公开(公告)号：US08461699B2

公开(公告)日：2013-06-11

申请号：US13142057

申请日：2009-12-16

申请人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Yukihiko Yamashita ,  Ken Nanaumi ,  Akitoshi Tanimoto

发明人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Yukihiko Yamashita ,  Ken Nanaumi ,  Akitoshi Tanimoto

IPC分类号： H01L23/29 ,  G03C1/00

CPC分类号： H01L21/312 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/40 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/563 ,  H01L21/76801 ,  H01L21/76802 ,  H01L23/293 ,  H01L23/525 ,  H01L23/5329 ,  H01L24/13 ,  H01L2224/10126 ,  H01L2224/73104 ,  H01L2224/73203 ,  H01L2924/01004 ,  H01L2924/01009 ,  H01L2924/01011 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01016 ,  H01L2924/01019 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01079 ,  H01L2924/10253 ,  H01L2924/30105 ,  H01L2924/3011 ,  H01L2924/00

摘要： The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.

摘要翻译： 本发明的正性感光性组合物包括具有酚羟基的碱溶性树脂，通过光产生酸的化合物，热交联剂和丙烯酸树脂。 可以提供可以用碱性水溶液显影的正色调感光组合物，具有足够高的灵敏度和分辨率，并且可以形成具有优异的粘合性和耐热冲击性的抗蚀剂图案。

公开(公告)号：US20110254178A1

公开(公告)日：2011-10-20

申请号：US13142057

申请日：2009-12-16

申请人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Yukihiko Yamashita ,  Ken Nanaumi ,  Akitoshi Tanimoto

发明人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Yukihiko Yamashita ,  Ken Nanaumi ,  Akitoshi Tanimoto

IPC分类号： H01L23/28 ,  G03F7/20 ,  G03F7/004

CPC分类号： H01L21/312 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/40 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/563 ,  H01L21/76801 ,  H01L21/76802 ,  H01L23/293 ,  H01L23/525 ,  H01L23/5329 ,  H01L24/13 ,  H01L2224/10126 ,  H01L2224/73104 ,  H01L2224/73203 ,  H01L2924/01004 ,  H01L2924/01009 ,  H01L2924/01011 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01016 ,  H01L2924/01019 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01079 ,  H01L2924/10253 ,  H01L2924/30105 ,  H01L2924/3011 ,  H01L2924/00

摘要： The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.

摘要翻译： 本发明的正性感光性组合物包括具有酚羟基的碱溶性树脂，通过光产生酸的化合物，热交联剂和丙烯酸树脂。 可以提供可以用碱性水溶液显影的正色调感光组合物，具有足够高的灵敏度和分辨率，并且可以形成具有优异的粘合性和耐热冲击性的抗蚀剂图案。

公开(公告)号：US20110204528A1

公开(公告)日：2011-08-25

申请号：US13060763

申请日：2009-09-02

申请人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Ken Nanaumi

发明人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Ken Nanaumi

IPC分类号： H01L23/28 ,  G03F7/004 ,  G03F7/20 ,  H01L23/58

CPC分类号： G03F7/0233 ,  G03F7/0045 ,  G03F7/40 ,  H01L2224/13

摘要： A positive tone photosensitive composition comprising: (A) an alkali-soluble resin having a phenolic hydroxyl group; (B) a phenol resin modified by a compound having an unsaturated hydrocarbon group containing 4 to 100 carbon atoms; (C) a compound that generates an acid by the action of light; (D) a thermal cross-linker that crosslinks the ingredient (A) and the ingredient (B) by heating; and (E) a solvent.

摘要翻译： 一种正性感光性组合物，其含有：（A）具有酚性羟基的碱溶性树脂; （B）由具有4〜100个碳原子的不饱和烃基的化合物改性的酚醛树脂; （C）通过光的作用产生酸的化合物; （D）通过加热交联成分（A）和成分（B）的热交联剂; 和（E）溶剂。

公开(公告)号：US08426985B2

公开(公告)日：2013-04-23

申请号：US13060763

申请日：2009-09-02

申请人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Ken Nanaumi

发明人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Ken Nanaumi

IPC分类号： H01L23/52 ,  H01L23/48 ,  H01L29/40

CPC分类号： G03F7/0233 ,  G03F7/0045 ,  G03F7/40 ,  H01L2224/13

摘要： A positive tone photosensitive composition comprising: (A) an alkali-soluble resin having a phenolic hydroxyl group; (B) a phenol resin modified by a compound having an unsaturated hydrocarbon group containing 4 to 100 carbon atoms; (C) a compound that generates an acid by the action of light; (D) a thermal cross-linker that crosslinks the ingredient (A) and the ingredient (B) by heating; and (E) a solvent.

