Metallic rotational polygon mirror
    7.
    发明授权
    Metallic rotational polygon mirror 失效
    金属旋转多面镜

    公开(公告)号:US4643518A

    公开(公告)日:1987-02-17

    申请号:US710061

    申请日:1985-03-11

    申请人: Yasushi Taniguchi

    发明人: Yasushi Taniguchi

    CPC分类号: G02B5/0875 G02B5/09 G02B26/12

    摘要: This specification discloses a metallic rotational polygon mirror having a metallic member formed of aluminum or an alloy thereof, a thin film formed of at least one of chromium, tungsten and nickel on the metallic member, and a thin metal film of high reflection factor formed of at least one of gold, silver and copper on the thin film. The metallic rotational polygon mirror has a high reflection factor and a strong intimate contact property between the metallic member and the thin film and between the thin films, and has excellent corrosion resistance and durability.

    摘要翻译: 本说明书公开了一种金属旋转多面镜,其具有由铝或其合金构成的金属构件,金属构件上由铬,钨和镍中的至少一种形成的薄膜,以及由高反射率形成的金属薄膜 薄膜上的金,银和铜中的至少一种。 金属旋转多面镜在金属构件和薄膜之间以及薄膜之间具有高反射率和强烈的紧密接触性,并且具有优异的耐腐蚀性和耐久性。

    SILICON SUBSTRATE HAVING TEXTURED SURFACE, AND PROCESS FOR PRODUCING SAME
    8.
    发明申请
    SILICON SUBSTRATE HAVING TEXTURED SURFACE, AND PROCESS FOR PRODUCING SAME 有权
    具有纹理表面的硅衬底及其生产方法

    公开(公告)号:US20140020750A1

    公开(公告)日:2014-01-23

    申请号:US14006357

    申请日:2012-03-28

    摘要: The present invention addresses the problem of providing a novel silicon substrate having a textured surface by dry-etching the surface of a silicon substrate having (111) orientation and thereby forming a texture thereon. The present invention provides a silicon substrate having (111) orientation, said silicon substrate having a textured surface that includes multiple protrusions which each comprise three slant faces and have heights of 100 to 8000 nm. This process for producing a silicon substrate includes: a step of preparing a silicon substrate having (111) orientation; and a step of blowing an etching gas onto the surface of the silicon substrate, said etching gas containing one or more gases selected from the group consisting of ClF3, XeF2, BrF3, BrF5 and NF3.

    摘要翻译: 本发明解决了通过干法蚀刻具有(111)取向的硅衬底的表面从而在其上形成纹理来提供具有纹理表面的新型硅衬底的问题。 本发明提供具有(111)取向的硅衬底,所述硅衬底具有纹理化表面,其包括多个突起,每个突出部包括三个倾斜面并且具有100至8000nm的高度。 该制造硅衬底的工艺包括:制备具有(111)取向的硅衬底的步骤; 以及将蚀刻气体吹送到硅衬底的表面上的步骤,所述蚀刻气体含有选自ClF 3,XeF 2,BrF 3,BrF 5和NF 3中的一种或多种气体。

    Apparatus for manufacturing sub-harness
    10.
    发明授权
    Apparatus for manufacturing sub-harness 失效
    用于制造辅助线束的装置

    公开(公告)号:US06993833B2

    公开(公告)日:2006-02-07

    申请号:US10755340

    申请日:2004-01-13

    IPC分类号: H01B43/00

    摘要: A method for manufacturing a sub-harness comprises the steps of: holding a first connector housing in a guiding device for terminal insertion; holding a second connector housing in a continuity check tool; bringing a terminal at a first end of an electric wire with terminals at the both ends thereof into contact with a touch contact to make a specified light emitter of light emitters in the guiding device emit, said touch contact being connected to the guiding device via a main control device, said touch contact having a curved contact surface; inserting the terminal at the first end into a specified terminal-receiving chamber of terminal-receiving chambers in the first connector housing to bring the terminal at the first end into contact with a specified terminal contact of terminal contacts in the guiding device, said specified chamber being illuminated by said light emitter; and checking continuity between terminals at the first end and at a second end of the electric wire with a continuity check control device which is connected to the continuity check tool and the specified terminal contact, said terminal at the second end having been inserted into the second connector housing.

    摘要翻译: 一种用于制造子束的方法包括以下步骤