Method and apparatus for fabricating semiconductor chips using varying areas of precision
    9.
    发明授权
    Method and apparatus for fabricating semiconductor chips using varying areas of precision 有权
    使用不同精度的区域制造半导体芯片的方法和装置

    公开(公告)号:US07763396B2

    公开(公告)日:2010-07-27

    申请号:US11355757

    申请日:2006-02-16

    IPC分类号: G03F9/00

    CPC分类号: G03F7/70433

    摘要: A system that fabricates a semiconductor chip. The system places patterns for components which require fine line-widths within a high resolution region of a reticle, wherein the high resolution region provides sharp focus for a given wavelength of light used by the lithography system. At the same time, the system places patterns for components which do not require fine line-widths outside of the high-resolution region of the reticle, thereby utilizing the region outside of the high-resolution region of the reticle instead of avoiding the region. Note that the coarseness for components placed outside of the high resolution region of the reticle is increased to compensate for the loss of optical focus outside of the high resolution region.

    摘要翻译: 制造半导体芯片的系统。 系统将要求精细线宽的部件的图案放置在标线的高分辨率区域内,其中高分辨率区域为光刻系统使用的给定波长的光提供清晰的焦点。 同时,系统将不需要精细线宽的部件的图案放置在标线片的高分辨率区域之外,从而利用分划板的高分辨率区域之外的区域,而不是避开该区域。 注意,放大在分划板的高分辨率区域之外的分量的粗糙度被增加以补偿高分辨率区域外的光学焦点的损失。

    METHOD AND APPARATUS FOR FABRICATING SEMICONDUCTOR CHIPS USING VARYING AREAS OF PRECISION
    10.
    发明申请
    METHOD AND APPARATUS FOR FABRICATING SEMICONDUCTOR CHIPS USING VARYING AREAS OF PRECISION 审中-公开
    使用精度变化区域制作半导体器件的方法和装置

    公开(公告)号:US20100244288A1

    公开(公告)日:2010-09-30

    申请号:US12813808

    申请日:2010-06-11

    IPC分类号: H01L23/544 G03B27/52

    CPC分类号: G03F7/70433

    摘要: A system that fabricates a semiconductor chip. The system places patterns for components which require fine line-widths within a high resolution region of a reticle, wherein the high resolution region provides sharp focus for a given wavelength of light used by the lithography system. At the same time, the system places patterns for components which do not require fine line-widths outside of the high-resolution region of the reticle, thereby utilizing the region outside of the high-resolution region of the reticle instead of avoiding the region. Note that the coarseness for components placed outside of the high resolution region of the reticle is increased to compensate for the loss of optical focus outside of the high resolution region.

    摘要翻译: 制造半导体芯片的系统。 系统将要求精细线宽的部件的图案放置在标线的高分辨率区域内,其中高分辨率区域为光刻系统使用的给定波长的光提供清晰的焦点。 同时,系统将不需要精细线宽的部件的图案放置在标线片的高分辨率区域之外,从而利用分划板的高分辨率区域之外的区域,而不是避开该区域。 注意,放大在分划板的高分辨率区域之外的分量的粗糙度被增加以补偿高分辨率区域外的光学焦点的损失。