公开(公告)号：US4491104A

公开(公告)日：1985-01-01

申请号：US398100

申请日：1982-07-14

Applicant: Isao Fujii ,  Hiroyuki Nishimura ,  Masaaki Kato

Inventor： Isao Fujii ,  Hiroyuki Nishimura ,  Masaaki Kato

IPC: F02B1/04 ,  F02B19/10 ,  F02B19/18

CPC classification number: F02B19/1028 ,  F02B1/04 ,  Y02T10/125

Abstract: A torch ignition type internal combustion engine has an auxiliary combustion chamber connected by a torch passage to a compact main combustion chamber. A cavity in the cylinder head forming a part of the main combustion chamber is provided with two intake valves on one side of the cavity and one exhaust valve on the other side. A large squish area is formed between the upper surface of the piston and the lower surface of the cylinder head and one or more suction conduits connect this squish area to the torch passage between its ends. Two torch passages may be provided; one may extend into the cavity near the exhaust valve and the other into the cavity near the remote intake valve. A plug chamber receives the spark plug electrodes and this chamber is in communication with both the auxiliary combustion chamber and the torch passage. In one form of the invention one torch passage extends from the lower end of the auxiliary combustion chamber and the other torch passage extends from the plug chamber.

Abstract translation: 火炬点火型内燃机具有通过炬通道连接到紧凑型主燃烧室的辅助燃烧室。 形成主燃烧室一部分的气缸盖中的空腔在空腔一侧设有两个进气阀，另一侧设有一个排气阀。 在活塞的上表面和气缸盖的下表面之间形成大的挤压区域，并且一个或多个抽吸管道将这个挤压区域连接到其端部之间的割炬通道。 可以提供两个火炬通道; 一个可以延伸到排气门附近的空腔中，另一个延伸到远程进气阀附近的空腔中。 插塞室容纳火花塞电极，该室与辅助燃烧室和割炬通道连通。 在本发明的一种形式中，一个焊炬通道从辅助燃烧室的下端延伸，另一个炬通道从插塞室延伸。

公开(公告)号：US08635886B2

公开(公告)日：2014-01-28

申请号：US13558698

申请日：2012-07-26

Applicant: Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

Inventor： Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

IPC: C03B37/00 ,  C03B20/00

CPC classification number: C03B19/1438 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/40 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/085 ,  C03C4/12 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2203/44

Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Abstract translation: 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

公开(公告)号：US20060183622A1

公开(公告)日：2006-08-17

申请号：US10548237

申请日：2004-03-03

Applicant: Hiroyuki Nishimura ,  Akira Fujinoki

Inventor： Hiroyuki Nishimura ,  Akira Fujinoki

IPC: C03C3/06 ,  C03B37/07 ,  C03B37/075 ,  C03B37/018

CPC classification number: C03B32/00 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  Y02P40/57

Abstract: The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

Abstract translation: 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

公开(公告)号：US20050229898A1

公开(公告)日：2005-10-20

申请号：US11103473

申请日：2005-04-12

Applicant: Takashi Kikutani ,  Hiroyuki Nishimura

Inventor： Takashi Kikutani ,  Hiroyuki Nishimura

IPC: F02M47/00 ,  F02D41/20 ,  F02D41/34 ,  F02D41/38 ,  F02D41/40 ,  F02M47/02 ,  F02M51/00 ,  F02M51/06 ,  F02M63/00 ,  F02M63/02

CPC classification number: F02D41/38 ,  F02D41/20 ,  F02D41/402 ,  F02D2041/201 ,  F02D2041/2031 ,  F02D2041/2055 ,  F02D2041/2082

Abstract: A control device executes an overlap injection operation, in which one of the plurality of injectors is energized first to inject fuel, and a next one of the plurality of injectors is energized to inject fuel after starting of the energization of the one of the plurality of injectors while the one of the plurality of injectors is still kept energized. The control device corrects an energization period of the next one of the injectors by lengthening the energization period of the next one of the injectors in comparison to a normal energization period of the next one of the injectors, which is set for a non-overlap injection operation of the next one of the plurality of injectors.

