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公开(公告)号：US20100013079A1
公开(公告)日：2010-01-21
申请号：US12504209
申请日：2009-07-16
申请人： In-Sik Cho , Yong-Kwan Lee , Cheol-Joon Yoo
发明人： In-Sik Cho , Yong-Kwan Lee , Cheol-Joon Yoo
IPC分类号： H01L23/28
CPC分类号： H01L21/561 , H01L21/565 , H01L23/3121 , H01L2924/0002 , H01L2924/00
摘要： A package substrate may include an insulating substrate, a circuit pattern and a mold gate pattern. The insulating pattern may have a mold gate region through which a molding member may pass. The circuit pattern may be formed on the insulating substrate. The mold gate pattern may be formed on the mold gate region of the insulating substrate. The mold gate pattern may include a polymer having relatively strong adhesion strength with respect to the insulating substrate and relatively weak adhesion strength with respect to the molding member. Thus, costs of the package substrate and the semiconductor package may be decreased.
摘要翻译： 封装基板可以包括绝缘基板，电路图案和模具浇口图案。 绝缘图案可以具有模制浇口区域，模制构件可以通过该模具浇口区域。 电路图案可以形成在绝缘基板上。 模具栅极图案可以形成在绝缘基板的模具栅极区域上。 模具浇口图案可以包括相对于绝缘基板具有相对较强的粘合强度的聚合物和相对于模制构件的相对弱的粘附强度。 因此，可以降低封装衬底和半导体封装的成本。
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2.发明授权公开(公告)号：US09041180B2
公开(公告)日：2015-05-26
申请号：US14295577
申请日：2014-06-04
申请人： Yong-Kwan Lee
发明人： Yong-Kwan Lee
CPC分类号： H01L23/564 , H01L23/3128 , H01L23/562 , H01L24/16 , H01L24/32 , H01L24/48 , H01L24/70 , H01L24/73 , H01L24/89 , H01L25/105 , H01L25/50 , H01L2224/16225 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2225/1023 , H01L2225/1058 , H01L2225/1088 , H01L2924/00014 , H01L2924/12042 , H01L2924/15311 , H01L2924/15331 , H01L2924/181 , H01L2924/18161 , H01L2924/3511 , H01L2924/00012 , H01L2924/00 , H01L2224/45099
摘要： The stack package includes a first semiconductor package and a second semiconductor package. The first semiconductor package includes a first substrate having a first modulus and at least one semiconductor chip mounted on the first substrate. The second semiconductor package stacked on the first semiconductor package and includes a second substrate having a second modulus and at least one semiconductor chip mounted on the second substrate. The second modulus is less than the first modulus. Even in the event that the first semiconductor package is under severe warpage due to a temperature change, the flexible second substrate, which includes e.g., polyimide or poly ethylene terephthalate, of the second semiconductor package may be less sensitive to the temperature change, thereby improving reliability of the stack package.
摘要翻译： 堆叠封装包括第一半导体封装和第二半导体封装。 第一半导体封装包括具有第一模数的第一衬底和安装在第一衬底上的至少一个半导体芯片。 第二半导体封装堆叠在第一半导体封装上并且包括具有第二模量的第二衬底和安装在第二衬底上的至少一个半导体芯片。 第二模量小于第一模数。 即使第一半导体封装由于温度变化而处于严重翘曲的情况下，第二半导体封装的包括例如聚酰亚胺或聚对苯二甲酸乙二醇酯的柔性第二衬底对温度变化可能较不敏感，从而改善 堆栈包的可靠性。
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公开(公告)号：US08035056B2
公开(公告)日：2011-10-11
申请号：US12111903
申请日：2008-04-29
申请人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
IPC分类号： B23K10/00
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, comprising: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译： 等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 向处理室供给处理气体的气体供给装置; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有 开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。
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公开(公告)号：US20050017201A1
公开(公告)日：2005-01-27
申请号：US10892259
申请日：2004-07-14
申请人： Gi-Chung Kwon , Hong-Young Chang , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Hong-Young Chang , Yong-Kwan Lee
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/321
摘要： A hybrid coupled plasma type apparatus includes: a chamber having a gas-injecting unit; an electrostatic chuck in the chamber; an insulating plate over the gas-injecting unit; a high frequency generator; an impedance matching circuit connected to the high frequency generator; first and second antennas connected to the impedance matching circuit in parallel, a power of the high frequency generator being supplied to the first and second antennas; an electrode of a plate shape connected to one of the first and second antennas in serial, the power of the high frequency generator being supplied to the electrode; and a power distributor between the high frequency generator and one of the first and second antennas.
