公开(公告)号：US20050136538A1

公开(公告)日：2005-06-23

申请号：US10739493

申请日：2003-12-17

申请人： Srikant Pathak ,  Blake Simmons ,  Paul Dentinger

发明人： Srikant Pathak ,  Blake Simmons ,  Paul Dentinger

IPC分类号： C12N5/00 ,  C12N5/02

CPC分类号： C12N5/0068 ,  C12N2533/30 ,  C12N2535/10

摘要： One embodiment of the invention describes a novel method for providing a substrate for selective cell patterning, wherein the method comprises contacting an epoxide coated substrate surface with a bi-functional molecule having an epoxide end group and reacting these end groups with the substrate surface through a photochemically induced acid coupling reaction. The bi-functional molecule is applied in solution to the substrate surface as a photo-sensitive coating. A photomask stencil is used to deposit electromagnetic radiation into the coating in predetermined locations to form a desired pattern of the coating. The patterned substrate is provided by washing coating from the substrate leaving the bi-functional molecule attached to the substrate in those areas exposed to the radiation providing thereby cell adhesive moieties in controlled locations on the substrate.

摘要翻译： 本发明的一个实施方案描述了一种用于提供用于选择性细胞图案化的底物的新方法，其中所述方法包括使环氧化物涂覆的基底表面与具有环氧端基的双功能分子接触，并使这些端基与基底表面反应，通过 光化学诱导酸偶联反应。 将双功能分子作为光敏涂层施加在基材表面的溶液中。 光掩模模板用于将电磁辐射沉积到预定位置的涂层中以形成涂层的期望图案。 通过从衬底洗涤涂层而提供图案化衬底，留下暴露于辐射的那些区域中附着到衬底上的双功能分子，从而提供衬底上受控位置中的细胞粘合剂部分。

公开(公告)号：US20050100712A1

公开(公告)日：2005-05-12

申请号：US10712808

申请日：2003-11-12

申请人： Blake Simmons ,  Robert Crocker ,  Paul Dentinger ,  Marion Hunter ,  Kamlesh Patel ,  Jonathan Sala

发明人： Blake Simmons ,  Robert Crocker ,  Paul Dentinger ,  Marion Hunter ,  Kamlesh Patel ,  Jonathan Sala

IPC分类号： B29C65/00 ,  C08J5/12 ,  B32B31/26

CPC分类号： B29C65/52 ,  B29C65/006 ,  B29C65/4815 ,  B29C65/4825 ,  B29C65/483 ,  B29C65/4835 ,  B29C65/484 ,  B29C65/485 ,  B29C65/521 ,  B29C65/523 ,  B29C65/526 ,  B29C66/112 ,  B29C66/1122 ,  B29C66/114 ,  B29C66/45 ,  B29C66/452 ,  B29C66/5346 ,  B29C66/54 ,  B29C66/71 ,  B29L2031/756 ,  B81B2201/051 ,  B81C3/001 ,  B81C2203/038 ,  C08J5/128 ,  Y10T428/24612 ,  B29K2065/00 ,  B29K2079/085 ,  B29K2071/00

摘要： Methods and materials are described for the joining of plastics and other materials wherein polymerizable substances are diffused into the material to form a surface diffusion zone adjacent to the surface of the plastic workpiece to be joined. The surfaces are brought into contact and the polymerization reactions in the surface diffusion zone are initiated, creating thereby a strong bond across the contacting surfaces. High-performance engineered plastics such as polyetherimides, polyphenylenes, and polyether-ether-ketones are among the materials that are advantageously joined by this technique. Polymerizable substances including styrene and divinylbenzene are shown to give good bonds. Such joining methods can bond dissimilar materials difficult or impossible to join by other techniques. The surfaces to be joined are dry prior to initiation of the polymerization reaction, permitting repositioning and realignment of the surfaces as often as desired before joining. The present joining techniques do not clog or interfere with the structure of microfeatures on the surface of the workpieces to be joined, making this joining techniques especially advantageous for the fabrication of microfluidic devices. Such devices fabricated from high-performance engineered plastic joined by the present bonding techniques are shown to be capable of routine operation at high pressures and to withstand high-pressure cycling without damage.

