Devices and methods for side-coupling optical fibers to optoelectronic components
    4.
    发明申请
    Devices and methods for side-coupling optical fibers to optoelectronic components 失效
    将光纤侧耦合到光电子部件的装置和方法

    公开(公告)号:US20070014527A1

    公开(公告)日:2007-01-18

    申请号:US11524597

    申请日:2006-09-21

    IPC分类号: G02B6/00

    摘要: Optical devices, components and methods for mounting optical fibers and for side-coupling light to/from optical fibers using a modified silicon V-groove, or silicon V-groove array, wherein V-grooves, which are designed for precisely aligning/spacing optical fibers, are “recessed” below the surface of the silicon. Optical fibers can be recessed below the surface of the silicon substrate such that a precisely controlled portion of the cladding layer extending above the silicon surface can be removed (lapped). With the cladding layer removed, the separation between the fiber core(s) and optoelectronic device(s) can be reduced resulting in improved optical coupling when the optical fiber silicon array is connected to, e.g., a VCSEL array.

    摘要翻译: 用于安装光纤的光学装置,部件和方法以及用于使用改进的硅V形槽或光纤V沟槽阵列将光耦合到光纤的光纤,其中V形槽被设计用于精确对准/间隔光学 纤维在硅的表面下“凹进”。 光纤可以在硅衬底的表面下方凹入,从而可以去除(重叠)在硅表面之上延伸的覆层的精确控制部分。 当去除包覆层时,可以减小光纤芯和光电子器件之间的分离,从而当光纤硅阵列连接到例如VCSEL阵列时改善光耦合。

    Apparatus and methods for encapsulating microelectromechanical (MEM) devices on a wafer scale
    5.
    发明申请
    Apparatus and methods for encapsulating microelectromechanical (MEM) devices on a wafer scale 有权
    用于将微机电(MEM)器件封装在晶片上的装置和方法

    公开(公告)号:US20060108675A1

    公开(公告)日:2006-05-25

    申请号:US10993548

    申请日:2004-11-19

    CPC分类号: B81C1/00293 B81C2203/0145

    摘要: Apparatus and methods are provided for enabling wafer-scale encapsulation of microelectromechanical (MEM) devices (e.g., resonators, filters) to protect the MEMs from the ambient and to provide either a controlled ambient or a reduced pressure. In particular, methods for wafer-scale encapsulation of MEM devices are provided, which enable encapsulation of MEM devices under desired ambient conditions that are not determined by the deposition conditions of a sealing process in which MEM release via holes are sealed or pinched-off, and which prevent sealing material from being inadvertently deposited on the MEM device during the sealing process.

    摘要翻译: 提供了设备和方法,用于实现微机电(MEM)装置(例如,谐振器,滤波器)的晶片级封装,以保护MEM免受环境影响,并提供受控的环境或减压。 特别地,提供了用于MEM器件的晶片级封装的方法,其能够在期望的环境条件下封装MEM器件,所述环境条件不是通过其中MEM释放通孔被密封或夹断的密封过程的沉积条件来确定的, 并且其在密封过程中防止密封材料被无意中沉积在MEM装置上。

    Method and apparatus for providing parallel optoelectronic communication with an electronic device

    公开(公告)号:US20050058408A1

    公开(公告)日:2005-03-17

    申请号:US10667234

    申请日:2003-09-17

    IPC分类号: G02B6/42 G02B6/43

    摘要: An optoelectronic assembly for an electronic system includes a support electronic chip set configured for at least one of providing multiplexing, demultiplexing, coding, decoding and optoelectronic transducer driving and receive functions. A first substrate having a first surface and an opposite second surface is in communication with the support electronic chip set via the first surface while a second substrate is in communication with the second surface of the first substrate. The second substrate is configured for mounting at least one of data processing, data switching and data storage chips. An optoelectronic transducer is in signal communication with the support electronic chip set and an optical fiber array is aligned at a first end with the optoelectronic transducer and with an optical signaling medium at a second end. An electrical signal from the support electronic chip set is communicated to the optoelectronic transducer via an electrical signaling medium, and the support electronic chip set and the optoelectronic transducer share a common thermal path for cooling.

    Method for isotropic etching of copper

    公开(公告)号:US07056648B2

    公开(公告)日:2006-06-06

    申请号:US10664017

    申请日:2003-09-17

    IPC分类号: G03F7/34 C23F1/18

    摘要: Copper and copper alloys are etched to provide uniform and smooth surface by employing an aqueous composition that comprises an oxidant, a mixture of at least one weak complexant and at least one strong complexant for the copper or copper alloy, and water and has a pH of about 6 to about 12 so as to form an oxidized etch controlling layer and to uniformly remove the copper or copper alloy; and then removing the oxidized etch controlling layer with a non-oxidizing composition. Copper and copper alloy structure, having smooth upper surfaces are also provided.