摘要翻译： 混合耦合等离子体型装置包括：具有气体注入单元的室; 腔室中的静电卡盘; 气体注入单元上的绝缘板; 高频发生器; 连接到高频发生器的阻抗匹配电路; 第一和第二天线并联连接到阻抗匹配电路，高频发生器的功率被提供给第一和第二天线; 连接到第一和第二天线中的一个的板状电极，高频发生器的功率被提供给电极; 以及高频发生器与第一和第二天线之一之间的功率分配器。
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公开(公告)号：US07442273B2
公开(公告)日：2008-10-28
申请号：US10892259
申请日：2004-07-14
申请人： Gi-Chung Kwon , Hong-Young Chang , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Hong-Young Chang , Yong-Kwan Lee
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/321
摘要： A hybrid coupled plasma type apparatus includes: a chamber having a gas-injecting unit; an electrostatic chuck in the chamber; an insulating plate over the gas-injecting unit; a high frequency generator; an impedance matching circuit connected to the high frequency generator; first and second antennas connected to the impedance matching circuit in parallel, a power of the high frequency generator being supplied to the first and second antennas; an electrode of a plate shape connected to one of the first and second antennas in serial, the power of the high frequency generator being supplied to the electrode; and a power distributor between the high frequency generator and one of the first and second antennas.
摘要翻译： 混合耦合等离子体型装置包括：具有气体注入单元的室; 腔室中的静电卡盘; 气体注入单元上的绝缘板; 高频发生器; 连接到高频发生器的阻抗匹配电路; 第一和第二天线并联连接到阻抗匹配电路，高频发生器的功率被提供给第一和第二天线; 连接到第一和第二天线中的一个的板状电极，高频发生器的功率被提供给电极; 以及高频发生器与第一和第二天线之一之间的功率分配器。
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公开(公告)号：US07411148B2
公开(公告)日：2008-08-12
申请号：US11356947
申请日：2006-02-16
申请人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supplier supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, including: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译： 等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 供应处理气体的气体供应器; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有 开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。
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7.发明申请公开(公告)号：US20060255471A1
公开(公告)日：2006-11-16
申请号：US11404756
申请日：2006-04-17
申请人： Yong-Kwan Lee , Tae-Duk Nam
发明人： Yong-Kwan Lee , Tae-Duk Nam
IPC分类号： H01L23/48
CPC分类号： H01L23/562 , H01L23/4334 , H01L24/48 , H01L2224/05599 , H01L2224/16 , H01L2224/32225 , H01L2224/45099 , H01L2224/4824 , H01L2224/73215 , H01L2224/73253 , H01L2224/85399 , H01L2924/00014 , H01L2924/15311 , H01L2924/181 , H01L2924/00 , H01L2924/00012 , H01L2224/45015 , H01L2924/207
摘要： The flip chip package includes a semiconductor chip electrically connected to a circuit substrate. A protective cap is disposed over the semiconductor chip, and includes at least one portion extending beyond an edge of the semiconductor chip.
摘要翻译： 倒装芯片封装包括电连接到电路基板的半导体芯片。 保护帽设置在半导体芯片的上方，并且包括延伸超出半导体芯片的边缘的至少一个部分。
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公开(公告)号：US06288493B1
公开(公告)日：2001-09-11
申请号：US09562902
申请日：2000-05-02
申请人： Yong-Kwan Lee , Nam-Sik Yoon , Sung-Sik Kim , Pyung-Woo Lee , Hong-Young Chang
发明人： Yong-Kwan Lee , Nam-Sik Yoon , Sung-Sik Kim , Pyung-Woo Lee , Hong-Young Chang
IPC分类号： H05H124
CPC分类号： H01J37/321 , H05H1/46
摘要： The invention relates to an antenna device of a low impedance for generating a large quantity of inductively coupled plasma to process a large size of a specimen with adjustment for a uniform distribution in the density of plasma, comprising: a high frequency power source; a first antenna for receiving the high frequency power supplied from the high frequency power source; and a second antenna connected in parallel with the first antenna for receiving the high frequency power supplied from the high frequency power source, wherein a resonant state is kept between the first and second antennas.
