公开(公告)号：US06817903B1

公开(公告)日：2004-11-16

申请号：US09635507

申请日：2000-08-09

申请人： Krishnaswamy Ramkumar ,  Kaichiu Wong ,  Venuka Jayatilaka

发明人： Krishnaswamy Ramkumar ,  Kaichiu Wong ,  Venuka Jayatilaka

IPC分类号： H01L21311

CPC分类号： H01L21/02164 ,  H01L21/022 ,  H01L21/02238 ,  H01L21/02271 ,  H01L21/31662 ,  H01L21/76205 ,  H01L21/76224

摘要： A method and process reducing or eliminating electrical leakage between active areas in a semiconductor separated by isolation regions. A method and process are disclosed for the fabrication of an isolation region in a semiconductor. The method and process can be used in the fabrication of isolation regions used for the separation of adjacent active areas in an integrated circuit. A shallow trench is created on the surface of the semiconductor in regions where isolation spaces are to be formed. A layer of silicon dioxide (LINOX) is then grown over the surfaces of the trench. The LINOX covers roughened regions formed along the surfaces of the trench during its formation. The LINOX is then annealed at a temperature above the LINOX deposition temperature for a period of time. Annealing reduces stresses in the LINOX and in the surrounding semiconductor material. Annealing also increases the density of the LINOX. Thus annealing increases the LINOX resistance to gouge during subsequent processing. This leads to a reduction in dislocations in the semiconductor and a reduction in electrical leakage around the isolation region. A more robust LINOX and a reduction in electrical leakage around an isolation region allows the further shrinkage of integrated circuit dimensions. Furthermore, denuding and gettering of the semiconductor are both accomplished during the annealing step which results in a shortening of total processing time. Finally, since gouging of the LINOX no longer occurs where poly/spacer etch overlaps an active area corner, restrictions on placement of poly lines have been eliminated.

摘要翻译： 一种减少或消除由隔离区隔开的半导体的有源区之间的漏电的方法和过程。 公开了用于制造半导体中的隔离区域的方法和工艺。 该方法和过程可用于制造用于在集成电路中分离相邻有源区的隔离区。 在要形成隔离空间的区域中，在半导体的表面上形成浅沟槽。 然后在沟槽的表面上生长一层二氧化硅（LINOX）。 LINOX包括在其形成期间沿着沟槽的表面形成的粗糙区域。 然后将LINOX在高于LINOX沉积温度的温度下退火一段时间。 退火降低了LINOX和周围半导体材料的应力。 退火也增加了LINOX的密度。 因此，退火在后续加工过程中增加了LINOX电阻。 这导致半导体中位错的减少和隔离区周围的漏电减少。 更强大的LINOX和隔离区域周围的漏电减少允许集成电路尺寸进一步收缩。 此外，半导体的剥蚀和吸杂都在退火步骤期间完成，这导致总处理时间的缩短。 最后，由于在多层/间隔层蚀刻与有源区域角重叠的情况下，LINOX的刨削不再发生，所以已经消除了对多线的布置的限制。

公开(公告)号：US6004399A

公开(公告)日：1999-12-21

申请号：US784207

申请日：1997-01-15

申请人： Kaichiu Wong ,  Krishnaswamy Ramkumar ,  Hanna Bamnolker ,  Suraj Puri ,  Rajiv Bhushan ,  David Wong ,  Gary Elmore ,  Raj Mohindra

发明人： Kaichiu Wong ,  Krishnaswamy Ramkumar ,  Hanna Bamnolker ,  Suraj Puri ,  Rajiv Bhushan ,  David Wong ,  Gary Elmore ,  Raj Mohindra

IPC分类号： B08B3/04 ,  B08B3/10 ,  B08B3/12 ,  H01L21/00 ,  B08B3/08

CPC分类号： H01L21/67057 ,  B08B3/04 ,  B08B3/102 ,  B08B3/12 ,  H01L21/67051 ,  Y10S134/902

摘要： A method is described for cleaning a semiconductor wafer. The method includes immersing a wafer in a liquid comprising water. The wafer has a front face, a back face, and an edge. The method also includes providing a substantially particle free environment adjacent to the front face and the back face as the liquid is being removed. A step of introducing a carrier gas comprising a cleaning enhancement substance also is included. It is believed that the cleaning enhancement substance dopes any liquid adhered to the front and back faces of the wafer to cause a concentration gradient of the cleaning enhancement substance in the liquid and accelerate removal of the adhered liquid off of the water.

