Processing system
    1.
    发明授权
    Processing system 有权
    处理系统

    公开(公告)号:US08939108B2

    公开(公告)日:2015-01-27

    申请号:US13708936

    申请日:2012-12-08

    摘要: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.

    摘要翻译: 提供了一种用于处理物体(3)的处理系统,其中处理系统适于聚焦第一能量束,特别是电子束(11)和第二能量束,特别是离子束(21) 在可以配置被处理物体(3)的聚焦区域(29)上。 具有用于穿过能量束的两个开口(38,39)和用于供给处理气体的连接器(37))的处理室壁(35)从处理系统的真空室(2)界定处理室(45)。 通过激活能量束中的一个能量束并通过其中一个能量束检查物体来处理物体,能够使物体相对于能量束之一的传播方向的不同取向。

    Processing System
    2.
    发明申请
    Processing System 审中-公开
    处理系统

    公开(公告)号:US20150114294A1

    公开(公告)日:2015-04-30

    申请号:US14590952

    申请日:2015-01-06

    摘要: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.

    摘要翻译: 提供了一种用于处理物体(3)的处理系统,其中处理系统适于聚焦第一能量束,特别是电子束(11)和第二能量束,特别是离子束(21) 在可以配置被处理物体(3)的聚焦区域(29)上。 具有用于穿过能量束的两个开口(38,39)和用于供给处理气体的连接器(37))的处理室壁(35)从处理系统的真空室(2)界定处理室(45)。 通过激活能量束中的一个能量束并通过其中一个能量束检查物体来处理物体,能够使物体相对于能量束之一的传播方向的不同取向。

    PARTICLE BEAM SYSTEM INCLUDING A SUPPLY OF PROCESS GAS TO A PROCESSING LOCATION
    3.
    发明申请
    PARTICLE BEAM SYSTEM INCLUDING A SUPPLY OF PROCESS GAS TO A PROCESSING LOCATION 有权
    颗粒束系统,包括将过程气体供应给处理位置

    公开(公告)号:US20130187064A1

    公开(公告)日:2013-07-25

    申请号:US13746560

    申请日:2013-01-22

    IPC分类号: F17D1/04

    摘要: A system for supplying a process gas to a processing location of a particle beam system is disclosed. The system for supplying the processing gas includes a gas reservoir, a gas conduit, a pipe located close to the processing location, a valve between the gas conduit and the pipe, and a controller configured to open and to close the valve to switch the system from a first mode of operation in which process gas is not supplied to the processing location to a second mode of operation in which process gas is supplied to the processing location. The controller can alternately open and close the valve in cycles. Each cycle can include a first duration in which the valve is open and a second duration in which the valve is closed. The ratio of the first duration to the second duration can be changed.

    摘要翻译: 公开了一种用于将处理气体提供给粒子束系统的处理位置的系统。 用于供应处理气体的系统包括气体储存器,气体导管,位于处理位置附近的管,气体管道和管道之间的阀以及被配置为打开和关闭阀以切换系统的控制器 从处理气体未被提供给处理位置的第一操作模式到处理气体被供应到处理位置的第二操作模式。 控制器可以循环打开和关闭阀门。 每个循环可以包括其中阀打开的第一持续时间和阀关闭的第二持续时间。 可以改变第一持续时间与第二持续时间的比率。

    Apparatus for focusing and for storage of ions and for separation of pressure areas
    4.
    发明申请
    Apparatus for focusing and for storage of ions and for separation of pressure areas 审中-公开
    用于聚焦和存储离子和分离压力区域的装置

    公开(公告)号:US20160020064A1

    公开(公告)日:2016-01-21

    申请号:US14803342

    申请日:2015-07-20

    IPC分类号: H01J37/18 H01J37/20 H01J37/28

    摘要: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.

    摘要翻译: 公开了一种用于聚焦和存储离子的装置和用于将第一压力区域与第二压力区域分离的装置,特别是用于离子分析装置。 粒子束装置可以具有上述装置中的至少一个。 提供了用于保持离子和至少一个多极单元的容器。 多极单元具有纵向轴线的通孔以及多个电极。 第一组电极处于距纵向轴线的第一径向距离处。 在每种情况下,第二组电极距离纵向轴线的第二径向距离。 第一径向距离小于第二径向距离。 或者或另外,该装置可以具有径向范围的细长开口。 开口具有大于径向范围的纵向范围。

    Particle beam system including a supply of process gas to a processing location
    5.
    发明授权
    Particle beam system including a supply of process gas to a processing location 有权
    粒子束系统包括向加工位置供给工艺气体

    公开(公告)号:US08969835B2

    公开(公告)日:2015-03-03

    申请号:US13746560

    申请日:2013-01-22

    摘要: A system for supplying a process gas to a processing location of a particle beam system is disclosed. The system for supplying the processing gas includes a gas reservoir, a gas conduit, a pipe located close to the processing location, a valve between the gas conduit and the pipe, and a controller configured to open and to close the valve to switch the system from a first mode of operation in which process gas is not supplied to the processing location to a second mode of operation in which process gas is supplied to the processing location. The controller can alternately open and close the valve in cycles. Each cycle can include a first duration in which the valve is open and a second duration in which the valve is closed. The ratio of the first duration to the second duration can be changed.

    摘要翻译: 公开了一种用于将处理气体提供给粒子束系统的处理位置的系统。 用于供应处理气体的系统包括气体储存器,气体导管,位于处理位置附近的管,气体导管和管之间的阀,以及被配置为打开和关闭阀以切换系统的控制器 从处理气体未被提供给处理位置的第一操作模式到处理气体被供应到处理位置的第二操作模式。 控制器可以循环打开和关闭阀门。 每个循环可以包括其中阀打开的第一持续时间和阀关闭的第二持续时间。 可以改变第一持续时间与第二持续时间的比率。

    PRINTED CIRCUIT BOARD MULTIPOLE UNITS USED FOR ION TRANSPORTATION
    6.
    发明申请
    PRINTED CIRCUIT BOARD MULTIPOLE UNITS USED FOR ION TRANSPORTATION 审中-公开
    印刷电路板多用途单元用于运输

    公开(公告)号:US20140326874A1

    公开(公告)日:2014-11-06

    申请号:US14279957

    申请日:2014-05-16

    摘要: An apparatus for transmission of energy of an ion to at least one gas particle and/or for transportation of an ion and a particle beam device having an apparatus such as this are disclosed. In particular, a container is provided, in which a gas is arranged which has gas particles, wherein the container has a transport axis. Furthermore, at least one first multipole unit and at least one second multipole unit are provided, which are arranged along the transport axis. The first multipole unit and the second multipole unit are formed by printed circuit boards. Furthermore, an electronic circuit is provided, which provides each multipole unit with a potential, such that a potential gradient is generated, in particular along the transport axis.

    摘要翻译: 公开了一种用于将离子的能量传输到至少一个气体颗粒和/或用于输送离子的装置和具有这样的装置的粒子束装置。 特别地,提供一种容器,其中布置有气体颗粒的气体,其中容器具有输送轴线。 此外,提供沿着输送轴线布置的至少一个第一多极单元和至少一个第二多极单元。 第一多极单元和第二多极单元由印刷电路板形成。 此外,提供了一种电子电路,其为每个多极单元提供电势,使得产生电位梯度,特别是沿输送轴。