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    METHOD FOR PRODUCING PHOTOVOLTAIC CELL
    4.
    发明申请
    METHOD FOR PRODUCING PHOTOVOLTAIC CELL 审中-公开
    生产光伏电池的方法

    公开(公告)号：US20120122265A1

    公开(公告)日：2012-05-17

    申请号：US13298582

    申请日：2011-11-17

    申请人： Youichi Machii ,  Masato Yoshida ,  Takeshi Nojiri ,  Kaoru Okaniwa ,  Mitsunori Iwamuro ,  Shuuichirou Adachi ,  Akihiro Orita ,  Tetsuya Satou ,  Keiko Kizawa

    发明人： Youichi Machii ,  Masato Yoshida ,  Takeshi Nojiri ,  Kaoru Okaniwa ,  Mitsunori Iwamuro ,  Shuuichirou Adachi ,  Akihiro Orita ,  Tetsuya Satou ,  Keiko Kizawa

    IPC分类号： H01L31/0232

    CPC分类号： H01L31/022441 ,  H01L31/18 ,  Y02E10/50

    摘要： The method for producing a photovoltaic cell includes applying an n-type diffusion layer forming composition including an n-type impurity-containing glass powder and a dispersion medium onto a first region on one surface side of a semiconductor substrate; applying a p-type diffusion layer forming composition including a p-type impurity-containing glass powder and a dispersion medium onto a second region other than the first region on the surface of the semiconductor substrate where the first region is provided; a thermal diffusion process in which an n-type diffusion layer and a p-type diffusion layer are formed by heat-treating the semiconductor substrate onto which the n-type diffusion layer forming composition and the p-type diffusion layer forming composition are applied; and forming an electrode on each of the first region where the n-type diffusion layer is formed and the second region where the p-type diffusion layer is formed, respectively.

    摘要翻译： 制造光伏电池的方法包括在半导体衬底的一个表面侧的第一区域上施加包含n型含杂质玻璃粉末和分散介质的n型扩散层形成组合物; 将包含p型含杂质的玻璃粉末和分散介质的p型扩散层形成用组合物涂布在设置有所述第一区域的所述半导体基板的表面上的除了所述第一区域以外的第二区域上; 通过对施加了n型扩散层形成组合物和p型扩散层形成组合物的半导体衬底进行热处理形成n型扩散层和p型扩散层的热扩散工艺; 并且在形成有n型扩散层的第一区域和形成p型扩散层的第二区域分别形成电极。

    Method for producing photovoltaic cell
    5.
    发明授权
    Method for producing photovoltaic cell 有权
    光电池生产方法

    公开(公告)号：US08404599B2

    公开(公告)日：2013-03-26

    申请号：US13298475

    申请日：2011-11-17

    申请人： Youichi Machii ,  Masato Yoshida ,  Takeshi Nojiri ,  Kaoru Okaniwa ,  Mitsunori Iwamuro ,  Shuuichirou Adachi ,  Akihiro Orita ,  Tetsuya Satou ,  Keiko Kizawa

    发明人： Youichi Machii ,  Masato Yoshida ,  Takeshi Nojiri ,  Kaoru Okaniwa ,  Mitsunori Iwamuro ,  Shuuichirou Adachi ,  Akihiro Orita ,  Tetsuya Satou ,  Keiko Kizawa

    IPC分类号： H01L21/31

    CPC分类号： H01L31/1804 ,  H01L21/2225 ,  H01L21/2255 ,  H01L31/022425 ,  H01L31/068 ,  Y02E10/547 ,  Y02P70/521

    摘要： The method for producing a photovoltaic cell includes applying, on a partial region of one surface side of a semiconductor substrate, a first n-type diffusion layer forming composition including an n-type impurity-containing glass powder and a dispersion medium; applying, on at least a region other than the partial region on the surface of the semiconductor substrate, a second n-type diffusion layer forming composition which includes an n-type impurity-containing glass powder and a dispersion medium and in which a concentration of the n-type impurity is lower than that of the first n-type diffusion layer forming composition, where the first n-type diffusion layer forming composition is applied; heat-treating the semiconductor substrate on which the first n-type diffusion layer forming composition and the second n-type diffusion layer forming composition are applied to form an n-type diffusion layer; and forming an electrode on the partial region.

