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1.
公开(公告)号:US20070054489A1
公开(公告)日:2007-03-08
申请号:US11503259
申请日:2006-08-14
申请人: Kwong Wong , Louis Hsu , Timothy Dalton , Carl Radens , Chih-Chao Yang , Lawrence Clevenger , Theodorus Standaert
发明人: Kwong Wong , Louis Hsu , Timothy Dalton , Carl Radens , Chih-Chao Yang , Lawrence Clevenger , Theodorus Standaert
IPC分类号: H01L21/44
CPC分类号: H01L21/76852 , H01L21/288 , H01L21/2885 , H01L21/76885 , H01L23/5226 , H01L23/53238 , H01L2924/0002 , H01L2924/00
摘要: A method of making an interconnect that includes providing an interconnect structure in a dielectric material, recessing the dielectric material such that a portion of the interconnect structure extends above an upper surface of the dielectric; and depositing an encasing cap over the extended portion of the interconnect structure.
摘要翻译: 一种制造互连的方法,包括在电介质材料中提供互连结构,使电介质材料凹陷,使得互连结构的一部分在电介质的上表面上方延伸; 以及在所述互连结构的延伸部分上沉积封装盖。
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2.
公开(公告)号:US20060160349A1
公开(公告)日:2006-07-20
申请号:US11034890
申请日:2005-01-14
申请人: Kwong Wong , Louis Hsu , Timothy Dalton , Carl Radens , Chih-Chao Yang , Lawrence Clevenger , Theodorus Standaert
发明人: Kwong Wong , Louis Hsu , Timothy Dalton , Carl Radens , Chih-Chao Yang , Lawrence Clevenger , Theodorus Standaert
IPC分类号: H01L21/4763
CPC分类号: H01L21/76852 , H01L21/288 , H01L21/2885 , H01L21/76885 , H01L23/5226 , H01L23/53238 , H01L2924/0002 , H01L2924/00
摘要: A method of making an interconnect comprising: providing an interconnect structure in a dielectric material, recessing the dielectric material such that a portion of the interconnect structure extends above an upper surface of the dielectric; and depositing an encasing cap over the extended portion of the interconnect structure.
摘要翻译: 一种制造互连的方法,包括:在介电材料中提供互连结构,使所述电介质材料凹陷,使得所述互连结构的一部分在所述电介质的上表面上方延伸; 以及在所述互连结构的延伸部分上沉积封装盖。
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3.
公开(公告)号:US20060109117A1
公开(公告)日:2006-05-25
申请号:US10904664
申请日:2004-11-22
申请人: Louis Hsu , Lawrence Clevenger , Carl Radens , Kwong Wong , Chih-Chao Yang , Timothy Dalton
发明人: Louis Hsu , Lawrence Clevenger , Carl Radens , Kwong Wong , Chih-Chao Yang , Timothy Dalton
IPC分类号: G08B13/14
CPC分类号: G06F21/554 , G06F21/81 , G06F21/86
摘要: A deactivation management unit for facilitating an intelligent multistage system deactivation process where the deactivation management unit is flexible, facilitates recovery, and renders reverse engineering nearly impossible after the system has been permanently deactivated.