Abstract translation: 控制装置执行重叠喷射操作，其中多个喷射器中的一个首先被激发以喷射燃料，并且在多个喷射器中的一个的通电开始之后，多个喷射器中的下一个喷射器被激励以喷射燃料 而多个喷射器中的一个仍然保持通电。 控制装置与下一个喷射器的正常通电周期相比，通过延长下一个喷射器的通电周期来校正下一个喷射器的通电周期，该正常通电周期被设置用于非重叠喷射 多个喷射器中的下一个喷射器的操作。

公开(公告)号：US06761951B2

公开(公告)日：2004-07-13

申请号：US10315990

申请日：2002-12-11

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Takayuki Shimakawa

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Takayuki Shimakawa

IPC: B32B300

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57 ,  Y10T428/21 ,  Y10T428/2913

Abstract: A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950° C. each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1×10−6. The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.

Abstract translation: 通过沿着生长方向均匀化具有周期条纹的合成石英玻璃锭获得的具有特定尺寸的圆柱形，无氯合成石英玻璃坯料具有（a）在工作和离轴方向上的条纹等级，其满足美国A级 军事规格MIL-G-174B，（b）工作和离轴方向的平均羟基浓度分别为700〜1,000ppm，（c）工作和离轴方向的平均假想温度为850〜950℃ ，和（d）工作方向上最多为1×10 -6的633nm波长的光的折射率分布。 该空白对激光具有良好的透射率，当用激光照射时几乎不发生劣化，并且特别适用于ArF准分子激光相关应用。

公开(公告)号：US6031238A

公开(公告)日：2000-02-29

申请号：US29451

申请日：1998-02-26

Applicant: Akira Fujinoki ,  Hiroyuki Nishimura ,  Toshiki Mori

Inventor： Akira Fujinoki ,  Hiroyuki Nishimura ,  Toshiki Mori

IPC: G02B13/14 ,  G03F7/20

CPC classification number: G03F7/701 ,  G02B13/14 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70958

Abstract: A known projection aligner for integrated circuit fabrication, in which an integrated circuit pattern image is projected on a wafer, comprises an ArF excimer laser and an optical system composed of groups of quartz glass optical members made of synthetic quartz glass. To provide a projection aligner having optical properties, such as durability, optical transmittance and the like, which are not degraded over a long time of operation and the optical system can be constructed at a low cost as a whole, it is suggested that the optical system comprises a first quartz glass optical member group whose hydrogen molecule concentration is in the range between 1.times.10.sup.17 and 5.times.10.sup.18 molecules/cm.sup.3 and a third quartz glass optical member group whose hydrogen molecule concentration is in the range between 5.times.10.sup.18 to 5.times.10.sup.19 molecules/cm.sup.3.

Abstract translation: PCT No.PCT / EP97 / 03406 Sec。 371日期1998年2月26日 102（e）1998年2月26日PCT 1997年6月30日PCT公布。 出版物WO98 / 00761 日本1998年1月8日在集成电路制造中，集成电路图案投影在晶片上的已知投影对准器包括ArF准分子激光器和由合成石英玻璃制成的石英玻璃光学部件组成的光学系统。 为了提供一种投影对准器，其具有在长时间不劣化的光学性能，例如耐久性，光透射率等，并且光学系统可以以低成本整体构造，因此建议光学 系统包括其氢分子浓度在1×10 17和5×10 18分子/ cm 3之间的第一石英玻璃光学构件组和氢分子浓度在5×1018至5×1019分/ cm 3之间的第三石英玻璃光学构件组。

公开(公告)号：US5859162A

公开(公告)日：1999-01-12

申请号：US604456

申请日：1996-02-21

Applicant: Shigeyuki Yamamoto ,  Hiroyuki Nishimura ,  Hiroshi Adachi

Inventor： Shigeyuki Yamamoto ,  Hiroyuki Nishimura ,  Hiroshi Adachi

IPC: C08L83/04 ,  C07F7/21 ,  C08G77/12 ,  C08G77/14 ,  C08G77/22 ,  C08G77/34 ,  H01L21/312 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532 ,  C08G77/06

