摘要:
The invention provides highly transparent single crystalline AlN layers as device substrates for light emitting diodes in order to improve the output and operational degradation of light emitting devices. The highly transparent single crystalline AlN layers have a refractive index in the a-axis direction in the range of 2.250 to 2.400 and an absorption coefficient less than or equal to 15 cm-1 at a wavelength of 265 nm. The invention also provides a method for growing highly transparent single crystalline AlN layers, the method including the steps of maintaining the amount of Al contained in wall deposits formed in a flow channel of a reactor at a level lower than or equal to 30% of the total amount of aluminum fed into the reactor, and maintaining the wall temperature in the flow channel at less than or equal to 1200° C.
摘要:
The invention provides highly transparent single crystalline AlN layers as device substrates for light emitting diodes in order to improve the output and operational degradation of light emitting devices. The highly transparent single crystalline AlN layers have a refractive index in the a-axis direction in the range of 2.250 to 2.400 and an absorption coefficient less than or equal to 15 cm-1 at a wavelength of 265 nm. The invention also provides a method for growing highly transparent single crystalline A1N layers, the method including the steps of maintaining the amount of Al contained in wall deposits formed in a flow channel of a reactor at a level lower than or equal to 30% of the total amount of aluminum fed into the reactor, and maintaining the wall temperature in the flow channel at less than or equal to 1200° C.
摘要:
This invention provides a p-type group III nitride semiconductor, with good p-type properties, having a composition expressed by AlXGaYInZN in which each of X, Y and Z indicates a rational number satisfying a relationship of X+Y+Z=1.0, even if Al content is as high as 1.0>X≧0.5. It is achieved that a proportion of a hole concentration at 30° C. to an acceptor impurity atom concentration is 0.001 or more in the p-type group III nitride semiconductor of the invention, by doping acceptor impurity atoms such as Mg in concentration of 5×1018 to 1×1020 cm−3 using the method, for example, MOCVD with attention not to incorporate an impurity atom other than the acceptor impurity atom or not to form dislocation in the crystal when producing the group III nitride semiconductor expressed by the above composition.
摘要翻译:本发明提供一种p型III族氮化物半导体,具有良好的p型性质,具有由Al x Ga Y InZ N表示的组成,其中X,Y和Z各自表示满足X + Y + Z = 1.0的关系的有理数, 即使Al含量高达1.0>X≥0.5。 实现在本发明的p型III族氮化物半导体中,在30℃至受主杂质原子浓度的空穴浓度的比例为0.001以上,通过掺杂受体杂质原子如Mg的浓度为5 ×1018〜1×1020cm-3的方法,例如MOCVD,注意不要掺杂除受体杂质原子以外的杂质原子,或者在制造由上述表示的III族氮化物半导体时,在晶体中形成位错 组成。
摘要:
A production method of a layered body having a single crystal layer including a group III nitride having a composition AlXGaYInZN (wherein, X, Y and Z are rational numbers respectively satisfying 0.9≦X≦1.0, 0.0≦Y≦0.1, 0.0≦Z≦0.1, and X+Y+Z=1.0) includes a first growing step supplying an oxygen source gas to a sapphire substrate with a nitrogen source gas and a group III raw material gas which is a raw material gas for growing the group III nitride single crystal, thereby growing an initial single crystal layer comprising the group III nitride satisfying the composition and comprising oxygen in a concentration of 1×1020 cm−3 or more and 5×1021 cm−3 or less in a thickness of 15 nm or more and 40 nm or less on the sapphire substrate; and a second growing step of supplying the raw material gas without the oxygen source gas, or supplying the oxygen source gas in a less amount than the first growing step together with the raw material gas onto the initial single crystal layer, thereby growing the second group III nitride single crystal layer comprising the group III nitride satisfying the composition having reduced oxygen concentration than the initial single crystal layer.
