公开(公告)号：US09018674B2

公开(公告)日：2015-04-28

申请号：US13441364

申请日：2012-04-06

申请人： Dorothea Werber ,  Anton Mauder ,  Frank Pfirsch ,  Hans-Joachim Schulze ,  Franz Hirler ,  Alexander Philippou

发明人： Dorothea Werber ,  Anton Mauder ,  Frank Pfirsch ,  Hans-Joachim Schulze ,  Franz Hirler ,  Alexander Philippou

IPC分类号： H01L29/739 ,  H01L29/06 ,  H01L29/08

CPC分类号： H01L29/7396 ,  H01L29/0696 ,  H01L29/0834

摘要： A semiconductor includes a drift zone of a first conductivity type arranged between a first side and a second side of a semiconductor body. The semiconductor device further includes a first region of the first conductivity type and a second region of a second conductivity type subsequently arranged along a first direction parallel to the second side. The semiconductor device further includes an electrode at the second side adjoining the first and second regions. The semiconductor device further includes a third region of the second conductivity type arranged between the drift zone and the first region. The third region is spaced apart from the second region and from the second side.

摘要翻译： 半导体包括布置在半导体主体的第一侧和第二侧之间的第一导电类型的漂移区。 半导体器件还包括第一导电类型的第一区域和沿着平行于第二侧面的第一方向布置的第二导电类型的第二区域。 半导体器件还包括邻近第一和第二区域的第二侧的电极。 半导体器件还包括布置在漂移区和第一区之间的第二导电类型的第三区。 第三区域与第二区域和第二区域隔开。

公开(公告)号：US20130264607A1

公开(公告)日：2013-10-10

申请号：US13441364

申请日：2012-04-06

申请人： Dorothea Werber ,  Anton Mauder ,  Frank Pfirsch ,  Hans-Joachim Schulze ,  Franz Hirler ,  Alexander Philippou

发明人： Dorothea Werber ,  Anton Mauder ,  Frank Pfirsch ,  Hans-Joachim Schulze ,  Franz Hirler ,  Alexander Philippou

IPC分类号： H01L29/739

CPC分类号： H01L29/7396 ,  H01L29/0696 ,  H01L29/0834

摘要： A semiconductor includes a drift zone of a first conductivity type arranged between a first side and a second side of a semiconductor body. The semiconductor device further includes a first region of the first conductivity type and a second region of a second conductivity type subsequently arranged along a first direction parallel to the second side. The semiconductor device further includes an electrode at the second side adjoining the first and second regions. The semiconductor device further includes a third region of the second conductivity type arranged between the drift zone and the first region. The third region is spaced apart from the second region and from the second side.

摘要翻译： 半导体包括布置在半导体主体的第一侧和第二侧之间的第一导电类型的漂移区。 半导体器件还包括第一导电类型的第一区域和沿着平行于第二侧面的第一方向布置的第二导电类型的第二区域。 半导体器件还包括邻近第一和第二区域的第二侧的电极。 半导体器件还包括布置在漂移区和第一区之间的第二导电类型的第三区。 第三区域与第二区域和第二区域隔开。

公开(公告)号：US09214521B2

公开(公告)日：2015-12-15

申请号：US13529185

申请日：2012-06-21

申请人： Dorothea Werber ,  Frank Pfirsch ,  Hans-Joachim Schulze ,  Carsten Schaeffer ,  Volodymyr Komarnitskyy ,  Anton Mauder

发明人： Dorothea Werber ,  Frank Pfirsch ,  Hans-Joachim Schulze ,  Carsten Schaeffer ,  Volodymyr Komarnitskyy ,  Anton Mauder

IPC分类号： H01L29/66 ,  H01L29/739 ,  H01L29/32 ,  H01L29/861 ,  H01L29/06 ,  H01L29/423 ,  H01L29/78 ,  H01L29/167 ,  H01L21/265 ,  H01L29/40 ,  H01L29/417 ,  H01L29/10

CPC分类号： H01L29/32 ,  H01L21/26506 ,  H01L29/0619 ,  H01L29/0634 ,  H01L29/0692 ,  H01L29/0696 ,  H01L29/1095 ,  H01L29/167 ,  H01L29/402 ,  H01L29/41766 ,  H01L29/423 ,  H01L29/7395 ,  H01L29/7397 ,  H01L29/7811 ,  H01L29/8611

摘要： A semiconductor device includes a first emitter region of a first conductivity type, a second emitter region of a second conductivity type complementary to the first type, a drift region of the second conductivity type, and a first electrode. The first and second emitter regions are arranged between the drift region and first electrode and each connected to the first electrode. A device cell of a cell region includes a body region of the first conductivity type adjoining the drift region, a source region of the second conductivity type adjoining the body region, and a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric. A second electrode is electrically connected to the source and body regions. A parasitic region of the first conductivity type is disposed outside the cell region and includes at least one section with charge carrier lifetime reduction means.