摘要翻译: 一种停用管理单元,用于促进智能多级系统停用过程,其中停用管理单元是灵活的,便于恢复,并且在系统被永久停用之后几乎不可能实现逆向工程。
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公开(公告)号:US20080014663A1
公开(公告)日:2008-01-17
申请号:US11776835
申请日:2007-07-12
申请人: Louis Hsu , Timothy Dalton , Lawrence Clevenger , Carl Radens , Kwong Wong , Chih-Chao Yang
发明人: Louis Hsu , Timothy Dalton , Lawrence Clevenger , Carl Radens , Kwong Wong , Chih-Chao Yang
IPC分类号: H01L21/00
CPC分类号: H01H59/0009 , H01H1/20 , H01H2001/0084 , H01H2001/0089 , Y10T29/49105 , Y10T29/49128 , Y10T29/49155 , Y10T29/49204 , Y10T29/49208
摘要: A hinge type MEMS switch that is fully integratable within a semiconductor fabrication process such as a CMOS, is described. The MEMS switch constructed on a substrate consists of two posts, each end thereof terminating in a cap; a rigid movable conductive plate having a surface terminating in a ring in each of two opposing edges, the rings being loosely connected to guiding posts; upper and lower electrode pairs; and upper and lower interconnect wiring lines connected and disconnected by the rigid movable conductive plate. When in the energized state, a low voltage level is applied to the upper electrode pair, while the lower electrode pair is grounded. The conductive plate moves up, shorting two upper interconnect wirings lines. Conversely, the conductive plate moves down when the voltage is applied to the lower electrode pair, while the upper electrode pair is grounded, shorting the two lower interconnect wiring lines and opening the upper wiring lines. The MEMS switch thus formed generates an even force that provides the conductive plate with a translational movement, with the displacement being guided by the two vertical posts.
摘要翻译: 描述了在诸如CMOS之类的半导体制造工艺中可完全集成的铰链式MEMS开关。 构造在基板上的MEMS开关由两个柱构成,每个端部终止于盖; 刚性可移动导电板,其表面终止于两个相对边缘中的每一个中的环中,所述环松散地连接到引导柱; 上下电极对; 并且由刚性可移动导电板连接和断开的上下互连布线。 当处于通电状态时,低电压电平施加到上电极对,而下电极对接地。 导电板向上移动,使两条上部互连线路短路。 相反,当电压施加到下电极对时,导电板向下移动,而上电极对接地,使两个下互连布线短路并打开上布线。 由此形成的MEMS开关产生均匀的力,其为导电板提供平移运动,位移由两个垂直柱引导。
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公开(公告)号:US20060145792A1
公开(公告)日:2006-07-06
申请号:US10905449
申请日:2005-01-05
申请人: Louis Hsu , Timothy Dalton , Lawrence Clevenger , Carl Radens , Kwong Wong , Chih-Chao Yang
发明人: Louis Hsu , Timothy Dalton , Lawrence Clevenger , Carl Radens , Kwong Wong , Chih-Chao Yang
IPC分类号: H01H51/22
CPC分类号: H01H59/0009 , H01H1/20 , H01H2001/0084 , H01H2001/0089 , Y10T29/49105 , Y10T29/49128 , Y10T29/49155 , Y10T29/49204 , Y10T29/49208
摘要: A hinge type MEMS switch that is fully integratable within a semiconductor fabrication process, such as a CMOS, is described. The MEMS switch constructed on a substrate consists of two posts, each end thereof terminating in a cap; a movable conductive plate having a surface terminating in a ring in each of two opposing edges, the rings being loosely connected to guiding posts; an upper and lower electrode pairs; and upper and lower interconnect wiring lines connected and disconnected by the movable conductive plate. When in the energized state, a low voltage level is applied to the upper electrode pair, while the lower electrode pair is grounded. The conductive plate moves up, shorting two upper interconnect wirings lines. Conversely, the conductive plate moves down when the voltage is applied to the lower electrode pair, while the upper electrode pair is grounded, shorting the two lower interconnect wiring lines and opening the upper wiring lines. The MEMS switch thus formed generates an even force that provides the conductive plate with a translational movement, with the displacement being guided by the two vertical posts.