摘要翻译： 描述了用于连接塑料和其它材料的方法和材料，其中可聚合物质扩散到材料中以形成邻近待连接的塑料工件的表面的表面扩散区。 使表面接触，并且开始表面扩散区中的聚合反应，从而产生穿过接触表面的强结合。 通过这种技术有利地连接的材料之中的高性能工程塑料如聚醚酰亚胺，聚苯醚和聚醚 - 醚 - 酮。 包括苯乙烯和二乙烯基苯在内的可聚合物质显示出良好的键合。 这种接合方法可以通过其他技术使不相似的材料难以或不可能接合。 在开始聚合反应之前，待连接的表面是干的，允许在接合之前经常按需要重新定位和重新排列表面。 本接合技术不会堵塞或干扰要接合的工件的表面上的微特征的结构，使得该接合技术对于微流体装置的制造特别有利。 由通过本发明的接合技术连接的高性能工程塑料制造的这种装置被证明能够在高压下常规操作并且承受高压循环而不损坏。

公开(公告)号：US20050118529A1

公开(公告)日：2005-06-02

申请号：US11005452

申请日：2004-12-06

申请人： Paul Dentinger ,  Karen Krafcik ,  Kelby Simison

发明人： Paul Dentinger ,  Karen Krafcik ,  Kelby Simison

IPC分类号： C07C381/12 ,  G03C1/492 ,  G03C1/73 ,  G03C1/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/40

CPC分类号： G03F7/038 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/40 ,  Y10S430/115 ,  Y10S430/126

摘要： The use of photoacid generators including an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt in a photoimageable composition helps improve resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenyl A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; and a photoacid generator comprising an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt. Preferred alkoxyphenylphenyliodonium salts include 4-octyloxyphenyl phenyliodonium hexafluoroantimonate and 4-methoxyphenyl phenyliodonium hexafluoroantimonate. The photoimageable composition is particularly suited for producing high aspect ration microstructure.

摘要翻译： 在光致成像组合物中使用包含烷氧基苯基苯基碘鎓盐和/或双（叔丁基苯基）碘鎓盐的光酸产生剂有助于提高分辨率。 合适的可光成像组合物包括：（a）溶解在有机溶剂中的多官能聚合物环氧树脂，其中环氧树脂包含由缩水甘油醚定量保护的双苯基A的低聚物，其中低聚物的平均官能度为约3至 12; 和含有烷氧基苯基苯基碘鎓盐和/或双（叔丁基苯基）碘鎓盐的光酸产生剂。 优选的烷氧基苯基碘鎓盐包括六氟锑酸4-辛氧基苯基苯基碘鎓和六氟锑酸4-甲氧基苯基苯基碘鎓。 可光成像组合物特别适用于生产高纵横比微观结构。

公开(公告)号：US20050164125A1

公开(公告)日：2005-07-28

申请号：US11030254

申请日：2005-01-06

申请人： Paul Dentinger ,  Karen Krafcik ,  Kelby Simison

发明人： Paul Dentinger ,  Karen Krafcik ,  Kelby Simison

IPC分类号： C07C381/12 ,  G03C1/492 ,  G03C1/73 ,  G03C1/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/40

CPC分类号： G03F7/038 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/40 ,  Y10S430/115 ,  Y10S430/126

摘要： The use of photoacid generators including an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt in a photoimageable composition helps improve resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; and a photoacid generator comprising an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt. Preferred alkoxyphenylphenyliodonium salts include 4-octyloxyphenyl phenyliodonium hexafluoroantimonate and 4-methoxyphenyl phenyliodonium hexafluoroantimonate. The photoimageable composition is particularly suited for producing high aspect ration microstructure.

