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公开(公告)号：US5389858A
公开(公告)日：1995-02-14
申请号：US915798
申请日：1992-07-16
IPC分类号： H01J29/76 , H01J37/141 , H01J37/153 , H01J37/30 , H01J37/305 , G09G1/04 , G21K1/08 , H01J3/14
CPC分类号： H01J37/141 , H01J37/153 , H01J37/3007
摘要： The magnetic axis of a stigmation yoke is varied from the mechanical axis of the stigmation yoke by differentially driving pairs of coils in a quadrupole configuration with currents which differ from a nominal stigmation current by approximately equal amounts, applied in opposite senses. Set-up procedures for electron beam deflection systems, such as in e-beam tools, are automated by emulating manual procedures in combination with electrical alteration of the magnetic axis of the stigmator yoke. Stigmation errors can also be corrected under automated set-up procedure control to allow dynamic correction of astigmatism in electron beam deflection system. Electrically variability of the magnetic axis of the stigmator yoke also allows the placement of the stigmator yoke at a position in the electron optical column other than prior to deflection stages as well as improved freedom from positional and aberrational errors.
摘要翻译： 通过在四极配置中差分驱动成对的线圈，通过以相反的方向施加大约相等量的标称标称电流的电流差异地驱动柱形磁轭的机械轴线，磁极轴的磁轴是从机械轴线变化的。 用于电子束工具的电子束偏转系统的设置程序通过模拟手动程序与喷枪轭的磁轴的电气改变相结合而自动化。 在自动设置程序控制下也可以纠正标示误差，以允许电子束偏转系统中的散光动态校正。 柱状磁轭的磁轴的电气变化也允许将标称磁轭放置在电子光学柱的位置之外，而不是在偏转阶段之前的位置以及改进的位置和像差误差的自由度。
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2.发明授权
公开(公告)号：US4675528A
公开(公告)日：1987-06-23
申请号：US750081
申请日：1985-06-28
摘要： The technique of measuring the spotsize and edgewidth of an electron beam by incrementally scanning the beam through discrete scan locations across a sharp edge is improved by processing the resulting beam current signals directly rather than the differentiated beam current signal. A linear regression is performed on beam current data points expected to fall in the linear portion of the beam current versus beam position characteristic in order to provide a linear approximation of the overall characteristic. Extrapolation of the linear function to its intersections with the maximum (I.sub.1) and minimum (I.sub.0) beam current levels yields corresponding beam positions Z.sub.B and Z.sub.A, such that (Z.sub.B -Z.sub.A) is a measure of spotsize in the scan direction. Edgewidth between the twelve and eighty-eight percent amplitude levels is obtained by locating measured beam currents at incremental scan locations on both sides of beam positions Z.sub.A and Z.sub.B, and interpolating to find the actual beam currents I.sub.A and I.sub.B at these positions. Edgewidths D.sub.A and D.sub.B are computed as D.sub.A =4.sqroot..pi.(Z.sub.B -Z.sub.A)(I.sub.A -I.sub.0)(I.sub.1 -I.sub.0) and D.sub.B =4.sqroot..pi.(Z.sub.B -Z.sub.A)(I.sub.1 -I.sub.B)(I.sub.1 -I.sub.0). In the case of a square beam with rounded corners, spotsize (i.e., side of square) is measured by a diagonal incremental scan and determination, by interpolation, of the beam positions Z.sub.C and Z.sub.D at which the beam current is I.sub.C =I.sub.0 +19(I.sub.1 -I.sub.0)/64 and I.sub.D =I.sub.0 +45(I.sub.1 -I.sub.0)/64. The spotsize is then computed from the formula 3.01816 (Z.sub.C -Z.sub.D).
