摘要:
An integrated circuit has functional circuitry coupled to a terminal. An electrostatic discharge protector can be coupled to the terminal to protect the functional circuitry from an electrostatic discharge. A substrate includes a first semiconductor material with a first dopant type. A plurality of drain segments adjoin the substrate. Each of the drain segments has a first conductor, a second conductor, and a third conductor. A central via set in a central region of the drain segment couples the second conductor to the third conductor. A peripheral via set in a peripheral region of the drain segment couples the first conductor to the second conductor. A plurality of source segments adjoin the substrate and laterally interlace with the drain segments. If an electrostatic discharge is detected at the terminal of the integrated circuit, an electrical current of the ESD is directed into the electrostatic discharge protector and distributed substantially uniformly among a plurality of resistive paths in the electrostatic discharge protector.
摘要:
An integrated circuit has functional circuitry coupled to a terminal. An electrostatic discharge protector can be coupled to the terminal to protect the functional circuitry from an electrostatic discharge. A substrate includes a first semiconductor material with a first dopant type. A plurality of drain segments adjoin the substrate. Each of the drain segments has a first conductor, a second conductor, and a third conductor. A central via set in a central region of the drain segment couples the second conductor to the third conductor. A peripheral via set in a peripheral region of the drain segment couples the first conductor to the second conductor. A plurality of source segments adjoin the substrate and laterally interlace with the drain segments. If an electrostatic discharge is detected at the terminal of the integrated circuit, an electrical current of the ESD is directed into the electrostatic discharge protector and distributed substantially uniformly among a plurality of resistive paths in the electrostatic discharge protector.
摘要:
A device includes an image sensor chip having an image sensor therein. A read-out chip is underlying and bonded to the image sensor chip, wherein the read-out chip includes a logic device selected from the group consisting essentially of a reset transistor, a source follower, a row selector, and combinations thereof therein. The logic device and the image sensor are electrically coupled to each other, and are parts of a same pixel unit. A peripheral circuit chip is underlying and bonded to the read-out chip, wherein the peripheral circuit chip includes a logic circuit.
摘要:
A system and method for isolating semiconductor devices is provided. An embodiment comprises an isolation region that is laterally removed from source/drain regions of semiconductor devices and has a dielectric material extending over the isolation implant between the source/drain regions. The isolation region may be formed by forming an opening through a layer over the substrate, depositing a dielectric material along the sidewalls of the opening, implanting ions into the substrate after the deposition, and filling the opening with another dielectric material.
摘要:
A device includes a diode, which includes a first, a second, and a third doped region in a semiconductor substrate. The first doped region is of a first conductivity type, and has a first impurity concentration. The second doped region is of the first conductivity type, and has a second impurity concentration lower than the first impurity concentration. The second doped region encircles the first doped region. The third doped region is of a second conductivity type opposite the first conductivity type, wherein the third doped region overlaps a portion of the first doped region and a portion of the second doped region.
摘要:
An integrated circuit structure includes a semiconductor substrate, and a dielectric pad extending from a bottom surface of the semiconductor substrate up into the semiconductor substrate. A low-k dielectric layer is disposed underlying the semiconductor substrate. A first non-low-k dielectric layer is underlying the low-k dielectric layer. A metal pad is underlying the first non-low-k dielectric layer. A second non-low-k dielectric layer is underlying the metal pad. An opening extends from a top surface of the semiconductor substrate down to penetrate through the semiconductor substrate, the dielectric pad, and the low-k dielectric layer, wherein the opening lands on a top surface of the metal pad. A passivation layer includes a portion on a sidewall of the opening, wherein a portion of the passivation layer at a bottom of the opening is removed.
摘要:
Provided is an image sensor device. The image sensor device includes a substrate having a front side and a back side. The image sensor includes first and second radiation-detection devices that are disposed in the substrate. The first and second radiation-detection devices are operable to detect radiation waves that enter the substrate through the back side. The image sensor also includes an anti-reflective coating (ARC) layer. The ARC layer is disposed over the back side of the substrate. The ARC layer has first and second ridges that are disposed over the first and second radiation-detection devices, respectively. The first and second ridges each have a first refractive index value. The first and second ridges are separated by a substance having a second refractive index value that is less than the first refractive index value.
摘要:
A device includes a semiconductor substrate having a front side and a backside. A plurality of image sensors is disposed at the front side of the semiconductor substrate. A plurality of clear color-filters is disposed on the backside of the semiconductor substrate. A plurality of metal rings encircles the plurality of clear color-filters.
摘要:
The present disclosure provides various embodiments of an image sensor device. An exemplary image sensor device includes an image sensing region disposed in a substrate; a multilayer interconnection structure disposed over the substrate; and a color filter formed in the multilayer interconnection structure and aligned with the image sensing region. The color filter has a length and a width, where the length is greater than the width.
摘要:
Methods and apparatus for packaging a backside illuminated (BSI) image sensor or a BSI sensor device with an application specific integrated circuit (ASIC) are disclosed. A bond pad array may be formed in a bond pad area of a BSI sensor where the bond pad array comprises a plurality of bond pads electrically interconnected, wherein each bond pad of the bond pad array is of a small size which can reduce the dishing effect of a big bond pad. The plurality of bond pads of a bond pad array may be interconnected at the same layer of the pad or at a different metal layer. The BSI sensor may be bonded to an ASIC in a face-to-face fashion where the bond pad arrays are aligned and bonded together.