公开(公告)号：US12084538B2

公开(公告)日：2024-09-10

申请号：US16630159

申请日：2018-07-16

Applicant: LG Chem, Ltd.

Inventor： Yoon Hyung Hur ,  Je Gwon Lee ,  Sung Soo Yoon ,  No Jin Park ,  Eun Young Choi ,  Se Jin Ku ,  Mi Sook Lee ,  Hyung Ju Ryu ,  Na Na Kang ,  Eung Chang Lee

IPC: C08F8/18 ,  C08F4/46 ,  C08F4/48 ,  C08F8/42 ,  C08F20/14 ,  C08F20/16 ,  C08F8/20 ,  C08F8/24

CPC classification number: C08F8/18 ,  C08F4/46 ,  C08F4/461 ,  C08F4/463 ,  C08F4/48 ,  C08F4/484 ,  C08F8/42 ,  C08F20/14 ,  C08F20/16 ,  C08F8/20 ,  C08F8/24

Abstract: A method for producing a polymer containing metal atoms or halogen atoms at the terminals thereof with excellent efficiency while minimizing or eliminating side reactions or the like is provided. The method can also freely control molecular weight characteristics of the polymer.

公开(公告)号：US11145049B2

公开(公告)日：2021-10-12

申请号：US16629858

申请日：2018-07-16

Applicant: LG Chem, Ltd.

Inventor： Hyung Ju Ryu ,  Se Jin Ku ,  Mi Sook Lee ,  Sung Soo Yoon

IPC: G06T7/00 ,  G01N23/04 ,  G01N33/44 ,  G01Q30/06 ,  G06T5/00 ,  G06T5/10

Abstract: A method for analyzing a polymer membrane, which can improve accuracy of structural analysis of the polymer membrane and shorten the analysis time by effectively removing noise is provided.

公开(公告)号：US10934426B2

公开(公告)日：2021-03-02

申请号：US16461204

申请日：2017-11-29

Applicant: LG Chem, Ltd.

Inventor： Se Jin Ku ,  Mi Sook Lee ,  Hyung Ju Ryu ,  Sung Soo Yoon ,  No Jin Park ,  Jung Keun Kim ,  Je Gwon Lee ,  Eun Young Choi

IPC: C08L53/00 ,  C08J5/18 ,  C08J7/12 ,  C08J5/22 ,  C08F220/38 ,  C08F220/22 ,  C09D153/00 ,  C08F293/00 ,  C08F228/02 ,  C08F220/18 ,  H01L21/027 ,  B82Y40/00 ,  G03F1/00 ,  H01L21/311 ,  H01L21/308

Abstract: The present disclosure relates to a polymer composition and a use thereof to produce a polymer film. Such a polymer composition provides excellent self-assembly properties and is capable of forming a vertical orientation structure in a short time even on a surface where no neutral treatment is performed.

公开(公告)号：US20200056002A1

公开(公告)日：2020-02-20

申请号：US16346669

申请日：2017-11-29

Applicant: LG Chem, Ltd.

Inventor： Mi Sook Lee ,  Se Jin Ku ,  No Jin Park ,  Jung Keun Kim ,  Je Gwon Lee ,  Hyung Ju Ryu ,  Eun Young Choi

IPC: C08J5/18 ,  G03F7/16 ,  G03F7/20

Abstract: The present application relates to a block copolymer and a use thereof. The present application can provide a laminate which is capable of forming a highly aligned block copolymer on a substrate and thus can be effectively applied to production of various patterned substrates, and a method for producing a patterned substrate using the same.

公开(公告)号：US10295908B2

公开(公告)日：2019-05-21

申请号：US15515290

申请日：2015-09-30

Applicant: LG Chem, Ltd.

Inventor： No Jin Park ,  Jung Keun Kim ,  Je Gwon Lee ,  Sung Soo Yoon ,  Se Jin Ku ,  Mi Sook Lee ,  Eun Young Choi ,  Hyung Ju Ryu

IPC: C08F32/06 ,  G03F7/16 ,  C08G61/12 ,  H01L21/3105 ,  H01L21/027 ,  C08F212/08 ,  C08F216/12 ,  C08F220/10 ,  C08F220/26 ,  C08F220/30 ,  C08J5/18 ,  C08L53/00 ,  B05D1/00 ,  B05D3/00 ,  C08F293/00 ,  C09D153/00 ,  G03F7/09 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  C08F299/02 ,  C08G61/08 ,  C08F2/14 ,  C08J7/12 ,  G03F7/00 ,  G03F7/30 ,  C08L53/02 ,  B81C1/00 ,  B82Y40/00

Abstract: The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.

公开(公告)号：US10227438B2

公开(公告)日：2019-03-12

申请号：US15102112

申请日：2014-12-08

Applicant: LG Chem, Ltd.