CPC classification number: C08G77/34 ,  C07F7/21 ,  C08G77/12 ,  H01L23/5329 ,  H01L2924/0002

Abstract: A high-purity silicone ladder polymer of high molecular weight which contains 1 ppm or less of sodium, potassium, iron, copper, lead, magnesium, manganese and chlorine, and 1 ppb or less of uranium and thorium; and whose polymerization degree is 600 to 10000. Trialkoxysilane compounds or trichlorosilane compounds are hydrolyzed to produce a high-purity silicone ladder prepolymer whose polymerization degree is 5 to 600. The silicone ladder prepolymer is subjected to dehydrative condensation by using a nucleophilic reagent as a catalyst, and then purified in a dissolution/reprecipitation method to yield the silicone ladder polymer.

Abstract translation: 含有1ppm以下钠，钾，铁，铜，铅，镁，锰，氯等1ppm以下铀，钍1ppm以上的高分子量高分子硅酸酯聚合物。 聚合度为600〜10000.将三烷氧基硅烷化合物或三氯硅烷化合物水解，得到聚合度为5〜600的高纯度硅氧烷预聚物。使用亲核试剂作为催化剂使硅树脂预聚物进行脱水缩合 ，然后在溶解/再沉淀法中纯化，得到硅树脂聚合物。

公开(公告)号：US5734414A

公开(公告)日：1998-03-31

申请号：US395097

申请日：1995-02-27

Applicant: Hiroyuki Nishimura ,  Yasuaki Muranaka ,  Hiroyuki Tashiro ,  Takashi Yamaguchi

Inventor： Hiroyuki Nishimura ,  Yasuaki Muranaka ,  Hiroyuki Tashiro ,  Takashi Yamaguchi

IPC: H04N7/14

CPC classification number: H04N7/142

Abstract: A camera unit for an electronic conference is adapted to be set on a monitor, and comprises a stationary support base set on the monitor, a camera unit body provided on said stationary support base so as to be horizontally rotatable, a lens block supported to the camera unit body so as to be vertically rotatable, and a control device incorporated in the camera unit body, for controlling the rotation of the camera unit body and the lens block and the focal distance and zooming ratio of the lens block, the lens block is adapted to be turned between a horizontal position at which the lens block is stored in a recess formed in the camera unit body, and picks up a person in front thereof, and a vertical position at which the lens block is projected forward from the camera unit body so as to pick up a document set therebelow, and the control device controls the focal distance and zooming ratio of the lens block in accordance with a horizontally rotating position of the camera unit body and a vertical rotating position of the lens block.

Abstract translation: 一种用于电子会议的相机单元适于设置在监视器上，并且包括设置在监视器上的固定支撑基座，设置在所述固定支撑基座上以便水平可旋转的照相机单元主体， 相机单元主体以便可垂直旋转;以及控制装置，其结合在相机单元主体中，用于控制相机单元主体和透镜块的旋转以及透镜块的焦距和变焦比，透镜块为 适于在透镜块被存储在形成于相机单元主体中的凹部中的水平位置之间转动，并且拾取其前方的人以及透镜块从相机单元向前突出的垂直位置 从而拾取其下面的文件，并且控制装置根据照相机单元主体的水平旋转位置来控制透镜块的焦距和变焦比，并且 透镜块的垂直旋转位置。

公开(公告)号：US5728630A

公开(公告)日：1998-03-17

申请号：US743190

申请日：1996-11-05

Applicant: Hiroyuki Nishimura ,  Hiroshi Adachi ,  Etsushi Adachi ,  Shigeyuki Yamamoto ,  Shintaro Minami ,  Shigeru Harada ,  Toru Tajima ,  Kimio Hagi

