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    Microelectrochemical devices
    1.
    发明授权
    Microelectrochemical devices 失效
    微电化学器件

    公开(公告)号：US4717673A

    公开(公告)日：1988-01-05

    申请号：US798263

    申请日：1985-11-19

    申请人： Mark S. Wrighton ,  Henry S. White, Jr. ,  James W. Thackeray

    发明人： Mark S. Wrighton ,  Henry S. White, Jr. ,  James W. Thackeray

    IPC分类号： G01N21/75 ,  G01N27/00 ,  G01N27/04 ,  G01N27/12 ,  G01N27/26 ,  G01N27/30 ,  G01N27/327 ,  G01N27/333 ,  G01N27/414 ,  G01N27/416 ,  G02F1/01 ,  G02F1/153 ,  G11C13/02 ,  H01G7/00 ,  H01G9/028 ,  H01L21/822 ,  H01L27/04 ,  H01L29/78 ,  H01L29/861 ,  H01L49/00 ,  H01L51/05 ,  H01L51/30 ,  H01L51/40 ,  H01L51/42 ,  G01N27/22

    CPC分类号： H01L51/0077 ,  B82Y10/00 ,  G02F1/1533 ,  G11C13/0009 ,  G11C13/0014 ,  G11C13/0016 ,  H01G7/00 ,  H01L51/0006 ,  H01L51/0035 ,  H01L51/0508 ,  H01L51/0583 ,  H01L51/0595 ,  G01N27/4145 ,  H01L51/42 ,  Y02E10/549 ,  Y10S436/806 ,  Y10T436/209163

    摘要： Very stable, polymer-based electrochemical devices, formed by polymerization of thiophene or a derivative such as 3-methylthiophene which is durable in an aqueous electrolyte over a wide pH range, which respond rapidly to chemical or electrical signals, are disclosed. In one embodiment, the device functions as an extremely sensitive sensor which measures changes in chemical concentration or pH. For example, a poly-3-methylthiophene-based device is sensitive to as little as 8.times.10.sup.-16 moles of an oxidant which reversibly interacts with the polymer, including gas phase oxidants such as I.sub.2. In a variation of the polymer-based device, a catalyst such as a noble metal or an enzyme, is dispersed on or within the conducting polymer matrix so that the device is responsive to chemicals such as H.sub.2 and O.sub.2 which the polymer would otherwise respond very slowly to. In a second embodiment, a polymer-based electrochromic device consists of polymer-coated microelectrodes which are individually addressed. Very high resolution is achieved by separating the microelectrodes by distances on the order of 10,000 Angstroms. In still another embodiment, the polymer-based device functions as a capacitor with an energy density as high as 200-300 J/cm.sup.3 which can operate at frequencies as high as 100 Hz. Large polymer-based capacitors are useful for storage of solar energy or as automobile batteries. Microcapacitors may be incorporated into conventional integrated circuit designs.

    摘要翻译： 公开了通过噻吩聚合形成的非常稳定的基于聚合物的电化学装置，或者是在宽pH范围内耐水解的电解质中的3-甲基噻吩，其在化学或电信号上迅速响应。 在一个实施例中，该装置用作测量化学浓度或pH变化的极敏感的传感器。 例如，基于聚-3-甲基噻吩的器件对少至8×10-16摩尔的氧化剂敏感，氧化剂与聚合物可逆地相互作用，包括气相氧化剂如I2。 在基于聚合物的装置的变体中，催化剂如贵金属或酶分散在导电聚合物基质上或导电聚合物基质内，使得该装置对诸如H 2和O 2的化学物质有反应，聚合物否则将会非常响应 慢慢到 在第二实施例中，基于聚合物的电致变色装置由单独寻址的聚合物涂覆的微电极组成。 通过将微电极分开约10,000埃的距离来实现非常高的分辨率。 在另一个实施方案中，基于聚合物的器件用作能够在高达100Hz的频率下操作的能量密度高达200-300J / cm 3的电容器。 大型聚合物电容器可用于储存太阳能或汽车电池。 微电容器可以并入传统的集成电路设计中。

    POLYMERIZABLE PHOTOACID GENERATORS
    2.
    发明申请
    POLYMERIZABLE PHOTOACID GENERATORS 有权
    聚合光电发生器

    公开(公告)号：US20120171616A1

    公开(公告)日：2012-07-05

    申请号：US13339948

    申请日：2011-12-29

    申请人： James W. Thackeray ,  Suzanne M. Coley ,  Vipul Jain ,  Owendi Ongayi ,  James F. Cameron ,  Paul J. LaBeaume ,  Ahmad E. Madkour

    发明人： James W. Thackeray ,  Suzanne M. Coley ,  Vipul Jain ,  Owendi Ongayi ,  James F. Cameron ,  Paul J. LaBeaume ,  Ahmad E. Madkour

    IPC分类号： G03F7/20 ,  C07C69/593 ,  G03F7/004 ,  C07C69/54 ,  C08F228/06 ,  C08G63/688

    CPC分类号： G03F7/0045 ,  C07C309/12 ,  C07C309/42 ,  C07C381/12 ,  C07D333/76 ,  C08F220/38 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/126

    摘要： A compound has formula (I): Q-O-(A)-Z−G+  (I) wherein Q is a halogenated or non-halogenated, C2-30 olefin-containing group, A is a fluorine-substituted C1-30 alkylene group, a fluorine-substituted C3-30 cycloalkylene group, a fluorine-substituted C6-30 arylene group, or a fluorine-substituted C7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G+ has formula (II): wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached to one adjacent R0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.