    摘要翻译： 制造光伏电池的方法包括在半导体衬底的一个表面侧的部分区域上施加包含n型含杂质玻璃粉末和分散介质的第一n型扩散层形成组合物; 在至少在半导体衬底的表面上的部分区域以外的区域施加第二n型扩散层形成组合物，其包含含n型杂质的玻璃粉末和分散介质，其中浓度 n型杂质比施加第一n型扩散层形成组合物的第一n型扩散层形成组合物低; 对其上施加有第一n型扩散层形成组合物和第二n型扩散层形成组合物的半导体衬底进行热处理以形成n型扩散层; 以及在所述部分区域上形成电极。

    Method for producing photovoltaic cell
    6.
    发明授权
    Method for producing photovoltaic cell 有权
    光电池生产方法

    公开(公告)号：US08410000B2

    公开(公告)日：2013-04-02

    申请号：US13298535

    申请日：2011-11-17

    申请人： Youichi Machii ,  Masato Yoshida ,  Takeshi Nojiri ,  Kaoru Okaniwa ,  Mitsunori Iwamuro ,  Shuuichirou Adachi ,  Akihiro Orita ,  Tetsuya Satou ,  Keiko Kizawa

    发明人： Youichi Machii ,  Masato Yoshida ,  Takeshi Nojiri ,  Kaoru Okaniwa ,  Mitsunori Iwamuro ,  Shuuichirou Adachi ,  Akihiro Orita ,  Tetsuya Satou ,  Keiko Kizawa

    IPC分类号： H01L21/31

    CPC分类号： H01L31/068 ,  H01L31/022425 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    摘要： The method for producing a photovoltaic cell includes applying, on a partial region of one surface side of a semiconductor substrate, a first p-type diffusion layer forming composition including a p-type impurity-containing glass powder and a dispersion medium; applying, on at least a region other than the partial region on the surface of the semiconductor substrate, a second p-type diffusion layer forming composition which includes a p-type impurity-containing glass powder and a dispersion medium and in which a concentration of the p-type impurity is lower than that of the first p-type diffusion layer forming composition, where the first p-type diffusion layer forming composition is applied; heat-treating the semiconductor substrate on which the first p-type diffusion layer forming composition and the second p-type diffusion layer forming composition are applied to form a p-type diffusion layer; and forming an electrode on the partial region.

    摘要翻译： 制造太阳能电池的方法包括在半导体衬底的一个表面侧的部分区域上施加包含p型含杂质玻璃粉末和分散介质的第一p型扩散层形成组合物; 在至少在半导体衬底的表面上的部分区域以外的区域施加第二p型扩散层形成组合物，其包含含p型杂质的玻璃粉末和分散介质，其中浓度 p型杂质低于第一p型扩散层形成用组合物，其中涂布第一p型扩散层形成组合物; 对其上施加有第一p型扩散层形成组合物和第二p型扩散层形成组合物的半导体衬底进行热处理以形成p型扩散层; 以及在所述部分区域上形成电极。

    Polishing slurry and polishing method
    9.
    发明授权
    Polishing slurry and polishing method 有权
    抛光浆和抛光方法

    公开(公告)号：US08075800B2

    公开(公告)日：2011-12-13

    申请号：US10558406

    申请日：2004-05-28

    申请人： Naoyuki Koyama ,  Youichi Machii ,  Masato Yoshida ,  Masato Fukasawa ,  Toranosuke Ashizawa

    发明人： Naoyuki Koyama ,  Youichi Machii ,  Masato Yoshida ,  Masato Fukasawa ,  Toranosuke Ashizawa

