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    Apparatuses and methods for atomic layer deposition
    1.
    发明授权
    Apparatuses and methods for atomic layer deposition 有权
    用于原子层沉积的装置和方法

    公开(公告)号：US08747556B2

    公开(公告)日：2014-06-10

    申请号：US13618741

    申请日：2012-09-14

    申请人： Hyman W. H. Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong Yuan ,  Hougong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    发明人： Hyman W. H. Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong Yuan ,  Hougong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    IPC分类号： C23C16/455 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

    CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/4558 ,  H01J37/32449 ,  Y10T137/87265

    摘要： Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel.

    摘要翻译： 本发明的实施例提供了诸如等离子体增强型ALD（PE-ALD）的原子层沉积（ALD）的装置和方法。 在一些实施例中，提供了一种PE-ALD室，其包括与其中具有基板支撑件的室主体耦合的室盖组件。 在一个实施例中，室盖组件具有入口歧管组件，其包含围绕集中通道的环形通道，其中集中通道延伸穿过入口歧管组件，并且入口歧管组件还包含从环形通道延伸的注入孔， 集中通道侧壁，集中通道。 腔室盖组件还包括设置在入口歧管组件下方的喷头组件，设置在入口歧管组件和喷头组件之间的水箱，以及设置在入口歧管组件上方并与入口歧管组件耦合的远程等离子体系统（RPS） 与集中通道的流体通信。

    APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
    3.
    发明申请
    APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION 有权
    用于原子层沉积的装置和方法

    公开(公告)号：US20130008984A1

    公开(公告)日：2013-01-10

    申请号：US13618741

    申请日：2012-09-14

    申请人： Hyman Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong (John) Yuan ,  Hou Gong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    发明人： Hyman Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong (John) Yuan ,  Hou Gong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    IPC分类号： C23C16/455

    CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/4558 ,  H01J37/32449 ,  Y10T137/87265

    摘要： Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel.

    摘要翻译： 本发明的实施例提供了诸如等离子体增强型ALD（PE-ALD）的原子层沉积（ALD）的装置和方法。 在一些实施例中，提供了一种PE-ALD室，其包括与其中具有基板支撑件的室主体耦合的室盖组件。 在一个实施例中，室盖组件具有入口歧管组件，其包含围绕集中通道的环形通道，其中集中通道延伸穿过入口歧管组件，并且入口歧管组件还包含从环形通道延伸的注入孔， 集中通道侧壁，集中通道。 室盖组件还包括布置在入口歧管组件下方的喷头组件，设置在入口歧管组件和喷头组件之间的水箱，以及设置在入口歧管组件上方并与入口歧管组件耦合的远程等离子体系统（RPS） 与集中通道的流体通信。

    Apparatuses and methods for atomic layer deposition
    4.
    发明授权
    Apparatuses and methods for atomic layer deposition 有权
    用于原子层沉积的装置和方法

    公开(公告)号：US08291857B2

    公开(公告)日：2012-10-23

    申请号：US12494901

    申请日：2009-06-30

    申请人： Hyman Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong (John) Yuan ,  Hou Gong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    发明人： Hyman Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong (John) Yuan ,  Hou Gong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    IPC分类号： C23C16/452 ,  C23C16/455 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

    CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/4558 ,  H01J37/32449 ,  Y10T137/87265

    摘要： Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel.

    摘要翻译： 本发明的实施例提供了诸如等离子体增强型ALD（PE-ALD）的原子层沉积（ALD）的装置和方法。 在一些实施例中，提供了一种PE-ALD室，其包括与其中具有基板支撑件的室主体耦合的室盖组件。 在一个实施例中，室盖组件具有入口歧管组件，其包含围绕集中通道的环形通道，其中集中通道延伸穿过入口歧管组件，并且入口歧管组件还包含从环形通道延伸的注入孔， 集中通道侧壁，集中通道。 腔室盖组件还包括设置在入口歧管组件下方的喷头组件，设置在入口歧管组件和喷头组件之间的水箱，以及设置在入口歧管组件上方并与入口歧管组件耦合的远程等离子体系统（RPS） 与集中通道的流体通信。

    APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
    5.
    发明申请
    APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION 有权
    用于原子层沉积的装置和方法

    公开(公告)号：US20100003406A1

    公开(公告)日：2010-01-07

    申请号：US12494901

    申请日：2009-06-30

    申请人： Hyman Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong (John) Yuan ,  Hou Gong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    发明人： Hyman Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong (John) Yuan ,  Hou Gong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    IPC分类号： C23C16/34

    CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/4558 ,  H01J37/32449 ,  Y10T137/87265

    摘要： Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel.

