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    Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus
    7.
    发明申请
    Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus 审中-公开
    制造的平版印刷设备，器件制造方法和器件具有增加的焦深

    公开(公告)号：US20070013889A1

    公开(公告)日：2007-01-18

    申请号：US11179056

    申请日：2005-07-12

    申请人： Laurentius Jorritsma ,  Johannes Baselmans ,  Arno Bleeker ,  Jacob Klinkhamer

    发明人： Laurentius Jorritsma ,  Johannes Baselmans ,  Arno Bleeker ,  Jacob Klinkhamer

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70275 ,  G03F7/70575 ,  G03F7/70641

    摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, an array of individually controllable elements serving to impart the beam with a pattern in its cross-section, a substrate table for supporting a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The beam of radiation comprises a plurality of beam components. The plurality of beam components includes a first beam component having a first frequency spectrum about a first frequency and at least a second beam component having a second frequency spectrum about a second frequency. The second frequency is different from the first frequency. The projection system focuses the first and second beam components at different heights with respect to the substrate table.

    摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于在其横截面中赋予光束的单独可控元件的阵列，用于支撑衬底的衬底台，以及用于将图案化的投影系统 光束到基板的目标部分上。 辐射束包括多个光束分量。 多个光束分量包括具有关于第一频率的第一频谱的第一光束分量和具有关于第二频率的第二频谱的至少第二光束分量。 第二频率与第一频率不同。 投影系统将第一和第二光束分量相对于衬底台聚焦在不同的高度。

    Lithographic apparatus and device manufacturing method
    8.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20060098175A1

    公开(公告)日：2006-05-11

    申请号：US10983336

    申请日：2004-11-08

    申请人： Pieter De Jager ,  Cheng-Qun Gui ,  Jacob Klinkhamer ,  Eduard Hoeberichts

    发明人： Pieter De Jager ,  Cheng-Qun Gui ,  Jacob Klinkhamer ,  Eduard Hoeberichts

    IPC分类号： G03B27/00

    CPC分类号： G03F7/70475 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70358

    摘要： A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of a series of tracks on the substrate. The tracks overlap so that each track comprises a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams. A maximum intensity of a first part of each beam directed towards a first portion of the track can be greater than a maximum intensity of a second part of that beam directed towards a second portion of the track, such that the first and second portions of the track are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan.

    摘要翻译： 一种用于曝光衬底的光刻设备和方法。 照明系统提供一系列由单独可控元件的阵列构图的辐射束。 图案化的光束通过透镜阵列投射到基板的目标部分上。 阵列中的每个透镜将图案化束的相应部分朝向衬底引导。 位移系统引起衬底和梁之间的相对位移，使得束在预定扫描方向上跨过衬底扫描。 投影系统被定位成使得每个光束沿着衬底上的一系列轨道中的相应一个被扫描。 轨道重叠，使得每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠的至少一个第二部分，并且被两个梁扫描。 朝向轨道的第一部分的每个光束的第一部分的最大强度可以大于朝向轨道的第二部分的该光束的第二部分的最大强度，使得第一部分和第二部分 轨道暴露于基本上相同的最大强度的辐射。 相邻光束的这种重叠和光束强度的调制可以允许将不同光学柱的光学覆盖区缝合在一起以使得能够在单次扫描中暴露大面积的基板。