摘要翻译： 本发明涉及一种用于产生大量电感耦合等离子体的低阻抗天线装置，用于对等离子体密度进行调整以调整大尺寸样品，包括：高频电源; 用于接收从高频电源提供的高频电力的第一天线; 以及与第一天线并联连接的第二天线，用于接收从高频电源提供的高频电力，其中谐振状态保持在第一和第二天线之间。
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公开(公告)号：US20060191880A1
公开(公告)日：2006-08-31
申请号：US11356947
申请日：2006-02-16
申请人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
发明人： Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
CPC分类号： H01J37/32935 , H01J37/321 , H05H1/46
摘要： A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, comprising: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
摘要翻译： 等离子体产生装置包括：具有室盖并限定气密反应区域的室; 室内的一个感受器; 向处理室供给处理气体的气体供给装置; 以及相对于所述基座通过所述室盖垂直设置的环形芯，包括：与所述室结合的环形铁磁芯，所述环形铁磁芯具有在所述室外部的第一部分和所述室内的第二部分，所述第二部分具有 开口部; 连接到所述室的射频（RF）电源; 感应线圈，其电连接到所述RF电源，所述感应线圈滚动所述第一部分; 以及与RF电源和感应线圈之间的阻抗匹配的匹配电路。
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公开(公告)号：US07088047B2
公开(公告)日：2006-08-08
申请号：US11043207
申请日：2005-01-26
申请人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
发明人： Yong-Kwan Lee , Won-Bong Jung , Sang-Won Lee , Sae-Hoon Uhm , Dong-Seok Lee
CPC分类号： H01J37/321 , H05H1/46
摘要： An inductively coupled plasma generator having a lower aspect ratio reaction gas, comprising a chamber having a gas inlet through which a reaction gas is supplied, a vacuum pump for maintaining the inside of the chamber vacuum and a gas outlet for exhausting the reaction gas after completion of the reaction, a chuck for mounting a target material to be processed inside the chamber, and an antenna to which high-frequency power is applied, the antenna provided at the upper and lateral portions of the chamber, wherein the antenna has parallel antenna elements in which a discharge of a high frequency can be allowed and impedance is low to ensure a low electron temperature, the antenna is disposed such that a powered end of each of the antenna elements and a ground end of each of the antenna elements opposite to the powered end are symmetrical in view of the center of an imaginary circle formed by the antenna to establish rotation symmetry of plasma density profiles, the antenna elements are twisted in a helical manner, and the powered end of each of the antenna elements is positioned to be far from the chamber and the ground end of each of the antenna elements is positioned to be close to the chamber, thereby compensating for a drop in the plasma density due to ion loss occurring at the powered end.
摘要翻译： 一种具有较低纵横比的反应气体的电感耦合等离子体发生器，包括具有供应反应气体的气体入口的室，用于维持室内真空的真空泵和用于在完成后排出反应气体的气体出口 的反应，用于在室内安装待处理的目标材料的卡盘以及设置在室的上部和外侧部分处的高频电力的天线，其中天线具有平行的天线元件 其中可以允许高频放电并且阻抗低以确保低电子温度，天线被布置成使得每个天线元件的动力端和每个天线元件的接地端与 鉴于由天线形成的假想圆的中心，以建立等离子体密度分布的旋转对称性，动力端对称，天线元件ar e以螺旋方式扭绞，并且每个天线元件的动力端定位成远离腔室，并且每个天线元件的接地端被定位成靠近腔室，从而补偿了下降 由于在动力端发生离子损失引起的等离子体密度。
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