    摘要翻译： 本发明的实施例提供了诸如等离子体增强型ALD（PE-ALD）的原子层沉积（ALD）的装置和方法。 在一些实施例中，提供了一种PE-ALD室，其包括与其中具有基板支撑件的室主体耦合的室盖组件。 在一个实施例中，室盖组件具有入口歧管组件，其包含围绕集中通道的环形通道，其中集中通道延伸穿过入口歧管组件，并且入口歧管组件还包含从环形通道延伸的注入孔， 集中通道侧壁，集中通道。 腔室盖组件还包括设置在入口歧管组件下方的喷头组件，设置在入口歧管组件和喷头组件之间的水箱，以及设置在入口歧管组件上方并与入口歧管组件耦合的远程等离子体系统（RPS） 与集中通道的流体通信。

    APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION
    6.
    发明申请
    APPARATUSES AND METHODS FOR ATOMIC LAYER DEPOSITION 有权
    用于原子层沉积的装置和方法

    公开(公告)号：US20120000422A1

    公开(公告)日：2012-01-05

    申请号：US13232317

    申请日：2011-09-14

    申请人： Hyman Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong (John) Yuan ,  Hou Gong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    发明人： Hyman Lam ,  Bo Zheng ,  Hua Ai ,  Michael Jackson ,  Xiaoxiong (John) Yuan ,  Hou Gong Wang ,  Salvador P. Umotoy ,  Sang Ho Yu

    IPC分类号： C23C16/455 ,  F17D1/20

    CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/4558 ,  H01J37/32449 ,  Y10T137/87265

    摘要： Embodiments of the invention provide apparatuses and methods for atomic layer deposition (ALD), such as plasma-enhanced ALD (PE-ALD). In some embodiments, a PE-ALD chamber is provided which includes a chamber lid assembly coupled with a chamber body having a substrate support therein. In one embodiment, the chamber lid assembly has an inlet manifold assembly containing an annular channel encompassing a centralized channel, wherein the centralized channel extends through the inlet manifold assembly, and the inlet manifold assembly further contains injection holes extending from the annular channel, through a sidewall of the centralized channel, and to the centralized channel. The chamber lid assembly further contains a showerhead assembly disposed below the inlet manifold assembly, a water box disposed between the inlet manifold assembly and the showerhead assembly, and a remote plasma system (RPS) disposed above and coupled with the inlet manifold assembly, and in fluid communication with the centralized channel.

    摘要翻译： 本发明的实施例提供了诸如等离子体增强型ALD（PE-ALD）的原子层沉积（ALD）的装置和方法。 在一些实施例中，提供了一种PE-ALD室，其包括与其中具有基板支撑件的室主体耦合的室盖组件。 在一个实施例中，室盖组件具有入口歧管组件，其包含围绕集中通道的环形通道，其中集中通道延伸穿过入口歧管组件，并且入口歧管组件还包含从环形通道延伸的注入孔， 集中通道侧壁，集中通道。 腔室盖组件还包括设置在入口歧管组件下方的喷头组件，设置在入口歧管组件和喷头组件之间的水箱，以及设置在入口歧管组件上方并与入口歧管组件耦合的远程等离子体系统（RPS） 与集中通道的流体通信。

    System and Method for Automated Testing of Complicated Dialog Systems
    9.
    发明申请
    System and Method for Automated Testing of Complicated Dialog Systems 有权
    复杂对话系统自动测试的系统和方法

    公开(公告)号：US20090306995A1

    公开(公告)日：2009-12-10

    申请号：US12133123

    申请日：2008-06-04

    申请人： Fuliang Weng ,  Hua Ai

    发明人： Fuliang Weng ,  Hua Ai

    IPC分类号： G06Q10/00 ,  G10L15/26 ,  G10L15/00

    CPC分类号： G10L15/01 ,  G06Q10/103

    摘要： Embodiments of an automated dialog system testing method and component are described. This automated testing method and system supplements real human-based testing with simulated user input and incorporates a set of evaluation measures that focus on three basic aspects of task-oriented dialog systems, namely, understanding ability, efficiency, and the appropriateness of system actions. These measures are first applied on a corpus generated between a dialog system and a group of human users to demonstrate the validity of these measures with the human users' satisfaction levels. Results generally show that these measures are significantly correlated with these satisfaction levels. A regression model is then built to predict the user satisfaction scores using these evaluation measures. The regression model is applied on a simulated dialog corpus trained from the above real user corpus, and show that the user satisfaction score estimated from the simulated dialogs do not significantly differ from the real users' satisfaction scores. These evaluation measures can then be used to assess the system performance based on the estimated user satisfaction.

    摘要翻译： 描述了自动对话系统测试方法和组件的实施例。 这种自动测试方法和系统通过模拟用户输入来补充真正的基于人力的测试，并结合了一套关注面向任务的对话系统的三个基本方面的评估措施，即理解能力，效率和系统操作的适用性。 这些措施首先应用于对话系统和一组人类用户之间产生的语料库，以显示这些措施与人类用户满意度的有效性。 结果一般表明，这些措施与这些满意度水平显着相关。 然后建立回归模型，以使用这些评估措施来预测用户满意度评分。 回归模型应用于从上述真实用户语料库训练的模拟对话语料库，并显示从模拟对话框估计的用户满意度评分与实际用户满意度得分无显着差异。 这些评估措施可以用于根据估计的用户满意度来评估系统性能。