公开(公告)号：US4364099A

公开(公告)日：1982-12-14

申请号：US179791

申请日：1980-08-20

申请人： Masataka Koyama ,  Kiyoshi Satoh ,  Minoru Terashima

发明人： Masataka Koyama ,  Kiyoshi Satoh ,  Minoru Terashima

IPC分类号： H01G4/10 ,  H01L27/01

CPC分类号： H01L27/016 ,  H01G4/10

摘要： A tantalum film capacitor has an .alpha.-tantalum as a lower electrode, a chemical conversion layer of .alpha.-tantalum as a dielectric and an upper electrode, an improvement involving forming a highly nitrogen-doped tantalum film between the .alpha.-tantalum and a substrate, and also, another improvement involving forming a transitional thin tantalum layer between said highly nitrogen-doped tantalum film and said .alpha.-tantalum. The nitrogen concentration of the highly nitrogen-doped tantalum film is from 14 to 30 atomic %. The electrical properties, especially leakage current, are improved over those of the prior art. A disadvantage of the conventional .alpha.-tantalum thin film capacitor, that is the necessity of using an expensive partial glazed Al.sub.2 O.sub.3 substrate, is eliminated, and a non-glazed Al.sub.2 O.sub.3 substrate can be used in the present invention.

摘要翻译： 钽膜电容器具有作为下电极的α钽，作为电介质的α钽的化学转化层和上电极，涉及在α-钽和衬底之间形成高度氮掺杂钽膜的改进， 并且还涉及在所述高度氮掺杂钽膜和所述α-钽之间形成过渡薄钽层的另一改进。 高氮掺杂钽膜的氮浓度为14〜30原子％。 电性能，特别是漏电流，比现有技术的要好。 消除了常规α-钽薄膜电容器的缺点，即需要使用昂贵的部分釉面Al 2 O 3衬底，并且在本发明中可以使用非釉面Al 2 O 3衬底。

公开(公告)号：US07534469B2

公开(公告)日：2009-05-19

申请号：US11095314

申请日：2005-03-31

申请人： Kiyoshi Satoh ,  Yoshinobu Kano

发明人： Kiyoshi Satoh ,  Yoshinobu Kano

IPC分类号： C23C16/00

CPC分类号： B08B7/0035 ,  C23C16/4405 ,  C23C16/52

摘要： A CVD apparatus comprising an optical unit detecting the mass of contaminants adhering to an inner surface of a CVD reactor by irradiating an inner surface of the reactor with light having monochromaticity through an optical window provided on an inner wall of the reactor and receiving its reflected light is provided.

摘要翻译： 一种CVD装置，包括光学单元，其通过设置在反应器的内壁上的光学窗口照射具有单色光的反射器的内表面来检测附着在CVD反应器的内表面上的污染物的质量，并接收其反射光 被提供。

公开(公告)号：US07271093B2

公开(公告)日：2007-09-18

申请号：US10852637

申请日：2004-05-24

申请人： Chou San Nelson Loke ,  Kanako Yoshioka ,  Kiyoshi Satoh

发明人： Chou San Nelson Loke ,  Kanako Yoshioka ,  Kiyoshi Satoh

IPC分类号： H01L21/44

CPC分类号： H01L21/76834 ,  H01L21/76807 ,  H01L21/76832 ,  H01L23/53238 ,  H01L23/5329 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method of forming an interconnect for a semiconductor device using triple hard layers, comprises: forming a first hard layer serving as an etch stop layer on a metal interconnect-formed dielectric layer; forming a second hard layer on the first hard layer; forming a dielectric layer on the second hard layer; forming a third hard layer on the dielectric layer; forming a hole through the third and second hard layers, the dielectric layer, and the first hard layer; and filling the hole with metal to establish an interconnect. The second and third hard layers are each made of carbon-doped silicon oxide formed from a source gas and a redox gas, while controlling the carbon content in the second hard layer as a function of a flow rate of the redox gas.

摘要翻译： 一种使用三层硬质层形成用于半导体器件的互连的方法包括：在金属互连形成的介电层上形成用作蚀刻停止层的第一硬层; 在所述第一硬质层上形成第二硬质层; 在所述第二硬质层上形成介电层; 在所述电介质层上形成第三硬质层; 通过第三和第二硬质层，电介质层和第一硬质层形成孔; 并用金属填充孔以建立互连。 第二和第三硬层各自由源气体和氧化还原气体形成的碳掺杂氧化硅制成，同时控制第二硬质层中的碳含量作为氧化还原气体的流量的函数。

公开(公告)号：US06780257B2

公开(公告)日：2004-08-24

申请号：US10051718

申请日：2002-01-17

申请人： Tsuyoshi Nagata ,  Hiroyasu Tsuchida ,  Yoshio Uematsu ,  Kiyoshi Satoh ,  Kosuke Tamaru

发明人： Tsuyoshi Nagata ,  Hiroyasu Tsuchida ,  Yoshio Uematsu ,  Kiyoshi Satoh ,  Kosuke Tamaru

IPC分类号： C21D900

CPC分类号： C22C38/40 ,  G11B5/4826 ,  G11B5/4833 ,  G11B33/1446

摘要： A base plate of a stainless-steel body material formed by pressing is polished and cleared of burrs by means of an abrasive material that consists mainly of Fe2O3 in a polishing process. The polished base plate is heated to a heat treatment temperature for solid solution in a reducing atmosphere in a heat treatment process. In this heat treatment process, an oxide in the constituents of minute fragments of the abrasive material in the surface of the body material of the base plate is reduced to leave iron, which is dispersed into the body material.