    摘要翻译： 化合物具有式（I）：QO-（A）-Z-G +（I）其中Q是卤代或非卤代的含C30-30烯烃基团，A是氟取代的C1-30亚烷基， 氟取代的C3-30亚环烷基，氟取代的C6-30亚芳基或氟取代的C7-30亚烷基 - 亚芳基，Z是包含磺酸酯，磺酰胺或磺酰胺的阴离子基团，G +具有式 （II）：其中X为S或I，每个R 0为卤代或非卤代，独立地为C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 4-30芳基; 或这些的组合，其中当X是S时，R0中的一个可任选地通过单键连接到一个相邻的R0基团，a是2或3，其中当X是I时，a是2，或当X 是S，a是3。公开了共聚物，光致抗蚀剂，涂布的基材和图案化方法。

    PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION
    3.
    发明申请
    PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION 有权
    光敏共聚物和光电组合物

    公开(公告)号：US20120129105A1

    公开(公告)日：2012-05-24

    申请号：US13298761

    申请日：2011-11-17

    申请人： James W. Thackeray ,  Emad Aqad ,  Su Jin Kang ,  Owendi Ongayi

    发明人： James W. Thackeray ,  Emad Aqad ,  Su Jin Kang ,  Owendi Ongayi

    IPC分类号： G03F7/20 ,  C08F228/06 ,  G03F7/027 ,  C08F220/68 ,  G03F7/004

    CPC分类号： G03F7/0392 ,  C08F212/08 ,  C08F212/14 ,  C08F212/34 ,  C08F216/12 ,  G03F7/0045 ,  G03F7/0046 ,  C08F216/125 ,  C08F216/165 ,  C08F216/1466

    摘要： A copolymer has formula: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30 acid decomposable group, or a combination; each R9 is independently F, a C1-10 alkyl, C1-10 fluoroalkyl, C1-10 alkoxy, or a C1-10 fluoroalkoxy group; R10 is a cation-bound C10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.

    摘要翻译： 共聚物具有式：其中R1-R5独立地为H，C1-6烷基或C4-6芳基，R6为氟化或非氟化C5-30酸可分解基团; 每个Ar是单环，多环或稠合的多环C 6-20芳基; 每个R 7和R 8是-OR 11或-C（CF 3）2 OR 11，其中每个R 11是H，氟化或非氟化的C5-30酸可分解基团或其组合; 每个R 9独立地为F，C 1-10烷基，C 1-10氟烷基，C 1-10烷氧基或C 1-10氟烷氧基; R10是含阳离子结合的C10-40光酸产生剂基团，摩尔分数a，b和d分别为0〜0.80，c为0.01〜0.80，e为0〜0.50，a，b，d为0， e大于0，和a + b + c + d + e为1,1，m为1〜4的整数，n为0〜5的整数。光致抗蚀剂和被覆基材各自包含共聚物 。

    Polymers and photoresist compositions
    4.
    发明授权
    Polymers and photoresist compositions 有权
    聚合物和光致抗蚀剂组合物

    公开(公告)号：US07838199B2

    公开(公告)日：2010-11-23

    申请号：US12072790

    申请日：2008-02-28

    申请人： James W. Thackeray ,  Roger A. Nassar

    发明人： James W. Thackeray ,  Roger A. Nassar

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/38 ,  Y10S430/106 ,  Y10S430/111

    摘要： The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.

    摘要翻译： 本发明涉及包含含有一种或多种光酸产生剂基团的单元的新聚合物和含有聚合物的光致抗蚀剂。 本发明优选的聚合物适用于在短波长（例如亚250nm或亚-200nm，特别是248nm和193nm）成像的光刻胶中。

    Antihalation compositions
    5.
    发明授权
    Antihalation compositions 失效
    抗晕化组合物

    公开(公告)号：US07776508B2

    公开(公告)日：2010-08-17

    申请号：US11981621

    申请日：2007-10-31

    申请人： James W. Thackeray ,  George W. Orsula

    发明人： James W. Thackeray ,  George W. Orsula

    IPC分类号： G03F7/00

    CPC分类号： G03F7/091 ,  G03F7/038 ,  G03F7/38

    摘要： Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

    摘要翻译： 用于减少光致抗蚀剂外涂层的曝光辐射的反射的抗晕化组合物和方法。 本发明的防光组合物包括树脂粘合剂和能够引起树脂粘合剂的热诱导交联反应的材料。