摘要翻译： 在光致成像组合物中使用包含烷氧基苯基苯基碘鎓盐和/或双（叔丁基苯基）碘鎓盐的光酸产生剂有助于提高分辨率。 合适的可光成像组合物包括：（a）溶解在有机溶剂中的多官能聚合环氧树脂，其中环氧树脂包含由缩水甘油醚定量保护的双酚A的低聚物，其中低聚物的平均官能度为约3至 12; 和含有烷氧基苯基苯基碘鎓盐和/或双（叔丁基苯基）碘鎓盐的光酸产生剂。 优选的烷氧基苯基碘鎓盐包括六氟锑酸4-辛氧基苯基苯基碘鎓和六氟锑酸4-甲氧基苯基苯基碘鎓。 可光成像组合物特别适用于生产高纵横比微观结构。

公开(公告)号：US20120167949A1

公开(公告)日：2012-07-05

申请号：US13338607

申请日：2011-12-28

申请人： Paul Dentinger ,  James Page ,  John Liptac ,  Stuart Maestas

发明人： Paul Dentinger ,  James Page ,  John Liptac ,  Stuart Maestas

IPC分类号： G02B5/10 ,  B32B37/14 ,  H01L31/0232 ,  B29D11/00

CPC分类号： B29D11/00596 ,  F24S23/31 ,  F24S23/70 ,  F24S23/81 ,  H01L31/0547 ,  Y02E10/40 ,  Y02E10/52

摘要： Embodiments of the present invention include structures and methods for enhancing illumination uniformity from solar concentrators. Certain embodiments may use features on a reflective layer to globally correct for deviation in reflective behavior from a desired shape. Local features such as facets on a reflective layer are formed such that the resulting illumination profile represents a superposition of multiple facets. Features may be formed on a back film to correct the reflectance of the back film. In some embodiments, features may be formed on a front film to correct a profile from refraction. In some embodiments the corrections are for line concentrators. Global and local correction techniques may be used together, and may be used on front film or reflective film(s) together or separately. Global and/or local correction may also be used in combination with other approaches, such as secondary optic receiver compensation.

摘要翻译： 本发明的实施例包括用于增强来自太阳能集中器的照明均匀性的结构和方法。 某些实施例可以使用反射层上的特征来全面地校正反射行为与期望形状的偏差。 形成诸如反射层上的刻面的局部特征，使得所产生的照明轮廓表示多个面的叠加。 可以在背膜上形成特征以校正背膜的反射率。 在一些实施例中，可以在前膜上形成特征以校正轮廓的折射。 在一些实施例中，校正用于线路集中器。 全局和局部校正技术可以一起使用，并且可以一起或分开地用于前片或反射膜上。 全局和/或局部校正也可以与其他方法组合使用，例如次级光接收机补偿。

公开(公告)号：US06858378B1

公开(公告)日：2005-02-22

申请号：US10125134

申请日：2002-04-17

申请人： Paul Dentinger ,  Karen L. Krafick ,  Kelby Liv Simison

发明人： Paul Dentinger ,  Karen L. Krafick ,  Kelby Liv Simison

IPC分类号： C07C381/12 ,  G03C1/492 ,  G03C1/73 ,  G03C1/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/40

CPC分类号： G03F7/038 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/40 ,  Y10S430/115 ,  Y10S430/126

摘要： The use of photoacid generators including an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt in a photoimageable composition helps improve resolution. Suitable photoimageable compositions includes: (a) a multifuctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; and a photoacid generator comprising an alkoxyphenylphenyliodonium salt and/or bis(t-butylphenyl)iodonium salt. Preferred alkoxyphenylphenyliodonium salts include 4-octyloxyphenyl phenyliodonium hexafluoroantimonate and 4-methoxyphenyl phenyliodonium hexafluoroantimonate. The photoimageable composition is particularly suited for producing high aspect ratio microstructures.

摘要翻译： 在光致成像组合物中使用包含烷氧基苯基苯基碘鎓盐和/或双（叔丁基苯基）碘鎓盐的光酸产生剂有助于提高分辨率。 合适的可光成像组合物包括：（a）多功能聚合物环氧树脂，其溶解在有机溶剂中，其中环氧树脂包含由缩水甘油醚定量保护的双酚A的低聚物，其中低聚物的平均官能度为约3至 12; 和含有烷氧基苯基苯基碘鎓盐和/或双（叔丁基苯基）碘鎓盐的光酸产生剂。 优选的烷氧基苯基碘鎓盐包括六氟锑酸4-辛氧基苯基苯基碘鎓和六氟锑酸4-甲氧基苯基苯基碘鎓。 可光成像组合物特别适用于生产高纵横比微结构。