摘要翻译:具有单晶层的制造方法,具有包含具有Al x Ga Y In Z N组成的III族氮化物的单晶层(其中,X,Y和Z分别为有效数分别满足0.9≦̸ X< l1; 1.0,0.0≦̸ Y≦̸ 0.1,0.0& ; Z≦̸ 0.1和X + Y + Z = 1.0)包括用氮源气体向蓝宝石衬底供应氧源气体的第一生长步骤和用于生长该组的原料气体的第III族原料气体 III族氮化物单晶,从而生长出包含满足组成的III族氮化物的初始单晶层,并且包含浓度为1×1020cm -3以上且5×1021cm-3以下的氧,厚度为15nm 或更多且在40nm或更小的蓝宝石衬底上; 以及第二生长步骤,在没有氧源气体的情况下供给原料气体,或者将比原料气体少的第一生长步骤的氧源气体与初始单晶层一起供给,从而使第二组 III族氮化物单晶层,其包含满足具有比初始单晶层低的氧浓度的组成的III族氮化物。
摘要:
A repeatedly usable and releasable sheet is coated thereon with an adhesive copolymer microspheres-containing aqueous suspension and polymer microparticles prepared by polymerization of one or more vinyl monomers. In the presence of a protective colloid comprising casein, the microspheres is prepared by aqueous suspension polymerization of (a) from 70 to 99.9 percent by weight of one or more monomers selected from the group consisting of alkyl acrylate esters and alkyl methacrylate esters, (b) from 0.1 to 10 percent by weight of one or more .alpha.-monoolefin carboxylic acids and (c) from 0 to 29.9 percent by weight of one or more vinyl monomers other than the foregoing (a) and (b).
摘要:
A method for forming an n-type contact electrode comprising an n-type nitride semiconductor such as AlxInyGazN (with x, y, and z being rational numbers that sum to 1.0 and fulfill the relations 0
摘要翻译:一种用于形成n型接触电极的方法,其包括n型氮化物半导体,例如Al x In y Ga z N(x,y和z是有理数为1.0并且满足关系0
摘要:
Disclosed is a novel method for group III polarity growth on a sapphire substrate. Specifically disclosed is a method for producing a laminate wherein a group III nitride single crystal layer is laminated on a sapphire substrate by an MOCVD method. The method for producing a laminate comprises: a pretreatment step in which an oxygen source gas is supplied onto the sapphire substrate; a first growth step in which an initial single crystal layer that contains oxygen at a concentration of 5×1020 cm−3 or more but 5×1021 cm−3 or less is grown with a thickness of 3 nm or more but less than 15 nm by supplying the oxygen source gas onto the sapphire substrate together with a starting material gas for the growth of the group III nitride; and a second growth step in which a group III nitride single crystal layer that is reduced in the oxygen concentration in comparison to the initial single crystal layer is grown by supplying the starting material gas onto the initial single crystal layer without supplying the oxygen source thereto, or alternatively by supplying the oxygen source, together with the starting material gas, at a lower supply rate than that in the first growth step.
摘要:
A sealing device for an elevator door includes a doorway member, doors, a movable member, a push-down mechanism and a sealing mechanism. The doorway member is provided for a gate. The doors open or close along the doorway member. The movable member is set horizontally and provided to be movable in a vertical direction in the doorway member, and it is urged upwards by an urging unit. The push-down mechanism pushes down the movable member against the force of the urging unit just before the doors are closed. The sealing mechanism is kept non-contact with the doors while they are moving, and seals the gap between the doors and the doorway member as it is brought into contact with upper section of the doors when the movable member is pushed down by the push-down mechanism.
摘要:
The acrylic copolymer of the present invention is an acrylic copolymer comprising recurring units derived from a (meth)acrylic ester compound and recurring units derived from a vinyl compound having --SO.sub.3 R (wherein R represents a hydrogen atom or a lower alkyl group) or having an acceptable salt thereof, wherein at least a part of ester groups of the (meth)acrylic ester compound is substituted by a group having recurring units derived from a (meth)acrylic ester. The present invention further provides a process for the preparation of the acrylic copolymer and use application of the acrylic copolymer utilizing its adhesion properties.
摘要:
A method for forming an n-type contact electrode, which includes an n-type nitride semiconductor such as AlxInyGazN (with x, y, and z being rational numbers that sum to 1.0 and fulfill the relations 0
摘要翻译:一种形成n型接触电极的方法,其包括n型氮化物半导体,例如Al x In y Ga z N(x,y和z是有效数为1.0并满足关系0