摘要翻译: 描述了在诸如CMOS之类的半导体制造工艺中可完全集成的铰链式MEMS开关。 构造在基板上的MEMS开关由两个柱构成,每个端部终止于盖; 可移动导电板,其表面终止于两个相对边缘中的每一个中的环中,所述环松动地连接到引导柱; 上下电极对; 以及由可动导电板连接和断开的上下互连布线。 当处于通电状态时,低电压电平施加到上电极对,而下电极对接地。 导电板向上移动,使两条上部互连线路短路。 相反,当电压施加到下电极对时,导电板向下移动,而上电极对接地,使两个下互连布线短路并打开上布线。 由此形成的MEMS开关产生均匀的力,其为导电板提供平移运动,位移由两个垂直柱引导。
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公开(公告)号:US20060081986A1
公开(公告)日:2006-04-20
申请号:US10964882
申请日:2004-10-14
申请人: Lawrence Clevenger , Timothy Dalton , Louis Hsu , Conal Murray , Carl Radens , Kwong-Hon Wong , Chih-Chao Yang
发明人: Lawrence Clevenger , Timothy Dalton , Louis Hsu , Conal Murray , Carl Radens , Kwong-Hon Wong , Chih-Chao Yang
IPC分类号: H01L23/52
CPC分类号: H01L21/76802 , H01L21/76805 , H01L21/76843 , H01L21/76844 , H01L21/76847 , H01L21/76865 , H01L23/5226 , H01L23/53238 , H01L23/53295 , H01L2924/0002 , H01L2924/3011 , H01L2924/00
摘要: The present invention provides an interconnect structure that can be made in the BEOL which exhibits good mechanical contact during normal chip operations and does not fail during various reliability tests as compared with the conventional interconnect structures described above. The inventive interconnect structure has a kinked interface at the bottom of a via that is located within an interlayer dielectric layer. Specifically, the inventive interconnect structure includes a first dielectric layer having at least one metallic interconnect embedded within a surface thereof; a second dielectric layer located atop the first dielectric layer, wherein said second dielectric layer has at least one aperture having an upper line region and a lower via region, wherein the lower via region includes a kinked interface; at least one pair of liners located on at least vertical walls of the at least one aperture; and a conductive material filling the at least one aperture.
摘要翻译: 本发明提供一种可以在BEOL中制造的互连结构,其在正常的芯片操作期间表现出良好的机械接触,并且在与上述的常规互连结构相比在各种可靠性测试期间不会失败。 本发明的互连结构在通孔的底部具有位于层间介质层内的扭结界面。 具体地,本发明的互连结构包括:第一介电层,其具有嵌入在其表面内的至少一个金属互连; 位于所述第一介电层顶部的第二电介质层,其中所述第二电介质层具有至少一个具有上线区域和下通孔区域的孔,其中所述下通孔区域包括扭结界面; 位于所述至少一个孔的至少垂直壁上的至少一对衬垫; 以及填充所述至少一个孔的导电材料。
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公开(公告)号:US20050070127A1
公开(公告)日:2005-03-31
申请号:US10674719
申请日:2003-09-30
申请人: Lawrence Clevenger , Timothy Dalton , Louis Hsu , Carl Radens , Keith Hon Wong , Chih-Chao Yang
发明人: Lawrence Clevenger , Timothy Dalton , Louis Hsu , Carl Radens , Keith Hon Wong , Chih-Chao Yang
摘要: A method and apparatus for adjusting capacitance of an on-chip capacitor uses exposure of a dielectric material of the capacitor to an ion beam comprising ions of at least one material to modify a dielectric constant of the dielectric material.
摘要翻译: 用于调整片上电容器的电容的方法和装置使用将电容器的电介质材料暴露于包含至少一种材料的离子的离子束,以改变介电材料的介电常数。
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公开(公告)号:US20070164357A1
公开(公告)日:2007-07-19
申请号:US11333068
申请日:2006-01-17
申请人: Lawrence Clevenger , Timothy Dalton , Louis Hsu , Carl Radens , Keith Wong , Chih-Chao Yang
发明人: Lawrence Clevenger , Timothy Dalton , Louis Hsu , Carl Radens , Keith Wong , Chih-Chao Yang
IPC分类号: H01L27/12 , H01L27/01 , H01L31/0392
CPC分类号: H01L27/1203 , H01L21/28114 , H01L21/823456 , H01L21/84 , H01L29/42376 , H01L2924/0002 , H01L2924/00
摘要: A transistor device and method of forming the same comprises a substrate; a first gate electrode over the substrate; a second gate electrode over the substrate; and a landing pad comprising a pair of flanged ends overlapping the second gate electrode, wherein the structure of the second gate electrode is discontinuous with the structure of the landing pad.
