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公开(公告)号：US08779376B2
公开(公告)日：2014-07-15
申请号：US13648887
申请日：2012-10-10
Applicant: FEI Company
Inventor： Lynwood W. Swanson , Gregory A. Schwind , Sean Kellogg , Kun Liu
CPC classification number: H01J37/00 , G01T1/29 , H01J37/02 , H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/065
Abstract: The state of an emitter can be determined by measurements of how the current changes with the extraction voltage. A field factor β function is determined by series of relatively simple measurements of charged particles emitted at different conditions. The field factor can then be used to determine derived characteristics of the emission that, in the prior art, were difficult to determine without removing the source from the focusing column and mounting it in a specialized apparatus. The relations are determined by the source configuration and have been found to be independent of the emitter shape, and so emission character can be determined as the emitter shape changes over time, without having to determine the emitter shape and without having to redefine the relation between the field factor and the series of relatively simple measurements, and the relationships between the field factor and other emission parameters.
Abstract translation: 发射极的状态可以通过测量电流如何随提取电压而变化来确定。 场因子 功能通过在不同条件下发射的带电粒子的一系列相对简单的测量来确定。 然后可以使用场因子来确定发射的导出特性，在现有技术中难以确定，而不需要从聚焦柱移除源并将其安装在专门的装置中。 关系由源配置确定，并且已经被发现与发射体形状无关，因此发射体形状随着时间的推移而被确定，而不必确定发射体形状，而不必重新定义发射体形状之间的关系 场因子和一系列相对简单的测量，以及场因子与其他发射参数之间的关系。
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公开(公告)号：US20180211807A1
公开(公告)日：2018-07-26
申请号：US15874798
申请日：2018-01-18
Applicant: FEI Company
Inventor： Gregory A. Schwind , Aurelien Philippe Jean Maclou Botman , Sean Kellogg , Leon van Kouwen , Luigi Mele
CPC classification number: H01J27/20 , H01J27/205 , H01J37/08 , H01J37/26 , H01J2237/006 , H01J2237/061 , H01J2237/082
Abstract: A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.
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3.发明申请公开(公告)号：US20150357166A1
公开(公告)日：2015-12-10
申请号：US14734905
申请日：2015-06-09
Applicant: FEI Company
Inventor： Sean Kellogg , Anthony Graupera , William N. Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Noel Smith , Shouyin Zhang
CPC classification number: H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
Abstract: An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
Abstract translation: 用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。 紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。 使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。
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4.发明授权Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source 有权在电感耦合等离子体（ICP）离子源中不同工艺气体之间快速切换的方法和结构公开(公告)号：US09159534B2
公开(公告)日：2015-10-13
申请号：US14159227
申请日：2014-01-20
Applicant: FEI Company
Inventor： Anthony Graupera , Sean Kellogg , Mark W. Utlaut , N. William Parker
CPC classification number: H01J37/3002 , H01J37/08 , H01J37/18 , H01J2237/006 , H01J2237/08 , H01J2237/0827
Abstract: An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.
Abstract translation: 可打开的气体通道提供在带电粒子束系统中的电感耦合等离子体源中快速抽出工艺或烘烤气体。 通常定位在源电极或气体入口的一部分中的阀在打开时增加气体导电性，以便在等离子体源的操作期间泵出等离子体室并关闭。
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5.发明申请Methods and Structures for Rapid Switching Between Different Process Gases in an Inductively-Coupled Plasma (ICP) Ion Source 审中-公开在电感耦合等离子体（ICP）离子源中不同工艺气体之间快速切换的方法和结构公开(公告)号：US20140306607A1
公开(公告)日：2014-10-16
申请号：US14159227
申请日：2014-01-20
Applicant: FEI Company
Inventor： Anthony Graupera , Sean Kellogg , Mark W. Utlaut , N. William Parker
IPC: H01J37/30
CPC classification number: H01J37/3002 , H01J37/08 , H01J37/18 , H01J2237/006 , H01J2237/08 , H01J2237/0827
Abstract: An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.