摘要翻译： 一种正性感光性组合物，其含有：（A）具有酚性羟基的碱溶性树脂; （B）由具有4〜100个碳原子的不饱和烃基的化合物改性的酚醛树脂; （C）通过光的作用产生酸的化合物; （D）通过加热交联成分（A）和成分（B）的热交联剂; 和（E）溶剂。

公开(公告)号：US09786576B2

公开(公告)日：2017-10-10

申请号：US12741854

申请日：2008-11-07

申请人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Ken Nanaumi

发明人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Ken Nanaumi

IPC分类号： B32B3/30 ,  G03F7/20 ,  G03F7/004 ,  H01L23/31 ,  G03F7/023 ,  G03F7/40 ,  H01L23/00

CPC分类号： H01L23/3171 ,  G03F7/0236 ,  G03F7/40 ,  H01L23/3114 ,  H01L24/13 ,  H01L2224/05001 ,  H01L2224/05008 ,  H01L2224/05022 ,  H01L2224/05024 ,  H01L2224/05124 ,  H01L2224/05572 ,  H01L2224/056 ,  H01L2924/10253 ,  H01L2924/15788 ,  H01L2924/181 ,  Y10T428/24479 ,  H01L2924/00 ,  H01L2924/00014

摘要： A positive-type photosensitive resin composition includes (A) a phenol resin modified by a compound having an unsaturated hydrocarbon group having 4 to 100 carbon atoms; (B) a compound that produces an acid by light; (C) a thermal crosslinking agent; and (D) a solvent. The positive-type photosensitive resin composition according to the present invention can be developed by an alkaline aqueous solution, and an effect thereof is that a resist pattern having sufficiently high sensitivity and resolution, excellent adhesion, and good thermal shock resistance can be formed.

公开(公告)号：US20110250396A1

公开(公告)日：2011-10-13

申请号：US12741854

申请日：2008-11-07

申请人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Ken Nanaumi

发明人： Hiroshi Matsutani ,  Takumi Ueno ,  Alexandre Nicolas ,  Ken Nanaumi

IPC分类号： B32B3/30 ,  G03F7/20 ,  G03F7/004

CPC分类号： H01L23/3171 ,  G03F7/0236 ,  G03F7/40 ,  H01L23/3114 ,  H01L24/13 ,  H01L2224/05001 ,  H01L2224/05008 ,  H01L2224/05022 ,  H01L2224/05024 ,  H01L2224/05124 ,  H01L2224/05572 ,  H01L2224/056 ,  H01L2924/10253 ,  H01L2924/15788 ,  H01L2924/181 ,  Y10T428/24479 ,  H01L2924/00 ,  H01L2924/00014

摘要： A positive-type photosensitive resin composition includes (A) a phenol resin modified by a compound having an unsaturated hydrocarbon group having 4 to 100 carbon atoms; (B) a compound that produces an acid by light; (C) a thermal crosslinking agent; and (D) a solvent. The positive-type photosensitive resin composition according to the present invention can be developed by an alkaline aqueous solution, and an effect thereof is that a resist pattern having sufficiently high sensitivity and resolution, excellent adhesion, and good thermal shock resistance can be formed.

摘要翻译： 正型感光性树脂组合物包含（A）通过具有4〜100个碳原子的不饱和烃基的化合物改性的酚醛树脂; （B）通过光产生酸的化合物; （C）热交联剂; 和（D）溶剂。 根据本发明的正型感光性树脂组合物可以通过碱性水溶液显影，其效果是可以形成具有足够高的灵敏度和分辨率，优异的粘附性和良好的耐热冲击性的抗蚀剂图案。

公开(公告)号：US08836089B2

公开(公告)日：2014-09-16

申请号：US13823260

申请日：2011-09-02

申请人： Akitoshi Tanimoto ,  Shigeru Nobe ,  Kei Kasuya ,  Hiroshi Matsutani ,  Takumi Ueno ,  Yu Aoki ,  Shingo Tahara

发明人： Akitoshi Tanimoto ,  Shigeru Nobe ,  Kei Kasuya ,  Hiroshi Matsutani ,  Takumi Ueno ,  Yu Aoki ,  Shingo Tahara

IPC分类号： H01L23/29 ,  H01L21/47 ,  G03F7/075 ,  G03F7/039 ,  G03F7/40 ,  G03F7/022

CPC分类号： G03F7/039 ,  G03F7/0226 ,  G03F7/0751 ,  G03F7/40 ,  H01L2224/11

摘要： The positive-type photosensitive resin composition according to the present invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound that produces an acid by light, a thermal crosslinking agent, and a silane compound having at least one functional group selected from an epoxy group and a sulfide group.

