公开(公告)号：US20110081655A1

公开(公告)日：2011-04-07

申请号：US12997469

申请日：2009-05-13

申请人： Masatoshi Narahara ,  Toshiro Saito ,  Naoshi Itabashi ,  Jiro Yamamoto ,  Hiroyuki Uchiyama

发明人： Masatoshi Narahara ,  Toshiro Saito ,  Naoshi Itabashi ,  Jiro Yamamoto ,  Hiroyuki Uchiyama

IPC分类号： C12Q1/68 ,  C12M1/34

CPC分类号： G01N21/648

摘要： An object of the present invention relates to distinguishing, from a fluorophore of an unreacted substrate, a single fluorophore attached to a nucleotide that is incorporated into a probe by a nucleic acid synthesis. The present invention relates to a nucleic acid analyzing device that analyzes a nucleic acid in sample by fluorescence, wherein a localized surface plasmon is generated by illumination, and a probe for analyzing the nucleic acid in the sample is on the site where the surface plasmon is generated. According to the present invention, since it is possible to efficiently produce fluorescence intensifying effects due to the surface plasmon and to immobilize the probe to a region within the reach of the fluorescence intensifying effects, it becomes possible to measure a nucleic acid synthesis without removing unreacted nucleotide to which fluorophores are attached.

摘要翻译： 本发明的目的在于从未反应的底物的荧光团区分与通过核酸合成并入探针中的核苷酸连接的单个荧光团。 本发明涉及通过荧光分析样品中的核酸的核酸分析装置，其中通过照射产生局部表面等离子体激元，并且用于分析样品中的核酸的探针位于表面等离子体为 生成。 根据本发明，由于可以有效地产生由于表面等离子体激元引起的荧光增强作用并且将探针固定在荧光增强作用范围内的区域，因此可以测量核酸合成而不去除未反应的 附着有荧光团的核苷酸。

公开(公告)号：US08865403B2

公开(公告)日：2014-10-21

申请号：US12997469

申请日：2009-05-13

申请人： Masatoshi Narahara ,  Toshiro Saito ,  Naoshi Itabashi ,  Jiro Yamamoto ,  Hiroyuki Uchiyama

发明人： Masatoshi Narahara ,  Toshiro Saito ,  Naoshi Itabashi ,  Jiro Yamamoto ,  Hiroyuki Uchiyama

IPC分类号： C12Q1/68 ,  C12M1/36 ,  G01N21/00 ,  G01N21/64

CPC分类号： G01N21/648

摘要： An object of the present invention relates to distinguishing, from a fluorophore of an unreacted substrate, a single fluorophore attached to a nucleotide that is incorporated into a probe by a nucleic acid synthesis. The present invention relates to a nucleic acid analyzing device that analyzes a nucleic acid in sample by fluorescence, wherein a localized surface plasmon is generated by illumination, and a probe for analyzing the nucleic acid in the sample is on the site where the surface plasmon is generated. According to the present invention, since it is possible to efficiently produce fluorescence intensifying effects due to the surface plasmon and to immobilize the probe to a region within the reach of the fluorescence intensifying effects, it becomes possible to measure a nucleic acid synthesis without removing unreacted nucleotide to which fluorophores are attached.

摘要翻译： 本发明的目的在于从未反应的底物的荧光团区分与通过核酸合成并入探针中的核苷酸连接的单个荧光团。 本发明涉及通过荧光分析样品中的核酸的核酸分析装置，其中通过照射产生局部表面等离子体激元，并且用于分析样品中的核酸的探针位于表面等离子体为 生成。 根据本发明，由于可以有效地产生由于表面等离子体激元引起的荧光增强作用并且将探针固定在荧光增强作用范围内的区域，因此可以测量核酸合成而不去除未反应的 附着有荧光团的核苷酸。

公开(公告)号：US20130323839A1

公开(公告)日：2013-12-05

申请号：US13996074

申请日：2010-12-22

申请人： Ryosuke Takahashi ,  Akiko Hisada ,  Hiroshi Sonoda ,  Taku Saito ,  Naoshi Itabashi ,  Jiro Yamamoto

