1) by means of particle irradiation (P), at least two defect regions (10, 11, 12, 13) are produced in the semiconductor component (1). In this process, a particle beam (P), consisting of particles (a, b, c, d) with at least approximately the same initial energy, is acted on by at least one means (2), before reaching the semiconductor component (1), in such a way that the particles (a, b, c, d) subsequently have different energy values, at least two energy value groups being distinguishable. It is thereby possible, with a single particle irradiation operation, to produce an arbitrary number of defect regions whose arrangement and weighting is arbitrarily selectable.

    摘要翻译: 在通过粒子照射(P)调整半导体部件(1)中的载流子寿命的工序中,在半导体部件(1)中产生至少两个缺陷区域(10,11,12,13)。 在该过程中,由具有至少大致相同的初始能量的粒子(a,b,c,d)组成的粒子束(P)在到达半导体部件(2)之前由至少一个装置(2)起作用 1),使得颗粒(a,b,c,d)随后具有不同的能量值,至少两个能量值组是可区分的。 因此,通过单粒子照射操作可以产生任意数量的排列和加权可任意选择的缺陷区域。

    Process for fabricating a semiconductor component
    6.
    发明授权
    Process for fabricating a semiconductor component 失效
    半导体部件的制造方法

    公开(公告)号:US06475876B2

    公开(公告)日:2002-11-05

    申请号:US09374844

    申请日:1999-08-16

    IPC分类号: H01L2130

    CPC分类号: H01L29/6609 H01L29/8611

    摘要: In a process for fabricating a semiconductor component, in particular a semiconductor diode, a semiconductor substrate (1) is provided with metal layers (3, 4) in order to form electrode terminals and with passivation (2), and is exposed to particle irradiation (P) in order to adjust the carrier lifetime. This being the case, at least the metal layer (3) on the irradiation side and the passivation (2) are not applied until after the particle irradiation (P). As a result, a continuous defect region (5), which precludes undesired edge effects, is obtained in the semiconductor substrate (1).

    摘要翻译: 在制造半导体部件,特别是半导体二极管的工艺中,半导体衬底(1)设置有金属层(3,4)以形成电极端子和钝化层(2),并暴露于粒子照射 (P),以调整载体寿命。 在这种情况下,至少在照射侧的金属层(3)和钝化层(2)直到粒子照射(P)才被施加。 结果,在半导体衬底(1)中获得了排除不想要的边缘效应的连续缺陷区域(5)。