摘要翻译： 描述了一种用于清洁半导体晶片的方法。 该方法包括将晶片浸入包含水的液体中。 晶片具有前表面，后表面和边缘。 该方法还包括当正在除去液体时提供与前表面和背面相邻的基本上无颗粒的环境。 还包括引入包含清洁增强物质的载气的步骤。 相信清洁增强物质会粘附到晶片的正面和背面的任何液体，从而引起液体中清洁增强物质的浓度梯度，并加速从水中除去附着液体。

公开(公告)号：US08710578B2

公开(公告)日：2014-04-29

申请号：US13431069

申请日：2012-03-27

申请人： Fredrick Jenne ,  Krishnaswamy Ramkumar

发明人： Fredrick Jenne ,  Krishnaswamy Ramkumar

IPC分类号： H01L29/792

CPC分类号： H01L29/792 ,  B82Y10/00 ,  H01L21/28282 ,  H01L29/513 ,  H01L29/785 ,  H01L29/7926

摘要： Embodiments of a non-planar memory device including a split charge-trapping region and methods of forming the same are described. Generally, the device comprises: a channel formed from a thin film of semiconducting material overlying a surface on a substrate connecting a source and a drain of the memory device; a tunnel oxide overlying the channel; a split charge-trapping region overlying the tunnel oxide, the split charge-trapping region including a bottom charge-trapping layer comprising a nitride closer to the tunnel oxide, and a top charge-trapping layer, wherein the bottom charge-trapping layer is separated from the top charge-trapping layer by a thin anti-tunneling layer comprising an oxide. Other embodiments are also disclosed.

摘要翻译： 描述了包括分离电荷捕获区域的非平面存储器件及其形成方法的实施例。 通常，该器件包括：由覆盖存储器件的源极和漏极的衬底上的表面的半导体材料薄膜形成的沟道; 覆盖通道的隧道氧化物; 分离电荷捕获区域，覆盖隧道氧化物，分离电荷捕获区域包括底部电荷捕获层，其包含更接近隧道氧化物的氮化物，以及顶部电荷捕获层，其中底部电荷捕获层被分离 从顶部的电荷捕获层通过包含氧化物的薄的抗隧道层。 还公开了其他实施例。

公开(公告)号：US20130178030A1

公开(公告)日：2013-07-11

申请号：US13434347

申请日：2012-03-29

申请人： Krishnaswamy Ramkumar ,  Bo Jin ,  Fredrick Jenne

发明人： Krishnaswamy Ramkumar ,  Bo Jin ,  Fredrick Jenne

IPC分类号： H01L21/336

CPC分类号： B82Y10/00 ,  H01L21/28282 ,  H01L21/823431 ,  H01L21/823821 ,  H01L27/105 ,  H01L27/1052 ,  H01L27/11568 ,  H01L27/11573 ,  H01L29/66833 ,  H01L29/792 ,  H01L29/7926

摘要： An embodiment of a method of integration of a non-volatile memory device into a logic MOS flow is described. Generally, the method includes: forming a pad dielectric layer of a MOS device above a first region of a substrate; forming a channel of the memory device from a thin film of semiconducting material overlying a surface above a second region of the substrate, the channel connecting a source and drain of the memory device; forming a patterned dielectric stack overlying the channel above the second region, the patterned dielectric stack comprising a tunnel layer, a charge-trapping layer, and a sacrificial top layer; simultaneously removing the sacrificial top layer from the second region of the substrate, and the pad dielectric layer from the first region of the substrate; and simultaneously forming a gate dielectric layer above the first region of the substrate and a blocking dielectric layer above the charge-trapping layer.

摘要翻译： 描述了将非易失性存储器件集成到逻辑MOS流中的方法的实施例。 通常，该方法包括：在衬底的第一区域之上形成MOS器件的焊盘电介质层; 从半导体材料的薄膜形成存储器件的沟道，该半导体材料的薄膜覆盖在衬底的第二区域上方的表面，所述通道连接存储器件的源极和漏极; 形成覆盖在第二区域上方的通道上的图案化电介质堆叠，所述图案化电介质叠层包括隧道层，电荷俘获层和牺牲顶层; 同时从衬底的第二区域去除牺牲顶层，以及从衬底的第一区域去除焊盘介电层; 并且同时在衬底的第一区域上方形成栅极电介质层，并且在电荷俘获层上方形成阻挡电介质层。

公开(公告)号：US20130175504A1

公开(公告)日：2013-07-11

申请号：US13436872

申请日：2012-03-31

申请人： Sagy Levy ,  Krishnaswamy Ramkumar ,  Fredrick Jenne ,  Sam Geha

发明人： Sagy Levy ,  Krishnaswamy Ramkumar ,  Fredrick Jenne ,  Sam Geha

IPC分类号： H01L29/775

CPC分类号： H01L29/66833 ,  B82Y10/00 ,  G11C16/0466 ,  G11C16/10 ,  G11C16/14 ,  H01L21/28282 ,  H01L29/0673 ,  H01L29/0676 ,  H01L29/4234 ,  H01L29/42392 ,  H01L29/66795 ,  H01L29/7833 ,  H01L29/792 ,  H01L29/7926

