摘要:
A spring-like cooling structure for an in-line chip module is formed from a continuous sheet of a thermally conducting material having a front side and a back side, the sheet folded at substantially a one-hundred and eighty degree angle, wherein a length of the structure substantially correlates to a length of the in-line chip module, and a width of the structure is wider than a width of the in-line chip module such that the structure fits over and substantially around the in-line chip module; openings at a left-side, right-side and a bottom of the structure for easily affixing and removing the structure from the in-line chip module; a top part comprising a top surface disposed over a top of the in-line chip module when affixed to the in-line chip module, and comprising an angled surface flaring outward from the in-line chip module, the angled surface positioned directly beneath the top surface; a center horizontal part; a gap between the center horizontal part and the plurality of chips; and a flared bottom area of the structure.
摘要:
A spring-like cooling structure for an in-line chip module is formed from a continuous sheet of a thermally conducting material having a front side and a back side, the sheet folded at substantially a one-hundred and eighty degree angle, wherein a length of the structure substantially correlates to a length of the in-line chip module, and a width of the structure is wider than a width of the in-line chip module such that the structure fits over and substantially around the in-line chip module; openings at a left-side, right-side and a bottom of the structure for easily affixing and removing the structure from the in-line chip module; a top part comprising a top surface disposed over a top of the in-line chip module when affixed to the in-line chip module, and comprising an angled surface flaring outward from the in-line chip module, the angled surface positioned directly beneath the top surface; a center horizontal part; a gap between the center horizontal part and the plurality of chips; and a flared bottom area of the structure.
摘要:
An approach to determine a power-on-hour offset for a memory device that is newly-installed into a computer system is provided, which subtracts a current power-on-hour count of the memory device from a current power-on-hour value of a power supply that supplies operative power to the memory device within the computer system. In response to the computer system powering down, an accumulated power-on-hour for the memory device is determined by subtracting the power-on-hour offset of the memory from a current power-on-hour value of the computer system power supply. The determined power-on-hour offset and accumulated power-on-hour values are saved into one or more designated bytes of a free area of electrically erasable programmable read-only memory of the memory device that are available for data storage by a memory controller, and wherein data stored therein persists after operative power is lost to the memory device, the memory controller or the computer system.
摘要:
An approach to determine a power-on-hour offset for a memory device that is newly-installed into a computer system is provided, which subtracts a current power-on-hour count of the memory device from a current power-on-hour value of a power supply that supplies operative power to the memory device within the computer system. In response to the computer system powering down, an accumulated power-on-hour for the memory device is determined by subtracting the power-on-hour offset of the memory from a current power-on-hour value of the computer system power supply. The determined power-on-hour offset and accumulated power-on-hour values are saved into one or more designated bytes of a free area of electrically erasable programmable read-only memory of the memory device that are available for data storage by a memory controller, and wherein data stored therein persists after operative power is lost to the memory device, the memory controller or the computer system.
摘要:
Disclosed is a process for producing multi-level conductor/insulator films on a processed semiconductor substrate having a conductor pattern. The insulator layers, each comprise a photosensitive polyimide polymer composition, and this allows the desired wiring channels and stud vias to be formed directly in the insulator layers, without the use of separate masking layers and resulting image transfer steps, thus providing a less cumbersome and costly process.
摘要:
A process of patterning a conductive layer on a substrate avoiding webbing yet permitting high density patterning places two layers between the resist and the metal. The first layer is an antireflective coating such as titanium nitride applied to the metal. The second layer is a barrier comprising silicon such as sputtered silicon or SiO.sub.2. The barrier layer may also be a thin coating of spin-on glass. The barrier layer prevents interaction between the TiN and acid groups which are generated during exposure of the resist. With this structure in place the resist is applied, exposed and developed.
摘要:
The invention relates generally to lithographic patterning of very small features. In particular, the invention relates generally to patterning of semiconductor circuit features smaller than lithographically defined using either conventional optical lithography or next generation lithography techniques. The invention relates more particularly, but not by way of limitation, to lateral trimming of photoresist images.
摘要:
In connection with the manufacture of chips having partitioned logic, a partitioned mask layout approach. This approach provides the chip exposure pattern as a set of partitions corresponding to macros or core functions and also handles glue logic and interconnect. A result of this approach is a simplified, cost-effective process that does not defer customization to other, potentially more time-consuming and inefficient tasks.