Vertically aligned nanostructure scanning probe microscope tips
    5.
    发明申请
    Vertically aligned nanostructure scanning probe microscope tips 失效
    垂直取向的纳米结构扫描探针显微镜技巧

    公开(公告)号:US20050103993A1

    公开(公告)日:2005-05-19

    申请号:US10716770

    申请日:2003-11-19

    IPC分类号: G01Q70/12 G01Q70/16 G12B21/02

    CPC分类号: G01Q70/16 G01Q70/12

    摘要: Methods and apparatus are described for cantilever structures that include a vertically aligned nanostructure, especially vertically aligned carbon nanofiber scanning probe microscope tips. A method includes A method, includes fabricating a cantilever structure having a vertically aligned nanostructure including: forming a doped layer at a first side of a substrate; depositing an etch mask layer on a second side of the substrate; forming a plurality of alignment marks that are coupled to the first side of the substrate; depositing a catalyst nanoparticle at a deterministic site that is coupled to the doped layer; growing the vertically aligned nanostructure at the deterministic site with the catalyst nanoparticle; depositing a first protective layer that surrounds at least a portion of the vertically aligned nanostructure; patterning the first protective layer to define an outline of a cantilever body; transferring the outline of the cantilever body from the first protective layer into the doped layer to form the cantilever body from the doped layer; depositing a second protective layer that coats at least a portion of a surface of the cantilever body; patterning the etch mask layer to define an outline of a relieved volume; transferring the outline of the relieved volume from the etch mask layer into the second side of the substrate to remove the relieved volume from the substrate, where the cantilever body is not removed.

    摘要翻译: 描述了包括垂直排列的纳米结构,特别是垂直排列的碳纳米纤维扫描探针显微镜尖端的悬臂结构的方法和装置。 一种方法包括一种方法,包括制造具有垂直排列的纳米结构的悬臂结构,包括:在衬底的第一侧形成掺杂层; 在所述衬底的第二侧上沉积蚀刻掩模层; 形成耦合到所述基板的第一侧的多个对准标记; 在耦合到掺杂层的确定性位点沉积催化剂纳米颗粒; 用催化剂纳米颗粒在确定性位点生长垂直排列的纳米结构; 沉积围绕所述垂直排列的纳米结构的至少一部分的第一保护层; 图案化第一保护层以限定悬臂体的轮廓; 将悬臂体的轮廓从第一保护层转移到掺杂层中以从掺杂层形成悬臂体; 沉积涂覆悬臂体表面的至少一部分的第二保护层; 图案化蚀刻掩模层以限定释放体积的轮廓; 将缓冲体积的轮廓从蚀刻掩模层转移到衬底的第二侧,以从衬底移除释放体积,其中悬臂体不被去除。