摘要:
The use of photoacid generators including an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt in a photoimageable composition helps improve resolution. Suitable photoimageable compositions includes: (a) a multifuctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; and a photoacid generator comprising an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt. Preferred alkoxyphenylphenyliodonium salts include 4-octyloxyphenyl phenyliodonium hexafluoroantimonate and 4-methoxyphenyl phenyliodonium hexafluoroantimonate. The photoimageable composition is particularly suited for producing high aspect ratio microstructures.
摘要:
The use of selected buffering amines in a photoimageable composition prevents process bias which with conventional photoresists causes designed features to be distorted, especially in corners and high resolution features. It is believed that the amines react with the catalysts, e.g., photoacids, generated to create an inert salt. The presence of the amines also increases resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; (b) a photoactive compound; and (c) an amine that is selected from the group consisting of triisobutylamine, 1,8-bis(dimethylamino)naphthalene (also known as PROTON SPONGET™), 2,2′-diazabicyclo[2.2.2] octane and mixtures thereof. The photoimageable composition is particularly suited for producing high aspect ratio metal microstructures.
摘要:
The use of photoacid generators including an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt in a photoimageable composition helps improve resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenyl A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; and a photoacid generator comprising an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt. Preferred alkoxyphenylphenyliodonium salts include 4-octyloxyphenyl phenyliodonium hexafluoroantimonate and 4-methoxyphenyl phenyliodonium hexafluoroantimonate. The photoimageable composition is particularly suited for producing high aspect ration microstructure.
摘要:
The use of photoacid generators including an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt in a photoimageable composition helps improve resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; and a photoacid generator comprising an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt. Preferred alkoxyphenylphenyliodonium salts include 4-octyloxyphenyl phenyliodonium hexafluoroantimonate and 4-methoxyphenyl phenyliodonium hexafluoroantimonate. The photoimageable composition is particularly suited for producing high aspect ration microstructure.
摘要:
Embodiments of the present invention include structures and methods for enhancing illumination uniformity from solar concentrators. Certain embodiments may use features on a reflective layer to globally correct for deviation in reflective behavior from a desired shape. Local features such as facets on a reflective layer are formed such that the resulting illumination profile represents a superposition of multiple facets. Features may be formed on a back film to correct the reflectance of the back film. In some embodiments, features may be formed on a front film to correct a profile from refraction. In some embodiments the corrections are for line concentrators. Global and local correction techniques may be used together, and may be used on front film or reflective film(s) together or separately. Global and/or local correction may also be used in combination with other approaches, such as secondary optic receiver compensation.
摘要:
One embodiment of the invention describes a novel method for providing a substrate for selective cell patterning, wherein the method comprises contacting an epoxide coated substrate surface with a bi-functional molecule having an epoxide end group and reacting these end groups with the substrate surface through a photochemically induced acid coupling reaction. The bi-functional molecule is applied in solution to the substrate surface as a photo-sensitive coating. A photomask stencil is used to deposit electromagnetic radiation into the coating in predetermined locations to form a desired pattern of the coating. The patterned substrate is provided by washing coating from the substrate leaving the bi-functional molecule attached to the substrate in those areas exposed to the radiation providing thereby cell adhesive moieties in controlled locations on the substrate.
摘要:
Embodiments of the present invention may utilize one or more techniques, alone or in combination, to maximize a surface area of a receiver that is configured to convert light into another form of energy. One technique enhances collection efficiency by controlling a size, shape, and/or position of a cell relative to an expected illumination profile under various conditions. Another technique positions non-active elements (such as electrical contacts and/or interconnects) on surfaces likely to be shaded from incident light by other elements of the receiver. Another technique utilizes embodiments of interconnect structures occupying a small footprint. According to certain embodiments, the receiver may be cooled by exposure to a fluid such as water or air.
摘要:
Methods and materials are described for the joining of plastics and other materials wherein polymerizable substances are diffused into the material to form a surface diffusion zone adjacent to the surface of the plastic workpiece to be joined. The surfaces are brought into contact and the polymerization reactions in the surface diffusion zone are initiated, creating thereby a strong bond across the contacting surfaces. High-performance engineered plastics such as polyetherimides, polyphenylenes, and polyether-ether-ketones are among the materials that are advantageously joined by this technique. Polymerizable substances including styrene and divinylbenzene are shown to give good bonds. Such joining methods can bond dissimilar materials difficult or impossible to join by other techniques. The surfaces to be joined are dry prior to initiation of the polymerization reaction, permitting repositioning and realignment of the surfaces as often as desired before joining. The present joining techniques do not clog or interfere with the structure of microfeatures on the surface of the workpieces to be joined, making this joining techniques especially advantageous for the fabrication of microfluidic devices. Such devices fabricated from high-performance engineered plastic joined by the present bonding techniques are shown to be capable of routine operation at high pressures and to withstand high-pressure cycling without damage.