Gate valve
    1.
    发明授权
    Gate valve 失效
    闸阀

    公开(公告)号:US6092786A

    公开(公告)日:2000-07-25

    申请号:US60546

    申请日:1998-04-15

    CPC分类号: F16K1/16

    摘要: Provided is a gate valve for opening and closing an aperture formed in a body of a chamber and designed so that an object is loaded into or unloaded from the chamber, comprising a lift mechanism provided on a side portion of the chamber body, a supporting portion supported by a lift mechanism for up-and-down motion, a valve plate supported by the supporting portion and movable between a closed position such as to close the aperture of the chamber body and an open position such that the valve plate is separated from the aperture to leave the aperture open as the supporting portion is moved up and down by the lift mechanism, and a separating mechanism for allowing the valve plate to move to a position ahead of the aperture so that the valve plate is separated from the aperture.

    摘要翻译: 提供了一种用于打开和关闭形成在室体中的孔的闸阀,其设计成使得物体被装载到或者从室卸载,包括设置在室主体的侧部上的提升机构,支撑部分 由用于上下运动的升降机构支撑的阀板,由支撑部分支撑并可在闭合位置之间移动的阀板,以关闭室主体的孔口和打开位置,使得阀板与阀板分离 孔由于支撑部分由提升机构上下移动而使孔开放,以及分离机构,用于允许阀板移动到孔前方的位置,使得阀板与孔分离。

    Vacuum treatment device
    4.
    发明授权
    Vacuum treatment device 有权
    真空处理装置

    公开(公告)号:US06746196B1

    公开(公告)日:2004-06-08

    申请号:US09889148

    申请日:2001-07-12

    IPC分类号: B65G4907

    摘要: A vacuum treatment device, comprising a vacuum treatment chamber (1) etching a semiconductor wafer (W) as a body to be treated and a preliminary vacuum chamber (2) communicating with the vacuum treatment chamber (1), wherein a transfer arm (5) and first and second buffers (6, 7) for temporarily supporting the wafer (W) are installed in the preliminary vacuum chamber (2), the transfer arm (5) is provided with a flexible arm part (5a) and a support part (16) supporting the wafer (W), the arm part (5a) is extended and retracted by the rotations of a drive side swing arm (14) and a driven side swing arm (15) forming the arm (5a) so as to move the support part (16) straight forward and backward while maintaining it in its attitude, and the first and second buffers (6, 7) are disposed on the motion route of the support part (16) of the transfer arm (5).

    摘要翻译: 1.一种真空处理装置,其特征在于,具备对作为被处理体的半导体晶片(W)进行蚀刻的真空处理室(1)和与所述真空处理室(1)连通的预备真空室(2),其特征在于, )和用于临时支撑晶片(W)的第一和第二缓冲器(6,7)安装在预备真空室(2)中,传送臂(5)设置有柔性臂部分(5a)和支撑部分 (16)支撑晶片(W)时,通过驱动侧摆臂(14)和形成臂(5a)的从动侧摆臂(15)的旋转使臂部(5a)伸长和缩回,从而 在保持其姿态的同时将支撑部(16)向前后方向移动,第一缓冲器(6,7)设置在传送臂(5)的支撑部(16)的运动路径上。

    Structure or construction for mounting a pressure detector
    8.
    发明授权
    Structure or construction for mounting a pressure detector 有权
    用于安装压力检测器的结构或结构

    公开(公告)号:US06606912B2

    公开(公告)日:2003-08-19

    申请号:US09825340

    申请日:2001-04-04

    IPC分类号: G01L700

    摘要: A construction for mounting a pressure detector prevents the detector diaphragm from being strained by stress applied to the pressure detector as the detector is mounted in a fixture main body provided in a pipe line or the like, thereby keeping the output characteristics and temperature characteristics of the detector from greatly differing before and after the mounting. The pressure detector is constructed by combining and fastening together a diaphragm base having a diaphragm and a sensor base having a sensor element therein that is activated by displacement of the diaphragm base. The pressure detector, with a gasket placed thereunder, is disposed in a mounting hole of a fixture main body that is mounted in a pipe line. The pressure detector is air-tightly pressed and fastened by a presser member inserted from above in the mounting hole. The presser member is brought in contact with a block upper surface of the diaphragm base, and the gasket is also brought in contact with the block lower surface of the diaphragm base. A shallow groove is defined in the form of a ring on the lower surface of the block at a place inward of the portion contacting the metal gasket so that the shallow groove absorbs strain caused by the presser member.

    摘要翻译: 用于安装压力检测器的结构防止了检测器膜片被施加到压力检测器上的应力而被应变,因为检测器安装在设置在管线等中的夹具主体中,从而保持了输出特性和温度特性 检测器在安装前后差异很大。 压力检测器通过将具有隔膜的膜片基座和具有传感器元件的传感器基座组合并紧固在一起而构成,该传感器基座通过隔膜基座的位移而被激活。 压力检测器,其上放置有垫圈,设置在安装在管道中的固定装置本体的安装孔中。 压力检测器通过从安装孔中从上方插入的压紧构件气密地按压并紧固。 压板构件与隔膜基座的块上表面接触,并且垫圈也与隔膜基座的块下表面接触。 浅槽在块体的下表面上在与金属垫片接触的部分的内侧的位置处以环的形式限定,使得浅槽吸收由压紧构件引起的应变。

    Substrate replacing method and substrate processing apparatus
    10.
    发明授权
    Substrate replacing method and substrate processing apparatus 有权
    基板更换方法和基板处理装置

    公开(公告)号:US08663489B2

    公开(公告)日:2014-03-04

    申请号:US12732451

    申请日:2010-03-26

    IPC分类号: B44C1/22

    CPC分类号: H01L21/67745 H01L21/67748

    摘要: A method for replacing plural substrates to be processed by a substrate processing apparatus which includes a substrate processing chamber, a load lock chamber, and a conveying apparatus including first and second conveying members for conveying the plural substrates into and out from the substrate processing chamber and the load lock chamber. The method includes the steps of a) conveying a first substrate out from the substrate processing chamber with the first conveying member, b) conveying a second substrate into the substrate processing chamber with the second conveying member, c) conveying the second substrate out from the load lock chamber with the second conveying member, and d) conveying the first substrate into the load lock chamber with the first conveying member. The steps c) and d) are performed between step a) and step b).

    摘要翻译: 一种用于替换多个基板的方法,所述基板处理装置包括基板处理室,负载锁定室和输送装置,所述基板处理装置包括用于将多个基板输入和移出基板处理室的第一和第二输送部件, 负载锁定室。 该方法包括以下步骤:a)用第一输送部件从基板处理室输出第一基板,b)用第二输送部件将第二基板输送到基板处理室中,c)将第二基板从 负载锁定室与第二输送构件,以及d)用第一输送构件将第一基板输送到装载锁定室。 在步骤a)和步骤b)之间执行步骤c)和d)。