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    Lithographic alignment system
    3.
    发明申请
    Lithographic alignment system 有权
    光刻对准系统

    公开(公告)号：US20050162626A1

    公开(公告)日：2005-07-28

    申请号：US10762568

    申请日：2004-01-23

    申请人： Gert-Jan Heerens ,  Bastiaan Lambertus Marinus Van De Ven

    发明人： Gert-Jan Heerens ,  Bastiaan Lambertus Marinus Van De Ven

    IPC分类号： G03B27/42 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC分类号： G03F9/7096 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7015

    摘要： A lithographic apparatus equipped with an alignment system is presented herein. In one embodiment, the lithographic apparatus includes an illumination system that provides a beam of radiation, a patterning device that imparts the beam of radiation with a desired pattern in its cross-section and is supported by a support structure, a substrate holder that holds a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a conditioned chamber. The apparatus also includes an actuator that introduces either the patterning device or the substrate into the conditioned chamber and an alignment system, which is disposed outside the conditioned chamber, that positions the patterning device or the substrate in alignment with the projected patterned beam of radiation.

    摘要翻译： 本文介绍了配备有对准系统的光刻设备。 在一个实施例中，光刻设备包括提供辐射束的照明系统，在其横截面中赋予所需图案的辐射束并由支撑结构支撑的图案形成装置， 基板，将图案化的光束投射到基板的目标部分上的投影系统和调节室。 该装置还包括将图案形成装置或基板引入调节室的致动器以及设置在调节室外部的对准系统，其使图案形成装置或基板与投影的图案化的辐射束对准。

    Mask transport system configured to transport a mask into and out of a lithographic apparatus
    5.
    发明授权
    Mask transport system configured to transport a mask into and out of a lithographic apparatus 有权
    掩模传送系统被配置为将掩模传送到光刻设备中和从光刻设备传出

    公开(公告)号：US08235212B2

    公开(公告)日：2012-08-07

    申请号：US12483940

    申请日：2009-06-12

    申请人： Gert-Jan Heerens

    发明人： Gert-Jan Heerens

    IPC分类号： B65D85/00 ,  B65D85/48

    CPC分类号： G03F1/66 ,  G03F7/707 ,  G03F7/70741 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70983

    摘要： A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.

    摘要翻译： 掩模传送系统被配置为将掩模传送到光刻设备中和从光刻设备传出。 掩模传送系统包括被配置为屏蔽掩模的顶侧和底侧的第一容器。 当掩模被第一容器遮蔽时，用于具有预定波长的辐射的至少一部分至少部分是半透明的，用于检测掩模的顶侧或底侧上的污染物。 掩模传送系统还包括构造成封闭第一容器的第二容器。 第二容器包括限定第一开口的第一部分和覆盖第一开口的可打开盖。 盖被配置为打开和释放光刻设备内的第一容器或与光刻设备的界面处。

    Assembly of a reticle holder and a reticle
    7.
    发明申请
    Assembly of a reticle holder and a reticle 有权
    一个标线架和一个掩模版

    公开(公告)号：US20070247609A1

    公开(公告)日：2007-10-25

    申请号：US11812166

    申请日：2007-06-15

    申请人： Gert-Jan Heerens ,  Bastiaan Lambertus Van De Ven

    发明人： Gert-Jan Heerens ,  Bastiaan Lambertus Van De Ven

    IPC分类号： G03B27/42 ,  G03B27/62

    CPC分类号： G03B27/42 ,  G03B27/62 ,  G03F7/707 ,  G03F7/70741 ,  G03F9/7003 ,  G03F9/7011 ,  G03F9/7088 ,  G03F9/7096

    摘要： A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container constructed and arranged to store the assembly during the positioning of the reticle with respect to the reticle holder. The reticle holder and the detector are arranged to be kinematically aligned with respect to each other.

    摘要翻译： 用于光刻设备的系统包括光罩和光罩保持器的组件。 标线包括标记。 该系统还包括位置检测器，其布置成检测掩模版标记物以相对于光罩保持器定位光罩;以及存储容器，其被构造和布置成在掩模版相对于光罩保持器定位期间存储组件。 掩模版保持器和检测器被布置成相对于彼此以运动方式对准。

    Lithographic apparatus and device manufacturing method
    8.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US07119346B2

    公开(公告)日：2006-10-10

    申请号：US10986181

    申请日：2004-11-12

    申请人： Hendrik Antony Johannes Neerhof ,  Gert-Jan Heerens

    发明人： Hendrik Antony Johannes Neerhof ,  Gert-Jan Heerens

    IPC分类号： A61N5/00

    CPC分类号： G03F7/70858 ,  G03F7/70916 ,  G03F7/7095 ,  G03F7/70983

    摘要： A lithographic apparatus is provided. The apparatus includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a high voltage conductor in a part of the apparatus that is evacuated or at a low pressure during normal use of the apparatus. The conductor is coated by an isolation layer having a conductivity that is high enough to prevent charge build-up on the outside thereof during use of the apparatus, and low enough to limit peak current flow during a breakdown.

    摘要翻译： 提供光刻设备。 该装置包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。 图案形成装置用于使辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及在正常使用期间被抽空或处于低压的装置的一部分中的高压导体 的装置。 导体由具有足够高的导电性的隔离层涂覆，以防止在使用该装置期间其外部的电荷积聚，并且足够低以限制击穿期间的峰值电流流动。