METHOD OF MAKING SEMICONDUCTOR DEVICE
    2.
    发明申请
    METHOD OF MAKING SEMICONDUCTOR DEVICE 有权
    制造半导体器件的方法

    公开(公告)号:US20130178008A1

    公开(公告)日:2013-07-11

    申请号:US13748734

    申请日:2013-01-24

    Abstract: A semiconductor device includes a sensor portion, a cap portion, and an ion-implanted layer. The sensor portion has a sensor structure at a surface portion of a surface. The cap portion has first and second surfaces opposite to each other and includes a through electrode. The surface of the sensor portion is joined to the first surface of the cap portion such that the sensor structure is sealed between the sensor portion and the cap portion. The ion-implanted layer is located on the second surface of the cap portion. The through electrode extends from the first surface to the second surface and is exposed through the ion-implanted layer.

    Abstract translation: 半导体器件包括传感器部分,帽部分和离子注入层。 传感器部分在表面的表面部分具有传感器结构。 盖部具有彼此相对的第一和第二表面,并且包括通孔。 传感器部分的表面与盖部分的第一表面接合,使得传感器结构被密封在传感器部分和盖部分之间。 离子注入层位于帽部的第二表面上。 通孔从第一表面延伸到第二表面,并通过离子注入层暴露。

Patent Agency Ranking