发明人： Ryosuke Takahashi ,  Akiko Hisada ,  Hiroshi Sonoda ,  Taku Saito ,  Naoshi Itabashi ,  Jiro Yamamoto

IPC分类号： G01N33/50

CPC分类号： G01N33/5008 ,  C12M25/00 ,  C12M25/06

摘要： Provided is a culture sheet which enables a technique for forming a three-dimensional tissue having uniform diameter without applying any chemical on the surface of a culture substrate. On the culture sheet (150) of the culture substrate, a plurality of holes (152) are formed and nanopillars (153), which are capable of controlling the adhesiveness and migration ability of cells, are formed on the bottom surface of each hole (152), said bottom face serving as a culture surface. The culture surface of each hole (151) is provided with a partition wall (152) and the internal nanopillars (153) are formed in the vicinity of the center of the hole (151). Owing to this configuration, the interaction among the disseminated cells can be restricted so that uniformly sized three-dimensional structures of the cells can be formed.

摘要翻译： 提供一种培养片，其能够形成具有均匀直径的三维组织的技术，而不在培养基材的表面上施加任何化学物质。 在培养基板的培养板（150）上形成有多个孔（152），并且能够控制细胞的粘附性和迁移能力的纳米柱（153）形成在各孔的底面 152），所述底面用作培养表面。 每个孔（151）的培养表面设置有分隔壁（152），并且内孔纳米柱（153）形成在孔（151）的中心附近。 由于这种构造，可以限制扩散细胞之间的相互作用，从而可以形成均匀尺寸的细胞的三维结构。

公开(公告)号：US20140162351A1

公开(公告)日：2014-06-12

申请号：US14131767

申请日：2011-08-29

申请人： Jiro Yamamoto ,  Naoshi Itabashi ,  Taku Saito ,  Akiko Hisada ,  Ryosuke Takahashi ,  Hiroshi Sonoda

发明人： Jiro Yamamoto ,  Naoshi Itabashi ,  Taku Saito ,  Akiko Hisada ,  Ryosuke Takahashi ,  Hiroshi Sonoda

IPC分类号： C12N5/071 ,  B29C59/02 ,  C12N5/04

CPC分类号： C12N5/0602 ,  B29C59/022 ,  C12M23/12 ,  C12M25/00 ,  C12N5/04

摘要： An operating efficiency of an observer is considerably restricted since it is not known at which position a culturing cell is disposed among a great number of pieces of holes of a culturing sheet. The culturing sheet is configured by a partitioning wall, a hole isolated by the partitioning wall, a local culturing region formed with plural local culturing region pillars a height of which is lower than that of the partitioning wall at a portion of a bottom face, and identification mark pillars formed at an identification mark region which differs from the culturing region at the bottom face of the hole. An identification mark is prevented from being unable to be optically recognized by adhering a spheroid to the identification mark region by making a diameter and a height of the identification mark pillar smaller than a diameter and a height of the local culturing pillar.

摘要翻译： 观察者的操作效率受到相当的限制，因为在培养板的大量孔中不设置培养单元的位置。 培养片由分隔壁，由分隔壁隔离的空穴构成，局部培养区形成有多个局部培养区柱，其高度低于底面部分的分隔壁， 识别标记柱形成在与孔底面的培养区域不同的识别标记区域。 通过使识别标记柱的直径和高度小于局部培养柱的直径和高度，通过将球体粘附到识别标记区域来防止识别标记不被光学识别。