Inventor： Je Gwon Lee ,  Jung Keun Kim ,  No Jin Park ,  Mi Sook Lee ,  Se Jin Ku ,  Eun Young Choi ,  Sung Soo Yoon

IPC: C08F293/00 ,  C07F7/18 ,  C07C43/215 ,  C07C43/225 ,  C07C217/84 ,  C07D209/48 ,  C08F12/20 ,  C08F12/22 ,  C08F12/26 ,  C08F12/32 ,  C08F212/14 ,  C08F220/10 ,  C08F220/30 ,  C08J5/18 ,  G03F7/00 ,  C08J7/12 ,  C07C35/48 ,  C08J7/14 ,  C09D153/00 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  B81C1/00 ,  B82Y40/00

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

公开(公告)号：US10196474B2

公开(公告)日：2019-02-05

申请号：US15173670

申请日：2016-06-05

Applicant: LG Chem, Ltd.

Inventor： No Jin Park ,  Jung Keun Kim ,  Je Gwon Lee ,  Mi Sook Lee ,  Se Jin Ku ,  Eun Young Choi ,  Sung Soo Yoon

IPC: C08F293/00 ,  C08L53/00 ,  G03F7/00

Abstract: The present application provides the block copolymers and their application. The present application may provide the block copolymers that have excellent self assembling and phase separation properties and therefore that can be effectively used in various applications. The present application may also provide applications of the block copolymers.

公开(公告)号：US09788434B2

公开(公告)日：2017-10-10

申请号：US14763414

申请日：2014-09-22

Applicant: LG CHEM, LTD.

Inventor： Min Su Jeong ,  You Jin Kyung ,  Byung Ju Choi ,  Woo Jae Jeong ,  Bo Yun Choi ,  Kwang Joo Lee ,  Se Jin Ku

IPC: G03F7/11 ,  G06F7/40 ,  H05K3/02 ,  H05K3/28 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  H01L21/48 ,  G03F7/027 ,  G03F7/09 ,  H05K3/34

CPC classification number: H05K3/027 ,  G03F7/027 ,  G03F7/038 ,  G03F7/09 ,  G03F7/16 ,  G03F7/20 ,  G03F7/327 ,  G03F7/40 ,  H01L21/4846 ,  H05K3/281 ,  H05K3/3452

Abstract: The present invention relates to a preparation method for a dry film solder resist (DFSR) capable of forming the DFSR having fine unevenness on a surface by a more simplified method, and a film laminate used therein. The preparation method for a dry film solder resist includes forming a predetermined photo-curable and heat-curable resin composition on a transparent carrier film having a surface on which a fine unevenness having an average roughness (Ra) of 200 nm to 2 μm is formed; laminating the resin composition on a substrate to form a laminated structure in which the substrate, the resin composition, and the transparent carrier film are sequentially formed; exposing the resin composition and delaminating the transparent carrier film; and alkaline-developing the resin composition in a non-exposure part and performing heat-curing.

公开(公告)号：US11613599B2

公开(公告)日：2023-03-28

申请号：US16757564

申请日：2018-11-07

Applicant: LG Chem, Ltd.

Inventor： Eung Chang Lee ,  Mi Sook Lee ,  Se Jin Ku ,  Na Na Kang ,  Hyung Ju Ryu ,  Sung Soo Yoon ,  No Jin Park ,  Je Gwon Lee ,  Eun Young Choi ,  Yoon Hyung Hur

IPC: C08F293/00 ,  C08F214/18 ,  C08L53/00 ,  B32B27/00 ,  C07C65/28 ,  C08F212/14

Abstract: Methods for forming a laminate are provided. The method provides a highly aligned block copolymer without orientation defects, coordination number defects distance defects and the like on a substrate, thereby providing a laminate which can be effectively applied to the production of various patterned substrates, and a method for producing a patterned substrate using the same.

公开(公告)号：US11506972B2

公开(公告)日：2022-11-22

申请号：US16462707

申请日：2017-12-13

Applicant: LG Chem, Ltd.

Inventor： Mi Sook Lee ,  Se Jin Ku ,  No Jin Park ,  Jung Keun Kim ,  Je Gwon Lee ,  Eun Young Choi ,  Hyung Ju Ryu ,  Sung Soo Yoon

IPC: G03F7/00 ,  H01L21/027 ,  H01L21/033 ,  C08L53/00 ,  H01L51/00

Abstract: The present application relates to a method for preparing a patterned substrate. The method may be applied to a process of manufacturing devices such as, for example, electronic devices and integrated circuits, or other applications, such as manufacture of integrated optical systems, guidance and detection patterns of magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads or organic light emitting diodes, and the like, and may also be used to build a pattern on a surface used in manufacture of discrete track media, such as integrated circuits, bit-patterned media and/or magnetic storage devices such as hard drives.