摘要翻译： 根据本发明的正型感光性树脂组合物包含具有酚羟基的碱溶性树脂，通过光产生酸的化合物，热交联剂和具有至少一个选自以下的官能团的硅烷化合物： 环氧基和硫醚基。

公开(公告)号：US20130168859A1

公开(公告)日：2013-07-04

申请号：US13823260

申请日：2011-09-02

申请人： Akitoshi Tanimoto ,  Shigeru Nobe ,  Kei Kasuya ,  Hiroshi Matsutani ,  Takumi Ueno ,  Yu Aoki ,  Shingo Tahara

发明人： Akitoshi Tanimoto ,  Shigeru Nobe ,  Kei Kasuya ,  Hiroshi Matsutani ,  Takumi Ueno ,  Yu Aoki ,  Shingo Tahara

IPC分类号： G03F7/039

CPC分类号： G03F7/039 ,  G03F7/0226 ,  G03F7/0751 ,  G03F7/40 ,  H01L2224/11

摘要： The positive-type photosensitive resin composition according to the present invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound that produces an acid by light, a thermal crosslinking agent, and a silane compound having at least one functional group selected from an epoxy group and a sulfide group.

摘要翻译： 根据本发明的正型感光性树脂组合物包含具有酚羟基的碱溶性树脂，通过光产生酸的化合物，热交联剂和具有至少一个选自以下的官能团的硅烷化合物： 环氧基和硫醚基。

公开(公告)号：US07638254B2

公开(公告)日：2009-12-29

申请号：US12207958

申请日：2008-09-10

申请人： Takashi Hattori ,  Yasuharu Murakami ,  Hiroshi Matsutani ,  Masayuki Ooe ,  Hajime Nakano

发明人： Takashi Hattori ,  Yasuharu Murakami ,  Hiroshi Matsutani ,  Masayuki Ooe ,  Hajime Nakano

IPC分类号： G03F7/023

CPC分类号： G03F7/0233

摘要： Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the composition is cured by a low-temperature process at equal to or lower than 280° C., as well as low water absorption and capability to give a pattern with favorable configuration. The positive photosensitive resin composition contains: (a) alkaline aqueous solution-soluble polyamide having a polyoxazole precursor structure; (b) an o-quinonediazide compound; and (c) a latent acid generator which generates acid upon heating. The composition optionally further contains (d) a compound having a phenolic hydroxyl group or (e) a solvent.

摘要翻译： 提供一种正型感光性树脂组合物，其不仅在优异的感光度，分辨率和粘附性方面有优势，而且即使当组合物在低于280℃等温或低于280℃的温度下固化时也具有优异的耐热性，因为 以及低吸水率和赋予有利构造的图案的能力。 正型感光性树脂组合物含有：（a）具有聚恶唑前体结构的碱性水溶性溶液性聚酰胺; （b）邻醌二叠氮化合物; 和（c）在加热时产生酸的潜酸产生剂。 组合物任选地还包含（d）具有酚羟基的化合物或（e）溶剂。

公开(公告)号：US06238628B1

公开(公告)日：2001-05-29

申请号：US08998052

申请日：1997-12-24

申请人： Hiroshi Matsutani

发明人： Hiroshi Matsutani

IPC分类号： B01D5370

CPC分类号： B01D53/1456 ,  B01D53/70 ,  B01D2257/2064 ,  B01D2259/804 ,  B01J19/123 ,  B01J19/245 ,  B01J2219/00139 ,  B01J2219/00177 ,  B01J2219/00777 ,  B01J2219/185 ,  C02F1/281 ,  C02F1/32 ,  C02F2101/322 ,  C02F2101/36

摘要： A photolytic device for breaking down organic chlorine compounds, such as trichloroethylene and tetrachloroethylene, in a fluid includes a first reaction chamber, a second reaction chamber, and an acid component absorption column. The first reaction chamber and the second reaction chamber are connected in series, and the second reaction chamber and the acid component absorption column are connected in series. The first reaction chamber is a perfect mixing type chamber, and the second reaction chamber is an imperfect mixing type chamber. The first reaction chamber and the second reaction chamber each have an ultraviolet light source capable of emitting light of wavelength 300 nm or less.

摘要翻译： 在流体中分解有机氯化合物如三氯乙烯和四氯乙烯的光解装置包括第一反应室，第二反应室和酸组分吸收塔。 第一反应室和第二反应室串联连接，第二反应室和酸成分吸收塔串联连接。 第一反应室是完美的混合型室，第二反应室是不完美的混合型室。 第一反应室和第二反应室各自具有能够发射波长为300nm以下的光的紫外光源。