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    Bright And Clean X-Ray Source For X-Ray Based Metrology
    1.
    发明申请
    Bright And Clean X-Ray Source For X-Ray Based Metrology 审中-公开

    公开(公告)号：US20190069385A1

    公开(公告)日：2019-02-28

    申请号：US16112762

    申请日：2018-08-26

    Applicant: KLA-Tencor Corporation

    Inventor： Oleg Khodykin

    IPC: H05G2/00 ,  G01N23/20008

    Abstract: Methods and systems for x-ray based semiconductor metrology utilizing a clean, hard X-ray illumination source are described herein. More specifically, a laser produced plasma light source generates high brightness, hard x-ray illumination having energy in a range of 25,000 to 30,000 electron volts. To achieve high brightness, a highly focused, very short duration laser beam is focused onto a dense Xenon target in a liquid or solid state. The interaction of the focused laser pulse with the high density Xenon target ignites a plasma. Radiation from the plasma is collected by collection optics and is directed to a specimen under measurement. The resulting plasma emission is relatively clean because of the use of a non-metallic target material. The plasma chamber is filled with Xenon gas to further protect optical elements from contamination. In some embodiments, evaporated Xenon from the plasma chamber is recycled back to the Xenon target generator.

    Plasma-Based Light Source
    3.
    发明申请
    Plasma-Based Light Source 审中-公开
    等离子体光源

    公开(公告)号：US20160249442A1

    公开(公告)日：2016-08-25

    申请号：US14838594

    申请日：2015-08-28

    Applicant: KLA-Tencor Corporation

    Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Michael Kanouff ,  Oleg Khodykin

    IPC: H05G2/00

    CPC classification number: H05G2/003 ,  G03F7/20 ,  G03F7/70033 ,  H05G2/008

    Abstract: The present disclosure is directed to plasma-based light sources. Systems and methods are described for protecting components of the light source from plasma generated debris which can include target material gas, atomic vapor, high energy ions, neutrals, micro-particles, and contaminants. Particular embodiments include arrangements for reducing the adverse effects of plasma generated ions and neutrals on light source components while simultaneously reducing in-band light attenuation due to target material gas and vapor.

    Abstract translation: 本公开涉及基于等离子体的光源。 描述了用于保护光源的组分的等离子体产生的碎片的系统和方法，其可以包括目标材料气体，原子蒸汽，高能离子，中性粒子，微粒子和污染物。 具体实施方案包括用于减少等离子体产生的离子和中性物质对光源组分的不利影响的装置，同时减少由于目标材料气体和蒸汽引起的带内光衰减。

    Debris Protection System For Reflective Optic Utilizing Gas Flow
    4.
    发明申请
    Debris Protection System For Reflective Optic Utilizing Gas Flow 有权
    用于反射光学利用气体流动的碎片保护系统

    公开(公告)号：US20140306115A1

    公开(公告)日：2014-10-16

    申请号：US14247082

    申请日：2014-04-07

    Applicant: KLA-Tencor Corporation

    Inventor： Alexey Kuritsyn ,  Alexander Bykanov ,  Oleg Khodykin

    IPC: G02B27/00 ,  G01N23/20 ,  H05G2/00

    CPC classification number: G02B27/0006 ,  G01N2223/204 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70908 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: The present disclosure is directed to a system for protecting a reflective optic and/or any other surface in a plasma-based illumination system from debris by actively flowing gas against the debris flow direction. According to various embodiments, a vacuum chamber is configured to contain a target material, wherein a laser or discharge produced plasma is generated in response to an excitation of the target material. One or more outlets within the chamber are configured to receive gas flowing from a fluidically coupled gas source and further configured to actively flow the gas towards a source of debris and away from the reflective optic or any other protected surface at a controlled flow rate.

    Abstract translation: 本公开涉及一种用于通过主动地流动气体抵抗碎屑流动方向来保护基于等离子体的照明系统中的反射光学器件和/或任何其它表面免受碎片的系统。 根据各种实施例，真空室被配置为容纳目标材料，其中响应于目标材料的激发产生激光或放电产生的等离子体。 腔室内的一个或多个出口构造成接收从流体耦合的气体源流动的气体，并进一步配置成主动地将气体朝向碎屑源流动，并以受控流速远离反射光学元件或任何其它受保护的表面。

    Phase Grating For Mask Inspection System
    5.
    发明申请
    Phase Grating For Mask Inspection System 有权
    相位光栅面罩检测系统

    公开(公告)号：US20140131586A1

    公开(公告)日：2014-05-15

    申请号：US13786049

    申请日：2013-03-05

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Daimian Wang ,  Oleg Khodykin ,  Daniel Wack ,  Li Wang ,  Yanwei Liu

    IPC: G02B5/18 ,  G01N21/956

    CPC classification number: G02B5/1838 ,  G01J3/18 ,  G01N21/956 ,  G01N2021/95676 ,  G02B5/203 ,  G03F1/0092 ,  G03F1/84

    Abstract: Spectral Purity Filters, or SPFs, are disclosed. Such SPFs are designed to block out the 1030 nm drive laser and other undesired out of band light in a EUV mask inspection system. Different phase grating configurations for near normal incidence and grazing incidence are provided in the present disclosure and are configured specifically for EUV mask inspection.

