HYBRID ELECTRO-DEPOSITION OF SOFT MAGNETIC COBALT ALLOY FILMS
    6.
    发明申请
    HYBRID ELECTRO-DEPOSITION OF SOFT MAGNETIC COBALT ALLOY FILMS 审中-公开
    软磁性合金薄膜的混合电沉积

    公开(公告)号:US20080202922A1

    公开(公告)日:2008-08-28

    申请号:US11678056

    申请日:2007-02-22

    IPC分类号: C05B9/00

    摘要: A hybrid electro-deposition process for soft magnetic cobalt alloy films comprises providing a plating bath that includes cobalt and a reducing agent, providing a cobalt-containing anode in the plating bath coupled to a power supply, providing a substrate in the plating bath coupled to the power supply, wherein the substrate functions as a cathode, applying a magnetic field across the plating bath, and applying an electrical current to the plating bath by way of the power supply to cause the cobalt to deposit onto the substrate and form a soft magnetic film.

    摘要翻译: 用于软磁性钴合金膜的混合电沉积方法包括提供包括钴和还原剂的电镀槽,在与电源相连的电镀槽中提供含钴阳极,在镀浴中提供与 所述电源,其中所述衬底用作阴极,在所述电镀槽上施加磁场,并且通过所述电源将电流施加到所述电镀槽,以使所述钴沉积到所述衬底上并形成软磁体 电影。