Electrical testing apparatus with lateral movement of a probe support substrate

    公开(公告)号:US11073538B2

    公开(公告)日:2021-07-27

    申请号:US15861597

    申请日:2018-01-03

    申请人: Intel Corporation

    IPC分类号: G01R1/073 G01R1/067 H01L21/00

    摘要: An electrical-test apparatus is provided, which includes a plurality of tester interconnect structures cantilevered from a first side of a substrate. A base may be coupled to a second side of the substrate via one or more interconnect layers. The tester interconnect structures may contact corresponding interconnect structures of a device under test (DUT). In an example, the substrate is laterally movable relative to the DUT along a plane of the substrate, upon contact between the tester interconnect structures and the interconnect structures of the DUT.

    Slip-plane MEMS probe for high-density and fine pitch interconnects

    公开(公告)号:US10935573B2

    公开(公告)日:2021-03-02

    申请号:US16145571

    申请日:2018-09-28

    申请人: Intel Corporation

    摘要: A device probe includes a primary probe arm and a subsequent probe arm with a slip plane spacing between the primary probe arm and subsequent probe arm. Each probe arm is integrally part of a probe base that is attachable to a probe card. During probe use on a semiconductive device or a semiconductor device package substrate, overtravel of the probe tip allows the primary and subsequent probe arms to deflect, while sufficient resistance to deflection creates a useful contact with an electrical structure such as an electrical bump or a bond pad.

    Dual-sided socket device with corrugation structures and shield structures

    公开(公告)号:US12009612B2

    公开(公告)日:2024-06-11

    申请号:US17032587

    申请日:2020-09-25

    申请人: Intel Corporation

    IPC分类号: H01R13/11 H05K1/02 H05K9/00

    摘要: Techniques and mechanisms for coupling packaged devices with a socket device. In an embodiment, the socket device comprises a socket body structure and conductors extending therethrough. A pitch of the conductors is in a range of between 0.1 millimeters (mm) and 3 mm. First and second metallization structures also extend, respectively, from opposite respective sides of the socket body structure. In the socket body structure, a conductive shield structure, electrically coupled to the first and second metallization structures, substantially extends around one of the conductors. For each of the first and second metallization structures, a vertical span of the metallization structure is in a range of between 0.05 mm and 2.0 mm, a portion of a side of the metallization structure forms a respective corrugation structure, and a horizontal span of the portion is at least 5% of the vertical span of the metallization structure.

    ADDITIVELY MANUFACTURED STRUCTURES FOR HEAT DISSIPATION FROM INTEGRATED CIRCUIT DEVICES

    公开(公告)号:US20210407884A1

    公开(公告)日:2021-12-30

    申请号:US16912432

    申请日:2020-06-25

    申请人: Intel Corporation

    摘要: An integrated circuit assembly may be fabricated to include an integrated circuit device having a backside surface and a backside metallization layer on the backside surface of the integrated circuit device, wherein the backside metallization layer comprises a bond layer on the backside surface of the integrated circuit device, a high thermal conductivity layer on the bond layer, and a cap layer on the high thermal conductivity layer. The bond layer may be a layered stack comprising an adhesion promotion layer on the backside of the integrated circuit device and at one least metal layer. The high thermal conductivity layer may be an additively deposited material having a thermal conductivity greater than silicon, such as copper, silver, aluminum, diamond, silicon carbide, boron nitride, aluminum nitride, and combinations thereof.

    Conformable heat spreader
    8.
    发明授权

    公开(公告)号:US10566263B2

    公开(公告)日:2020-02-18

    申请号:US15718337

    申请日:2017-09-28

    申请人: Intel Corporation

    IPC分类号: H01L23/427 F28F1/40 G01R31/26

    摘要: A heat spreader apparatus, testing system, method may be used to test an electronic device. The heat spreader may include a hollow housing. The hollow housing may define an interior chamber. The hollow housing may include a contact surface. The heat spreader may include a working fluid. The working fluid may be included in the interior chamber. The hollow housing may be configured to be physically compliant. The hollow housing may be physically compliant such that the hollow housing conforms to the shape of a testing surface in response to an applied pressure. The testing surface may be a top surface of a semiconductor. The testing surface may be curved or otherwise lack uniformity. The hollow housing may conform to the curvature or lack of uniformity of the testing surface such that minimal gaps exist between the hollow housing and the surface.

    Slip-plane MEMs probe for high-density and fine pitch interconnects

    公开(公告)号:US11372023B2

    公开(公告)日:2022-06-28

    申请号:US17174191

    申请日:2021-02-11

    申请人: Intel Corporation

    摘要: A device probe includes a primary probe arm and a subsequent probe arm with a slip plane spacing between the primary probe arm and subsequent probe arm. Each probe arm is integrally part of a probe base that is attachable to a probe card. During probe use on a semiconductive device or a semiconductor device package substrate, overtravel of the probe tip allows the primary and subsequent probe arms to deflect, while sufficient resistance to deflection creates a useful contact with an electrical structure such as an electrical bump or a bond pad.