摘要翻译： 通过跨越尖锐边缘通过离散扫描位置逐渐扫描光束来测量电子束的斑点和边缘的技术通过直接处理所得到的束电流信号而不是分化的束电流信号来改进。 对预期落入光束电流与光束位置特性的线性部分的光束电流数据点进行线性回归，以提供整体特性的线性近似。 将线性函数外推到具有最大（I1）和最小（I0）光束电流水平的交点产生相应的光束位置ZB和ZA，使得（ZB-ZA）是扫描方向上的斑点的量度。 通过将测量的束电流定位在光束位置ZA和ZB的两侧上的增量扫描位置，并进行内插以在这些位置处找到实际的光束电流IA和IB，可以获得十八至八十八％的幅度电平之间的宽度。 EDG宽度DA和DB计算为DA = 4 2ROOT pi（ZB-ZA）（IA-I0）（I1-I0）和DB = 4 2ROOT pi（ZB-ZA）（I1-IB）（I1-I0）。 在具有圆角的方束的情况下，通过对角线增量扫描来测量斑点（即，平方的一侧），并且通过插值来确定束电流为IC = I0 + 19的光束位置ZC和ZD （I1-I0）/ 64和ID = I0 + 45（I1-I0）/ 64。 然后从公式3.01816（ZC-ZD）计算斑点。
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3.发明授权Automatic focus and deflection correction in E-beam system using optical target height measurements 失效使用光学目标高度测量的电子束系统中的自动对焦和偏转校正
公开(公告)号：US4468565A
公开(公告)日：1984-08-28
申请号：US336204
申请日：1981-12-31
IPC分类号： H01J37/21 , G02B7/28 , H01J37/22 , H01J37/304 , H01J37/305 , H01L21/027 , B23Q15/12 , G01B11/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G02B7/28 , H01J37/22 , H01J37/304 , H01J2237/216 , H01J2237/2482
摘要： An automatic focus correction system for E-beam lithography uses optical light from a narrow angle light source to illuminate a horizontal slit, the image of which is projected onto a target surface. Prior to and after reflection of the slit image from the target surface the light beam is projected parallel to the target surface to minimize vertical space requirements in the E-beam column. Variations in height, z-position, cause the slit image to move vertically and the focus of reflection to shift laterally and this image is redeflected in the horizontal plane by a prism to a linear diode array used to produce a video-type output signal. Autofocus electronics are used to convert the video output signal into an analog correction signal to the E-beam fine focus coil. The video-type signal is also converted to a digital height value to be used for corrections in beam magnification and rotation.
摘要翻译： 用于电子束光刻的自动聚焦校正系统使用来自窄角光源的光学光照射水平狭缝，其图像被投影到目标表面上。 在从目标表面反射狭缝图像之前和之后，光束平行于目标表面投射，以最小化电子束柱中的垂直空间要求。 高度，z位置的变化导致狭缝图像垂直移动并且反射焦点横向移动，并且该图像在水平面中被棱镜重新折射到用于产生视频类型输出信号的线性二极管阵列。 自动对焦电子设备用于将视频输出信号转换为电子束微调线圈的模拟校正信号。 视频类型信号也被转换为数字高度值，以用于光束放大和旋转中的校正。
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公开(公告)号：US4376249A
公开(公告)日：1983-03-08
申请号：US204427
申请日：1980-11-06
IPC分类号： H01J37/141 , H01J37/147 , H01J37/153 , H01J37/30 , H01J3/20
CPC分类号： H01J37/3007 , H01J37/1474
摘要： An electron beam projection system having a projection lens arranged so that upon pre-deflection of the electron beam the electron optical axis of the lens shifts to be coincident with the deflected beam. The projection system includes means for producing an electron beam, means for deflecting the beam, a magnetic projection lens having rotational symmetry for focusing the deflected beam and a pair of magnetic compensation yokes positioned within the bore of the projection lens means. The pair of correction yokes has coil dimensions such that, in combination, they produce a magnetic compensation field proportional to the first derivative of the axial magnetic field strength distribution curve of the projection lens. Upon application of current to the pair of compensation yokes the electron optical axis of the projection lens shifts to the position of the deflected beam so that the electron beam remains coincident with the shifted electron optical axis and lands perpendicular to a target.
摘要翻译： 一种具有投影透镜的电子束投影系统，其布置成使得在电子束的预偏转时，透镜的电子光轴移动以与偏转光束重合。 投影系统包括用于产生电子束的装置，用于偏转光束的装置，具有用于聚焦偏转光束的旋转对称性的磁性投影透镜和位于投影透镜装置的孔内的一对磁性补偿轭。 一对校正轭具有线圈尺寸，使得它们组合地产生与投影透镜的轴向磁场强度分布曲线的一阶导数成比例的磁补偿场。 在将电流施加到一对补偿轭时，投影透镜的电子光轴移动到偏转光束的位置，使得电子束与移动的电子光轴保持一致并垂直于目标。
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公开(公告)号：US5793048A
公开(公告)日：1998-08-11
申请号：US769047
申请日：1996-12-18
IPC分类号： G21K1/093 , G03F7/20 , G21K1/08 , G21K5/04 , H01J37/141 , H01J37/147 , H01J37/153 , H01J37/30 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , G21K1/08 , H01J37/3007 , H01J37/3174
摘要： An improved particle lens has an axis that is shifted to follow the central ray of the beam as it is deflected through the lens creating, in effect, a variable curvilinear optical axis for the lens and introducing aberrations depending on the object size and the distance off the lens symmetry axis. These aberrations are corrected by a set of wire pairs perpendicular to the system axis to add a gradient of the z-component of the magnetic field by which aberrations are generated of the same type but opposite direction as those inherent in the system.