摘要翻译： 通过压制形成的不锈钢主体材料的基板通过在抛光工艺中主要由Fe 2 O 3组成的研磨材料抛光和清除毛刺。 在热处理工序中将抛光后的基板加热至还原气氛中的固溶体的热处理温度。 在该热处理工序中，基板的主体材料表面的研磨材料的微小碎片成分中的氧化物被还原，留下分散在主体材料中的铁。

公开(公告)号：US06767836B2

公开(公告)日：2004-07-27

申请号：US10235217

申请日：2002-09-04

申请人： Nelson Loke Chou San ,  Kenichi Kagami ,  Kiyoshi Satoh

发明人： Nelson Loke Chou San ,  Kenichi Kagami ,  Kiyoshi Satoh

IPC分类号： H01L21302

CPC分类号： H01L21/02126 ,  C23C16/4405 ,  H01L21/02167 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/314 ,  H01L21/31633 ,  Y10S438/905

摘要： Provided herein is a method for cleaning CVD reaction chambers with active oxygen species. The active oxygen species may also be mixed with active fluorine species. The active oxygen species are products of a plasma, which may be either generated within the CVD reaction chamber or generated remotely and introduced into the CVD reaction chamber.

摘要翻译： 本文提供了一种用于清洁具有活性氧的CVD反应室的方法。 活性氧也可与活性氟物质混合。 活性氧是等离子体的产物，其可以在CVD反应室内产生或远程产生并引入CVD反应室。

公开(公告)号：US06761771B2

公开(公告)日：2004-07-13

申请号：US09982454

申请日：2001-10-17

申请人： Kiyoshi Satoh ,  Hiroki Arai

发明人： Kiyoshi Satoh ,  Hiroki Arai

IPC分类号： H01L2100

CPC分类号： H01L21/68735 ,  C23C16/4583 ,  C23C16/46

摘要： A substrate-supporting apparatus, wherein a substrate is not warped or distorted and a film with uniform thickness is formed, is a semiconductor substrate-supporting apparatus which supports and heats semiconductor substrates inside a vacuum-pumped reaction chamber. On the substrate-supporting surface of the semiconductor substrate-supporting apparatus, a concave portion which includes a depression slanting from the peripheral portion to the center is provided, the semiconductor substrate is supported in a position where the peripheral portion of the back surface of the substrate contacts the slanting surface of the concave portion, and the concave portion is formed so that an interval between the center of the concave portion and the semiconductor substrate becomes the designated distance. The slanting surface of the concave portion may include a portion of a spherical surface or a conical surface.

摘要翻译： 一种衬底支撑装置，其中衬底不翘曲或变形，并且形成具有均匀厚度的膜，是在真空抽吸反应室内支撑和加热半导体衬底的半导体衬底支撑装置。 在半导体基板支撑装置的基板支撑面上设置有包括从周边部向中心倾斜的凹部的凹部，半导体基板被支撑在该半导体基板支撑装置的背面的周边部 基板与凹部的倾斜面接触，并且形成凹部，使得凹部的中心与半导体基板的间隔成为指定距离。 凹部的倾斜表面可以包括球形表面或锥形表面的一部分。

公开(公告)号：US06683745B1

公开(公告)日：2004-01-27

申请号：US09472175

申请日：1999-12-27

申请人： Sri M. Sri-Jayantha ,  Vijayeshwar Das Khanna ,  Gerard McVicker ,  Hien Dang ,  Arun Sharma ,  Kiyoshi Satoh ,  Tatsuo Nakamoto

发明人： Sri M. Sri-Jayantha ,  Vijayeshwar Das Khanna ,  Gerard McVicker ,  Hien Dang ,  Arun Sharma ,  Kiyoshi Satoh ,  Tatsuo Nakamoto

IPC分类号： G11B1700

CPC分类号： G11B33/08

摘要： A system for mounting a hard disk enclosure (HDE), includes a casing pivotably mounted to minimize at least one of settle-out dynamics, external rotational vibration, and emitted vibration, the casing allowing the HDE to rotate substantially freely, wherein the center of gravity of the HDE is substantially the same as a pivot point of the casing. Further, a computer chassis includes a housing, at least one disk drive assembly for being housed by the housing, and a plurality of theta-mounts integrally built within the housing.