摘要： An embodiment of a semiconductor memory device including a multi-layer charge storing layer and methods of forming the same are described. Generally, the device includes a channel formed from a semiconducting material overlying a surface on a substrate connecting a source and a drain of the memory device; a tunnel oxide layer overlying the channel; and a multi-layer charge storing layer including an oxygen-rich, first oxynitride layer on the tunnel oxide layer in which a stoichiometric composition of the first oxynitride layer results in it being substantially trap free, and an oxygen-lean, second oxynitride layer on the first oxynitride layer in which a stoichiometric composition of the second oxynitride layer results in it being trap dense. In one embodiment, the device comprises a non-planar transistor including a gate having multiple surfaces abutting the channel, and the gate comprises the tunnel oxide layer and the multi-layer charge storing layer.

摘要翻译： 描述了包括多层电荷存储层的半导体存储器件的实施例及其形成方法。 通常，该器件包括由半导体材料形成的沟道，该半导体材料覆盖连接存储器件的源极和漏极的衬底上的表面; 覆盖通道的隧道氧化物层; 以及多层电荷存储层，其在所述隧道氧化物层上包含富氧的第一氧氮化物层，其中所述第一氧氮化物层的化学计量组成导致其基本上无陷阱，并且将贫氧的第二氮氧化物层置于 第一氧氮化物层，其中第二氧氮化物层的化学计量组成导致其陷阱致密。 在一个实施例中，该器件包括非平面晶体管，其包括具有邻接通道的多个表面的栅极，并且栅极包括隧道氧化物层和多层电荷存储层。

公开(公告)号：US08445381B2

公开(公告)日：2013-05-21

申请号：US11961750

申请日：2007-12-20

申请人： Krishnaswamy Ramkumar ,  Sundar Narayanan

发明人： Krishnaswamy Ramkumar ,  Sundar Narayanan

IPC分类号： H01L21/02

CPC分类号： H01L21/022 ,  H01L21/0217 ,  H01L21/02233 ,  H01L21/02337 ,  H01L21/28044 ,  H01L21/3144 ,  H01L29/4941 ,  H01L29/78

摘要： A method of making a semiconductor structure comprises forming an oxide layer on a substrate; forming a silicon nitride layer on the oxide layer; annealing the layers in NO; and annealing the layers in ammonia. The equivalent oxide thickness of the oxide layer and the silicon nitride layer together is at most 25 Angstroms.

摘要翻译： 制造半导体结构的方法包括在衬底上形成氧化物层; 在氧化物层上形成氮化硅层; 在NO中退火层; 并在氨中退火层。 氧化物层和氮化硅层的等效氧化物厚度在一起为至多25埃。

公开(公告)号：US08143129B2

公开(公告)日：2012-03-27

申请号：US12185747

申请日：2008-08-04

申请人： Krishnaswamy Ramkumar ,  Ravindra Kapre ,  Jeremy Warren

发明人： Krishnaswamy Ramkumar ,  Ravindra Kapre ,  Jeremy Warren

IPC分类号： H01L29/792

CPC分类号： H01L29/7833 ,  H01L21/823412 ,  H01L21/823425 ,  H01L21/823462 ,  H01L27/105 ,  H01L27/1052 ,  H01L27/11568 ,  H01L27/11573 ,  H01L29/665 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/7836 ,  H01L29/7843

摘要： A semiconductor structure and method to form the same. The semiconductor structure includes a substrate having a non-volatile charge trap memory device disposed on a first region and a logic device disposed on a second region. A charge trap dielectric stack may be formed subsequent to forming wells and channels of the logic device. HF pre-cleans and SC1 cleans may be avoided to improve the quality of a blocking layer of the non-volatile charge trap memory device. The blocking layer may be thermally reoxidized or nitridized during a thermal oxidation or nitridation of a logic MOS gate insulator layer to densify the blocking layer. A multi-layered liner may be utilized to first offset a source and drain implant in a high voltage logic device and also block silicidation of the nonvolatile charge trap memory device.