摘要翻译: 晶体管器件及其形成方法包括:衬底; 衬底上的第一栅电极; 在所述衬底上方的第二栅电极; 以及着陆垫,其包括与所述第二栅电极重叠的一对凸缘端,其中所述第二栅极的结构与所述着陆焊盘的结构不连续。
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公开(公告)号:US20060043435A1
公开(公告)日:2006-03-02
申请号:US10930989
申请日:2004-08-31
申请人: Lawrence Clevenger , Timothy Dalton , Louis Hsu , Carl Radens , Keith Wong , Chih-Chao Yang
发明人: Lawrence Clevenger , Timothy Dalton , Louis Hsu , Carl Radens , Keith Wong , Chih-Chao Yang
IPC分类号: H01L29/76
CPC分类号: H01L21/28114 , H01L21/76895 , H01L21/823425 , H01L21/823437 , H01L21/823475 , H01L27/0629 , H01L27/088 , H01L29/41783 , H01L29/6653 , H01L29/66545
摘要: Gate conductors on an integrated circuit are formed with enlarged upper portions which are utilized to electrically connect the gate conductors with other devices. A semiconductor device comprises a gate conductor with an enlarged upper portion which electrically connects the gate conductor to a local diffusion region. Another semiconductor device comprises two gate conductors with enlarged upper portions which merge to create electrically interconnected gate conductors. Methods for forming the above semiconductor devices are also described and claimed.
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公开(公告)号:US20080092367A1
公开(公告)日:2008-04-24
申请号:US11968896
申请日:2008-01-03
申请人: Louis Hsu , Lawrence Clevenger , Timothy Dalton , Carl Radens , Keith Wong , Chih-Chao Yang
发明人: Louis Hsu , Lawrence Clevenger , Timothy Dalton , Carl Radens , Keith Wong , Chih-Chao Yang
CPC分类号: H01H50/005 , H01H2050/007 , Y10T29/4902 , Y10T29/49105 , Y10T29/49147
摘要: A method of fabricating a MEMS switch having a free moving inductive element within in micro-cavity guided by at least one inductive coil. The switch consists of an upper inductive coil at one end of a micro-cavity; optionally, a lower inductive coil; and a free-moving inductive element preferably made of magnetic material. The coils are provided with an inner permalloy core. Switching is achieved by passing a current through the upper coil, inducing a magnetic field unto the inductive element. The magnetic field attracts the free-moving inductive element upwards, shorting two open conductive wires, closing the switch. When the current flow stops or is reversed, the free-moving magnetic element drops back by gravity to the bottom of the micro-cavity and the conductive wires open. When the chip is not mounted with the correct orientation, the lower coil pulls the free-moving inductive element back at its original position.
摘要翻译: 一种制造具有由至少一个感应线圈引导的微腔内的自由运动的感应元件的MEMS开关的方法。 开关由微腔一端的上感应线圈组成; 可选地,下感应线圈; 以及优选由磁性材料制成的自由移动的电感元件。 线圈设有内坡道合金芯。 通过使电流通过上部线圈,从而产生电感元件的磁场来实现切换。 磁场向上吸引自由移动的感应元件,短路两根开放的导线,闭合开关。 当电流停止或反转时,自由移动的磁性元件通过重力返回到微腔的底部并且导线打开。 当芯片没有以正确的方向安装时,下线圈将自由移动的感应元件拉回其原始位置。
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