    Abstract translation: 公开了光谱纯化过滤器或SPF。 这样的SPF被设计为在EUV掩模检查系统中阻挡1030nm驱动激光器和其它不期望的带外光。 在本公开内容中提供了用于近似法向入射和掠入射的不同相位光栅配置，并且被专门用于EUV掩模检查。

    High power broadband illumination source
    6.
    发明授权
    High power broadband illumination source 有权

    公开(公告)号：US10806016B2

    公开(公告)日：2020-10-13

    申请号：US16036660

    申请日：2018-07-16

    Applicant: KLA-Tencor Corporation

    Inventor： Oleg Khodykin ,  Ilya Bezel

    IPC: H05G2/00 ,  G21K1/06 ,  G21K5/04 ,  G03F7/20 ,  G01N21/88 ,  H01J61/00 ,  G01N21/956

    Abstract: A system for generating broadband radiation is disclosed. The system includes a target material source configured to deliver one or more of a liquid or solid state target material to a plasma-forming region of a chamber. The system further includes a pump source configured to generate pump radiation to excite the target material in the plasma forming region of the chamber to generate broadband radiation. The system is further configured to transmit at least a portion of the broadband radiation generated in the plasma-forming region of the chamber out of the chamber through a windowless aperture.

    Methods And Systems For Semiconductor Metrology Based On Polychromatic Soft X-Ray Diffraction
    7.
    发明申请
    Methods And Systems For Semiconductor Metrology Based On Polychromatic Soft X-Ray Diffraction 审中-公开

    公开(公告)号：US20190017946A1

    公开(公告)日：2019-01-17

    申请号：US16030849

    申请日：2018-07-09

    Applicant: KLA-Tencor Corporation

    Inventor： Daniel Wack ,  Oleg Khodykin ,  Andrei V. Shchegrov ,  Alexander Kuznetsov ,  Nikolay Artemiev ,  Michael Friedmann

    IPC: G01N23/201 ,  G01N23/20008 ,  H01L21/66 ,  H01L21/67

    Abstract: Methods and systems for performing measurements of semiconductor structures based on high-brightness, polychromatic, reflective small angle x-ray scatterometry (RSAXS) metrology are presented herein. RSAXS measurements are performed over a range of wavelengths, angles of incidence, and azimuth angles with small illumination beam spot size, simultaneously or sequentially. In some embodiments, RSAXS measurements are performed with x-ray radiation in the soft x-ray (SXR) region at grazing angles of incidence in the range of 5-20 degrees. In some embodiments, the x-ray illumination source size is 10 micrometers or less, and focusing optics project the source area onto a wafer with a demagnification factor of 0.2 or less, enabling an incident x-ray illumination spot size of less than two micrometers. In another aspect, active focusing optics project programmed ranges of illumination wavelengths, angles of incidence, and azimuth angles, or any combination thereof, onto a metrology area, either simultaneously or sequentially.

    Plasma Based Light Source Having a Target Material Coated on a Cylindrically-Symmetric Element
    8.
    发明申请
    Plasma Based Light Source Having a Target Material Coated on a Cylindrically-Symmetric Element 有权

    公开(公告)号：US20170142818A1

    公开(公告)日：2017-05-18

    申请号：US15268793

    申请日：2016-09-19

    Applicant: KLA-Tencor Corporation

    Inventor： Alexey Kuritsyn ,  Ye Liu ,  Oleg Khodykin

    IPC: H05G2/00 ,  G02F1/03

    CPC classification number: H05G2/008 ,  G02F1/0327 ,  G02F2203/26

    Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a cylindrically-symmetric element (e.g., drum). Embodiments include a pre-pulsing arrangement which can be optimized to reduce irradiation damage to the drum and a pulse trimming unit which can be employed to reduce irradiation damage to the drum. In addition, an embodiment is disclosed wherein the surface of a cylindrically-symmetric element is formed with a plurality of grooves having a groove depth greater than 1 mm and a focusing unit focusing a laser beam and establishing an irradiation site to produce plasma from the target material, with the irradiation site distanced from a groove surface portion to protect the surface portion from irradiation damage.

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