摘要翻译： 改进的粒子透镜具有在被偏转穿过透镜时沿着光束的中心射线移动的轴，实际上产生用于透镜的可变曲线光轴并根据物体尺寸和距离导出像差 透镜对称轴。 这些像差通过垂直于系统轴的一组线对来校正，以增加磁场的z分量的梯度，通过该梯度生成与系统中固有的相同类型但相反方向的像差。
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6.发明授权Dynamic compensation of non-linear electron beam landing angle in variable axis lenses 失效可变轴透镜中非线性电子束着陆角的动态补偿
公开(公告)号：US5285074A
公开(公告)日：1994-02-08
申请号：US893172
申请日：1992-06-03
IPC分类号： G09G1/00 , G09G1/04 , H01J29/70 , H01J37/147 , H01J37/304 , H01L21/027 , H01L21/30 , H04N3/16
CPC分类号： H01J37/304 , H01J2237/04928 , H01J2237/1507 , H01J2237/153 , H01J2237/30461 , H01J2237/3175
摘要： A dynamic correction arrangement for an electron beam projection/deflection system provides high order correction values for deflection in accordance with a correction equation. Particularly as applied to high accuracy telecentric deflection, the coefficients of terms of the correction equation may be determined by calibration for a small number of test points. Correction values may be stored in a look-up table or computed in real time by using a math co-processor in a processing pipeline. The correction provided corrects landing angle errors through the third order in telecentric projection/deflection systems such as systems utilizing variable axis immersion lenses.
摘要翻译： 电子束投影/偏转系统的动态校正装置根据校正方程为偏转提供高阶校正值。 特别是应用于高精度远心偏转时，校正方程的项的系数可以通过少量测试点的校准来确定。 校正值可以存储在查找表中或通过在处理流水线中使用数学协处理器实时计算。 该校正提供了在诸如利用可变轴浸没透镜的系统的远心投影/偏转系统中通过第三级校正着陆角误差。
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公开(公告)号：US5757010A
公开(公告)日：1998-05-26
申请号：US769083
申请日：1996-12-18
申请人： Guenther O. Langner
发明人： Guenther O. Langner
IPC分类号： H01J37/141 , G21K1/093 , H01J37/147 , H01J37/153 , H01J37/30 , H01J37/317 , G21K1/08 , G02B27/10 , G21K5/10
CPC分类号： B82Y10/00 , B82Y40/00 , G21K1/093 , H01J37/3007 , H01J37/3174
摘要： An improved particle lens has an axis that is shifted to follow the central ray of the beam as it is deflected through the lens creating, in effect, a variable curvilinear optical axis for the lens and introducing aberrations having depending on the object size and the distance off the lens symmetry axis. These aberrations are corrected by a set of correction elements generating compensating aberrations of the same type, comprising at least one wire pair perpendicular to the system axis and carrying fixed currents to introduce a gradient in the field, together with three coils centered on the system axis to cancel a bias field introduced by the wire pair.