摘要翻译： 一种半导体结构及其形成方法。 半导体结构包括具有设置在第一区域上的非易失性电荷陷阱存储器件和设置在第二区域上的逻辑器件的衬底。 可以在形成逻辑器件的阱和通道之后形成电荷陷阱电介质叠层。 可以避免HF预清洗和SC1清洁，以提高非挥发性电荷陷阱存储器件的阻挡层的质量。 在逻辑MOS栅极绝缘体层的热氧化或氮化期间，阻挡层可以被热再氧化或氮化，以致密封阻挡层。 可以使用多层衬垫来首先在高压逻辑器件中偏置源极和漏极注入，并且还阻挡非易失性电荷陷阱存储器件的硅化。

公开(公告)号：US07898852B1

公开(公告)日：2011-03-01

申请号：US12005803

申请日：2007-12-27

申请人： Sagy Levy ,  Krishnaswamy Ramkumar ,  Peter Voss

发明人： Sagy Levy ,  Krishnaswamy Ramkumar ,  Peter Voss

IPC分类号： G11C16/04

CPC分类号： G11C16/0466 ,  G11C11/56 ,  H01L21/28282 ,  H01L29/42324 ,  H01L29/4234 ,  H01L29/7881 ,  H01L29/792

摘要： Methods and apparatus for programming and sensing a bi-nitride layer trapped-charge memory device in one of a first and second programmed states or one of a first and second erased states, where the first and second programmed states correspond to first and second uniform trapped charge distributions of a first charge type and the first and second erased states correspond to first and second uniform trapped charge distributions of a second charge type.

摘要翻译： 用于以第一和第二编程状态或第一和第二擦除状态中的一种编程和感测二氮化物层捕获电荷存储器件的方法和装置，其中第一和第二编程状态对应于第一和第二均匀捕获 第一充电类型和第一和第二擦除状态的电荷分布对应于第二充电类型的第一和第二均匀俘获电荷分布。

公开(公告)号：US07867918B1

公开(公告)日：2011-01-11

申请号：US12046073

申请日：2008-03-11

申请人： Krishnaswamy Ramkumar

发明人： Krishnaswamy Ramkumar

IPC分类号： H01L21/31

CPC分类号： H01L21/28282 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/022 ,  H01L21/02233 ,  H01L21/02271 ,  H01L21/28202 ,  H01L21/28273 ,  H01L21/3143 ,  H01L29/513 ,  H01L29/518

摘要： A semiconductor topography is provided which includes a silicon dioxide layer with a thickness equal to or less than approximately 10 angstroms and a silicon nitride layer arranged upon the silicon dioxide layer. In addition, a method is provided which includes growing an oxide film upon a semiconductor topography in the presence of an ozonated substance and depositing a silicon nitride film upon the oxide film. In some embodiments, the method may include growing the oxide film in a first chamber at a first temperature and transferring the semiconductor topography from the first chamber to a second chamber while the semiconductor topography is exposed to a substantially similar temperature as the first temperature. In either embodiment, the method may be used to form a semiconductor device including an oxide-nitride gate dielectric having an electrical equivalent oxide gate dieletric thickness of less than approximately 20 angstroms.

摘要翻译： 提供半导体形貌，其包括厚度等于或小于约10埃的二氧化硅层和布置在二氧化硅层上的氮化硅层。 此外，提供了一种方法，其包括在存在臭氧化物质的情况下在半导体形貌上生长氧化膜并在氧化物膜上沉积氮化硅膜。 在一些实施例中，该方法可以包括在第一温度下在第一室中生长氧化膜并将半导体形貌从第一室转移到第二室，同时将半导体形貌暴露于与第一温度基本相似的温度。 在任一实施例中，该方法可用于形成半导体器件，其包括具有小于约20埃的电等效氧化物栅极薄膜厚度的氧化物 - 氮化物栅极电介质。

公开(公告)号：US07670963B2

公开(公告)日：2010-03-02

申请号：US11904513

申请日：2007-09-26

申请人： Krishnaswamy Ramkumar ,  Sagy Levy

发明人： Krishnaswamy Ramkumar ,  Sagy Levy

IPC分类号： H01L21/469

CPC分类号： H01L21/28282 ,  H01L21/3144 ,  H01L21/3145 ,  H01L29/4234 ,  H01L29/66833 ,  Y10S438/954

摘要： A method for fabricating a nonvolatile charge trap memory device is described. The method includes first forming a tunnel dielectric layer on a substrate in a first process chamber of a single-wafer cluster tool. A charge-trapping layer is then formed on the tunnel dielectric layer in a second process chamber of the single-wafer cluster tool. A top dielectric layer is then formed on the charge-trapping layer in the second or in a third process chamber of the single-wafer cluster tool.

摘要翻译： 描述了制造非易失性电荷陷阱存储器件的方法。 该方法包括首先在单晶片簇工具的第一处理室中的衬底上形成隧道电介质层。 然后在单晶片簇工具的第二处理室中的隧道介电层上形成电荷捕获层。 然后在单晶片簇工具的第二或第三处理室中的电荷俘获层上形成顶部电介质层。