Inventor： Hiroyuki Nishimura ,  Hiroshi Adachi ,  Etsushi Adachi ,  Shigeyuki Yamamoto ,  Shintaro Minami ,  Shigeru Harada ,  Toru Tajima ,  Kimio Hagi

IPC: H01L21/3205 ,  B32B27/08 ,  C08G77/16 ,  H01L21/312 ,  H01L21/768 ,  H01L23/522 ,  H01L23/532 ,  H01L21/31

CPC classification number: H01L21/02137 ,  B32B27/08 ,  H01L21/02282 ,  H01L21/02304 ,  H01L21/02362 ,  H01L21/3122 ,  H01L21/76801 ,  H01L21/76826 ,  H01L21/76829 ,  H01L21/76834 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/12044

Abstract: In a semiconductor device and a method of fabrication thereof, a resin film forms an interlayer film of the semiconductor device having a multilayer interconnection structure, and is formed by only one coating using coating liquid containing silicone ladder polymers represented by the chemical formula: (HO).sub.2 (R.sub.2 Si.sub.2 O.sub.3).sub.n H.sub.2. As a result, it is possible to improve long-term reliability of electric characteristics or the like, and simplify a process.

Abstract translation: 在半导体器件及其制造方法中，树脂膜形成具有多层互连结构的半导体器件的中间膜，并且仅使用包含由以下化学式表示的硅树脂聚合物的涂布液形成一个涂层：（HO ）2（R2Si2O3）nH2。 结果，可以提高电特性等的长期可靠性，并且简化工艺。

公开(公告)号：US5660954A

公开(公告)日：1997-08-26

申请号：US370179

申请日：1995-01-09

Applicant: Kazuhiro Suga ,  Atsushi Sekiguchi ,  Kenji Ueda ,  Hiroyuki Nishimura

Inventor： Kazuhiro Suga ,  Atsushi Sekiguchi ,  Kenji Ueda ,  Hiroyuki Nishimura

IPC: G03H1/02 ,  G03H1/18 ,  G03H1/20 ,  G03H1/04 ,  G03H1/00

CPC classification number: G03H1/202 ,  G03H1/0256 ,  G03H1/18 ,  G03H1/0248 ,  G03H1/0252 ,  G03H2223/25 ,  G03H2227/04 ,  G03H2240/55 ,  G03H2250/10 ,  G03H2250/12 ,  G03H2250/32

Abstract: A duplicating photosensitive material film is brought into close contact with an ND glass reduced in thickness so as to become flexible or a flexible sheet or an ND glass coated with a cushioning layer through an optical contacting liquid containing a surface active agent. In addition, a spacer is interposed between a hologram original plate and a duplicating photosensitive material, and a space defined by the spacer is filled with an optical contacting liquid, thereby regulating the thickness of the optical contacting liquid layer with the spacer. Therefore, when pressure is applied, the optical contacting liquid is uniformly pressed, so that it can be made uniform and thin in thickness. Accordingly, it is possible to prevent a failure of duplication of a hologram image due to undesirable flow of the optical contacting liquid. In addition, the wettability of the optical contacting liquid improves, so that it is possible to prevent trapping of air and foaming and to make the optical contacting liquid uniform and thin in thickness. Thus, it becomes possible to duplicate a hologram image excellently. In addition, a cushioning layer is provided on the inner side of an AR coated ND glass or on the upper side of a photosensitive material film, and another cushioning layer is provided on the side of an original plate protecting glass which is closer to the optical contacting liquid or on the lower side of the photosensitive material film. With this arrangement, even if dust enters, it can be effectively held inside the cushioning layers. Thus, it is possible to prevent undesirable flow of the optical contacting liquid and lifting of the film due to dust and hence possible to perform duplication effectively without any hindrance. Also disclosed is a hologram producing apparatus which includes mechanisms for feeding and taking up a duplicating photosensitive material film, and a contacting liquid dropping mechanism. The apparatus further includes a mechanism for nipping an excess of contacting liquid dropped, a mechanism for drying the contacting liquid attached to the exposed duplicating photosensitive material film, a mechanism for positioning the film, etc.