公开(公告)号：US06908722B2

公开(公告)日：2005-06-21

申请号：US10183441

申请日：2002-06-28

申请人： Satoshi Ebata ,  Eiji Yoneda ,  Tomoki Nagai ,  Tatsuya Toneri ,  Yong Wang ,  Haruo Iwasawa ,  Yukio Nishimura

发明人： Satoshi Ebata ,  Eiji Yoneda ,  Tomoki Nagai ,  Tatsuya Toneri ,  Yong Wang ,  Haruo Iwasawa ,  Yukio Nishimura

IPC分类号： C07C309/17 ,  C07C309/19 ,  C07C309/23 ,  C07C381/12 ,  C07D333/46 ,  C07D333/78 ,  C07D335/02 ,  C07D347/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/00

CPC分类号： C07C309/23 ,  C07C309/17 ,  C07C309/19 ,  C07C381/12 ,  C07C2602/42 ,  C07C2603/86 ,  C07D333/46 ,  C07D333/78 ,  C07D335/02 ,  C07D347/00 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0757 ,  Y10S430/114 ,  Y10S430/115

摘要： A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z1 and Z2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

摘要翻译： 一种含有下式（I）的结构的新型光酸产生剂，其中R为氟含量为50重量％以下的一价有机基团，硝基，氰基或氢原子，Z ^{1和Z 2各自独立地为氟原子或具有1-10个碳原子的直链或支链全氟烷基。 当用于化学增强的辐射敏感性树脂组合物中时，光致酸产生剂显示出高透明度，较高的可燃性，并且没有生物累积性，并且产生在抗蚀涂层中表现出高酸度，高沸点，适度短扩散长度的酸，以及低 对掩模图案密度的依赖。}

公开(公告)号：US07217492B2

公开(公告)日：2007-05-15

申请号：US10743809

申请日：2003-12-24

申请人： Eiji Yoneda ,  Yong Wang ,  Yukio Nishimura

发明人： Eiji Yoneda ,  Yong Wang ,  Yukio Nishimura

IPC分类号： G03F7/038 ,  G03F7/039 ,  C07C303/00 ,  C07C307/00 ,  C07C315/00

CPC分类号： C07D317/72 ,  C07C317/14 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07D319/08 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0757 ,  Y10S430/115 ,  Y10S430/122

摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.

摘要翻译： 公开了具有下式（1）的阳离子部分的鎓盐化合物。 其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar 1和Ar 2为（取代的）芳族烃基，P为-O-SO 2， （O）R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。 鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。 含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。

公开(公告)号：US20050053861A1

公开(公告)日：2005-03-10

申请号：US10743809

申请日：2003-12-24

申请人： Eiji Yoneda ,  Yong Wang ,  Yukio Nishimura

发明人： Eiji Yoneda ,  Yong Wang ,  Yukio Nishimura

IPC分类号： C07C317/14 ,  C07C381/12 ,  C07D317/72 ,  C07D319/08 ,  C07D333/46 ,  G03C1/76 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

CPC分类号： C07D317/72 ,  C07C317/14 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07D319/08 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0757 ,  Y10S430/115 ,  Y10S430/122

摘要： An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.

摘要翻译： 公开了具有下式（1）的阳离子部分的鎓盐化合物。 其中A表示I或S，m为1或2，n为0或1，x为1-10，Ar1和Ar2为（取代）芳族烃基，P为-O-SO2R，-OS（O） R或-SO 2 R，其中R表示氢原子，（取代的）烷基或（取代的）脂环族烃基。 鎓盐化合物适合作为正色散辐射敏感性树脂组合物的光致抗蚀剂的光致酸发生剂。 含有该化合物的正色散辐射敏感性树脂组合物可用作高灵敏度的高分辨率的化学扩增光致抗蚀剂，对各种辐射有响应，并且具有优异的储存稳定性。

公开(公告)号：US07202016B2

公开(公告)日：2007-04-10

申请号：US11116269

申请日：2005-04-28

申请人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

发明人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

IPC分类号： G03F7/004

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/122

摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

摘要翻译： 一种包含特定共聚物和光致酸发生剂的化学放大的辐射敏感性树脂组合物，其中共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），

公开(公告)号：US06933094B2

公开(公告)日：2005-08-23

申请号：US09953941

申请日：2001-09-18

申请人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

发明人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/122

摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

摘要翻译： 包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基， ，或R 3和R 4可以与R 3和R 4的氮原子组合形成， 基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子 同时。 该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

公开(公告)号：US20050214680A1

公开(公告)日：2005-09-29

申请号：US11116269

申请日：2005-04-28

申请人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

发明人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03C1/76

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/122

摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

摘要翻译： 包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基， ，或R 3和R 4可以与R 3和R 4的氮原子组合形成， 基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子 同时。 该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

公开(公告)号：US20070042292A1

公开(公告)日：2007-02-22

申请号：US11504809

申请日：2006-08-16

申请人： Eiji Yoneda ,  Hirokazu Sakakibara ,  Hiromitsu Nakashima ,  Hiroki Nakagawa ,  Yukio Nishimura

发明人： Eiji Yoneda ,  Hirokazu Sakakibara ,  Hiromitsu Nakashima ,  Hiroki Nakagawa ,  Yukio Nishimura

IPC分类号： G03C1/00

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/2041

摘要： A radiation-sensitive resin composition which is a resist having properties such as excellent sensitivity, a small degree of line edge roughness of patterns, capability of inhibiting pattern collapsing, and the like is provided. The radiation-sensitive resin composition comprises an acid-dissociable group-containing polymer having recurring units of the following formulas (1-1) and (1-2), an additive of the following formula (1-3), and an acid generator, in the formula (1-1), R1 represents a methyl group and the like and X represents a specific polycyclic alicyclic hydrocarbon group and the like, in the formula (1-2), R1 represents a methyl group and the like and Z represents an acid-dissociable group which is dissociable by the action of an acid, and in the formula (1-3), n is an integer from 1-8 and A individually represents a hydroxyl group and the like.

