摘要:
Disclosed are: a resin composition for pattern formation, which enables the stable formation of a pattern at a level of the wavelength of light; a method for forming a pattern having a sea-island structure using the composition; and a process for producing a light-emitting element that can achieve high luminous efficiency properties. The resin composition for pattern formation comprises: (a) a specific block copolymer containing an aromatic ring-containing polymer and a poly(meth)acrylate as block moieties; (b) a homopolymer of a specific aromatic ring-containing polymer; and (c) a homopolymer of a specific poly(meth)acrylate, wherein the ratio of the total amount of the aromatic ring-containing homopolymer (b) and the poly(meth)acrylate homopolymer (c) relative to the entire resin composition is 0% by weight to 90% by weight, and the total amount of an aromatic ring-containing polymer moiety contained in the block copolymer (a) as a block moiety and the aromatic ring-containing homopolymer (b) relative to the entire resin composition is 10% by weight to 60% by weight.
摘要:
Disclosed are: a resin composition for pattern formation, which enables the stable formation of a pattern at a level of the wavelength of light; a method for forming a pattern having a sea-island structure using the composition; and a process for producing a light-emitting element that can achieve high luminous efficiency properties. The resin composition for pattern formation comprises: (a) a specific block copolymer containing an aromatic ring-containing polymer and a poly(meth)acrylate as block moieties; (b) a homopolymer of a specific aromatic ring-containing polymer; and (c) a homopolymer of a specific poly(meth)acrylate, wherein the ratio of the total amount of the aromatic ring-containing homopolymer (b) and the poly(meth)acrylate homopolymer (c) relative to the entire resin composition is 0% by weight to 90% by weight, and the total amount of an aromatic ring-containing polymer moiety contained in the block copolymer (a) as a block moiety and the aromatic ring-containing homopolymer (b) relative to the entire resin composition is 10% by weight to 60% by weight.
摘要:
Provided is a fluorine-containing elastomer blend comprising 5 to 60 wt. % of a high-molecular-weight, fluorine-containing elastomer having a number average molecular weight of 3,000,000 or more, 20 to 80 wt. % of a medium-molecular-weight, fluorine-containing elastomer having a number average molecular weight of 100,000 to 1,000,000, and 10 to 50 wt. % of a low-molecular-weight, fluorine-containing elastomer having a number average molecular weight of 7,000 to 13,000; the number average molecular weight Mn of each fluorine-containing elastomer being measured by liquid chromatography using tetrahydrofuran as a developing solvent at a polymer concentration of 0.5 wt. % at a measurement temperature of 35° C. The fluorine-containing elastomer blend can achieve low hardness and low modulus while improving roll processability.
摘要:
Example embodiments relate to detection of a held touch on a touch-sensitive display. In some embodiments, a touch held at a given position of a touch-sensitive display is detected. Movement of the touch is then tracked while the touch remains held on the touch-sensitive display. Finally, upon release of the held touch, an action is performed on a user interface object located at a position of the release of the held touch.
摘要:
The present invention relates to an electrophotographic photosensitive member 2 including a conductive body 20, a photoconductive layer 22 formed on the conductive body 20 using amorphous silicon, and a surface layer 23 formed on the photoconductive layer using amorphous silicon. The present invention further relates to an image forming apparatus provided with the electrophotographic photosensitive member 2. The photoconductive layer 22 has a mean roughness Ra of not more than 10 nm per 10 μm square. The surface layer 23, without undergoing grinding process, has a mean roughness Ra of not more than 10 nm per 10 μm square.
摘要翻译:本发明涉及一种电子照相感光构件2,其包括导电体20,使用非晶硅形成在导电体20上的光电导层22以及使用非晶硅形成在光电导层上的表面层23。 本发明还涉及一种设置有电子照相感光构件2的图像形成装置。光电导层22的平均粗糙度Ra每10平方米不超过10nm。 表面层23,不进行研磨处理,其平均粗糙度Ra为10m / m 2的平方。
摘要:
The present invention relates to a hermetic structure having a flat cable. Liquid rubber is charged into a gap to be sealed, the charged liquid rubber is subjected to a physical action at the normal temperature and under the normal pressure, and the liquid rubber is cured to form a seal. By forming the seal in this manner, the limitation of heat resistance and pressure resistance is moderated, the flexibility of selection of materials for various constituent members is enhanced, and the structure is simplified.
摘要:
On a frictional engage surface of one of inner and outer clutch plates constructing a wet-type multi-disk clutch, a plurality of convex ridges are formed at an infinitesimal predetermined interval distance. Lubricating oil is kept between the convex ridges, so that the wedge operation in oil can be reduced, whereby the torque transfer characteristic can be improved. Further, a height of the convex ridge is set equal to or more than 1 .mu.m and the interval distance of the convex ridge is set equal to or less than 600 .mu.m, preferably.In the configuration of the clutch plate, it is made of steel as a substrate. Further, a nitrogen diffusion layer, a nitrided layer and an oxidation tunic is formed on said nitrided layer are formed on the substrate in its order therefrom.
摘要:
A curable composition comprising (a) a curable polyimide soluble in organic solvents and (b) a polymerization initiator as essential components, said polyimide consisting of recurring units represented by the formula ##STR1## wherein, each of X, X.sub.1, X.sub.2, X.sub.3 and X.sub.4 is a tetravalent carbocyclic or heterocyclic residue, each of Y.sub.1, Y.sub.2, and Y.sub.3 is a divalent carbocylic or heterocyclic residue, at least one of Z.sub.1 and Z.sub.2 is a residue having a reactive carbon-carbon double bond, and each of l, m, and n is an integer from 0 to 20, preferably from 0 to 10. The polyimide may include (a) polyacrylate compounds (b) bis-imide compounds (c) photosensitive polyimide precursors (d) oxime initiators (e) a 3 component sensitizer of a phenone compound, a mercapto compound, and an arylamine-alkanol, or mixtures of a,b,c,d, and e.
摘要:
A basic copolymer whose main chain is cross-linked which comprises about 6 to about 98% by weight of recurring units of Formula (A) or (B), ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3, which may be the same or different, each represents a hydrogen atom or a hydrocarbon group selected from the group consisting of C.sub.1-20 alkyl groups, C.sub.3-10 cycloalkyl groups, C.sub.3-8 alkenyl groups, C.sub.6-15 aryl groups, C.sub.7-12 arylalkyl groups and C.sub.1-15 aminoalkyl groups; and X is an acid radical, and about 2 to about 94% by weight of cross-linked units based on the total weight of the recurring units of Formula (A) or (B) and the cross-linked units and, if desired, up to about 92% by weight of units of a monoethylenically unsaturated monomer or a conjugated monomer based on the total weight of the recurring units of Formula (A) or (B), the cross-linked units and the units of the monoethylenically unsaturated monomer or the conjugated monomer.