摘要翻译： 改进的粒子透镜具有在被偏转穿过透镜时沿着光束的中心光线移动的轴，实际上产生用于透镜的可变曲线光轴并且引入具有取决于物体尺寸和距离的像差 离开镜头对称轴。 这些像差由产生相同类型的补偿像差的一组校正元件校正，所述校正元件包括垂直于系统轴线的至少一个线对，并承载固定电流以在场中引入梯度，以及以系统轴为中心的三个线圈 以取消由线对引入的偏置场。
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公开(公告)号：US4820927A
公开(公告)日：1989-04-11
申请号：US97408
申请日：1987-09-15
IPC分类号： G01Q30/02 , G01Q30/16 , G01Q30/18 , G01Q90/00 , H01J37/073 , H01J37/301 , H01J37/317 , H01J27/02
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/073 , H01J37/301 , H01J37/3174 , H01J2237/188
摘要： A scanned electron beam system employs an electron beam source using an NEA activated photo-emitter as the cathode. The activated photo-emitter cathode produces a pre-shaped electron beam having a relatively small spot focussed on a target plane. The beam is selectively deflected to scan the beam spot along the target plane to expose desired patterns on that plane. The distance between the cathode and anode can be made large enough to accommodate in situ replenishment of cathode material, such as Cesium, without obstructing the electron optical path. The system includes two vacuum chambers which are differentially pumped through respective ports. The first chamber, in which the anode and cathode are located, is utilized for establishing the required electrostatic field. The second chamber is employed to produce the necessary focussing and selective beam deflection.
摘要翻译： 扫描电子束系统采用使用NEA激活的光发射体作为阴极的电子束源。 激活的光发射极阴极产生预聚焦电子束，其具有聚焦在目标平面上的相对小的光斑。 光束被选择性地偏转以沿着目标平面扫描光束点，以暴露该平面上的期望图案。 阴极和阳极之间的距离可以做得足够大以适应阴极材料（例如铯）的原位补充，而不会阻碍电子光路。 该系统包括通过相应端口差分泵浦的两个真空室。 阳极和阴极所在的第一个室用于建立所需的静电场。 第二个室用于产生必要的聚焦和选择性的光束偏转。
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9.发明授权All electrostatic electron optical sub-system for variable electron beam spot shaping and method of operation 失效所有静电电子子系统用于可变电子束点成形和操作方法
公开(公告)号：US4683366A
公开(公告)日：1987-07-28
申请号：US749789
申请日：1985-06-28
IPC分类号： H01J37/30 , H01J37/317 , B23K15/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3174 , H01J2237/043 , H01J2237/1207 , H01J2237/151 , H01J2237/31776
摘要： An all-electrostatic variable spot charged particle (electron) beam shaping sub-system which is compact and of much smaller size than known similar systems designed for the same purpose and operating with magnetic lenses. The improved electrostatic variable spot-shaping sub-system does not require mechanical rotation of the spot-shaping apertures for maintaining alignment or orientation. The improved sub-system includes both beam steering and beam blanking requiring less than 3 volts for operation of the blanking controls to turn the beam on and off. The novel system easily accomodates a variety of different beam-shaping apertures for use as the second beam shaping aperture in the sub-system including rectilinear triangles of different orientation to provide smooth 45 degree pattern delineation, rectangles, squares, and even different diameter circles where such configurations are required by a particular pattern to be written in the target plane.
摘要翻译： 全静电可变点带电粒子（电子）束整形子系统，紧凑且尺寸小于为同一目的而设计并与磁性镜头一起操作的已知类似系统。 改进的静电可变光斑整形子系统不需要用于保持对准或取向的光点成形孔的机械旋转。 改进的子系统包括波束转向和波束消隐，其需要小于3伏特用于操作消隐控制以使光束打开和关闭。 该新颖系统容易地容纳各种不同的光束成形孔，用作子系统中的第二光束整形孔，包括不同取向的直线三角形，以提供平滑的45度图案描绘，矩形，正方形以及甚至不同直径的圆，其中 通过将特定图案写入目标平面来要求这样的配置。
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公开(公告)号：US5708274A
公开(公告)日：1998-01-13
申请号：US769084
申请日：1996-12-18
IPC分类号： H01J37/141 , H01J37/153 , H01J37/14
CPC分类号： H01J37/153 , H01J37/141 , H01J2237/04922 , H01J2237/04928
摘要： A charged particle lens has an axis that is shifted to follow the central ray of the beam as it is deflected through the lens creating, in effect, a variable curvilinear optical axis for the lens and introducing aberrations having depending on the object size and the distance off the lens symmetry axis. These aberrations are corrected by a set of coil pairs tilted with respect to the system axis, which generate compensating aberrations of the same type.
摘要翻译： 带电粒子透镜具有在被偏转穿过透镜时沿着光束的中心光线移动的轴，实际上产生用于透镜的可变曲线光轴并引入具有取决于物体尺寸和距离的像差 离开镜头对称轴。 这些像差由相对于系统轴倾斜的一组线圈对来校正，这产生相同类型的补偿像差。
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