摘要翻译： 半导体器件包括第一导电类型的第一发射极区域，与第一类型互补的第二导电类型的第二发射极区域，第二导电类型的漂移区域和第一电极。 第一和第二发射极区域布置在漂移区域和第一电极之间，并且每个连接到第一电极。 单元区域的器件单元包括邻接漂移区的第一导电类型的主体区域，与身体区域邻接的第二导电类型的源极区域和与身体区域相邻并且与身体区域电介质绝缘的栅电极， 栅极电介质。 第二电极电连接到源区和体区。 第一导电类型的寄生区域设置在单元区域的外部，并且包括至少一个带有载流子寿命减少装置的区段。

公开(公告)号：US20130341674A1

公开(公告)日：2013-12-26

申请号：US13529185

申请日：2012-06-21

申请人： Dorothea Werber ,  Frank Pfirsch ,  Hans-Joachim Schulze ,  Carsten Schaeffer ,  Volodymyr Komarnitskyy ,  Anton Mauder

发明人： Dorothea Werber ,  Frank Pfirsch ,  Hans-Joachim Schulze ,  Carsten Schaeffer ,  Volodymyr Komarnitskyy ,  Anton Mauder

IPC分类号： H01L29/739

CPC分类号： H01L29/32 ,  H01L21/26506 ,  H01L29/0619 ,  H01L29/0634 ,  H01L29/0692 ,  H01L29/0696 ,  H01L29/1095 ,  H01L29/167 ,  H01L29/402 ,  H01L29/41766 ,  H01L29/423 ,  H01L29/7395 ,  H01L29/7397 ,  H01L29/7811 ,  H01L29/8611

摘要： A semiconductor device includes a first emitter region of a first conductivity type, a second emitter region of a second conductivity type complementary to the first type, a drift region of the second conductivity type, and a first electrode. The first and second emitter regions are arranged between the drift region and first electrode and each connected to the first electrode. A device cell of a cell region includes a body region of the first conductivity type adjoining the drift region, a source region of the second conductivity type adjoining the body region, and a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric. A second electrode is electrically connected to the source and body regions. A parasitic region of the first conductivity type is disposed outside the cell region and includes at least one section with charge carrier lifetime reduction means.

摘要翻译： 半导体器件包括第一导电类型的第一发射极区域，与第一类型互补的第二导电类型的第二发射极区域，第二导电类型的漂移区域和第一电极。 第一和第二发射极区域布置在漂移区域和第一电极之间，并且每个连接到第一电极。 单元区域的器件单元包括邻接漂移区的第一导电类型的主体区域，与身体区域邻接的第二导电类型的源极区域和与身体区域相邻并且与身体区域电介质绝缘的栅电极， 栅极电介质。 第二电极电连接到源区和体区。 第一导电类型的寄生区域设置在单元区域的外部，并且包括至少一个带有载流子寿命减少装置的区段。

公开(公告)号：US08461648B2

公开(公告)日：2013-06-11

申请号：US11996906

申请日：2006-07-27

申请人： Frank Pfirsch ,  Anton Mauder ,  Armin Willmeroth ,  Hans-Joachim Schulze ,  Stefan Sedlmaier ,  Markus Zundel ,  Franz Hirler ,  Arunjai Mittal

发明人： Frank Pfirsch ,  Anton Mauder ,  Armin Willmeroth ,  Hans-Joachim Schulze ,  Stefan Sedlmaier ,  Markus Zundel ,  Franz Hirler ,  Arunjai Mittal

IPC分类号： H01L29/732

CPC分类号： H01L29/7803 ,  H01L29/0634 ,  H01L29/0653 ,  H01L29/0696 ,  H01L29/0878 ,  H01L29/1095 ,  H01L29/407 ,  H01L29/41766 ,  H01L29/4916 ,  H01L29/66734 ,  H01L29/7802 ,  H01L29/7804 ,  H01L29/7806 ,  H01L29/7811 ,  H01L29/7813 ,  H01L29/872

摘要： A semiconductor component with a drift region and a drift control region. One embodiment includes a semiconductor body having a drift region of a first conduction type in the semiconductor body. A drift control region composed of a semiconductor material, which is arranged, at least in sections, is adjacent to the drift region in the semiconductor body. An accumulation dielectric is arranged between the drift region and the drift control region.