公开(公告)号：US20130112239A1

公开(公告)日：2013-05-09

申请号：US13442740

申请日：2012-04-09

申请人： John Liptac ,  Paul Dentinger ,  Robert Lamkin ,  James Page ,  Tom Reynolds

发明人： John Liptac ,  Paul Dentinger ,  Robert Lamkin ,  James Page ,  Tom Reynolds

IPC分类号： H01L31/052 ,  H01L31/05 ,  H01L31/042

CPC分类号： H01L31/0525 ,  F24S50/20 ,  G01S3/7861 ,  H01L31/0201 ,  H01L31/022433 ,  H01L31/035281 ,  H01L31/042 ,  H01L31/048 ,  H01L31/0508 ,  H01L31/0547 ,  H02S20/32 ,  Y02E10/47 ,  Y02E10/52

摘要： Embodiments of the present invention may utilize one or more techniques, alone or in combination, to maximize a surface area of a receiver that is configured to convert light into another form of energy. One technique enhances collection efficiency by controlling a size, shape, and/or position of a cell relative to an expected illumination profile under various conditions. Another technique positions non-active elements (such as electrical contacts and/or interconnects) on surfaces likely to be shaded from incident light by other elements of the receiver. Another technique utilizes embodiments of interconnect structures occupying a small footprint. According to certain embodiments, the receiver may be cooled by exposure to a fluid such as water or air.

摘要翻译： 本发明的实施例可以单独地或组合地利用一种或多种技术来最大化被配置为将光转换成另一形式的能量的接收器的表面积。 一种技术通过在各种条件下相对于预期的照明轮廓来控制细胞的尺寸，形状和/或位置来提高收集效率。 另一种技术将非活动元件（例如电触点和/或互连）定位在可能被接收器的其他元件从入射光遮蔽的表面上。 另一种技术利用占用小占地面积的互连结构的实施例。 根据某些实施例，接收器可以通过暴露于诸如水或空气的流体来冷却。

公开(公告)号：US06645696B1

公开(公告)日：2003-11-11

申请号：US09997090

申请日：2001-11-30

申请人： Kelby Liv Simison ,  Paul Dentinger

发明人： Kelby Liv Simison ,  Paul Dentinger

IPC分类号： G03F7038

CPC分类号： G03F7/038 ,  G03F7/0045

摘要： The use of selected buffering amines in a photoimageable composition prevents process bias which with conventional photoresists causes designed features to be distorted, especially in corners and high resolution features. It is believed that the amines react with the catalysts, e.g., photoacids, generated to create an inert salt. The presence of the amines also increases resolution. Suitable photoimageable compositions includes: (a) a multifunctional polymeric epoxy resin that is dissolved in an organic solvent wherein the epoxy resin comprises oligomers of bisphenol A that is quantitatively protected by glycidyl ether and wherein the oligomers have an average functionality that ranges from about 3 to 12; (b) a photoactive compound; and (c) an amine that is selected from the group consisting of triisobutylamine, 1,8-bis(dimethylamino)naphthalene (also known as PROTON SPONGET™), 2,2′-diazabicyclo[2.2.2] octane and mixtures thereof. The photoimageable composition is particularly suited for producing high aspect ratio metal microstructures.

摘要翻译： 在可光成像的组合物中使用选择的缓冲胺可以防止过程偏差，其中常规的光致抗蚀剂导致设计的特征变形，特别是在拐角和高分辨率特征中。 据信胺与催化剂反应，例如产生光酸以产生惰性盐。 胺的存在也增加了分辨率。 合适的可光成像组合物包括：（a）溶解在有机溶剂中的多官能聚合环氧树脂，其中环氧树脂包含由缩水甘油醚定量保护的双酚A的低聚物，其中低聚物的平均官能度为约3至 12; （b）光敏化合物; 和（c）选自三异丁胺，1,8-双（二​​甲基氨基）萘（也称为PROTON SPONGET TM），2,2'-二氮杂双环[2.2.2]辛烷和其混合物的混合物 其中。 可光成像组合物特别适用于生产高纵横比金属微结构。