    IPC分类号： C09K13/00 ,  H01L21/461 ,  H01L21/302

    CPC分类号： H01L21/31053 ,  C09G1/02 ,  C09K3/1454

    摘要： A polishing slurry containing a slurry dispersing particles of tetravalent metal hydroxide in a medium therein and an additive, characterized in that the additive is a polymer containing at least one kind of monomer component selected from a group of monomers represented with a general formulae (I) and (II) below (In the general formulae (I) and (II), R1 denotes hydrogen, a methyl group, a phenyl group, a benzil group, a chlorine group, a difluoromethyl group, a trifluoromethyl group or a cyano group, R2 and R3 denote hydrogen or an alkyl chain having 1 to 18 carbon atoms, a methylol group, an acetyl group or a diacetonyl group, and a case where both are hydrogen is not included. R4 denotes a morpholino group, a thiomorpholino group, a pyrrolidinyl group or a piperidino group.) The invention provides a polishing slurry in which particles form a chemical reaction layer with a polishing film to be removed with a very small mechanical action of the particles and mechanical removal by a pad without scratches and the additive realizes high planarity.

    摘要翻译： 一种抛光浆料，其含有在其中的介质中分散四价金属氢氧化物颗粒的浆料和添加剂，其特征在于，添加剂是含有选自由通式（I）表示的单体组中的至少一种单体组分的聚合物， 和（II）（在通式（I）和（II）中，R 1表示氢，甲基，苯基，苯偶酰基，氯基，二氟甲基，三氟甲基或氰基， R2和R3表示氢或碳原子数1〜18的烷基链，羟甲基，乙酰基或二丙酰基，不包括氢的情况，R4表示吗啉代基，硫代吗啉基， 吡咯烷基或哌啶子基）。本发明提供了一种抛光浆料，其中颗粒形成具有待除去的抛光膜的化学反应层，其具有非常小的颗粒的机械作用并通过pa机械去除 d没有划痕，添加剂实现了高平面性。

    Hazardous substance decomposer and process for producing the same
    10.
    发明申请
    Hazardous substance decomposer and process for producing the same 有权
    有害物质分解器及其生产方法

    公开(公告)号：US20060289826A1

    公开(公告)日：2006-12-28

    申请号：US10558406

    申请日：2004-05-28

    申请人： Naoyuki Koyama ,  Youichi Machii ,  Masato Yoshida ,  Masato Fukasawa ,  Toranosuke Ashizawa

    发明人： Naoyuki Koyama ,  Youichi Machii ,  Masato Yoshida ,  Masato Fukasawa ,  Toranosuke Ashizawa

    IPC分类号： C09K13/00 ,  H01L21/461 ,  H01L21/302

    CPC分类号： H01L21/31053 ,  C09G1/02 ,  C09K3/1454

    摘要： A polishing slurry containing a slurry dispersing particles of tetravalent metal hydroxide in a medium therein and an additive, characterized in that the additive is a polymer containing at least one kind of monomer component selected from a group of monomers represented with a general formulae (I) and (II) below (In the general formulae (I) and (II), R1 denotes hydrogen, a methyl group, a phenyl group, a benzil group, a chlorine group, a difluoromethyl group, a trifluoromethyl group or a cyano group, R2 and R3 denote hydrogen or an alkyl chain having 1 to 18 carbon atoms, a methylol group, an acetyl group or a diacetonyl group, and a case where both are hydrogen is not included. R4 denotes a morpholino group, a thiomorpholino group, a pyrrolidinyl group or a piperidino group.) The invention provides a polishing slurry in which particles form a chemical reaction layer with a polishing film to be removed with a very small mechanical action of the particles and mechanical removal by a pad without scratches and the additive realizes high planarity.

    摘要翻译： 一种抛光浆料，其含有在其中的介质中分散四价金属氢氧化物颗粒的浆料和添加剂，其特征在于，添加剂是含有选自由通式（I）表示的单体组中的至少一种单体组分的聚合物， 和（II）（在通式（I）和（II）中，R 1表示氢，甲基，苯基，苯偶酰基，氯基，二氟甲基， 三氟甲基或氰基，R 2和R 3表示氢或具有1至18个碳原子的烷基链，羟甲基，乙酰基或二丙酰基 并且不包括氢的情况，R 4表示吗啉代基，硫代吗啉代基，吡咯烷基或哌啶子基）。本发明提供了一种研磨浆料，其中颗粒形成 具有用非常小的机械作用除去的抛光膜的化学反应层 颗粒和通过垫没有划痕的机械去除和添加剂实现高平坦度。