公开(公告)号：US20110215858A1

公开(公告)日：2011-09-08

申请号：US12718381

申请日：2010-03-05

申请人： Anton Mauder ,  Franz Hirler ,  Frank Pfirsch ,  Hans-Joachim Schulze

发明人： Anton Mauder ,  Franz Hirler ,  Frank Pfirsch ,  Hans-Joachim Schulze

IPC分类号： H03K17/0412 ,  H01L29/739

CPC分类号： H01L29/739 ,  H03K17/0412

摘要： Disclosed is a method for controlling the recombination rate in the base region of a bipolar semiconductor component, and a bipolar semiconductor component.

摘要翻译： 公开了一种用于控制双极半导体部件和双极型半导体部件的基极区域中的复合率的方法。

公开(公告)号：US20090218621A1

公开(公告)日：2009-09-03

申请号：US11996906

申请日：2006-07-27

申请人： Frank Pfirsch ,  Anton Mauder ,  Armin Willmeroth ,  Hans-Joachim Schulze ,  Stefan Sedlmaier ,  Markus Zundel ,  Franz Hirler ,  Arunjai Mittal

发明人： Frank Pfirsch ,  Anton Mauder ,  Armin Willmeroth ,  Hans-Joachim Schulze ,  Stefan Sedlmaier ,  Markus Zundel ,  Franz Hirler ,  Arunjai Mittal

IPC分类号： H01L29/78 ,  H01L27/06 ,  H01L29/739

CPC分类号： H01L29/7803 ,  H01L29/0634 ,  H01L29/0653 ,  H01L29/0696 ,  H01L29/0878 ,  H01L29/1095 ,  H01L29/407 ,  H01L29/41766 ,  H01L29/4916 ,  H01L29/66734 ,  H01L29/7802 ,  H01L29/7804 ,  H01L29/7806 ,  H01L29/7811 ,  H01L29/7813 ,  H01L29/872

摘要： A semiconductor component with a drift region and a drift control region. One embodiment includes a semiconductor body having a drift region of a first conduction type in the semiconductor body. A drift control region composed of a semiconductor material, which is arranged, at least in sections, is adjacent to the drift region in the semiconductor body. An accumulation dielectric is arranged between the drift region and the drift control region.

摘要翻译： 具有漂移区域和漂移控制区域的半导体部件。 一个实施例包括半导体本体中具有第一导电类型的漂移区的半导体本体。 由半导体材料组成的漂移控制区域至少部分地布置成与半导体本体中的漂移区域相邻。 在漂移区域和漂移控制区域之间布置积累电介质。

公开(公告)号：US08435853B2

公开(公告)日：2013-05-07

申请号：US12871038

申请日：2010-08-30

申请人： Franz Hirler ,  Anton Mauder ,  Frank Pfirsch ,  Hans-Joachim Schulze

发明人： Franz Hirler ,  Anton Mauder ,  Frank Pfirsch ,  Hans-Joachim Schulze

IPC分类号： H01L21/8234

CPC分类号： H01L29/66143 ,  H01L21/823487 ,  H01L29/0626 ,  H01L29/1095 ,  H01L29/41766 ,  H01L29/456 ,  H01L29/4933 ,  H01L29/6609 ,  H01L29/6634 ,  H01L29/66348 ,  H01L29/66727 ,  H01L29/66734 ,  H01L29/7395 ,  H01L29/7397 ,  H01L29/7803 ,  H01L29/7804 ,  H01L29/7808 ,  H01L29/7813

摘要： A method for forming a field effect power semiconductor is provided. The method includes providing a semiconductor body, a conductive region arranged next to a main surface of the semiconductor body, and an insulating layer arranged on the main horizontal surface. A narrow trench is etched through the insulating layer to expose the conductive region. A polycrystalline semiconductor layer is deposited and a vertical poly-diode structure is formed. The polycrystalline semiconductor layer has a minimum vertical thickness of at least half of the maximum horizontal extension of the narrow trench. A polycrystalline region which forms at least a part of a vertical poly-diode structure is formed in the narrow trench by maskless back-etching of the polycrystalline semiconductor layer. Further, a semiconductor device with a trench poly-diode is provided.