Abstract translation: 可打开的气体通道提供在带电粒子束系统中的电感耦合等离子体源中快速抽出工艺或烘烤气体。 通常定位在源电极或气体入口的一部分中的阀在打开时增加气体导电性，以便在等离子体源的操作期间泵出等离子体室并关闭。
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Patent Agency Ranking
公开(公告)号：US09899181B1
公开(公告)日：2018-02-20
申请号：US15405139
申请日：2017-01-12
Applicant: FEI Company
Inventor： Gregory A. Schwind , Aurelien Philippe Jean Maclou Botman , Sean Kellogg , Leon van Kouwen , Luigi Mele
CPC classification number: H01J27/20 , H01J27/205 , H01J37/08 , H01J37/26 , H01J2237/006 , H01J2237/061 , H01J2237/082
Abstract: A collision ionization ion source comprising: A pair of stacked plates, sandwiched about an intervening gap; An input zone (aperture), provided in a first of said plates, to admit an input beam of charged particles to said gap; An output zone (aperture), located opposite said input zone and provided in the second of said plates, to allow emission of a flux of ions from said gap; A gas space, between said input and output zones, in which gas can be ionized by said input beam so as to produce said ions; A supply duct in said gap, for supplying a flow of said gas to said gas space, and comprising: An emergence orifice, opening into said gas space; An entrance orifice, connectable to a gas supply, wherein said duct comprises at least one transition region between said entrance orifice and said emergence orifice in which an inner height of said duct, measured normal to the plates, decreases from a first height value to a second height value.
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7.发明授权公开(公告)号：US09530625B2
公开(公告)日：2016-12-27
申请号：US14734905
申请日：2015-06-09
Applicant: FEI Company
Inventor： Sean Kellogg , Anthony Graupera , William N. Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Noel Smith , Shouyin Zhang
CPC classification number: H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
Abstract: An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
Abstract translation: 用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。 紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。 使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。
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公开(公告)号：US10325750B2
公开(公告)日：2019-06-18
申请号：US15874798
申请日：2018-01-18
Applicant: FEI Company
Inventor： Gregory A. Schwind , Aurelien Philippe Jean Maclou Botman , Sean Kellogg , Leon van Kouwen , Luigi Mele
Abstract: A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.
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公开(公告)号：US09691583B2
公开(公告)日：2017-06-27
申请号：US14792771
申请日：2015-07-07
Applicant: FEI Company
Inventor： Thomas G. Miller , Sean Kellogg , Shouyin Zhang , Mostafa Maazouz , Anthony Graupera
CPC classification number: H01J37/08 , H01J37/026 , H01J37/10 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/3007 , H01J37/3171 , H01J2237/0492 , H01J2237/08 , H01J2237/18 , H01J2237/188 , H01J2237/31713 , H01J2237/31749
Abstract: Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
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公开(公告)号：US20150380204A1
公开(公告)日：2015-12-31
申请号：US14792771
申请日：2015-07-07
Applicant: FEI Company
Inventor： Thomas G. Miller , Sean Kellogg , Shouyin Zhang , Mostafa Maazouz , Anthony Graupera
IPC: H01J37/08 , H01J37/10 , H01J37/18 , H01J37/317 , H01J37/30
CPC classification number: H01J37/08 , H01J37/026 , H01J37/10 , H01J37/16 , H01J37/18 , H01J37/185 , H01J37/3007 , H01J37/3171 , H01J2237/0492 , H01J2237/08 , H01J2237/18 , H01J2237/188 , H01J2237/31713 , H01J2237/31749
Abstract: Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system using a plasma source. The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers below the plasma source to reduce the opportunity for the ions to interact with gas.
Abstract translation: 申请人已经发现，通过高能离子和中性气体分子之间的电荷交换相互作用产生的高能中性粒子使用等离子体源在离子束系统中到达样品。 能量中性产生离子束冲击点的二次电子。 解决问题的方法包括等离子体源下面的差分泵浦腔，以减少离子与气体相互作用的机会。
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