摘要翻译： 一种用于安装硬盘盒（HDE）的系统，包括可枢转地安装的壳体，以最小化至少一个沉降动力学，外部旋转振动和发射的振动，所述壳体允许HDE基本上自由旋转，其中， HDE的重力基本上与壳体的枢转点相同。 此外，计算机机箱包括壳体，至少一个用于由壳体容纳的盘驱动组件以及一体地内置在壳体内的多个θ安装座。

公开(公告)号：US06351343B1

公开(公告)日：2002-02-26

申请号：US08798443

申请日：1997-02-10

申请人： Yuzo Nakagawa ,  Kiyoshi Satoh ,  Hiroki Kitahori ,  Naoyuki Kagami

发明人： Yuzo Nakagawa ,  Kiyoshi Satoh ,  Hiroki Kitahori ,  Naoyuki Kagami

IPC分类号： G11B3312

CPC分类号： G11B25/043 ,  G11B33/122

摘要： An arrangement structure of the printed circuit board and the interface cable connector of a magnetic disk drive for increasing the degree of freedom of the arrangement of a spindle motor, and for minimizing the size of a printed circuit board. An interface cable connector is disposed on the side opposite to the spindle motor, and the printed circuit board is sized so as not to contact with the spindle motor in the height direction. This allows the degree of freedom of the arrangement of the spindle motor to increase. Further, the distance between the interface cable connector and the preamplifier connector on the printed circuit board is short. Thus, the size of the printed circuit board can be made as small as possible.

摘要翻译： 印刷电路板和磁盘驱动器的接口电缆连接器的布置结构，用于增加主轴电动机布置的自由度，并使印刷电路板的尺寸最小化。 接口电缆连接器设置在与主轴电动机相对的一侧，并且印刷电路板的尺寸设计成不在高度方向上与主轴电动机接触。 这允许主轴电动机的布置的自由度增加。 此外，接口电缆连接器和印刷电路板上的前置放大器连接器之间的距离很短。 因此，可以使印刷电路板的尺寸尽可能小。

公开(公告)号：US6111714A

公开(公告)日：2000-08-29

申请号：US49785

申请日：1998-03-27

申请人： Tetsuo Ueda ,  Kiyoshi Satoh ,  Hiroyuki Ono ,  Toshiaki Wada

发明人： Tetsuo Ueda ,  Kiyoshi Satoh ,  Hiroyuki Ono ,  Toshiaki Wada

IPC分类号： G11B5/55 ,  G11B19/02 ,  G11B19/04 ,  G11B21/08 ,  G11B21/10 ,  G11B15/04 ,  G11B5/596

CPC分类号： G11B21/106 ,  G11B21/085 ,  G11B19/02 ,  G11B19/04 ,  G11B5/5547

摘要： A disk drive and a control method for the disk drive to reduce the number of unnecessary write inhibition operations. A microprocessor unit (MPU) 6 sets an allowable value Cv for the velocity of a magnetic head 1 to V0 until the head passes over N1 sectors after completion of a seek operation, Cv to V1 until the head passes over N2 sectors after passage of N1 sectors, and Cv to V2 after passage of N2 sectors. (N1

摘要翻译： 用于磁盘驱动器的磁盘驱动器和控制方法来减少不必要的写入禁止操作的数量。 微处理器单元（MPU）6将磁头1的速度的容许值Cv设定为V0，直到在完成寻道操作之后磁头经过N1个扇区，Cv到V1直到磁头经过N 2扇区 N2部门通过后，Cv到V2。 （N1

公开(公告)号：US5355267A

公开(公告)日：1994-10-11

申请号：US137395

申请日：1993-10-14

申请人： Akihiko Aoyagi ,  Jerry T. Coffey ,  Kiyoshi Satoh

发明人： Akihiko Aoyagi ,  Jerry T. Coffey ,  Kiyoshi Satoh

IPC分类号： G11B5/48 ,  G11B21/16 ,  G11B5/49 ,  G11B21/20

CPC分类号： G11B5/4806 ,  G11B21/16 ,  G11B5/4813

摘要： A suspension for a read/write head of a disk drive is fixed to a side wall of an arm. If two heads are to be suspended, a first suspension for one head and a second suspension for the other head are fixed to opposite side walls of the arm. Since the suspension is fixed to the side wall of the arm, there are no screw heads protruding or projections formed by hot staking on the top and the bottom surfaces of the arm and it is not necessary to make screw holes which extend from the top surface or the bottom surface into the arm perpendicularly to these surfaces. Thus, the vertical thickness of the head carriage assembly can be decreased.

摘要翻译： 用于磁盘驱动器的读/写头的悬架固定到臂的侧壁。 如果要悬挂两个头部，则用于一个头部的第一悬架和用于另一个头部的第二悬架固定到臂的相对侧壁。 由于悬架固定在臂的侧壁上，因此在臂的顶面和底面上没有螺纹头突出或通过热铆接形成的凸起，并且不需要制造从顶面延伸的螺纹孔 或垂直于这些表面的臂的底面。 因此，头托架组件的垂直厚度可以减小。