公开(公告)号：US20090165951A1

公开(公告)日：2009-07-02

申请号：US12400266

申请日：2009-03-09

申请人： Naoshi Itabashi ,  Tsutomu Tetsuka ,  Atsushi Ito

发明人： Naoshi Itabashi ,  Tsutomu Tetsuka ,  Atsushi Ito

IPC分类号： C23F1/08

CPC分类号： H01J37/3299 ,  H01J37/32183 ,  H01J37/32211 ,  H01J37/32935

摘要： A plasma processing apparatus includes a reaction container with the inner side wall thereof insulated, a sample rest and an antenna arranged in the reaction container. The high-frequency power is supplied to the antenna from a plasma generating power supply, the processing gas is introduced into the reaction container and converted to a plasma, and the sample placed on the sample rest is processed by the plasma. A matching unit for securing the impedance matching is inserted between the plasma generating power supply and a load circuit including the antenna. The matching unit includes a sensor for measuring the impedance characteristic on the load circuit side and a unit for changing the match point and the matching track leading to the match point on the input side of the matching unit in accordance with the measurement by the sensor.

摘要翻译： 等离子体处理装置包括其内侧壁绝缘的反应容器，设置在反应容器中的样品台和天线。 高频电力从等离子体发生电源供给到天线，将处理气体引入反应容器中并转换为等离子体，并且通过等离子体处理放置在样品台上的样品。 用于确保阻抗匹配的匹配单元插入在等离子体发生电源和包括天线的负载电路之间。 匹配单元包括用于测量负载电路侧的阻抗特性的传感器和用于根据传感器的测量改变匹配点和匹配轨道到达匹配单元的输入侧上的匹配点的单元。

公开(公告)号：US20070134922A1

公开(公告)日：2007-06-14

申请号：US11354919

申请日：2006-02-16

申请人： Masahito Mori ,  Toshiaki Nishida ,  Naoshi Itabashi ,  Motohiko Yoshigai ,  Hideyuki Kazumi ,  Kazutami Tago

发明人： Masahito Mori ,  Toshiaki Nishida ,  Naoshi Itabashi ,  Motohiko Yoshigai ,  Hideyuki Kazumi ,  Kazutami Tago

IPC分类号： H01L21/302

CPC分类号： H01L21/32136 ,  H01L21/28123 ,  H01L21/31138 ,  H01L21/32137 ,  H01L21/823828 ,  H01L21/823842 ,  H01L21/823878 ,  H01L21/84 ,  H01L22/26 ,  H01L29/66795

摘要： An etching technique capable of applying etching at high selectivity to a transition metal element-containing electrode material layer which is formed on or above a dielectric material layer made of a high-dielectric-constant or “high-k” insulator is provided. To this end, place a workpiece on a lower electrode located within a vacuum processing vessel. The workpiece has a multilayer structure of an electrode material layer which contains therein a transition metal element and a dielectric material layer made of high-k insulator. Then, while introducing a processing gas into the vacuum processing vessel, high-frequency power is applied to inside of the vacuum processing vessel, thereby performing plasma conversion of the introduced processing gas so that the workpiece is etched at its surface. When etching the electrode material layer, an HCl gas is supplied as the processing gas.

摘要翻译： 提供一种能够以高选择性对在由高介电常数或“高k”绝缘体制成的电介质材料层上形成的含过渡金属元素的电极材料层进行蚀刻的蚀刻技术。 为此，将工件放置在位于真空处理容器内的下电极上。 工件具有电极材料层的多层结构，其中包含过渡金属元件和由高k绝缘体制成的电介质材料层。 然后，在将真空​​处理容器内的处理气体导入真空处理容器的内部的同时，向真空处理容器的内部施加高频电力，进行等离子体转换，使工件在其表面被蚀刻。 当蚀刻电极材料层时，作为处理气体供给HCl气体。

公开(公告)号：US6033481A

公开(公告)日：2000-03-07

申请号：US225971

申请日：1999-01-06

申请人： Ken'etsu Yokogawa ,  Tetsuo Ono ,  Kazunori Tsujimoto ,  Naoshi Itabashi ,  Masahito Mori ,  Shinichi Tachi ,  Keizo Suzuki

发明人： Ken'etsu Yokogawa ,  Tetsuo Ono ,  Kazunori Tsujimoto ,  Naoshi Itabashi ,  Masahito Mori ,  Shinichi Tachi ,  Keizo Suzuki