摘要翻译： 提供了作为抗敏剂的耐辐射敏感性树脂组合物，其具有优异的灵敏度，图案的线边缘粗糙度，抑制图案折叠的能力等。 辐射敏感性树脂组合物包含具有下式（1-1）和（1-2）的重复单元的酸解离基团的聚合物，下式（1-3）的添加剂和酸发生剂 在式（1-1）中，R 1表示甲基等，X表示特定的多环脂肪族烃基等，式（1-2）中，R' SUP> 1表示甲基等，Z表示可通过酸的作用而离解的酸解离基，在式（1-3）中，n为1-8的整数 A独立地表示羟基等。

公开(公告)号：US09182674B2

公开(公告)日：2015-11-10

申请号：US13550733

申请日：2012-07-17

申请人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

发明人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

IPC分类号： G03F7/11 ,  G03F7/20 ,  C08F214/18 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24

CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

摘要： An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.

摘要翻译： 浸渍上层膜组合物包括树脂和溶剂。 树脂在照射期间形成水稳定膜并溶解在随后的显影剂中。 溶剂含有具有6个或更少碳原子的一价醇。 在浸渍曝光工艺中，应用该组合物在光致抗蚀剂膜上形成涂层，其中光致抗蚀剂膜通过设置在透镜和光致抗蚀剂膜之间的水进行照射。

公开(公告)号：US08791020B2

公开(公告)日：2014-07-29

申请号：US13193555

申请日：2011-07-28

申请人： Takashi Mori ,  Masato Tanaka ,  Yukio Nishimura ,  Yoshikazu Yamaguchi

发明人： Takashi Mori ,  Masato Tanaka ,  Yukio Nishimura ,  Yoshikazu Yamaguchi

IPC分类号： H01L21/311

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/02126 ,  H01L21/02214 ,  H01L21/02216 ,  H01L21/31144

摘要： A pattern-forming method includes forming a silicon-containing film on a substrate, the silicon-containing film having a mass ratio of silicon atoms to carbon atoms of 2 to 12. A shape transfer target layer is formed on the silicon-containing film. A fine pattern is transferred to the shape transfer target layer using a stamper that has a fine pattern to form a resist pattern. The silicon-containing film and the substrate are dry-etched using the resist pattern as a mask to form a pattern on the substrate in nanoimprint lithography. According to another aspect of the invention, a silicon-containing film includes silicon atoms and carbon atoms. A mass ratio of silicon atoms to carbon atoms is 2 to 12. The silicon-containing film is used for a pattern-forming method employed in nanoimprint lithography.

摘要翻译： 图案形成方法包括在基板上形成含硅膜，所述含硅膜的硅原子与碳原子的质量比为2〜12。在含硅膜上形成形状转印目标层。 使用具有精细图案的压模形成抗蚀剂图案，将精细图案转印到形状转印目标层。 使用抗蚀剂图案作为掩模对含硅膜和衬底进行干蚀刻，以在纳米压印光刻中在衬底上形成图案。 根据本发明的另一方面，含硅膜包括硅原子和碳原子。 硅原子与碳原子的质量比为2〜12。含硅膜用于纳米压印光刻中使用的图案形成方法。

公开(公告)号：US08572428B2

公开(公告)日：2013-10-29

申请号：US13279491

申请日：2011-10-24

申请人： Satoru Nishita ,  Yukio Nishimura

发明人： Satoru Nishita ,  Yukio Nishimura

IPC分类号： G06F11/00

CPC分类号： G06F11/1443 ,  G06F11/10 ,  G06F11/2089 ,  H04L1/18

摘要： A first controller stores externally input data to a memory of the first controller, reads data stored in the memory of the first controller and transmits the data to a second controller through a first controller bridge, detects a failure at the first controller bridge in transmission of the data. The second controller receives the data through a second controller bridge, writes the received data into a memory of the second controller, and determines whether the failure is caused by the first controller if a failure occurs in the memory controller and the second controller bridge. If a failure is detected in the first controller and the second controller and the failure is caused by the first controller, the first controller transmits the data causing the failure during transmission through the first controller bridge and the second controller receives the data through the second controller bridge.

摘要翻译： 第一控制器将外部输入数据存储到第一控制器的存储器中，读取存储在第一控制器的存储器中的数据，并通过第一控制器桥将数据发送到第二控制器，在第一控制器桥传输期间检测故障 数据。 第二控制器通过第二控制器桥接器接收数据，将接收到的数据写入第二控制器的存储器，并且如果在存储器控制器和第二控制器桥中发生故障，则确定是否由第一控制器引起故障。 如果在第一控制器和第二控制器中检测到故障，并且由第一控制器引起故障，则第一控制器在通过第一控制器桥传输期间发送导致故障的数据，并且第二控制器通过第二控制器接收数据 桥。