摘要翻译： 提供了一种用于形成场效应功率半导体的方法。 该方法包括提供半导体本体，邻近半导体主体的主表面布置的导电区域和布置在主水平表面上的绝缘层。 通过绝缘层蚀刻窄沟槽以暴露导电区域。 沉积多晶半导体层并形成垂直多晶二极管结构。 多晶半导体层的最小垂直厚度为窄沟槽的最大水平延伸的至少一半。 通过多晶半导体层的无掩模背面蚀刻，在窄沟槽中形成形成垂直多晶二极管结构的至少一部分的多晶区域。 此外，提供了具有沟槽多晶二极管的半导体器件。

公开(公告)号：US20070108513A1

公开(公告)日：2007-05-17

申请号：US11540922

申请日：2006-09-29

申请人： Michael Rub ,  Herbert Schafer ,  Armin Willmeroth ,  Anton Mauder ,  Stefan Sedlmaier ,  Roland Rupp ,  Manfred Pippan ,  Hans Weber ,  Frank Pfirsch ,  Franz Hirler ,  Hans-Joachim Schulze

发明人： Michael Rub ,  Herbert Schafer ,  Armin Willmeroth ,  Anton Mauder ,  Stefan Sedlmaier ,  Roland Rupp ,  Manfred Pippan ,  Hans Weber ,  Frank Pfirsch ,  Franz Hirler ,  Hans-Joachim Schulze

IPC分类号： H01L31/00

CPC分类号： H01L29/7813 ,  H01L21/76224 ,  H01L29/0653 ,  H01L29/165 ,  H01L29/66734 ,  H01L29/7804 ,  H01L29/7849

摘要： The fabrication of a semiconductor component having a semiconductor body in which is arranged a very thin dielectric layer having sections which run in the vertical direction and which extend very deeply into the semiconductor body is disclosed. In one method a trench is formed in a drift zone region proceeding from the front side of a semiconductor body, a sacrificial layer is produced on at least a portion of the sidewalls of the trench and at least a portion of the trench is filled with a semiconductor material which is chosen such that the quotient of the net dopant charge of the semiconductor material in the trench and the total area of the sacrificial layer on the sidewalls of the trench between the semiconductor material and the drift zone region is less than the breakdown charge of the semiconductor material, and the sacrificial layer is replaced with a dielectric.

摘要翻译： 公开了具有半导体主体的半导体部件的制造，其中布置有具有在垂直方向上延伸并且非常深地延伸到半导体本体中的截面的非常薄的电介质层。 在一种方法中，在从半导体主体的前侧开始的漂移区域中形成沟槽，在沟槽的至少一部分侧壁上产生牺牲层，并且沟槽的至少一部分填充有 半导体材料被选择为使得沟槽中的半导体材料的净掺杂剂电荷的商和半导体材料和漂移区域之间的沟槽的侧壁上的牺牲层的总面积小于击穿电荷 的半导体材料，并且牺牲层被电介质代替。

公开(公告)号：US09553178B2

公开(公告)日：2017-01-24

申请号：US12977755

申请日：2010-12-23

申请人： Franz Hirler ,  Anton Mauder ,  Frank Pfirsch ,  Hans-Joachim Schulze

发明人： Franz Hirler ,  Anton Mauder ,  Frank Pfirsch ,  Hans-Joachim Schulze

IPC分类号： H01L29/66 ,  H01L29/739 ,  H01L29/06 ,  H01L29/423

CPC分类号： H01L29/7397 ,  H01L29/0696 ,  H01L29/4236

摘要： A semiconductor component includes a first emitter zone of a first conductivity type, a second emitter zone of a second conductivity type, a first base zone arranged between the first and second emitter zones and a first control structure. The first control structure includes a control electrode arranged adjacent the first emitter zone, the control electrode being insulated from the first emitter zone by a first dielectric layer and extending in a current flow direction of the semiconductor component. The first control structure includes a first control connection and at least one first connection zone arranged between the first control connection and the control electrode and comprising a semiconductor material.

摘要翻译： 半导体部件包括第一导电类型的第一发射极区域，第二导电类型的第二发射极区域，布置在第一和第二发射极区域之间的第一基极区域和第一控制结构。 第一控制结构包括布置在第一发射区附近的控制电极，控制电极通过第一介电层与第一发射区绝缘，并沿着半导体部件的电流流动方向延伸。 第一控制结构包括第一控制连接和布置在第一控制连接和控制电极之间并且包括半导体材料的至少一个第一连接区域。