IPC分类号： C23C16/00 ,  H01J37/32

CPC分类号： H01J37/3222 ,  H01J37/32082 ,  H01J37/32678 ,  H01J2237/3341

摘要： A plasma processing apparatus in which power consumption is reduced, which can generate uniform plasma in a large range and in which minute processing in high etching selectivity and in high aspect ratio is enabled is disclosed. High density plasma is generated in a vacuum vessel housing a processed sample utilizing an electron cyclotron resonance phenomenon caused by an electromagnetic wave in an ultra-high frequency band and a magnetic field and the surface of the processed sample is etched using this plasma. An electromagnetic wave in an ultra-high frequency band for generating plasma is radiated from a planar conductive plate consisting of graphite or silicon which is arranged opposite to the surface of the processed sample into space inside the vacuum vessel. High density plasma in the low degree of dissociation can be generated by using an electromagnetic wave in an ultra-high frequency band and as a result, the controllability of etching reaction can be enhanced. Further, a radical effective in etching can be increased by reaction between the surface of a planar conductive plate for radiating an electromagnetic wave and plasma.

摘要翻译： 公开了能够在大范围内产生均匀的等离子体并能够实现高蚀刻选择性和高纵横比的微小加工的功耗降低的等离子体处理装置。 利用由超高频带和磁场中的电磁波引起的电子回旋共振现象，在容纳加工样品的真空容器中产生高密度等离子体，并且使用该等离子体蚀刻处理样品的表面。 用于产生等离子体的超高频带中的电磁波从由石墨或硅组成的平面导电板辐射，该导电板与被处理样品的表面相对地设置在真空容器内部的空间中。 通过在超高频带中使用电磁波可以产生低解离度的高密度等离子体，结果可以提高蚀刻反应的可控性。 此外，通过用于辐射电磁波的平面导电板的表面与等离子体之间的反应可以增加蚀刻中有效的自由基。

公开(公告)号：US5714757A

公开(公告)日：1998-02-03

申请号：US542562

申请日：1995-10-13

申请人： Naoshi Itabashi ,  Kozo Mochiji ,  Hiroyasu Shichi ,  Seiji Yamamoto ,  Satoshi Osabe ,  Keiichi Kanehori

发明人： Naoshi Itabashi ,  Kozo Mochiji ,  Hiroyasu Shichi ,  Seiji Yamamoto ,  Satoshi Osabe ,  Keiichi Kanehori

IPC分类号： G01N23/225 ,  G01Q90/00 ,  H01J37/252 ,  H01J37/08

CPC分类号： G01N23/2255 ,  H01J37/252 ,  H01J2237/04756

摘要： A surface analyzing method comprising an ion generation step for generating multiply-charged ions of specific ion species and specific charge state; a deceleration step for decelerating the generated multiply-charged ions to a lower kinetic energy than an energy of threshold of sputtering of an objective material; an irradiation step for irradiating the decelerated multiply-charged ions on the surface of a sample; and an analysis step for analyzing particles or light emitted from the surface of said sample by the irradiation of said multiply-charged ions. Apparatus is provided for carrying out the method. Since the ions irradiated on the sample surface are multiply-charged ions having a lower kinetic energy than that of threshold of sputtering of materials constituting a sample, the irradiated ions interact merely with the top surface layer of the sample whereby analyzed information merely from the top surface layer of the sample can be obtained, and as a result, the kind of atoms of the top surface layer of the sample and the bonding state of said atoms can be analyzed with high sensitivity and high resolution.

摘要翻译： 一种表面分析方法，包括用于产生特定离子种类的多电荷离子和特定电荷状态的离子产生步骤; 减速步骤，用于将产生的多电荷离子减速到比目标材料的溅射阈值的能量更低的动能; 照射步骤，用于在样品的表面上照射减速的多电荷离子; 以及分析步骤，用于通过照射所述多电荷离子来分析从所述样品的表面发射的颗粒或光。 提供了用于执行该方法的装置。 由于照射在样品表面上的离子是具有比构成样品的材料的溅射阈值低的动能的多电荷离子，因此照射的离子仅与样品的顶表面层相互作用，从而仅从顶部分析信息 可以获得样品的表面层，结果，可以以高灵敏度和高分辨率分析样品的顶表面层的原子的种类和所述原子的键合状态。

公开(公告)号：US09034270B2

公开(公告)日：2015-05-19

申请号：US13342726

申请日：2012-01-03

申请人： Hiroyuki Kobayashi ,  Takumi Tandou ,  Naoshi Itabashi

发明人： Hiroyuki Kobayashi ,  Takumi Tandou ,  Naoshi Itabashi

IPC分类号： B01J19/08 ,  B66B23/24 ,  B66B31/02 ,  A61L2/14

CPC分类号： B66B31/02 ,  A61L2/14

摘要： Sterilization and cleaning of an escalator hand rail are performed. A sterilization and cleaning device including a hand rail; a plasma source for irradiating the hand rails with ions or radicals or UV light; an enclosure for housing the plasma source; a power source for generating plasma; a fan for generating relatively negative pressure in the enclosure; filter units for removing removed bacteria, viruses, and organic matters such as hand marks; and filter plates located backward and forward of a moving direction of the hand rail in the enclosure along the hand rail is provided.

摘要翻译： 执行自动扶梯扶手的灭菌和清洁。 包括扶手的灭菌和清洁装置; 用于用离子或自由基或UV光照射扶手的等离子体源; 用于容纳等离子体源的外壳; 用于产生等离子体的电源; 用于在外壳中产生相对负压的风扇; 用于除去去除的细菌，病毒和有机物质如手标的过滤单元; 并且提供沿着手导轨位于外壳中的手轨的移动方向的后方和前方的过滤板。

公开(公告)号：US08926790B2

公开(公告)日：2015-01-06

申请号：US11508187

申请日：2006-08-23

申请人： Tsutomu Tetsuka ,  Toshio Masuda ,  Naoshi Itabashi ,  Masanori Kadotani ,  Takashi Fujii

发明人： Tsutomu Tetsuka ,  Toshio Masuda ,  Naoshi Itabashi ,  Masanori Kadotani ,  Takashi Fujii

IPC分类号： H01J37/32 ,  C23C16/455 ,  C23C16/44 ,  C23C16/505

CPC分类号： H01J37/32082 ,  C23C16/4401 ,  C23C16/45565 ,  C23C16/505 ,  H01J37/3244 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32504 ,  H01J37/32559

摘要： The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by reactive gas and heavy-metal contamination caused by plasma damage of components constituting the high-frequency electrode and gas supply unit. The plasma processing apparatus comprises a processing chamber 1 for subjecting a processing substrate 4 to plasma processing, gas supply means 17, 16 and 11 for feeding gas to the processing chamber 1, and an antenna electrode 10 for supplying high-frequency radiation for discharging the gas to generate plasma, wherein the gas supply means includes a gas shower plate 11 having gas discharge holes on the surface exposed to plasma, and a portion of or a whole surface of the conductor 10 exposed to gas constituting the antenna-electrode side of the gas supply means is subjected to ceramic spraying containing no heavy metal to form a protecting film 12.

摘要翻译： 本发明提供一种等离子体处理装置，旨在抑制由构成高频电极和气体供应单元的部件的等离子体损伤引起的反应性气体和重金属污染引起的腐蚀。 等离子体处理装置包括用于对处理基板4进行等离子体处理的处理室1，用于将气体供给到处理室1的气体供给装置17,16和11以及用于提供高频辐射的天线电极10 气体产生等离子体，其中气体供给装置包括在暴露于等离子体的表面上具有气体排放孔的气体喷淋板11和暴露于构成天线电极侧的气体的导体10的一部分或整个表面 气体供给装置经受不含重金属的陶瓷喷涂以形成保护膜12。